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    • 1. 发明授权
    • Semiconductor device having optoelectronic remote signal-exchange means
    • 具有光电远程信号交换装置的半导体装置
    • US6100595A
    • 2000-08-08
    • US105735
    • 1998-06-26
    • Herve JaouenMichel Marty
    • Herve JaouenMichel Marty
    • H01L33/00G02B6/42H01L27/14H01L31/0232H01L23/14G02B6/30
    • G02B6/4212G02B6/4248H01L2224/16225H01L2224/32225H01L2224/73204
    • A semiconductor device includes a chip forming an integrated circuit; a connection substrate; an internal coupling mechanism; and at least one optical communication system. The connection substrate comprises an external coupling mechanism for electrically coupling to a device other than the chip. The internal coupling mechanism electrically couples the integrated circuit to the external coupling mechanism. The at least one optical communication system comprises two optoelectronic parts. The first optoelectronic part is either an emitter or a receiver which is integrated into the chip and constitutes one component of the integrated circuit. The second optoelectronic part is borne by the connection substrate and is able to be externally connected to the connection substrate. The second optoelectronic part faces the first optoelectronic part and is capable of exchanging light signals with the first optoelectronic part.
    • 半导体器件包括形成集成电路的芯片; 连接基板; 内联机构; 和至少一个光通信系统。 连接基板包括用于电耦合到除了​​芯片之外的装置的外部耦合机构。 内部耦合机构将集成电路电耦合到外部耦合机构。 所述至少一个光通信系统包括两个光电子部件。 第一个光电子部分是集成到芯片中的发射极或接收器,并构成集成电路的一个部件。 第二光电子部分由连接基板承载,并且能够从外部连接到连接基板。 第二光电子部分面向第一光电子部分,并且能够与第一光电子部分交换光信号。
    • 2. 发明授权
    • Process for fabricating a metal-metal capacitor within an integrated circuit, and corresponding integrated circuit
    • 在集成电路内制造金属 - 金属电容器的工艺及相应的集成电路
    • US06423996B1
    • 2002-07-23
    • US09658221
    • 2000-09-08
    • Michel MartyHerve Jaouen
    • Michel MartyHerve Jaouen
    • H01L27108
    • H01L28/40
    • A process for fabricating a metal-metal capacitor within an integrated circuit comprises the steps of: producing a first metal electrode, a second metal electrode, and a dielectric layer on top of a lower insulating layer; and depositing an upper insulating layer on top of the two metal electrodes and the dielectric layer. The integrated circuit comprises the insulating layer, a first metal layer which is on top of the lower insulating layer, and the upper insulating layer which is on top of the first metal layer. The capacitor comprises the first metal electrode, the second metal electrode, and the dielectric layer wherein each of the two metal electrodes is in contact with one side of the dielectric layer. The electrodes and the dielectric layer lie between the lower insulating layer, which supports a level of metallization (M1), and the upper insulating layer which covers this level of metallization.
    • 一种用于在集成电路内制造金属 - 金属电容器的工艺包括以下步骤:在下绝缘层的顶部上产生第一金属电极,第二金属电极和电介质层; 以及在所述两个金属电极和所述电介质层的顶部上沉积上绝缘层。 集成电路包括绝缘层,位于下绝缘层顶部的第一金属层和位于第一金属层顶部的上绝缘层。 电容器包括第一金属电极,第二金属电极和电介质层,其中两个金属电极中的每一个与电介质层的一侧接触。 电极和电介质层位于支撑金属化水平(M1)的下绝缘层和覆盖这种金属化水平的上绝缘层之间。
    • 10. 发明授权
    • Method for manufacturing a bipolar transistor
    • 制造双极晶体管的方法
    • US07115465B2
    • 2006-10-03
    • US10838860
    • 2004-05-03
    • Michel MartyBertrand MartinetCyril Fellous
    • Michel MartyBertrand MartinetCyril Fellous
    • H01L21/8249
    • H01L29/66287H01L29/66242
    • A method for manufacturing a bipolar transistor, comprising the steps of: growing on the substrate a first semiconductor; depositing an encapsulation layer etchable with respect to the first semiconductor, forming a sacrificial block at the location of the base-emitter junction; exposing the first semiconductor around spacers formed around said block; forming a second semiconductor, then a third semiconductor etchable with respect to the second semiconductor layer, the encapsulation layer, and the spacers, the sum of the thicknesses of the second semiconductor and the sacrificial layer being substantially equal to the sum of the thicknesses of the encapsulation layer and of the sacrificial block; removing the block and the encapsulation layer; depositing a fourth semiconductor; removing the third semiconductor; and etching an insulating layer to maintain it on the emitter walls and between said emitter and the second semiconductor.
    • 一种制造双极晶体管的方法,包括以下步骤:在衬底上生长第一半导体; 沉积相对于第一半导体可蚀刻的封装层,在基极 - 发射极结的位置处形成牺牲块; 将第一半导体暴露在围绕所述块形成的间隔件周围; 形成第二半导体,然后可蚀刻相对于第二半导体层,封装层和间隔物的第三半导体,第二半导体和牺牲层的厚度之和基本上等于 封装层和牺牲块; 去除块和封装层; 沉积第四半导体; 去除第三半导体; 并蚀刻绝缘层以将其保持在发射极壁上和所述发射极与第二半导体之间。