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1. 发明申请

US20070294870A1 Multi-stage flow control apparatus and method of use 审中-公开
标题翻译：多级流量控制装置及其使用方法
公开(公告)号：US20070294870A1
公开(公告)日：2007-12-27
申请号：US11475365
申请日：2006-06-27
申请人： Ming-Kuei Tseng , Kim Vellore
发明人： Ming-Kuei Tseng , Kim Vellore
IPC分类号： H01L21/67
CPC分类号： H01L21/67225 , G05D7/0647 , H01L21/6715
摘要： A multi-stage flow control apparatus for use during the processing of a semiconductor substrate is provided. The multi-stage flow control apparatus includes a first inlet and a second inlet, an outlet, and a first throttle valve stage coupled to the first inlet. The first throttle valve stage includes a first throttle valve plug located within the first throttle valve stage. The first throttle valve plug is configured to control the amount of airflow through the first throttle valve stage by modulating the distance between the first throttle valve plug and faces of the first throttle valve stage. The multi-stage flow control apparatus further includes a second throttle valve stage coupled to the second inlet. The second throttle valve stage includes a second throttle valve plug located within the second throttle valve stage. The second throttle valve plug is configured to control the amount of airflow through the second throttle valve stage by modulating the distance between the second throttle valve plug and faces of the second throttle valve stage. In addition, the multi-stage flow control apparatus includes a floating plunger stage coupled to the throttle valve stage.
摘要翻译：提供了一种在半导体衬底的处理期间使用的多级流量控制装置。多级流量控制装置包括第一入口和第二入口，出口以及联接到第一入口的第一节流阀级。第一节流阀级包括位于第一节流阀级内的第一节流阀塞。第一节流阀塞构造成通过调节第一节流阀塞与第一节流阀级的面之间的距离来控制通过第一节流阀级的气流量。多级流量控制装置还包括联接到第二入口的第二节流阀级。第二节流阀级包括位于第二节流阀级内的第二节流阀塞。第二节流阀塞构造成通过调节第二节流阀塞与第二节流阀级的面之间的距离来控制通过第二节流阀级的气流量。此外，多级流量控制装置包括联接到节流阀级的浮动柱塞级。

2. 发明授权

US07677958B2 Retaining ring with flange for chemical mechanical polishing 有权
标题翻译：带法兰的挡圈用于化学机械抛光
公开(公告)号：US07677958B2
公开(公告)日：2010-03-16
申请号：US11506477
申请日：2006-08-17
申请人： Dan A. Marohl , Ming-Kuei Tseng
发明人： Dan A. Marohl , Ming-Kuei Tseng
IPC分类号： B24B47/26
CPC分类号： B24B37/32 , H01L21/30625
摘要： A retaining ring has a generally annular body with a top surface, a bottom surface, an inner diameter surface, and an outer diameter surface. The outer diameter surface includes an outwardly projecting flange having a lower surface, and the bottom surface includes a plurality of channels.
摘要翻译：保持环具有大致环形体，其具有顶表面，底表面，内径表面和外径表面。外径表面包括具有下表面的向外突出的凸缘，并且底表面包括多个通道。

3. 发明申请

US20070131562A1 Method and apparatus for planarizing a substrate with low fluid consumption 审中-公开
标题翻译：用于以低流体消耗平坦化基板的方法和装置
公开(公告)号：US20070131562A1
公开(公告)日：2007-06-14
申请号：US11298643
申请日：2005-12-08
申请人： Zhihong Wang , Ming-Kuei Tseng , Yuan Tian , Yongqi Hu , Stan Tsai
发明人： Zhihong Wang , Ming-Kuei Tseng , Yuan Tian , Yongqi Hu , Stan Tsai
IPC分类号： B23H3/00
CPC分类号： B23H5/08 , B24B37/04 , B24B57/02 , C25D5/06 , C25D5/08 , C25D7/12 , C25D17/001
摘要： The embodiments of the invention generally relate to a method and apparatus for processing a substrate with reduced fluid consumption. Embodiments of the invention may be beneficially utilized in chemical mechanical and electrochemical mechanical polishing processes, among other processes where conservation of a processing fluid disposed on a rotating pad is desirable. In one embodiment, a processing fluid delivery arm assembly is provided that includes a nozzle assembly supported at a distal end of an arm. The nozzle assembly includes a nozzle that is adjustable to control the delivery of fluid exiting therefrom in two planes relative to the arm. In another embodiment, processing fluid in the form of electrolyte fills holes formed at least partially through the pad as they enter the wet zone, and a current is driven through the electrolyte, filling the holes between a substrate and an electrode disposed below the surface of the pad.
摘要翻译：本发明的实施例一般涉及用于处理具有减少的流体消耗的基板的方法和装置。本发明的实施例可以有利地用于化学机械和电化学机械抛光工艺以及其它工艺中，其中设置在旋转焊盘上的处理流体的保护是期望的。在一个实施例中，提供了一种处理流体输送臂组件，其包括支撑在臂的远端处的喷嘴组件。喷嘴组件包括可调节的喷嘴，以控制从相对于臂的两个平面离开的流体的输送。在另一个实施方案中，电解液形式的处理流体在其进入湿区时填充至少部分地通过焊盘形成的孔，并且电流驱动通过电解质，填充基板和设置在下表面之下的电极之间的孔垫

