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1. 发明授权

US4850709A Fabri-perot spectroscopy method and apparatus utilizing the same 失效
标题翻译： Fabri-perot光谱法和利用该法的装置
公开(公告)号：US4850709A
公开(公告)日：1989-07-25
申请号：US19665
申请日：1987-02-27
申请人： Mikichi Ban , Osamu Kakuchi , Hironori Yamamoto , Masaru Ohtsuka , Osamu Shiba , Kazuhiko Hara
发明人： Mikichi Ban , Osamu Kakuchi , Hironori Yamamoto , Masaru Ohtsuka , Osamu Shiba , Kazuhiko Hara
IPC分类号： G01J3/26
CPC分类号： G01J3/26
摘要： Fabri-Perot spectroscopy method comprises a step of directing a light beam at a first refraction angle to a first Fabri-Perot interference plate and a step of directing a light beam transmitted through the first Fabri-Perot interference plate to a second Fabri-Perot interference plate at a second refraction angle, and Fabri-Perot spectroscopy apparatus comprises Fabri-Perot interference plates, a control device for changing a spacing between the Fabri-Perot interference plates, a first optical device for directing a light beam to the first Fabri-Perot interference plate at a first refraction angle, a second optical device for directing the light beam transmitted through the Fabri-Perot interference plate at a second refraction angle different from the first refraction angle to the second Fabri-Perot interference plate, and a seal for externally sealing the Fabri-Perot interference plates. Gas for protecting the Fabri-Perot interference plates is filled in the sealed space.
摘要翻译： Fabri-Pérot光谱法包括将第一折射角的光束引导到第一Fabri-Pérot干涉板的步骤和将透射通过第一Fabri-Pérot干涉板的光束引导到第二Fabri-Pérot干涉平板以第二折射角，Fabri-Pérot光谱装置包括Fabri-Pérot干涉板，用于改变Fabri-Pérot干涉板之间的间距的控制装置，用于将光束引导到第一Fabri-Pérot的第一光学装置在第一折射角处的干涉板，用于将透射通过Fabri-Pérot干涉板的光束以不同于第一折射角的第二折射角引导到第二Fabri-Pérot干涉板的第二光学装置，以及用于外部的密封件密封Fabri-Pérot干涉板。用于保护Fabri-Pérot干涉板的气体填充在密封空间中。

2. 发明授权

US5087121A Depth/height measuring device 失效
标题翻译：深度/高度测量装置
公开(公告)号：US5087121A
公开(公告)日：1992-02-11
申请号：US593253
申请日：1990-10-01
申请人： Osamu Kakuchi , Mikichi Ban
发明人： Osamu Kakuchi , Mikichi Ban
IPC分类号： G01B11/06 , G01B11/22
CPC分类号： G01B11/22 , G01B11/0608
摘要： A device for measuring depth of a groove formed on an article includes a light source for illuminating the article, a first detector for receiving light from a portion of the article having a groove and being illuminated by the light source, and for detecting a spectral reflectance in relation to the received light, a second detector for receiving light from the article illuminated by the light source and for detecting a spectral reflectance in relation to the received light, the second detector being effective to detect the spectral reflectance in a way not affected or substantially not affected by the groove of the article as compared with the detection by the first detector, and a depth detector for detecting the depth of the groove on the basis of the results of detection by the first and second detectors.
摘要翻译：用于测量形成在物品上的凹槽的深度的装置包括用于照亮物品的光源，用于接收来自具有凹槽并由光源照射的物品的一部分的光的第一检测器，并用于检测光谱反射率相对于所接收的光，第二检测器用于接收由光源照射的物品的光并且用于检测相对于接收的光的光谱反射率，第二检测器有效地以不受影响的方式检测光谱反射率，与第一检测器的检测相比基本上不受制品的凹槽的影响;以及深度检测器，用于基于第一和第二检测器的检测结果来检测凹槽的深度。

