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1. 发明授权

US08778080B2 Apparatus for double-plasma graft polymerization at atmospheric pressure 失效
标题翻译：用于在大气压下进行双等离子体接枝聚合的装置
公开(公告)号：US08778080B2
公开(公告)日：2014-07-15
申请号：US12124685
申请日：2008-05-21
申请人： Mien-Win Wu , Tien-Hsiang Hsueh , Cheng-Chang Hsieh , Chi-fong Ai
发明人： Mien-Win Wu , Tien-Hsiang Hsueh , Cheng-Chang Hsieh , Chi-fong Ai
IPC分类号： C08F2/46 , C23C16/513 , B05D3/04 , C08F2/52 , B05D7/04 , B05D3/14 , B05D1/18
CPC分类号： C08F2/52 , B05D1/18 , B05D3/0446 , B05D3/144 , B05D3/147 , B05D7/04 , B05D2252/02
摘要： Disclosed is an atmospheric-pressure double-plasma graft polymerization apparatus. The apparatus includes a workbench, an initial roller of a roll-to-roll device, an atmospheric-pressure plasma activation device, a peroxide formation device, a coating and grafting device, a drying device, a graft polymerization and curing device, a curing device and a final roller of a roll-to-roll device. The devices are sequentially provided on the workbench.
摘要翻译：公开了一种大气压双等离子体接枝聚合装置。该装置包括工作台，卷对卷装置的初始辊，大气压等离子体激活装置，过氧化物形成装置，涂覆和接枝装置，干燥装置，接枝聚合和固化装置，固化装置和卷对卷装置的最终辊。设备依次设置在工作台上。

2. 发明申请

US20090291226A1 Apparatus and Method for Double-Plasma Graft Polymerization at Atmospheric Pressure 失效
标题翻译：在大气压下双等离子体接枝聚合的装置和方法
公开(公告)号：US20090291226A1
公开(公告)日：2009-11-26
申请号：US12124685
申请日：2008-05-21
申请人： Mien-Win WU , Tien-Hsiang Hsueh , Cheng-Chang Hsieh , Chi-fong Ai
发明人： Mien-Win WU , Tien-Hsiang Hsueh , Cheng-Chang Hsieh , Chi-fong Ai
IPC分类号： C08F2/46 , C23C16/513
CPC分类号： C08F2/52 , B05D1/18 , B05D3/0446 , B05D3/144 , B05D3/147 , B05D7/04 , B05D2252/02
摘要： Disclosed is a n atmospheric-pressure double-plasma graft polymerization apparatus. The apparatus includes a workbench, an initial roller of a roll-to-roll device, an atmospheric-pressure plasma activation device, a peroxide formation device, a coating and grafting device, a drying device, a graft polymerization and curing device, a curing device and a final roller of a roll-to-roll device. The devices are sequentially provided on the workbench.
摘要翻译：公开了一种n大气压双等离子体接枝聚合装置。该装置包括工作台，卷对卷装置的初始辊，大气压等离子体激活装置，过氧化物形成装置，涂覆和接枝装置，干燥装置，接枝聚合和固化装置，固化装置和卷对卷装置的最终辊。设备依次设置在工作台上。

3. 发明申请

US20080060579A1 Apparatus of triple-electrode dielectric barrier discharge at atmospheric pressure 审中-公开
标题翻译：大气压下三电极介质阻挡放电装置
公开(公告)号：US20080060579A1
公开(公告)日：2008-03-13
申请号：US11510824
申请日：2006-08-28
申请人： Cheng-Chang Hsieh , Mien-Win Wu , Chi-Fong Ai
发明人： Cheng-Chang Hsieh , Mien-Win Wu , Chi-Fong Ai
IPC分类号： C23C16/00
CPC分类号： H01J37/32825 , H01J37/32009 , H01J37/32348 , H01J37/32587
摘要： A dielectric barrier discharge uses three electrodes at an atmospheric pressure. A wide discharge gap can be used and an enhanced plasma density can be achieved so that thick materials can be processed and its processing speed can also be greatly improved.
摘要翻译：电介质阻挡放电在大气压下使用三个电极。可以使用宽的放电间隙，并且可以实现增强的等离子体密度，使得可以处理厚的材料并且还可以极大地改善其加工速度。

