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1. 发明授权

US4771118A Process for manufacturing organic silazane polymers and process for manufacturing ceramics from the polymers 失效
标题翻译：用于制造有机硅氮烷聚合物的方法和由聚合物制造陶瓷的方法
公开(公告)号：US4771118A
公开(公告)日：1988-09-13
申请号：US903409
申请日：1986-09-03
申请人： Minoru Takamizawa , Mitsuo Umemura , Masato Kanari , Yoshihumi Takeda , Akira Hayashida
发明人： Minoru Takamizawa , Mitsuo Umemura , Masato Kanari , Yoshihumi Takeda , Akira Hayashida
IPC分类号： C08G77/48 , C04B35/571 , C04B35/589 , C08G77/62 , C08G77/06
CPC分类号： C04B35/589 , C08G77/62
摘要： A process for manufacturing an organic silazane polymer which comprises reacting ammonia with a mixture of methyldichlorosilane, methyltrichlorosilane and dimethyldichlorosilane to obtain an ammonolysis product. The ammonolysis product is polymerized in the presence of a basic catalyst capable of deprotonation to obtain an organic silazane polymer. The silazane polymer may be further melted, shaped and infusibilized. The thus infusibilized product is finally sintered to obtain a ceramic material.
摘要翻译：一种制备有机硅氮烷聚合物的方法，其包括使氨与甲基二氯硅烷，甲基三氯硅烷和二甲基二氯硅烷的混合物反应以获得氨解产物。氨解产物在能够去质子化的碱性催化剂存在下聚合，得到有机硅氮烷聚合物。硅氮烷聚合物可以进一步熔融，成型和不熔化。将这样的不熔化产物最终烧结得到陶瓷材料。

2. 发明授权

US4870035A Process for manufacturing organic silazane polymers and process for manufacturing ceramics from the polymers 失效
标题翻译：用于制造有机硅氮烷聚合物的方法和由聚合物制造陶瓷的方法
公开(公告)号：US4870035A
公开(公告)日：1989-09-26
申请号：US212438
申请日：1988-06-28
申请人： Minoru Takamizawa , Mitsuo Umemura , Masato Kanari , Yoshihumi Takeda , Akira Hayashida
发明人： Minoru Takamizawa , Mitsuo Umemura , Masato Kanari , Yoshihumi Takeda , Akira Hayashida
IPC分类号： C08G77/48 , C04B35/571 , C04B35/589 , C08G77/62
CPC分类号： C04B35/589 , C08G77/62
摘要： A process for manufacturing an organic silazane polymer which comprises reacting ammonia with a mixture of methyldichlorosilane, methyltrichlorosilane and dimethyldichlorosilane to obtain an ammonolysis product. The ammonolysis product is polymerized in the presence of a basic catalyst capable of deprotonation to obtain an organic silazane polymer. The silazane polymer may be further melted, shaped and infusibilized. The thus infusibilized product is finally sintered to obtain a ceramic material.
摘要翻译：一种制备有机硅氮烷聚合物的方法，其包括使氨与甲基二氯硅烷，甲基三氯硅烷和二甲基二氯硅烷的混合物反应以获得氨解产物。氨解产物在能够去质子化的碱性催化剂存在下聚合，得到有机硅氮烷聚合物。硅氮烷聚合物可以进一步熔融，成型和不熔化。将这样的不熔化产物最终烧结得到陶瓷材料。

3. 发明授权

US4461908A Method for the preparation of methyl hydrogensilanes 失效
标题翻译：甲基氢硅烷的制备方法
公开(公告)号：US4461908A
公开(公告)日：1984-07-24
申请号：US481867
申请日：1983-04-04
申请人： Minoru Takamizawa , Mitsuo Umemura , Taishi Kobayashi
发明人： Minoru Takamizawa , Mitsuo Umemura , Taishi Kobayashi
IPC分类号： C07F7/08
CPC分类号： C07F7/0896
摘要： The invention provides a novel and efficient method for the preparation of methyl hydrogensilanes, e.g. dimethyl silane, 1,1,2,2-tetramethyl disilane and 1,1,2,2,3,3-hexamethyl trisilane, with large demand in the industry of silicones as an intermediate for the synthesis of other valuable organosilicon compounds such as methyl hydrogenchlorosilanes. The inventive method comprises pyrolysis of a methyl polysilane composed of at least 60% by moles of dimethylsilicon units, the balance being monomethyl- and trimethylsilicon units, at a temperature in the range from 350.degree. to 800.degree. C.
摘要翻译：本发明提供了一种制备甲基氢硅烷的新型和有效的方法，例如二甲基硅烷，1,1,2,2-四甲基乙硅烷和1,1,2,2,3,3-六甲基丙硅烷，其中硅氧烷作为合成其它有价值的有机硅化合物的中间体有很大的需求，如甲基氢氯硅烷。本发明的方法包括在350℃至800℃的温度范围内热解由至少60摩尔％的二甲基硅单元组成的甲基聚硅烷，余量为单甲基和三甲基硅单元。