3. 发明授权

US07023561B2 Exposure apparatus with interferometer 失效
标题翻译：带干涉仪的曝光装置
公开(公告)号：US07023561B2
公开(公告)日：2006-04-04
申请号：US10620389
申请日：2003-07-17
申请人： Osamu Kakuchi , Eiichi Murakami
发明人： Osamu Kakuchi , Eiichi Murakami
IPC分类号： G01B9/02
CPC分类号： G03F7/706 , G01B9/02098
摘要： A projection exposure apparatus includes an exposure light source, an illumination system for illuminating a pattern, formed on a first object, with light from the exposure light source, a projection optical system for projecting a pattern, as illuminated with the light, onto a second object, and an interferometer for use in measurement of an optical characteristic of the projection optical system, wherein the interferometer is operable to perform the measurement by use of light from the exposure light source.
摘要翻译：投影曝光装置包括：曝光光源，用于照射形成在第一物体上的图案的照明系统，其具有来自曝光光源的光;投影光学系统，用于将由光照射的图案投影到第二物体和用于测量投影光学系统的光学特性的干涉仪，其中干涉仪可操作以通过使用来自曝光光源的光来进行测量。

4. 发明授权

US06924881B2 Projection exposure apparatus 失效
标题翻译：投影曝光装置
公开(公告)号：US06924881B2
公开(公告)日：2005-08-02
申请号：US10642699
申请日：2003-08-19
申请人： Eiichi Murakami , Osamu Kakuchi
发明人： Eiichi Murakami , Osamu Kakuchi
IPC分类号： H01L21/027 , G01M11/02 , G03B27/42 , G03F7/20 , G03B27/54 , G03B27/68
CPC分类号： G01M11/0264 , G01M11/0271 , G03B27/42 , G03F7/70058 , G03F7/706
摘要： A projection exposure apparatus includes an illumination optical system for illuminating a pattern formed on a first object, with light, a projection optical system for projecting the pattern of the first object, illuminated by the illumination optical system, onto a second object for exposure of the same with the pattern, a main system including the illumination optical system and the projection optical system, and an interferometer for use in measurement of an optical characteristic of the projection optical system and being mounted on the main system.
摘要翻译：投影曝光装置包括用于照亮形成在第一物体上的图案的照明光学系统，具有用于将由照明光学系统照明的第一物体的图案投射到第二物体上的投影光学系统，用于曝光与图案相同，包括照明光学系统和投影光学系统的主系统，以及用于测量投影光学系统的光学特性并安装在主系统上的干涉仪。

5. 发明授权

US07907263B2 Apparatuses and methods using measurement of a flare generated in an optical system 失效
标题翻译：使用在光学系统中产生的耀斑的测量的装置和方法
公开(公告)号：US07907263B2
公开(公告)日：2011-03-15
申请号：US12493229
申请日：2009-06-28
申请人： Michiko Aizawa , Eiji Aoki , Osamu Kakuchi , Yoshiyuki Kuramoto
发明人： Michiko Aizawa , Eiji Aoki , Osamu Kakuchi , Yoshiyuki Kuramoto
IPC分类号： G01B9/00 , G01B9/02 , G01B11/02
CPC分类号： G03F7/7085 , G03F7/705 , G03F7/70525 , G03F7/706 , G03F7/70941
摘要： The present invention provides a method including measuring a wavefront aberration of the optical system to be measured on a measurement surface, measuring a pupil transmittance distribution of the optical system determining a pupil function of the optical system based on the wavefront aberration and the pupil transmittance distribution, and performing imaging computation using the pupil function to obtain a light intensity distribution formed on an image plane of the optical system, and calculating a flare, generated in the optical system, from the light intensity distribution.
摘要翻译：本发明提供了一种方法，包括测量测量表面上要测量的光学系统的波前像差，测量基于波前像差和光瞳透射率分布来确定光学系统的光瞳功能的光学系统的光瞳透射率分布并且使用光瞳函数进行成像计算，以获得形成在光学系统的像面上的光强度分布，以及根据光强度分布计算在光学系统中产生的耀斑。