4. 发明授权

US08142608B2 Atmospheric pressure plasma reactor 有权
标题翻译：大气压等离子体反应堆
公开(公告)号：US08142608B2
公开(公告)日：2012-03-27
申请号：US11898356
申请日：2007-09-11
申请人： Chi-fong Ai , Mien-Win Wu , Cheng-Chang Hsieh
发明人： Chi-fong Ai , Mien-Win Wu , Cheng-Chang Hsieh
IPC分类号： H01L21/00 , C23C16/00
CPC分类号： C23C16/509 , C23C16/452 , H01J37/32348 , H01J37/32825 , H05H1/2406 , H05H2001/2412 , H05H2001/2425
摘要： An atmospheric pressure plasma reactor includes a high-voltage electrode, a common grounded electrode, a bias electrode and at least one dielectric layer. The high-voltage electrode is connected to a high-voltage power supply. The common grounded electrode is used with the high-voltage electrode to discharge and therefore produce planar atmospheric plasma from reactive gas. The bias electrode is used to generate bias for attracting the ions of the planar atmospheric pressure plasma. The dielectric layer is used to suppress undesirable arc discharge during the discharging.
摘要翻译：大气压等离子体反应器包括高压电极，公共接地电极，偏置电极和至少一个电介质层。高压电极连接到高压电源。公共接地电极与高电压电极一起使用以放电，因此从反应气体产生平面大气等离子体。偏置电极用于产生用于吸引平面大气压等离子体的离子的偏压。电介质层用于抑制放电期间的不期望的电弧放电。

5. 发明申请

US20070154650A1 Method and apparatus for glow discharge plasma treatment of flexible material at atmospheric pressure 审中-公开
标题翻译：用于在大气压力下对柔性材料进行辉光放电等离子体处理的方法和装置
公开(公告)号：US20070154650A1
公开(公告)日：2007-07-05
申请号：US11320609
申请日：2005-12-30
申请人： Mien-Win Wu , Cheng-Chang Hsieh , Chi-Fong Ai , Kuo-Chuan Cheng , Tien-Hsiang Hsuch
发明人： Mien-Win Wu , Cheng-Chang Hsieh , Chi-Fong Ai , Kuo-Chuan Cheng , Tien-Hsiang Hsuch
IPC分类号： B05D3/00 , H05H1/24 , C23C16/00 , B29C71/04
CPC分类号： H01J37/32825 , B29C59/14 , H01J37/32348 , H01J37/3244 , H01J37/3277 , H05H1/2406 , H05H2001/2412 , H05H2240/10
摘要： Abstract of the disclosure The present invention provides a method and an apparatus for a glow discharge plasma surface treatment of flexible sheet materials under atmospheric pressure. The apparatus comprises electrodes, a single plasma-gas flow channel, uniform gas inlet-and-outlet devices, gas-seal devices for the horizontal movements of sheet materials and reel devices, so as to attain an uniform distribution of plasma gases in the gap between electrodes. As a result, not only a great amount of expensive plasma gas is saved, but also an uniform glow discharge plasma is generated at the lowest input power to obtain a good quality of uniform plasma treatment with continuous processing and high production.
摘要翻译：发明内容本发明提供一种用于在大气压下对柔性片材进行辉光放电等离子体表面处理的方法和装置。该装置包括电极，单个等离子体气体流动通道，均匀的气体入口和出口装置，用于片材和卷轴装置的水平运动的气体密封装置，以便获得等离子体气体在间隙中的均匀分布电极之间。结果，不仅节省了大量昂贵的等离子体气体，而且在最低输入功率下产生均匀的辉光放电等离子体，以通过连续加工和高产量获得均匀等离子体处理的良好质量。

