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1. 发明授权

US07956403B2 Two-bit flash memory 有权
标题翻译：两位闪存
公开(公告)号：US07956403B2
公开(公告)日：2011-06-07
申请号：US12099168
申请日：2008-04-08
申请人： Ming-Cheng Chang , Wei-Ming Liao , Jer-Chyi Wang , Yi-Feng Chang
发明人： Ming-Cheng Chang , Wei-Ming Liao , Jer-Chyi Wang , Yi-Feng Chang
IPC分类号： H01L29/788
CPC分类号： H01L29/7887 , H01L21/28273 , H01L29/42336
摘要： A flash memory includes a substrate with a protrusion, a control gate, two floating gates, and a dielectric layer. The protrusion extends from a top face of the substrate. The control gate is formed on the protrusion of the substrate and extendedly covers opposite sidewalls of the protrusion. The floating gates are respectively formed on top of the protrusion and being on two opposite sides of the control gate. The dielectric layer is sandwiched the control gate and each of the two floating gates. Because of the arcuate control gate used in the flash memory, the controllability of the control gate is increased and the memory cell window is enhanced.
摘要翻译：闪存包括具有突起的基板，控制栅极，两个浮动栅极和介电层。突出部从基板的顶面延伸。控制栅极形成在基板的突起上并且延伸地覆盖突起的相对的侧壁。浮动栅极分别形成在突起的顶部并且位于控制栅极的两个相对侧上。电介质层夹在控制栅极和两个浮栅之中。由于在闪速存储器中使用的弧形控制门，所以控制栅极的可控性增加并且存储单元窗口被增强。

2. 发明申请

US20090085089A1 TWO-BIT FLASH MEMORY 有权
标题翻译：两位闪存
公开(公告)号：US20090085089A1
公开(公告)日：2009-04-02
申请号：US12099168
申请日：2008-04-08
申请人： Ming-Cheng Chang , Wei-Ming Liao , Jer-Chyi Wang , Yi-Feng Chang
发明人： Ming-Cheng Chang , Wei-Ming Liao , Jer-Chyi Wang , Yi-Feng Chang
IPC分类号： H01L29/788
CPC分类号： H01L29/7887 , H01L21/28273 , H01L29/42336
摘要： A flash memory includes a substrate with a protrusion, a control gate, two floating gates, and a dielectric layer. The protrusion extends from a top face of the substrate. The control gate is formed on the protrusion of the substrate and extendedly covers opposite sidewalls of the protrusion. The floating gates are respectively formed on top of the protrusion and being on two opposite sides of the control gate. The dielectric layer is sandwiched the control gate and each of the two floating gates. Because of the arcuate control gate used in the flash memory, the controllability of the control gate is increased and the memory cell window is enhanced.
摘要翻译：闪存包括具有突起的基板，控制栅极，两个浮动栅极和介电层。突出部从基板的顶面延伸。控制栅极形成在基板的突起上并且延伸地覆盖突起的相对的侧壁。浮动栅极分别形成在突起的顶部并且位于控制栅极的两个相对侧上。电介质层夹在控制栅极和两个浮栅之中。由于在闪速存储器中使用的弧形控制门，所以控制栅极的可控性增加并且存储单元窗口被增强。