4. 发明授权

US06890249B1 Carrier head with edge load retaining ring 有权
标题翻译：承载头带边缘负载保持环
公开(公告)号：US06890249B1
公开(公告)日：2005-05-10
申请号：US10327236
申请日：2002-12-20
申请人： Steven M. Zuniga , Ming-Kuei Tseng
发明人： Steven M. Zuniga , Ming-Kuei Tseng
IPC分类号： B24B37/04 , B24B47/02
CPC分类号： B24B37/32
摘要： A carrier head for chemical mechanical polishing of a substrate having a front surface, a back surface and an edge. The carrier head has a base, an inner retaining ring positioned beneath the base, and an outer retaining ring surrounding the inner retaining ring to retain the inner retaining ring. The inner retaining ring has a main portion with a first surface to apply a load to a perimeter portion of the back surface of the substrate and an annular lower projection protruding downwardly from the main portion with a second surface to circumferentially surround the edge of the substrate to retain the substrate.
摘要翻译：用于具有前表面，后表面和边缘的基底的化学机械抛光的载体头。承载头具有基座，位于基座下方的内部保持环和围绕内部保持环以保持内部保持环的外部保持环。内保持环具有主要部分，其具有第一表面，以将负载施加到基板的后表面的周边部分;以及环形下突出部，其从主体部分向下突出并具有第二表面以周向地围绕基板的边缘以保持基底。

5. 发明授权

US07678245B2 Method and apparatus for electrochemical mechanical processing 失效
标题翻译：电化学机械加工的方法和装置
公开(公告)号：US07678245B2
公开(公告)日：2010-03-16
申请号：US10880752
申请日：2004-06-30
申请人： Yan Wang , Siew Neo , Feng Liu , Stan D. Tsai , Yongqi Hu , Alain Duboust , Antoine Manens , Ralph M. Wadensweiler , Rashid Mavliev , Liang-Yuh Chen , Donald J. K. Olgado , Paul D. Butterfield , Ming-Kuei Tseng , Shou-Sung Chang , Lizhong Sun
发明人： Yan Wang , Siew Neo , Feng Liu , Stan D. Tsai , Yongqi Hu , Alain Duboust , Antoine Manens , Ralph M. Wadensweiler , Rashid Mavliev , Liang-Yuh Chen , Donald J. K. Olgado , Paul D. Butterfield , Ming-Kuei Tseng , Shou-Sung Chang , Lizhong Sun
IPC分类号： C25B9/00
CPC分类号： B23H5/06 , B23H5/08 , B23H5/10 , B24B37/046 , B24B37/16 , B24B49/16 , B24B53/017 , H01L21/32125
摘要： Embodiments of the invention generally provide a method and apparatus for processing a substrate in an electrochemical mechanical planarizing system. In one embodiment, a cell for polishing a substrate includes a processing pad disposed on a top surface of a platen assembly. A plurality of conductive elements are arranged in a spaced-apart relation across the upper planarizing surface and adapted to bias the substrate relative to an electrode disposed between the pad and the platen assembly. A plurality of passages are formed through the platen assembly between the top surface and a plenum defined within the platen assembly. In another embodiment, a system is provided having a bulk processing cell and a residual processing cell. The residual processing cell includes a biased conductive planarizing surface. In further embodiments, the conductive element is protected from attack by process chemistries.
摘要翻译：本发明的实施方案通常提供用于在电化学机械平面化系统中处理基底的方法和装置。在一个实施例中，用于抛光衬底的单元包括设置在压板组件的顶表面上的处理衬垫。多个导电元件跨过上平坦化表面以间隔的关系布置，并且适于相对于设置在垫和压板组件之间的电极偏压衬底。多个通道通过压板组件形成在顶表面和限定在压板组件内的气室之间。在另一个实施例中，提供了具有批处理单元和残余处理单元的系统。残余处理单元包括偏置的导电平面化表面。在另外的实施方案中，保护导电元件免受过程化学物质的侵蚀。

6. 发明授权

US07134948B2 Magnetically secured retaining ring 失效
标题翻译：磁性固定保持环
公开(公告)号：US07134948B2
公开(公告)日：2006-11-14
申请号：US11316413
申请日：2005-12-21
申请人： Ming-Kuei Tseng , Ralph M. Wadensweiler
发明人： Ming-Kuei Tseng , Ralph M. Wadensweiler
IPC分类号： B24B5/00
CPC分类号： B24B37/32
摘要： A retaining ring having a bottom portion that is removable from the ring's upper portion is described. The upper and lower portions of the retaining ring include one or more magnetic bodies and/or one or more bodies formed of a material that is attracted to magnets.
摘要翻译：描述了具有可从环的上部移除的底部的保持环。保持环的上部和下部包括一个或多个磁体和/或由吸附到磁体的材料形成的一个或多个主体。