6. 发明申请

US20120255492A1 Large Area Atmospheric Pressure Plasma Enhanced Chemical Vapor Deposition Apparatus 审中-公开
标题翻译：大面积大气压等离子体增强化学气相沉积装置
公开(公告)号：US20120255492A1
公开(公告)日：2012-10-11
申请号：US13080874
申请日：2011-04-06
申请人： Mien-Win Wu , Ding-Guey Tsai , Hwei-Lang Chang , Deng-Lain Lin , Cheng-Chang Hsieh , Chi-Fong Ai
发明人： Mien-Win Wu , Ding-Guey Tsai , Hwei-Lang Chang , Deng-Lain Lin , Cheng-Chang Hsieh , Chi-Fong Ai
IPC分类号： C23C16/513 , C23C16/458 , C23C16/50 , C23C16/453
CPC分类号： C23C16/545 , C23C16/0245 , C23C16/4401 , C23C16/45512 , C23C16/45565 , C23C16/50 , C23C16/513 , H01J37/32366 , H01J37/3244 , H01J37/32449 , H01J37/32568 , H01J37/32761 , H01J37/32825 , H01J37/32853
摘要： An apparatus provides large area atmospheric pressure plasma enhanced chemical vapor deposition without contaminations in its electrode assembly and deposited films. The apparatus consists of a large area vertical planar nitrogen plasma activation electrode assembly and its high voltage power supply, a large area vertical planar nitrogen plasma deposition electrode assembly and its high voltage power supply, a long-line uniform precursor jet apparatus, a roll-to-roll apparatus for substrate movement, and a sub-atmospheric pressure deposition chamber and its pumping apparatus. Not only can the deposited film contaminations in the electrode assembly interior and the debris of the deposited films from exterior of the electrode assembly and the air aerosols in the deposition chamber be completely prevented, but a large area roll-to-roll uniform deposition can also be achieved to meet a roll-to-roll continuous production, so as to achieve improved film quality, increased production throughput and reduced manufacturing cost.
摘要翻译：一种装置在其电极组件和沉积膜中提供大面积的大气压等离子体增强化学气相沉积而没有污染。该装置由大面积垂直平面氮等离子体激活电极组件及其高压电源，大面积垂直平面氮等离子体沉积电极组件及其高压电源，长线均匀前驱体喷射装置，用于基板移动的滚动装置和次大气压力沉积室及其抽吸装置。不仅可以完全防止电极组件内部的沉积膜污染物和电极组件外部沉积膜的碎屑和沉积室中的空气气溶胶，而且大面积的卷对卷均匀沉积也可以实现卷对卷连续生产，从而达到提高胶片质量，提高生产量和降低制造成本的目的。

7. 发明申请

US20100218896A1 Atmospheric pressure plasma reactor 有权
标题翻译：大气压等离子体反应堆
公开(公告)号：US20100218896A1
公开(公告)日：2010-09-02
申请号：US11898356
申请日：2007-09-11
申请人： Chi-fong Ai , Mien-Win Wu , Cheng-Chang Hsieh
发明人： Chi-fong Ai , Mien-Win Wu , Cheng-Chang Hsieh
IPC分类号： C23F1/08 , C23C16/00
CPC分类号： C23C16/509 , C23C16/452 , H01J37/32348 , H01J37/32825 , H05H1/2406 , H05H2001/2412 , H05H2001/2425
摘要： An atmospheric pressure plasma reactor includes a high-voltage electrode, a common grounded electrode, a bias electrode and at least one dielectric layer. The high-voltage electrode is connected to a high-voltage power supply. The common grounded electrode is used with the high-voltage electrode to discharge and therefore produce planar atmospheric plasma from reactive gas. The bias electrode is used to generate bias for attracting the ions of the planar atmospheric pressure plasma. The dielectric layer is used to suppress undesirable arc discharge during the discharging.
摘要翻译：大气压等离子体反应器包括高压电极，公共接地电极，偏置电极和至少一个电介质层。高压电极连接到高压电源。公共接地电极与高电压电极一起使用以放电，因此从反应气体产生平面大气等离子体。偏置电极用于产生用于吸引平面大气压等离子体的离子的偏压。电介质层用于抑制放电期间的不期望的电弧放电。

8. 发明申请

US20100225234A1 Hollow-cathode plasma generator 审中-公开
标题翻译：空心阴极等离子体发生器
公开(公告)号：US20100225234A1
公开(公告)日：2010-09-09
申请号：US11896620
申请日：2007-09-04
申请人： Ching-Pei Tseng , Cheng-Chang Hsieh , Chi-Fong Ai , Chia-Cheng Lee , Tien-Hsiang Hsueh , Chun-Han Wang
发明人： Ching-Pei Tseng , Cheng-Chang Hsieh , Chi-Fong Ai , Chia-Cheng Lee , Tien-Hsiang Hsueh , Chun-Han Wang
IPC分类号： H05H1/24
CPC分类号： H05H1/46 , H01J37/32596 , H01J37/32724
摘要： A hollow-cathode plasma generator includes a plurality of hollow cathodes joined together and connected to a power supply for generating plasma in vacuum. Each of the hollow cathodes includes at least one fillister defined therein, a fin formed on a side of the fillister, an air-circulating tunnel in communication with the fillister and a coolant-circulating tunnel defined therein. The fillister is used to contain working gas. The fin receives negative voltage from the power supply for ionizing the working gas to generate the plasma and spread the plasma in a single direction. The working gas travels into the fillister from the air-circulating tunnel. The coolant-circulating tunnel is used to circulate coolant for cooling the hollow cathode.
摘要翻译：中空阴极等离子体发生器包括多个连接在一起的中空阴极，并连接到用于在真空中产生等离子体的电源。每个中空阴极包括限定在其中的至少一个填充器，形成在填充器一侧的翅片，与填充器连通的空气循环隧道和限定在其中的冷却剂循环通道。灌装机用于容纳工作气体。翅片从电源接收负电压，用于电离工作气体以产生等离子体并且在单个方向上扩散等离子体。工作气体从空气循环通道进入灌装机。冷却剂循环隧道用于循环冷却剂以冷却空心阴极。

