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1. 发明授权

US5182231A Method for modifying wiring of semiconductor device 失效
标题翻译：修改半导体器件布线的方法
公开(公告)号：US5182231A
公开(公告)日：1993-01-26
申请号：US528064
申请日：1990-05-23
申请人： Mikio Hongo , Katsuro Mizukoshi , Shyuzo Sano , Takashi Kamimura , Takahiko Takahashi
发明人： Mikio Hongo , Katsuro Mizukoshi , Shyuzo Sano , Takashi Kamimura , Takahiko Takahashi
IPC分类号： H01L21/768 , H01L23/525 , H01L23/532
CPC分类号： H01L23/53257 , H01L21/76892 , H01L23/5254 , H01L2924/0002
摘要： The wiring of a semiconductor device having a multilayer interconnection on a semiconductor substrate is modified. A plurality of fine holes are formed on an insulation film by the radiation of a converged energy beam to expose selected ones of the internal lines of the underlying wiring. A thin buffer film of Cr, Ti, TiN, or W is formed along a path where an additional connection line is to be deposited. The path extends along an upper surface of the insulating film at least in and between the said fine holes. The additional connection line is deposited on the buffer film by energy beam CVD, using Mo, W, or Al, to interconnect the exposed internal lines. The additional connection line is annealed by radiating an energy beam thereon to reduce its resistance. A further insulating film is deposited covering the additional connection line by energy beam CVD.
摘要翻译：在半导体衬底上具有多层互连的半导体器件的布线被改变。通过会聚能量束的辐射在绝缘膜上形成多个细孔，以暴露底层布线的选定内部线。沿着要沉积另外的连接线的路径形成Cr，Ti，TiN或W的薄缓冲膜。该路径至少在所述细孔之间和之间沿绝缘膜的上表面延伸。通过使用Mo，W或Al的能量束CVD将附加连接线沉积在缓冲膜上以互连暴露的内部线。附加连接线通过在其上辐射能量束来降低其电阻而退火。通过能量束CVD沉积覆盖附加连接线的另一绝缘膜。

2. 发明授权

US5026664A Method of providing a semiconductor IC device with an additional conduction path 失效
标题翻译：提供具有附加传导路径的半导体IC器件的方法
公开(公告)号：US5026664A
公开(公告)日：1991-06-25
申请号：US334145
申请日：1989-04-06
申请人： Mikio Hongo , Katsuro Mizukoshi , Shuzo Sano , Takashi Kamimura , Fumikazu Itoh , Akira Shimase , Satoshi Haraichi , Takahiko Takahashi
发明人： Mikio Hongo , Katsuro Mizukoshi , Shuzo Sano , Takashi Kamimura , Fumikazu Itoh , Akira Shimase , Satoshi Haraichi , Takahiko Takahashi
IPC分类号： H01L21/3205 , H01L21/768 , H01L23/52
CPC分类号： H01L21/76838 , H01L21/32051 , H01L21/76892 , Y10S148/093
摘要： A semiconductor IC device having a substrate, a patterned conductor layer for interconnection of regions in the substrate and a passivation layer covering the device is provided with an additional conduction path of a pattern and/or part of the patterned conductor layer is removed for disconnection for the purpose of evaluation of the characteristics of the device. The additional conduction path is formed by forming a hole in the passivation layer to expose a part of the conductor layer, directing, in an atmosphere containing a metal compound gas, an ion beam onto the hole and onto a predetermined portion of the passivation layer on which the additional conduction path of a pattern is to be formed to thereby form a patterned film of the metal decomposed from the metal compound gas and forming an additional conductor on the patterned film. The provision of the additional conduction path and/or the removal of part of the patterned conductor layer is preformed in a chemical vapor deposition apparatus which includes a vacuum chamber and an ion beam radiation unit having a housing partitioned into, for example, first, second and third compartments. The ion beam radiation unit has an ion source placed in the first compartment, an ion beam focusing and deflecting device placed in the second compartment and pressure buffer constituted by the third compartment. The third compartment is coupled to and pneumatically isolated from the vacuum chamber for conducting an ion beam emitted from the ion source, passing the second compartment and ejected from the second compartment to the vacuum chamber.
摘要翻译：具有衬底，用于衬底中的区域的互连的图案化导体层和覆盖该器件的钝化层的半导体IC器件被设置有去除图案和/或图案化导体层的一部分的附加传导路径用于断开评估设备特点的目的。附加传导路径是通过在钝化层中形成一个孔而露出导体层的一部分而形成的，该导体层的一部分在包含金属化合物气体的气氛中引导离子束到孔上并延伸到钝化层的预定部分上其形成图案的附加传导路径，从而形成从金属化合物气体分解的金属的图案化膜，并在图案化膜上形成附加导体。提供额外的传导路径和/或去除图案化的导体层的一部分在化学气相沉积设备中预先形成，该化学气相沉积设备包括真空室和离子束辐射单元，该单元具有被分隔成例如第一，第二和第三个隔间。离子束辐射单元具有放置在第一隔室中的离子源，放置在第二隔室中的离子束聚焦和偏转装置以及由第三隔间构成的压力缓冲器。第三隔室与真空室联接并气动隔离，用于传导从离子源发射的离子束，通过第二隔室并从第二隔室喷射到真空室。