4. 发明授权

US4243607A Process for the preparation of tetrachloroalkanes 失效
标题翻译：四氯烷烃的制备方法
公开(公告)号：US4243607A
公开(公告)日：1981-01-06
申请号：US739049
申请日：1976-11-05
申请人： Minoru Takamizawa , Haruo Okamoto , Mitsuo Umemura , Kazuo Kooya
发明人： Minoru Takamizawa , Haruo Okamoto , Mitsuo Umemura , Kazuo Kooya
IPC分类号： B01J31/00 , C07B61/00 , C07C17/00 , C07C17/275 , C07C19/01 , C07C67/00 , C07C17/28
CPC分类号： C07C17/275
摘要： An ethylenic hydrocarbon is reacted with carbon tetrachloride in the presence of an alkyl phosphite, an iron chloride and a nitrile compound. According to this process, tetrachloroalkanes having more than two carbon atoms can be obtained in high yields.
摘要翻译：在亚烷基烷基酯，氯化铁和腈化合物的存在下，使烯烃与四氯化碳反应。根据该方法，可以高收率地得到碳原子数为2以上的四氯烷烃。

5. 发明授权

US4089882A Method of preparing fluoroalkyl-containing organosilanes 失效
标题翻译：制备含氟烷基的有机硅烷的方法
公开(公告)号：US4089882A
公开(公告)日：1978-05-16
申请号：US812855
申请日：1977-07-05
申请人： Minoru Takamizawa , Mitsuo Umemura , Kazuo Kooya
发明人： Minoru Takamizawa , Mitsuo Umemura , Kazuo Kooya
IPC分类号： C07F7/12 , C07F7/14 , C07F7/18 , C07F7/08
CPC分类号： C07F7/12 , C07F7/14 , C07F7/1804 , C07F7/1876
摘要： Fluoroalkylsilanes of the general formula R'CH.sub.2 CH.sub.2 SiR.sub.n X.sub.3-n are prepared by reaction of an organohydrogensilane of the general formula R.sub.n SiHX.sub.3-n with a fluoroolefin of the general formula R'CH.dbd.CH.sub.2, where R is an alkyl or aryl group, R' is a perfluoroalkyl group, X is a halogen atom or an alkoxy group and n is 0, 1 or 2 in the presence of a binary catalyst composed of a platinum compound and stannous chloride under relatively mild conditions of temperature and pressure, at a very high yield.
摘要翻译：通式R'CH2CH2SiRnX3-n的氟烷基硅烷通过将通式为R n SiHX 3-n的有机氢硅烷与通式R'CH = CH 2的氟烯烃反应制备，其中R是烷基或芳基，R'是在相当温和的温度和压力条件下，在铂化合物和氯化亚锡组成的二元催化剂的存在下，以非常高的产率，X是卤素原子或烷氧基，n是0,1或2。

6. 发明授权

US4870115A Foamable silicone rubber composition 失效
标题翻译：可发泡硅橡胶组合物
公开(公告)号：US4870115A
公开(公告)日：1989-09-26
申请号：US322922
申请日：1989-03-14
申请人： Kunio Itoh , Mitsuo Umemura
发明人： Kunio Itoh , Mitsuo Umemura
IPC分类号： C08J9/02 , C08L83/05 , C08L83/06 , C08L83/07 , C08L83/14
CPC分类号： C08J9/02 , C08L83/14 , C08J2383/04
摘要： A foamable silicone rubber composition, comprising:(A) a polyorganosilphenylenesiloxane copolymer represented by Formula (I): ##STR1## wherein R.sup.1 and R.sup.2 are each a particular monohydrocarbon group, and a and h are each an integer of 1 or more and have the relation of 1.gtoreq.a/b.gtoreq.0.05 and a+b.gtoreq.100,(B) an organosilicon compound containing a particular organosiloxy unit having a hydroxyl group,(C) a polyorganohydrogenosiloxane having at least two particular units having an Si--H bond, and(D) a platinum family metal catalyst.This composition can provide a foam with good mechanical strength.
摘要翻译：一种可发泡硅橡胶组合物，其包含：（A）由式（I）表示的聚有机硅烷基苯基硅氧烷共聚物：其中R 1和R 2各自是特定的单烃基，a和h各自为1的整数并且具有1> / = a / b> / = 0.05和a + b> / = 100的关系，（B）含有具有羟基的特定有机甲硅烷氧基单元的有机硅化合物，（C）聚有机氢硅氧烷至少两个具有Si-H键的特定单元，和（D）铂族金属催化剂。该组合物可以提供具有良好机械强度的泡沫。

