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    • 2. 发明申请
    • Transistor apparatus
    • 晶体管装置
    • US20070246800A1
    • 2007-10-25
    • US11408775
    • 2006-04-21
    • Leland SwansonGregory Howard
    • Leland SwansonGregory Howard
    • H01L27/12
    • H01L29/7322H01L29/0821
    • A transistor apparatus includes a silicon substrate and a barrier structure extending substantially from generally adjacent the silicon substrate to a locus displaced from the silicon substrate. The barrier structure generally surrounds a volume containing connection loci for the transistor apparatus and a buried layer in a silicon medium. The connection loci and the buried layer occupy a space generally presenting a first lateral expanse generally parallel with the silicon substrate. The volume presents a second lateral expanse generally parallel with the silicon substrate. The second lateral expanse is greater than the first lateral expanse within a predetermined distance of the substrate.
    • 晶体管装置包括硅衬底和基本上从硅衬底基本上相邻延伸到从硅衬底移位的轨迹的阻挡结构。 阻挡结构通常围绕用于晶体管装置的连接轨迹和硅介质中的掩埋层的体积。 连接轨迹和埋层占据通常呈现与硅衬底大致平行的第一横向宽度的空间。 体积呈现与硅衬底大致平行的第二横向宽度。 第二横向宽度大于在衬底的预定距离内的第一横向宽度。
    • 3. 发明申请
    • System and method for clamping a differential amplifier
    • 用于钳位差分放大器的系统和方法
    • US20070152753A1
    • 2007-07-05
    • US11325843
    • 2006-01-05
    • Leland Swanson
    • Leland Swanson
    • H03F3/45
    • H03F3/45475H03F1/12H03F3/45183H03F2200/153H03F2203/45101H03F2203/45138H03F2203/45186H03F2203/45628H03F2203/45636
    • System and method for limiting an output signal of a differential amplifier. A preferred embodiment comprises a limit sense amplifier configured to detect when the output exceeds a permitted limit, a common mode bias current unit configured to increase a signal gain of a common mode amplifier in the differential operational amplifier when the limit sense amplifier detects that the output exceeded the permitted limit, and an output stage bias current unit configured to fix the output at a level substantially equal to the specified limit when the limit sense amplifier detects that the output exceeded the permitted limit. The clamping is achieved by changing the operation of circuitry within the differential amplifier and results in a smoother clamping that helps to maintain stable operation.
    • 限制差分放大器输出信号的系统和方法。 优选实施例包括限制读出放大器,其被配置为检测何时输出超过允许极限;共模偏置电流单元,其被配置为当限位读出放大器检测到输出时增加差分运算放大器中的共模放大器的信号增益 以及输出级偏置电流单元,其配置为当限位读出放大器检测到输出超过允许极限时将输出固定在基本上等于指定极限的电平。 通过改变差分放大器内部电路的运行来实现钳位,从而实现更平滑的钳位,有助于保持稳定运行。
    • 4. 发明申请
    • Versatile system for cross-lateral junction field effect transisor
    • 用于跨横向连接场效应的通用系统
    • US20060151804A1
    • 2006-07-13
    • US11031586
    • 2005-01-07
    • Gregory HowardLeland Swanson
    • Gregory HowardLeland Swanson
    • H01L29/423
    • H01L29/808H01L29/0692
    • The present invention provides a system for providing a cross-lateral junction field effect transistor (114) having desired high-performance desired voltage, frequency or current characteristics. The cross-lateral transistor is formed on a commercial semiconductor substrate (102). A channel structure (124) is formed along the substrate, having source (120) and drain (122) structures laterally formed on opposites sides thereof. A first gate structure (116) is formed along the substrate, laterally adjoining the channel structure orthogonal to the source and drain structures. A second gate structure (118) is formed along the substrate, laterally adjoining the channel structure, orthogonal to the source and drain structures and opposite the first gate structure.
    • 本发明提供了一种用于提供具有期望的高性能期望电压,频率或电流特性的横向结型场效应晶体管(114)的系统。 横向晶体管形成在商用半导体衬底(102)上。 沿着衬底形成通道结构(124),其具有在其相对侧上横向形成的源极(120)和漏极(122)结构。 第一栅极结构(116)沿着衬底形成,横向邻接与源极和漏极结构正交的沟道结构。 第二栅极结构(118)沿着衬底形成,横向邻接沟道结构,垂直于源极和漏极结构并与第一栅极结构相对。
    • 6. 发明授权
    • Versatile system for cross-lateral junction field effect transistor
    • 用于跨横向结型场效应晶体管的多功能系统
    • US07459357B2
    • 2008-12-02
    • US11839832
    • 2007-08-16
    • Gregory E HowardLeland Swanson
    • Gregory E HowardLeland Swanson
    • H01L21/337
    • H01L29/808H01L29/0692
    • The present invention provides a system for providing a cross-lateral junction field effect transistor (114) having desired high-performance desired voltage, frequency or current characteristics. The cross-lateral transistor is formed on a commercial semiconductor substrate (102). A channel structure (124) is formed along the substrate, having source (120) and drain (122) structures laterally formed on opposites sides thereof. A first gate structure (116) is formed along the substrate, laterally adjoining the channel structure orthogonal to the source and drain structures. A second gate structure (118) is formed along the substrate, laterally adjoining the channel structure, orthogonal to the source and drain structures and opposite the first gate stricture.
    • 本发明提供了一种用于提供具有期望的高性能期望电压,频率或电流特性的横向结型场效应晶体管(114)的系统。 横向晶体管形成在商用半导体衬底(102)上。 沿着衬底形成通道结构(124),其具有在其相对侧上横向形成的源极(120)和漏极(122)结构。 第一栅极结构(116)沿着衬底形成,横向邻接与源极和漏极结构正交的沟道结构。 沿着衬底形成第二栅极结构(118),其横向邻接沟道结构,垂直于源极和漏极结构并与第一栅极狭窄相对。