6. 发明申请

US20100265515A1 MEASUREMENT METHOD, MEASUREMENT APPARATUS, EXPOSURE APPARATUS, AND DEVICE FABRICATION METHOD 失效
标题翻译：测量方法，测量装置，曝光装置和装置制造方法
公开(公告)号：US20100265515A1
公开(公告)日：2010-10-21
申请号：US12830213
申请日：2010-07-02
申请人： Osamu Kakuchi , Yoshiyuki Kuramoto
发明人： Osamu Kakuchi , Yoshiyuki Kuramoto
IPC分类号： G01B9/02
CPC分类号： G03F7/706 , G03F7/70566
摘要： A measurement method of measuring a wavefront aberration of an optical system to be measured, comprising a first measurement step of measuring wavefronts of the optical system to be measured with respect to linearly polarized light beams along at least three different azimuths, a first calculation step of calculating a wavefront of the optical system to be measured with respect to non-polarized light and a birefringent characteristic of the optical system to be measured, based on the wavefronts of the optical system to be measured, which are measured in the first measurement step, and a second calculation step of calculating a wavefront of the optical system to be measured with respect to arbitrary polarized light, based on the wavefront and the birefringent characteristic of the optical system to be measured, which are calculated in the first calculation step.
摘要翻译：一种测量被测光学系统的波前像差的测量方法，包括：测量相对于沿着至少三个不同方位角的线偏振光束的待测光学系统的波前的第一测量步骤;第一计算步骤，基于在第一测量步骤中测量的待测量的光学系统的波前，计算相对于非偏振光测量的光学系统的波前和待测量的光学系统的双折射特性，以及第二计算步骤，基于在第一计算步骤中计算出的要测量的光学系统的波前和双折射特性来计算相对于任意偏振光测量的光学系统的波前。

7. 发明授权

US07995213B2 Measurement method, measurement apparatus, exposure apparatus, and device fabrication method 失效
标题翻译：测量方法，测量装置，曝光装置和装置制造方法
公开(公告)号：US07995213B2
公开(公告)日：2011-08-09
申请号：US12830213
申请日：2010-07-02
申请人： Osamu Kakuchi , Yoshiyuki Kuramoto
发明人： Osamu Kakuchi , Yoshiyuki Kuramoto
IPC分类号： G01B9/02
CPC分类号： G03F7/706 , G03F7/70566
摘要： A measurement method of measuring a wavefront aberration of an optical system to be measured, comprising a first measurement step of measuring wavefronts of the optical system to be measured with respect to linearly polarized light beams along at least three different azimuths, a first calculation step of calculating a wavefront of the optical system to be measured with respect to non-polarized light and a birefringent characteristic of the optical system to be measured, based on the wavefronts of the optical system to be measured, which are measured in the first measurement step, and a second calculation step of calculating a wavefront of the optical system to be measured with respect to arbitrary polarized light, based on the wavefront and the birefringent characteristic of the optical system to be measured, which are calculated in the first calculation step.
摘要翻译：一种测量被测光学系统的波前像差的测量方法，包括：测量相对于沿着至少三个不同方位角的线偏振光束的待测光学系统的波前的第一测量步骤;第一计算步骤，基于在第一测量步骤中测量的待测量的光学系统的波前，计算相对于非偏振光测量的光学系统的波前和待测量的光学系统的双折射特性，以及第二计算步骤，基于在第一计算步骤中计算出的要测量的光学系统的波前和双折射特性来计算相对于任意偏振光测量的光学系统的波前。