7. 发明授权

US5422221A Resist compositions 失效
标题翻译：抗蚀剂组合物
公开(公告)号：US5422221A
公开(公告)日：1995-06-06
申请号：US197524
申请日：1994-02-16
申请人： Satoshi Okazaki , Mitsuo Umemura , Hiroshi Kanbara , Jun Hatakeyama , Tetsuya Inukai , Kazuhiro Nishikawa
发明人： Satoshi Okazaki , Mitsuo Umemura , Hiroshi Kanbara , Jun Hatakeyama , Tetsuya Inukai , Kazuhiro Nishikawa
IPC分类号： C08G8/12 , C08G8/24 , G03F7/023 , H01L21/027
CPC分类号： C08G8/24 , C08G8/12 , G03F7/023 , G03F7/0236
摘要： In a resist composition, a novolak resin including at least one recurring unit of the formula (1): ##STR1## wherein n is an integer of 1 to 4 and m is an integer of 0 to 3, having a weight average molecular weight of 1,000 to 10,000 calculated as polystyrene, and having the hydrogen atom of a hydroxyl group therein replaced by a 1,2-naphthoquinonediazidosulfonyl group in a proportion of 0.03 to 0.27 mol per hydrogen atom serves as an alkali-soluble resin and a photosensitive agent. The composition is uniform in that the photosensitive agent is uniformly incorporated in the novolak resin, and thus forms a uniform resist film. It is a useful positive resist having improved sensitivity, resolution, heat resistance, and film retentivity.
摘要翻译：在抗蚀剂组合物中，包含至少一种式（1）的重复单元的酚醛清漆树脂：m为0〜3的整数，以聚苯乙烯计，重均分子量为1,000〜10,000，具有氢原子的羟基取代为1,2-萘醌二叠氮基磺酰基，每个氢原子为0.03〜0.27mol，用作碱溶性树脂和感光剂。组合物是均匀的，因为感光剂均匀地结合在酚醛清漆树脂中，从而形成均匀的抗蚀剂膜。它是一种有用的正抗蚀剂，具有改进的灵敏度，分辨率，耐热性和膜保持性。

8. 发明申请

US20080272157A1 Sliding Nozzle Device and Pouring Device 审中-公开
标题翻译：滑动喷嘴装置和浇注装置
公开(公告)号：US20080272157A1
公开(公告)日：2008-11-06
申请号：US10592793
申请日：2005-03-14
申请人： Tsuneo Kondo , Hideto Takasugi , Mitsuo Umemura , Yoshinobu Kawai , Tomohiro Yotabun , Hisamori Ikeda , Hisao Inubushi
发明人： Tsuneo Kondo , Hideto Takasugi , Mitsuo Umemura , Yoshinobu Kawai , Tomohiro Yotabun , Hisamori Ikeda , Hisao Inubushi
IPC分类号： B22D41/50
CPC分类号： B22D41/40 , B22D41/24 , B22D41/34
摘要： A fixed plate (15) is provided in a fixed metal frame (14). An opening and closing metal frame (17) having a movable plate (21) is attached to the fixed metal frame (14) so as to be openable and closable. The fixed metal frame (14) is provided with a pressurizing mechanism (23) applying a pressure in a closing direction generated by a spring (25) to the opening and closing metal frame (17) in a closed state. An actuating member (29) is movably provided at a position facing the pressurizing mechanism (23). Cam surfaces (30d, 32a) are provided between the actuating member (29) and the pressurizing mechanism (23). The spring (25) is deformed against an urging force thereof on the basis of operations of the cam surfaces (30d, 32a) in accordance with a movement of the actuating member (29), and the pressure applied to the opening and closing metal frame (17) is strengthened.
摘要翻译：固定板（15）设置在固定金属框架（14）中。具有可移动板（21）的开闭金属框架（17）安装在固定金属框架（14）上以便可开启和关闭。固定金属框架（14）设置有加压机构（23），该加压机构（23）在关闭状态下将由弹簧（25）产生的关闭方向的压力施加到开闭金属框架（17）。致动构件（29）可移动地设置在面向加压机构（23）的位置。凸轮表面（30d，32a）设置在致动构件（29）和加压机构（23）之间。基于致动构件（29）的移动，基于凸轮表面（30d，32a）的操作，弹簧（25）抵抗其作用力变形，并且施加到开闭的压力金属框架（17）被加强。