7. 发明授权

US06547641B2 Carrier head with a substrate sensor 失效
公开(公告)号：US06547641B2
公开(公告)日：2003-04-15
申请号：US10091700
申请日：2002-03-04
申请人： Steven M. Zuniga , Ming-Kuei Tseng
发明人： Steven M. Zuniga , Ming-Kuei Tseng
IPC分类号： B24B4900
CPC分类号： B24B37/30 , B24B37/0053 , B24B49/00 , H01L21/681
摘要： A carrier head for a chemical mechanical polishing system includes a flexible membrane with a substrate receiving surface, a sensor mechanism to determine if a substrate is properly attached to the carrier head, and means for preventing fluid that may be located between the substrate and the flexible membrane from interfering with the substrate detection mechanism.

8. 发明申请

US20070295269A1 Multi-stage flow control apparatus with flexible membrane and method of use 审中-公开
标题翻译：具有柔性膜的多级流量控制装置及其使用方法
公开(公告)号：US20070295269A1
公开(公告)日：2007-12-27
申请号：US11475688
申请日：2006-06-27
申请人： Ming-Kuei Tseng
发明人： Ming-Kuei Tseng
IPC分类号： C23C14/00 , B05C13/02
CPC分类号： G05D7/0647
摘要： A method and apparatus for maintaining constant exhaust flow during processing of a semiconductor substrate is provided. For example, the apparatus may include an inlet and an outlet. Furthermore, the apparatus may include a throttle valve stage coupled to the inlet. The throttle valve stage includes a throttle valve plug located within the throttle valve stage. The throttle valve plug is configured to control the amount of airflow through the throttle valve stage by modulating the distance between the throttle valve plug and faces of the throttle valve stage. The apparatus further includes a floating plunger stage coupled to the throttle valve stage. The floating plunger stage includes a floating plunger coupled to a flexible attachment. The flexible attachment allows the floating plunger to move in a controlled manner to vary an opening between the floating plunger and the outlet.
摘要翻译：提供一种用于在半导体衬底的处理期间保持恒定排气流的方法和装置。例如，该装置可以包括入口和出口。此外，该装置可以包括联接到入口的节气门台。节流阀级包括位于节流阀级内的节流阀塞。节气门塞被构造成通过调节节流阀塞与节流阀级面之间的距离来控制通过节流阀级的气流量。该装置还包括联接到节流阀级的浮动柱塞级。浮动柱塞台包括联接到柔性附件的浮动柱塞。柔性附件允许浮动柱塞以受控的方式移动以改变浮动柱塞和出口之间的开口。

9. 发明授权

US07101273B2 Carrier head with gimbal mechanism 有权
标题翻译：承载头与万向架机构
公开(公告)号：US07101273B2
公开(公告)日：2006-09-05
申请号：US11237062
申请日：2005-09-28
申请人： Ming-Kuei Tseng , Steven M. Zuniga
发明人： Ming-Kuei Tseng , Steven M. Zuniga
IPC分类号： B24B5/00
CPC分类号： B24B37/30
摘要： A carrier head includes a housing connectable to a drive shaft to rotate therewith, a lower assembly having a substrate mounting surface, and a gimbal mechanism that connects the housing to the lower assembly to permit the lower assembly to pivot with respect to the housing about an axis substantially parallel to the polishing surface. The gimbal mechanism includes a shaft having an upper end slidably disposed in a vertical passage in a vertical passage in the housing, and a lower member that connects a lower end of the shaft to the lower assembly. The lower member bends to permit the base to pivot with respect to the housing. The shaft and the lower member are a unitary body.
摘要翻译：载体头包括可连接到驱动轴以与其一起旋转的壳体，具有基板安装表面的下部组件和将壳体连接到下部组件的万向节机构，以允许下部组件相对于壳体绕枢轴转动基本上平行于抛光表面。万向架机构包括：轴，其上端部可滑动地设置在壳体中的垂直通道中的垂直通道中;以及下部构件，其将轴的下端连接到下部组件。下部构件弯曲以允许基部相对于壳体枢转。轴和下部构件是一体的。

10. 发明申请

US20060025058A1 Carrier head with gimbal mechanism 有权
公开(公告)号：US20060025058A1
公开(公告)日：2006-02-02
申请号：US11237062
申请日：2005-09-28
申请人： Ming-Kuei Tseng , Steven Zuniga
发明人： Ming-Kuei Tseng , Steven Zuniga
IPC分类号： B24B29/00
CPC分类号： B24B37/30
摘要： A carrier head includes a housing connectable to a drive shaft to rotate therewith, a lower assembly having a substrate mounting surface, and a gimbal mechanism that connects the housing to the lower assembly to permit the lower assembly to pivot with respect to the housing about an axis substantially parallel to the polishing surface. The gimbal mechanism includes a shaft having an upper end slidably disposed in a vertical passage in a vertical passage in the housing, and a lower member that connects a lower end of the shaft to the lower assembly. The lower member bends to permit the base to pivot with respect to the housing. The shaft and the lower member are a unitary body.

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