3. 发明申请

US20080231376A1 Oscillation circuit controlling phase difference of output signals 审中-公开
标题翻译：振荡电路控制输出信号的相位差
公开(公告)号：US20080231376A1
公开(公告)日：2008-09-25
申请号：US11724015
申请日：2007-03-14
申请人： Masaki Kinoshita , Satoshi Terada , Takashi Kamimura
发明人： Masaki Kinoshita , Satoshi Terada , Takashi Kamimura
IPC分类号： H03L7/00
CPC分类号： H03L7/0995 , H03K3/0322 , H03L7/0998
摘要： A ring oscillation circuit composed of multiple op amps connected in series in a loop configuration is included to output a first output signal by adding multiple output signals of multiple op amps and to output a second output signal by adding all remaining output signals of multiple op amps.
摘要翻译：包括以环路配置串联连接的多个运算放大器组成的环形振荡电路，通过添加多个运算放大器的多个输出信号来输出第一输出信号，并通过加上多个运算放大器的所有剩余输出信号来输出第二输出信号。

4. 发明授权

US06427100B1 Motor control apparatus for hybrid vehicle 有权
标题翻译：混合动力汽车电机控制装置
公开(公告)号：US06427100B1
公开(公告)日：2002-07-30
申请号：US09686901
申请日：2000-10-12
申请人： Toshiaki Kaku , Takashi Kamimura
发明人： Toshiaki Kaku , Takashi Kamimura
IPC分类号： B60L1102
CPC分类号： B60W20/50 , B60K6/48 , B60L3/0038 , B60L3/0084 , B60L3/04 , B60L11/14 , B60L15/20 , B60L2240/80 , B60W10/06 , B60W10/08 , B60W20/00 , B60W2050/021 , Y02T10/6221 , Y02T10/6286 , Y02T10/645 , Y02T10/70 , Y02T10/7077 , Y02T10/72 , Y02T10/7275 , Y10S903/903
摘要： Disclosed is a motor control apparatus which can detect an abnormality in a feedback control loop and can suppress a change in the behavior of a vehicle that does not meet a driver's demand when the abnormality occurs. A motor control apparatus for a hybrid vehicle with an engine for outputting driving force of the vehicle, a motor for generating driving force for assisting the output from the engine and a battery for supplying power to the motor and for storing electric energy regenerated by the motor acting as a generator when the driving force is not required, is provided with: a detector for detecting supplied power to the motor or supplied current to the motor; a feedback controller for performing feedback control to keep the supplied power or the supplied current at a target value based on the detection result from the detector; an abnormality detector for detecting an abnormality in the detector; and an abnormality processing device for fixing supplied power or supplied current to the motor to a predetermined value by reducing a gain in the feedback control or stopping the feedback control until a predetermined time elapses since detection of an abnormality in the detector, and stopping controlling the motor after the predetermined time elapses since detection of the abnormality.
摘要翻译：公开了一种电动机控制装置，其可以检测反馈控制回路中的异常，并且可以在发生异常时抑制不符合驾驶员需求的车辆的行为的变化。一种用于混合动力车辆的电动机控制装置，其具有用于输出车辆的驱动力的发动机，用于产生用于辅助来自发动机的输出的驱动力的电动机和用于向电动机供电并且用于存储由电动机再生的电能的电池在不需要驱动力的情况下作为发电机，设置有检测器，用于检测对电动机的供电或供给到电动机的电流; 反馈控制器，用于执行反馈控制，以基于来自检测器的检测结果将所提供的功率或所提供的电流保持在目标值; 用于检测检测器中的异常的异常检测器; 以及异常处理装置，用于通过减少反馈控制中的增益或停止反馈控制将供给的电力或供给电流固定到电动机达到预定值，直到从检测器中的异常检测到经过预定时间，并且停止控制从检测到异常起经过了预定时间之后的电动机。