9. 发明申请

US20110192348A1 RF Hollow Cathode Plasma Generator 审中-公开
标题翻译：射频空心阴极等离子体发生器
公开(公告)号：US20110192348A1
公开(公告)日：2011-08-11
申请号：US12701035
申请日：2010-02-05
申请人： Ching-Pei Tseng , Cheng-Chang Hsieh , Chi-Fong Ai , Chia-Cheng Lee , Deng-Lain Lin
发明人： Ching-Pei Tseng , Cheng-Chang Hsieh , Chi-Fong Ai , Chia-Cheng Lee , Deng-Lain Lin
IPC分类号： C23C16/00 , H05H1/24
CPC分类号： C23C16/509 , H01J37/3244 , H01J37/32596
摘要： An RF hollow cathode plasma source consists of a vacuum chamber, a pipe, a hollow cathode, at least two compartments, a conduit and input electrodes. The pipe is inserted into the chamber for introducing working gas into the chamber. The hollow cathode is disposed in the chamber and formed with a large number of apertures. At least two compartments are located below the hollow cathode. Each of the compartments includes small apertures for uniformly spreading the working gas into the apertures of the hollow cathode. The conduit is disposed along two sides of the hollow cathode to circulate cooling water around the hollow cathode. The plural input power leads are arranged near the hollow cathode. The input power leads, the pipe and the conduits are connected to the hollow cathode though the electrically-insulated walls of the grounded vacuum chamber.
摘要翻译： RF空心阴极等离子体源由真空室，管，中空阴极，至少两个隔室，导管和输入电极组成。将管插入腔室中以将工作气体引入腔室。中空阴极设置在室中并形成有大量孔。至少两个隔室位于空心阴极的下面。每个隔室包括用于将工作气体均匀地分散到中空阴极的孔中的小孔。导管沿空心阴极的两侧设置，以将冷却水循环在中空阴极周围。多个输入电源引线设置在中空阴极附近。输入功率引线，管道和导管通过接地真空室的电绝缘壁连接到空心阴极。

10. 发明申请

US20110041766A1 PLASMA SOURCE 审中-公开
标题翻译：等离子体源
公开(公告)号：US20110041766A1
公开(公告)日：2011-02-24
申请号：US12732753
申请日：2010-03-26
申请人： Shih-Cheng Tseng , Cheng-Chang Hsieh , Ming-Chung Yang , Der-Jun Jan , Chi-Fong Ai
发明人： Shih-Cheng Tseng , Cheng-Chang Hsieh , Ming-Chung Yang , Der-Jun Jan , Chi-Fong Ai
IPC分类号： C23C16/513
CPC分类号： H01J37/3266 , H01J37/3211 , H01J37/32174 , H01J37/32357
摘要： A plasma source comprises a vacuum chamber, a plurality of discharge tubes, a plurality of permanent magnets, a plurality of RF antennas, and an RF power distribution circuit. The RF power distribution circuit is electrically coupled to an RF power supply and each of the plurality of RF antennas. The lengths of the transmission paths between each of the plurality of RF antennas and the RF power supply are the same, so that the RF power supply can provide each of discharge tubes with the same RF power.
摘要翻译：等离子体源包括真空室，多个放电管，多个永磁体，多个RF天线和RF功率分配电路。 RF功率分配电路电耦合到RF电源和多个RF天线中的每一个。多个RF天线中的每一个和RF电源之间的传输路径的长度相同，使得RF电源可以为每个放电管提供相同的RF功率。

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