9. 发明授权

US5541037A Anti-reflective material and patterning method 失效
标题翻译：抗反射材料和图案化方法
公开(公告)号：US5541037A
公开(公告)日：1996-07-30
申请号：US360045
申请日：1994-12-20
申请人： Jun Hatakeyama , Mitsuo Umemura , Hirohumi Kishita
发明人： Jun Hatakeyama , Mitsuo Umemura , Hirohumi Kishita
IPC分类号： G03F7/11 , C09D171/00 , C09D171/02 , C09K3/00 , G03F7/09 , H01L21/027 , G03C1/825
CPC分类号： G03F7/091
摘要： The invention provides an anti-reflective material comprising a salt of a carboxyl-terminated fluorinated alkyl polyether compound with a water-soluble amino compound. A resist pattern is defined by forming anti-reflective layer of the anti-reflective material on a photoresist layer, exposing the photoresist layer to a desired pattern of light, removing the anti-reflective layer, and developing the photoresist layer. A fine resist pattern having improved dimensional and alignment accuracies can be defined in a simple, efficient, reproducible manner without substantial environmental pollution. The invention is advantageously utilized in photo-lithography using photoresists.
摘要翻译：本发明提供一种抗反射材料，其包含羧基封端的氟化烷基聚醚化合物与水溶性氨基化合物的盐。通过在抗蚀剂层上形成抗反射材料的抗反射层，将光致抗蚀剂层暴露于期望的光图形，去除抗反射层和显影光致抗蚀剂层来限定抗蚀剂图案。具有改进的尺寸和对准精度的精细抗蚀剂图案可以以简单，有效，可再现的方式来定义，而没有实质的环境污染。本发明有利地用于使用光致抗蚀剂的光刻技术中。

10. 发明授权

US5795700A Method for forming resist pattern with enhanced contrast film 失效
标题翻译：用增强的对比膜形成抗蚀剂图案的方法
公开(公告)号：US5795700A
公开(公告)日：1998-08-18
申请号：US604369
申请日：1996-02-21
申请人： Jun Hatakeyama , Mitsuo Umemura , Toshinobu Ishihara , Satoshi Watanabe
发明人： Jun Hatakeyama , Mitsuo Umemura , Toshinobu Ishihara , Satoshi Watanabe
IPC分类号： G03F7/26 , G03F7/09 , H01L21/027 , H01L21/30 , H01L21/47 , G03C5/00
CPC分类号： G03F7/091
摘要： A resist pattern is formed on a substrate by forming a water-soluble resist film on the substrate, forming a contrast enhancing film on the resist film from a contrast enhancing composition comprising a specific arylnitrone compound of formula (1), pre-baking the resist film before or after formation of the contrast enhancing film, exposing the resist film to light through the contrast enhancing film, baking the films after exposure, removing the contrast enhancing film after the baking step, and developing the resist film. The process forms a resist pattern having a fully rectangular profile and an improved focus margin. The conventional apparatus can be utilized without substantial modification, achieving a cost reduction. ##STR1## wherein R.sup.1, R.sup.2, and R.sup.3 are independently an alkyl radical, an aryl radical or a hydrogen atom, R.sup.4 to R.sup.8 are independently an alkyl radical, a hydrogen atom or a carboxyl radical, at least one of R.sup.4 to R.sup.8 being a carboxyl radical, X is a hydrogen atom, an alkoxy radical represented by R.sup.9 O--, or a dialkylamino radical represented by R.sup.10 R.sup.11 N-- wherein R.sup.9 is an alkyl radical, R.sup.10 and R.sup.11 are independently an alkyl radical, and letter n ha a value of 0, 1 or 2.
摘要翻译：通过在基板上形成水溶性抗蚀剂膜，在抗蚀剂膜上形成对比度增强膜，从包含特定的式（1）的芳基硝酮化合物的对比度增强组合物形成抗蚀剂图案，预烘烤抗蚀剂形成对比度增强膜之前或之后的膜，通过对比度增强膜将抗蚀剂膜曝光，在曝光后烘烤膜，在烘烤步骤之后除去对比度增强膜，并显影抗蚀剂膜。该工艺形成具有完全矩形轮廓和改进的聚焦余量的抗蚀剂图案。可以在不进行实质性修改的情况下利用传统的装置，从而实现成本降低。（1）其中R1，R2和R3独立地是烷基，芳基或氢原子，R4至R8独立地是烷基，氢原子或羧基，R4至 R8是羧基，X是氢原子，由R9O-表示的烷氧基或由R10R11N-表示的二烷基氨基，其中R9是烷基，R10和R11独立地是烷基，并且字母n是一个值为0，1或2。

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