5. 发明授权

US5825035A Processing method and apparatus using focused ion beam generating means 失效
标题翻译：使用聚焦离子束产生装置的处理方法和装置
公开(公告)号：US5825035A
公开(公告)日：1998-10-20
申请号：US745657
申请日：1996-11-08
申请人： Michinobu Mizumura , Yuuichi Hamamura , Junzou Azuma , Akira Shimase , Takashi Kamimura , Fumikazu Itoh , Kaoru Umemura , Yoshimi Kawanami , Yuuichi Madokoro
发明人： Michinobu Mizumura , Yuuichi Hamamura , Junzou Azuma , Akira Shimase , Takashi Kamimura , Fumikazu Itoh , Kaoru Umemura , Yoshimi Kawanami , Yuuichi Madokoro
IPC分类号： H01J37/317
CPC分类号： H01J37/3056 , H01J2237/0802 , H01J2237/0805 , H01J2237/0807 , H01J2237/0817 , H01J2237/31732 , H01J2237/31742
摘要： A processing method using a plasma ion source for generating a focused ion beam, characterized by covering, with an insulator, an inner wall of a plasma holding vessel excluding a reference electrode for applying a voltage to a plasma and an ion extraction electrode for extracting ions from the plasma, and employing means of continuously controlling the absolute value of an ion beam current in a range of from 1 to 10 .mu.A by changing the absolute value of an ion extraction voltage applied between the reference electrode and the ion extraction electrode in a range of from 0 to 100 V; and an apparatus for carrying out the processing method. This is advantageous in stabilizing the ion beam current and in preventing the ion beam from being made dim even when the current value of the ion beam is changed.
摘要翻译：一种使用等离子体离子源产生聚焦离子束的处理方法，其特征在于，用绝缘体覆盖除了用于向等离子体施加电压的参考电极之外的等离子体保持容器的内壁和用于提取离子的离子提取电极并且通过改变在参考电极和离子提取电极之间施加的离子提取电压的绝对值，在1至10μA的范围内连续地控制离子束电流的绝对值的方法，范围为0〜100V; 以及用于执行处理方法的装置。这有利于稳定离子束电流，并且即使当离子束的电流值改变时也防止离子束变暗。