3. 发明申请

US20090090955A1 ELEVATED CHANNEL FLASH DEVICE AND MANUFACTURING METHOD THEREOF 审中-公开
标题翻译：高通道闪光器件及其制造方法
公开(公告)号：US20090090955A1
公开(公告)日：2009-04-09
申请号：US12057391
申请日：2008-03-28
申请人： Jer-Chyi Wang , Ming-Cheng Chang , Yi-Feng Chang , Wei-Ming Liao , Chien-Chang Huang
发明人： Jer-Chyi Wang , Ming-Cheng Chang , Yi-Feng Chang , Wei-Ming Liao , Chien-Chang Huang
IPC分类号： H01L21/336 , H01L29/788
CPC分类号： H01L29/7887 , H01L29/40114 , H01L29/66825 , H01L29/7851
摘要： A FLASH device including a substrate having a protrusive portion integrally formed thereon, two floating gates, a control gate and a dielectric layer is provided. The two floating gates are disposed on two sides of the protrusive portion and respectively covering a portion of the protrusive portion. The control gate is disposed on top of the protrusive portion and sandwiched between the two floating gates. The dielectric layer is disposed between each of the two floating gates and the control gate. Because the control gate of the FLASH device is disposed on the protrusive portion, an elevated channel can be formed. Moreover, because of the position of the two floating gates, an effective floating gate (FG) length can be increased without impacting the cell density.
摘要翻译：一种闪存装置，其特征在于，具备：一体地形成有突出部的基板，两个浮置栅极，控制栅极和电介质层。两个浮动门设置在突出部分的两侧并分别覆盖突出部分的一部分。控制门设置在突出部分的顶部并夹在两个浮动门之间。介电层设置在两个浮动栅极和控制栅极之间。因为FLASH装置的控制门设置在突出部分上，所以可以形成升高的通道。此外，由于两个浮栅的位置，可以增加有效浮栅（FG）长度而不影响单元密度。

4. 发明申请

US20090020801A1 TWO-BIT FLASH MEMORY CELL STRUCTURE AND METHOD OF MAKING THE SAME 审中-公开
标题翻译：双位闪存存储器单元结构及其制造方法
公开(公告)号：US20090020801A1
公开(公告)日：2009-01-22
申请号：US11951344
申请日：2007-12-06
申请人： Wei-Ming Liao , Ming-Cheng Chang , Jer-Chyi Wang
发明人： Wei-Ming Liao , Ming-Cheng Chang , Jer-Chyi Wang
IPC分类号： H01L29/788 , H01L21/336
CPC分类号： H01L29/7887 , H01L29/40114 , H01L29/42324 , H01L29/66825
摘要： A flash memory cell includes a control gate oxide layer on a substrate, a T-shaped control gate on the control gate oxide layer, a floating gate disposed on two recessed sidewalls of the T-shaped control gate, an insulating layer between the control gate and the floating gate, a dielectric layer between the floating gate and the substrate, a spacer on the sidewall of the floating gate, a P+ source/drain region next to the spacer, and an N+ pocket region encompassing the P+ source/drain region and covering the area directly under the floating gate.
摘要翻译：闪存单元包括衬底上的控制栅极氧化层，控制栅极氧化层上的T形控制栅极，设置在T形控制栅极的两个凹入侧壁上的浮置栅极，控制栅极之间的绝缘层浮置栅极和浮置栅极之间的电介质层，浮置栅极的侧壁上的间隔物，隔着间隔物的P +源极/漏极区域和包围P +源极/漏极区域的N +穴状区域，以及覆盖浮动门下方的区域。

5. 发明申请

US20080283904A1 TWO-BIT FLASH MEMORY CELL AND METHOD FOR MANUFACTURING THE SAME 审中-公开
标题翻译：双位闪存存储器单元及其制造方法
公开(公告)号：US20080283904A1
公开(公告)日：2008-11-20
申请号：US11828334
申请日：2007-07-25
申请人： Ming-Cheng Chang , Wei-Ming Liao , Jer-Chyi Wang , Chien-Chang Huang
发明人： Ming-Cheng Chang , Wei-Ming Liao , Jer-Chyi Wang , Chien-Chang Huang
IPC分类号： H01L29/792
CPC分类号： H01L29/7887 , H01L29/40114
摘要： A two-bit flash memory cell includes a substrate, a gate oxide layer disposed on the substrate, a gate stacked on the gate oxide layer. A charge storage spacer stack is disposed at either side of the gate. The charge storage spacer stack includes a bottom charge storage layer and an upper spacer layer. An insulating layer is disposed between the charge storage spacer stack and the gate. A liner is disposed underneath the bottom charge storage layer. A source/drain region is disposed at one side of the bottom charge storage layer within the substrate.
摘要翻译：两位闪存单元包括衬底，设置在衬底上的栅极氧化物层，堆叠在栅极氧化物层上的栅极。电荷存储间隔堆叠设置在栅极的任一侧。电荷存储间隔堆叠包括底部电荷存储层和上部间隔层。绝缘层设置在电荷存储间隔堆叠和栅极之间。衬底设置在底部电荷存储层下面。源极/漏极区域设置在衬底内的底部电荷存储层的一侧。