8. 发明申请

US20090219494A1 EVALUATION METHOD, EVALUATION APPARATUS, AND EXPOSURE APPARATUS 审中-公开
标题翻译：评价方法，评价装置和曝光装置
公开(公告)号：US20090219494A1
公开(公告)日：2009-09-03
申请号：US12392746
申请日：2009-02-25
申请人： Osamu Kakuchi
发明人： Osamu Kakuchi
IPC分类号： G03B27/00 , G01B11/03 , G01B9/02 , G06F15/00
CPC分类号： G01M11/0271 , G01J2009/0234 , G03B27/00 , G03F7/706
摘要： An evaluation method of evaluating an optical characteristic of an optical system to be evaluated using an interferometer, comprises a first acquisition step of acquiring a first interference fringe formed by the interferometer when a location of a movable element of the interferometer in an optical axis direction of the optical system is a first location, a second acquisition step of acquiring a second interference fringe formed by the interferometer when the location of the movable element in the optical axis direction is a second location different from the first location, a determination step of determining a pupil-center coordinate of the optical system based on the acquired first interference fringe and the acquired second interference fringe, and a computation step of computing the optical characteristic of the optical system using the pupil-center coordinate determined in the determination step.
摘要翻译：使用干涉仪评价光学系统的光学特性的评价方法包括：第一获取步骤，当干涉仪的可动元件的位置在光轴方向上时，获取由干涉仪形成的第一干涉条纹光学系统是第一位置，第二采集步骤，当可移动元件在光轴方向上的位置是不同于第一位置的第二位置时，获取由干涉仪形成的第二干涉条纹;确定步骤，确定基于获取的第一干涉条纹和获取的第二干涉条纹，光学系统的瞳孔中心坐标，以及计算步骤，使用在确定步骤中确定的瞳孔中心坐标来计算光学系统的光学特性。

9. 发明申请

US20060097205A1 Measuring apparatus, exposure apparatus and device manufacturing method 失效
标题翻译：测量装置，曝光装置和装置的制造方法
公开(公告)号：US20060097205A1
公开(公告)日：2006-05-11
申请号：US11267561
申请日：2005-11-04
申请人： Osamu Kakuchi , Yoshiyuki Kuramoto
发明人： Osamu Kakuchi , Yoshiyuki Kuramoto
IPC分类号： G01N21/86
CPC分类号： G03F7/706 , G03F7/70341
摘要： A measuring apparatus for measuring optical performance of a target optical system to be measured includes an optical unit for splitting light from a light source into measuring light and reference light so that the measuring light can be introduced into the target optical system, a reflection unit for reflecting the measuring light from the target optical system toward the target optical system via a fluid, and a detector for detecting an interference fringe generated between interference between the measuring light that has emitted from the target optical system after being reflected by the reflection unit and the reference light that does not pass the target optical system.
摘要翻译：用于测量待测光学系统的光学性能的测量装置包括：用于将来自光源的光分解为测量光和参考光的光学单元，使得测量光可以被引入到目标光学系统中;反射单元，用于将来自目标光学系统的测量光经由流体反射到目标光学系统;以及检测器，用于检测在由反射单元反射之后从目标光学系统发射的测量光之间产生的干涉条纹和不通过目标光学系统的参考光。

10. 发明申请

US20100002243A1 APPARATUSES AND METHODS USING MEASUREMENT OF A FLARE GENERATED IN AN OPTICAL SYSTEM 失效
标题翻译：使用在光学系统中产生的瓦斯的测量的装置和方法
公开(公告)号：US20100002243A1
公开(公告)日：2010-01-07
申请号：US12493229
申请日：2009-06-28
申请人： Michiko Aizawa , Eiji Aoki , Osamu Kakuchi , Yoshiyuki Kuramoto
发明人： Michiko Aizawa , Eiji Aoki , Osamu Kakuchi , Yoshiyuki Kuramoto
IPC分类号： G01B9/02 , G01B9/00
CPC分类号： G03F7/7085 , G03F7/705 , G03F7/70525 , G03F7/706 , G03F7/70941
摘要： The present invention provides a method including measuring a wavefront aberration of the optical system to be measured on a measurement surface, measuring a pupil transmittance distribution of the optical system determining a pupil function of the optical system based on the wavefront aberration and the pupil transmittance distribution, and performing imaging computation using the pupil function to obtain a light intensity distribution formed on an image plane of the optical system, and calculating a flare, generated in the optical system, from the light intensity distribution.
摘要翻译：本发明提供了一种方法，包括测量测量表面上要测量的光学系统的波前像差，测量基于波前像差和光瞳透射率分布来确定光学系统的光瞳功能的光学系统的光瞳透射率分布并且使用光瞳函数进行成像计算，以获得形成在光学系统的像面上的光强度分布，以及根据光强度分布计算在光学系统中产生的耀斑。

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