6. 发明授权

US5583344A Process method and apparatus using focused ion beam generating means 失效
公开(公告)号：US5583344A
公开(公告)日：1996-12-10
申请号：US595993
申请日：1996-02-09
申请人： Michinobu Mizumura , Yuuichi Hamamura , Junzou Azuma , Akira Shimase , Takashi Kamimura , Fumikazu Itoh , Kaoru Umemura , Yoshimi Kawanami , Yuuichi Madokoro
发明人： Michinobu Mizumura , Yuuichi Hamamura , Junzou Azuma , Akira Shimase , Takashi Kamimura , Fumikazu Itoh , Kaoru Umemura , Yoshimi Kawanami , Yuuichi Madokoro
IPC分类号： G01Q30/20 , G01Q60/52 , H01J37/305 , H01J37/317
CPC分类号： H01J37/3056 , H01J2237/0802 , H01J2237/0805 , H01J2237/0807 , H01J2237/0817 , H01J2237/31732 , H01J2237/31742 , H01J2237/31749
摘要： A processing method and a processing apparatus realizing the method use a focused ion beam generator. The apparatus includes a plasma or liquid metal ion source producing ions not influencing electric characteristics of a sample, an ion beam generator for extracting ions from the ion source into an ion beam, an ion beam focusing device for focusing the ion beam, an irradiator for irradiating the focused ion beam onto the sample, and a sample chamber in which the sample to be irradiated for processing is installed. The focused ion beam is irradiated onto a sample such as a silicon wafer or device to conduct on a particular position of the sample a fine machining work, a fine layer accumulation, and an analysis.

7. 发明授权

US4479848A Etching method and apparatus 失效
标题翻译：蚀刻方法和装置
公开(公告)号：US4479848A
公开(公告)日：1984-10-30
申请号：US579941
申请日：1984-02-14
申请人： Toru Otsubo , Susumu Aiuchi , Takashi Kamimura
发明人： Toru Otsubo , Susumu Aiuchi , Takashi Kamimura
IPC分类号： C23F4/00 , H01J37/32 , H01L21/302 , H01L21/3065 , H01L21/306 , B44C1/22 , C03C15/00 , C23F1/02
CPC分类号： H01J37/32935 , H01L21/302
摘要： The present invention consists in an etching method and apparatus wherein an optical image which is reflected from a region of a dicing stripe pattern on a substrate to-be-etched, such as a semiconductor wafer, is focused by a projecting optical system during selective etching. The focused pattern is converted into an image signal by an image detector, and a change of contrast in the region of the dicing stripe pattern is determined from the image signal. Based on this, an ending time for the etching can be decided from the change of contrast.
摘要翻译：本发明是一种蚀刻方法和装置，其中在选择性刻蚀中通过投影光学系统聚焦由半导体晶片等待刻蚀的基板上的切割条纹图案的区域反射的光学图像。通过图像检测器将聚焦图案转换为图像信号，并根据图像信号确定切割条纹图案区域中的对比度变化。基于此，可以根据对比度的变化来确定蚀刻的结束时间。

8. 发明授权

US07576117B1 Cyclic amine CCR3 antagonist 失效
标题翻译：环胺CCR3拮抗剂
公开(公告)号：US07576117B1
公开(公告)日：2009-08-18
申请号：US10031698
申请日：2000-08-04
申请人： Tatsuki Shiota , Masaki Sudoh , Tomonori Yokoyama , Yumiko Muroga , Takashi Kamimura , Akinobu Nakanishi
发明人： Tatsuki Shiota , Masaki Sudoh , Tomonori Yokoyama , Yumiko Muroga , Takashi Kamimura , Akinobu Nakanishi
IPC分类号： A61K31/40 , A61K31/38
CPC分类号： C07D207/14 , A61K31/40 , A61K31/445
摘要： A medicine containing, as an active ingredient, a cyclic amine derivative represented by the following formula (I), a pharmaceutically acceptable acid addition salt thereof or a pharmaceutically acceptable C1 to C6 alkyl addition salt thereof. The medicine has an action for treating or preventing diseases in which CCR3 participates, such as asthma and allergic rhinitis.
摘要翻译：含有下式（I）表示的环状胺衍生物，其药学上可接受的酸加成盐或其药学上可接受的C1〜C6烷基加成盐作为有效成分的药物。该药物具有治疗或预防CCR3参与疾病的作用，如哮喘和过敏性鼻炎。

