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    • 8. 发明授权
    • Process for forming an organic thin film
    • 用于形成有机薄膜的方法
    • US4604294A
    • 1986-08-05
    • US660230
    • 1984-10-12
    • Masahiro TanakaKazufumi AzumaKazuo NateMitsuo Nakatani
    • Masahiro TanakaKazufumi AzumaKazuo NateMitsuo Nakatani
    • G03C1/76B05D3/06B05D7/24
    • B05D1/60B05D3/06
    • An organic thin film consisting essentially of an organic compound is formed on a substrate surface by vacuum vapor deposition by exposing the organic compound as a vapor source to a laser beam having an energy level corresponding to that of the chemical bond of the organic compound, thereby sputtering the organic compound onto a substrate surface in vacuum and forming the organic thin film thereon. When a light or radiation-sensitive organic compound is used as the vapor source, a light or radiation-sensitive resist film is formed. The thin film thus formed retains the original chemical structure of the vapor source, and has a good flatness. Resolvability of resist film is improved owing to the absence of pin holes and particulate matters. A resist film having a higher sensitivity and a better contrast is formed by heating the substrate during the vapor deposition.
    • 通过将有机化合物作为蒸汽源暴露于具有与有机化合物的化学键的能级对应的能级的激光束,通过真空汽相沉积在基板表面上形成基本上由有机化合物构成的有机薄膜,由此 在真空中将有机化合物溅射到基板表面上并在其上形成有机薄膜。 当使用光或辐射敏感的有机化合物作为蒸气源时,形成光或辐射敏感的抗蚀剂膜。 由此形成的薄膜保持蒸气源的原始化学结构,并且具有良好的平坦度。 由于没有针孔和颗粒物质,抗蚀剂膜的可分离性得到改善。 通过在气相沉积期间加热基底来形成具有更高灵敏度和更好对比度的抗蚀剂膜。