6. 发明申请

US20090108321A1 FLASH MEMORY 审中-公开
标题翻译：闪存
公开(公告)号：US20090108321A1
公开(公告)日：2009-04-30
申请号：US11948947
申请日：2007-11-30
申请人： Ming-Cheng Chang , Wei-Ming Liao , Jer-Chyi Wang , Chien-Chang Huang
发明人： Ming-Cheng Chang , Wei-Ming Liao , Jer-Chyi Wang , Chien-Chang Huang
IPC分类号： H01L29/788
CPC分类号： G11C16/0458 , H01L29/40114 , H01L29/42324 , H01L29/7887
摘要： A flash memory is provided. The flash memory includes a substrate, a first insulation layer formed on the substrate, a control gate disposed on the first insulation layer, and two floating gates coplanar with the substrate respectively disposed on both sides of the control gate.
摘要翻译：提供闪存。闪速存储器包括基板，形成在基板上的第一绝缘层，设置在第一绝缘层上的控制栅极和与分别设置在控制栅极两侧的基板共面的两个浮动栅极。

7. 发明申请

US20080265342A1 TWO-BIT FLASH MEMORY CELL AND METHOD FOR MANUFACTURING THE SAME 审中-公开
标题翻译：双位闪存存储器单元及其制造方法
公开(公告)号：US20080265342A1
公开(公告)日：2008-10-30
申请号：US11780482
申请日：2007-07-20
申请人： Ming-Cheng Chang , Wei-Ming Liao , Jer-Chyi Wang , Chien-Chang Huang
发明人： Ming-Cheng Chang , Wei-Ming Liao , Jer-Chyi Wang , Chien-Chang Huang
IPC分类号： H01L29/78
CPC分类号： H01L29/7923 , H01L29/40117 , H01L29/42348
摘要： A two-bit flash memory cell includes a substrate, a gate oxide layer disposed on the substrate, a T-shaped gate on the gate oxide layer. A first charge storage layer is disposed at one side of and under the T-shaped gate. A second charge storage layer, which is separated from the first charge storage layer by a bottom portion of the T-shaped gate and the gate oxide layer, is disposed at the other side of and under the T-shaped gate. An insulating layer is disposed between the T-shaped gate and the gate oxide layer. A first source/drain region is disposed at one side of the T-shaped gate within the substrate. A second source/drain region is disposed at the other side of the T-shaped gate within the substrate.
摘要翻译：两位闪存单元包括衬底，设置在衬底上的栅极氧化物层，栅极氧化物层上的T形栅极。第一电荷存储层设置在T形门的一侧和下方。通过T形栅极和栅极氧化物层的底部与第一电荷存储层分离的第二电荷存储层设置在T形栅极的另一侧和下方。绝缘层设置在T形栅极和栅极氧化物层之间。第一源极/漏极区域设置在衬底内的T形栅极的一侧。第二源极/漏极区域设置在衬底内的T形栅极的另一侧。

8. 发明授权

US07667262B2 Two bit U-shaped memory structure and method of making the same 有权
标题翻译：两位U形记忆体结构及制作方法
公开(公告)号：US07667262B2
公开(公告)日：2010-02-23
申请号：US12139499
申请日：2008-06-15
申请人： Wei-Ming Liao , Jer-Chyi Wang
发明人： Wei-Ming Liao , Jer-Chyi Wang
IPC分类号： H01L29/788
CPC分类号： H01L27/11521 , H01L27/115 , H01L29/1037 , H01L29/1041 , H01L29/42336 , H01L29/66825 , H01L29/7887
摘要： A memory structure includes: a substrate; a control gate positioned on the substrate; floating gates positioned at two sides of the control gate, wherein the floating gates have a U-shaped bottom embedded in the substrate; a first dielectric layer positioned between the control gate and the substrate; a second dielectric layer positioned between the U-shaped bottom of the floating gates and the substrate; a third dielectric layer positioned between the control gate and the floating gates; a local doping region positioned around the floating gates channel; and a source/drain doping region positioned in the substrate at a side of the floating gates.
摘要翻译：存储器结构包括：衬底; 位于所述基板上的控制门; 位于控制栅极两侧的浮动栅极，其中浮动栅极具有埋入基板中的U形底部; 位于所述控制栅极和所述衬底之间的第一电介质层; 位于浮置栅极的U形底部和衬底之间的第二电介质层; 位于所述控制栅极和所述浮动栅极之间的第三介电层; 位于浮动栅极通道周围的局部掺杂区域; 以及位于浮动栅极一侧的衬底中的源极/漏极掺杂区域。