9. 发明申请

US20050287142A1 Remedies or preventives for rheumatoid arthritis 审中-公开
标题翻译：类风湿关节炎的治疗或预防措施
公开(公告)号：US20050287142A1
公开(公告)日：2005-12-29
申请号：US11207785
申请日：2005-08-22
申请人： Yasunori Nakayama , Takashi Kamimura , Tohru Akahoshi , Hirobumi Kondo
发明人： Yasunori Nakayama , Takashi Kamimura , Tohru Akahoshi , Hirobumi Kondo
IPC分类号： A61K31/00 , A61K31/711 , A61K38/19 , A61K48/00 , A61P19/02 , A61P29/00 , C07K16/24 , A61K39/395
CPC分类号： A61K31/00 , A61K31/711 , A61K38/195 , A61K48/00 , A61K2039/505 , C07K16/24 , G01N33/5029 , G01N33/5044 , G01N2800/102
摘要： This invention provides a therapeutic agent for treating or preventing rheumatoid arthritis containing a LARC inhibitor or a LARC receptor inhibitor.
摘要翻译：本发明提供治疗或预防含有LARC抑制剂或LARC受体抑制剂的类风湿性关节炎的治疗剂。

10. 发明授权

US5656811A Method for making specimen and apparatus thereof 失效
标题翻译：制作标本及其装置的方法
公开(公告)号：US5656811A
公开(公告)日：1997-08-12
申请号：US490423
申请日：1995-06-14
申请人： Fumikazu Itoh , Toshihiko Nakata , Tohru Ishitani , Akira Shimase , Hiroshi Yamaguchi , Takashi Kamimura
发明人： Fumikazu Itoh , Toshihiko Nakata , Tohru Ishitani , Akira Shimase , Hiroshi Yamaguchi , Takashi Kamimura
IPC分类号： G01B11/06 , B23K15/00 , C23F4/00 , G01N1/28 , G01N1/32 , G01Q60/00 , H01J37/26 , H01J37/28 , H01J37/304 , H01J37/305 , H01J37/317 , H01L21/66 , H01J37/30
CPC分类号： H01J37/3056 , G01N1/32 , H01J37/226 , H01J37/3005 , H01J37/304 , H01J2237/30466 , H01J2237/3114 , H01J2237/31745
摘要： A method for making a specimen for use in observation through a transparent electron microscope, includes a step of milling part of the specimen into a thin film part, which can be observed through a transparent electron microscope, by scanning and irradiating a focused ion beam onto the specimen, a step of observing a mark for detection of a position provided on the specimen as a secondary charged particle image by scanning and irradiating a charged particle beam onto the specimen without irradiating the charged particle beam onto the portion to be milled into the thin film part during the milling, and a step of compensating for positional drift of the focused ion beam during milling in accordance with a result of the observation. The method is carried out by an apparatus which includes irradiation area control means for controlling an irradiation area of the focused ion beam onto the specimen so that a surface of the specimen to be milled into the thin film part is not included in the secondary charged particle image when the secondary charged particle image of the surface, on which the mark for detecting the milling position of the specimen is formed, is displayed by the secondary charged particle image during milling part of the specimen, and compensation means for compensating the positional drift of the focused ion beam during milling in accordance with the mark for detecting the milling position.
摘要翻译：通过透明电子显微镜制造用于观察的试样的方法包括通过扫描和照射聚焦离子束将样品的一部分研磨成薄膜部分的步骤，其可以通过透明电子显微镜观察样品，通过扫描并将带电粒子束照射到样本上而不将所述被加入的颗粒束照射到待研磨的部分上来观察用于检测设置在样品上的位置的标记作为二次带电粒子图像的步骤，在研磨期间的薄膜部分，以及根据观察结果补偿在研磨期间聚焦离子束的位置漂移的步骤。该方法由包括照射区域控制装置的装置进行，该照射区域控制装置用于将聚焦离子束的照射区域控制在样本上，使得待研磨到薄膜部分中的样品的表面不包括在二次带电粒子中当在样品的研磨部分期间，通过二次带电粒子图像显示用于检测样品的研磨位置的标记的表面的二次带电粒子图像的图像，以及用于补偿样品的位置漂移的补偿装置根据用于检测铣削位置的标记在铣削期间聚焦的离子束。

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