9. 发明申请

US20090256189A1 TWO BIT U-SHAPED MEMORY STRUCTURE AND METHOD OF MAKING THE SAME 有权
标题翻译：两位U形存储器结构及其制造方法
公开(公告)号：US20090256189A1
公开(公告)日：2009-10-15
申请号：US12139499
申请日：2008-06-15
申请人： Wei-Ming Liao , Jer-Chyi Wang
发明人： Wei-Ming Liao , Jer-Chyi Wang
IPC分类号： H01L29/788 , H01L21/336
CPC分类号： H01L27/11521 , H01L27/115 , H01L29/1037 , H01L29/1041 , H01L29/42336 , H01L29/66825 , H01L29/7887
摘要： A memory structure includes: a substrate; a control gate positioned on the substrate; floating gates positioned at two sides of the control gate, wherein the floating gates have a U-shaped bottom embedded in the substrate; a first dielectric layer positioned between the control gate and the substrate; a second dielectric layer positioned between the U-shaped bottom of the floating gates and the substrate; a third dielectric layer positioned between the control gate and the floating gates; a local doping region positioned around the floating gates channel; and a source/drain doping region positioned in the substrate at a side of the floating gates.
摘要翻译：存储器结构包括：衬底; 位于所述基板上的控制门; 位于控制栅极两侧的浮动栅极，其中浮动栅极具有埋入基板中的U形底部; 位于所述控制栅极和所述衬底之间的第一电介质层; 位于浮置栅极的U形底部和衬底之间的第二电介质层; 位于所述控制栅极和所述浮动栅极之间的第三介电层; 位于浮动栅极通道周围的局部掺杂区域; 以及位于浮动栅极一侧的衬底中的源极/漏极掺杂区域。

10. 发明申请

US20090267126A1 RECESS CHANNEL TRANSISTOR 审中-公开
标题翻译：录音通道晶体管
公开(公告)号：US20090267126A1
公开(公告)日：2009-10-29
申请号：US12141070
申请日：2008-06-17
申请人： Jer-Chyi Wang , Wei-Ming Liao
发明人： Jer-Chyi Wang , Wei-Ming Liao
IPC分类号： H01L27/108
CPC分类号： H01L27/10876 , H01L21/823437 , H01L21/823487 , H01L27/10823
摘要： A recess channel transistor includes a semiconductor substrate; a trench isolation region in the semiconductor substrate, which defines an active area; a gate trench in the active area, wherein the gate trench includes a round lower portion; a recessed gate embedded in the gate trench with a spherical gate portion situated in the round lower portion; a gate oxide layer in the round lower portion between the semiconductor substrate and the spherical gate portion; a source region in the active area at one side of the recessed gate; a drain region in the active area at the other side of the recessed gate; and a channel region between the source region and the drain region, wherein the channel region presents a convex curve profile when viewed from a channel widthwise direction.
摘要翻译：凹槽通道晶体管包括半导体衬底; 半导体衬底中的沟槽隔离区域，其限定有源区域; 所述有源区中的栅极沟槽，其中所述栅极沟槽包括圆形下部; 嵌入栅极沟槽中的凹入栅极，其具有位于圆形下部中的球形栅极部分; 在半导体衬底和球形栅极部分之间的圆形下部中的栅氧化层; 在所述凹入栅极的一侧的有源区域中的源极区域; 在所述凹入栅极的另一侧的所述有源区域中的漏极区域; 以及源极区域和漏极区域之间的沟道区域，其中当从沟道宽度方向观察时，沟道区域呈现凸曲线轮廓。

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