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    • 1. 发明授权
    • Device for the plasma deposition of a polycrystalline diamond
    • 用于等离子体沉积多晶金刚石的装置
    • US06487986B1
    • 2002-12-03
    • US09719525
    • 2000-12-13
    • Michael LiehrLothar Schäfer
    • Michael LiehrLothar Schäfer
    • C23C1600
    • C23C16/274C23C16/54
    • In an apparatus for depositing polycrystalline diamond by plasma technology onto substrates (5) of large area, having a process chamber (1) with airlock (6a), a plurality of microwave plasma sources (9, 9′, . . . ) arranged in a common plane above the substrates (5) and extending transversely across the direction of substrate advancement, and gas inlet and gas outlet tubes (10, 10′, . . . , 11, 11′, . . . , 12, 12′, . . . , 13, 13′, . . . , 13a, . . . ) leading into the process chamber (1) are provided, a plurality of gas inlet and gas outlet tubes distributed over the length of the source are associated with each of the linear sources (9, 9′, . . . ), and the outlet openings of the gas inlet tubes being situated each directly above the linear source (9, 9′, . . . ), and the openings of the gas outlet tubes (13, 13′, . . . ) each in the area between two linear sources (9, 9′, . . . ) and in a plane which extends approximately through the core axes (5) of the linear sources (9, 9′, . . . ).
    • 在用于通过等离子体技术将多晶金刚石沉积到具有具有气闸(6a)的处理室(1)的大面积的基板(5)上的装置中,多个微波等离子体源(9,9'...) 在衬底(5)上方并沿衬底前进方向横向延伸的公共平面,以及气体入口和气体出口管(10,10',...,11,11',...,12,12', ...,13,13',...,13a,...),分配在源的长度上的多个气体入口和气体出口管与每个 的线性源(9,9',...),并且气体入口管的出口开口直接位于线性源(9,9',...)的正上方,气体出口的开口 每个在两个线性源(9,9',...)之间的区域中并且在大致延伸通过线性源(9,9')的芯轴(5)的平面中的管(13,13',...) 9',... 。 )。
    • 2. 发明申请
    • COATING DEVICE AND COATING METHOD
    • 涂层设备和涂层方法
    • US20120135144A1
    • 2012-05-31
    • US13375938
    • 2010-05-13
    • Tino HarigMarkus HöferArtur LaukartLothar SchäferMarkus Armgardt
    • Tino HarigMarkus HöferArtur LaukartLothar SchäferMarkus Armgardt
    • C23C16/455
    • C23C16/22C23C16/24C23C16/26C23C16/44C23C16/4405C23C16/52
    • A coating installation includes at least one recipient which can be evacuated and which is provided to receive a substrate, at least one gas supply device which can introduce at least one gaseous precursor into the recipient, and at least one activation device which contains at least one heatable activation element, the end thereof being secured to a securing point on a support element. A shielding element which can protect at least the securing point at least partially against the effect of the gaseous precursor is provided. The shielding element has a longitudinal extension having a first side and a second side, the first side being arranged on the support element and a locking element being arranged on the second side of the shielding element, the locking element having at least one outlet. At least one separation wall is arranged inside the shielding element, the wall separating the inner volume of the shielding element into a first partial volume and into a second partial volume.
    • 一种涂覆装置包括至少一个可被抽空的接收器,其被提供以接收基底,至少一个气体供应装置,其能够将至少一种气态前体引入接收器;以及至少一个激活装置,其包含至少一个 可加热激活元件,其端部固定到支撑元件上的固定点。 提供了可以至少部分地抵御气态前体的影响来保护至少保护点的屏蔽元件。 屏蔽元件具有纵向延伸部,其具有第一侧面和第二侧面,第一侧面布置在支撑元件上,锁定元件布置在屏蔽元件的第二侧上,锁定元件具有至少一个出口。 至少一个分隔壁布置在屏蔽元件内部,壁将屏蔽元件的内部容积分成第一部分体积并进入第二部分体积。
    • 5. 发明授权
    • Gemstone
    • 宝石
    • US06794014B2
    • 2004-09-21
    • US09319142
    • 1999-07-29
    • Ernst Michael WinterLothar SchäferThorsten Matthee
    • Ernst Michael WinterLothar SchäferThorsten Matthee
    • B32B900
    • A44C27/007Y10T428/24479Y10T428/24612
    • A gemstone is provided and has a large surface-area, plate-shaped support having a surface with least one pyramid-shaped depression. A thin vapor phase deposit layer comprises a thin, surface-shaped precious synthetic gemstone layer disposed on the large surface-area, plate-shaped support and has an upper surface facing away from the plate-shaped support and an underside having at least one pyramid-shaped projection disposed in and coinciding with the pyramid-shaped depression of the support. Side faces of the pyramid-shaped projections of the underside of the vapor phase deposit layer upon the plate-shaped support impart decorative, diamond-light-reflective qualities to the synthetic gemstone layer.
    • 提供了宝石,并且具有大的表面积的板状支撑件,其具有至少一个金字塔形凹陷的表面。 薄的气相沉积层包括设置在大表面积的板状支撑件上的薄的表面形状的珍贵的合成宝石层,并且具有背离板状支撑件的上表面和具有至少一个金字塔 该突起设置在支撑体的金字塔状的凹部中并与其一致。 在板状支撑体上的气相沉积层下侧的金字塔形突起的侧面赋予合成宝石层装饰性的金刚石光反射性质。
    • 7. 发明授权
    • Coating device and coating method
    • 涂布装置和涂布方法
    • US08940367B2
    • 2015-01-27
    • US13375938
    • 2010-05-13
    • Tino HarigMarkus HöferArtur LaukartLothar SchäferMarkus Armgardt
    • Tino HarigMarkus HöferArtur LaukartLothar SchäferMarkus Armgardt
    • C23C16/00C23C16/22C23C16/24C23C16/26C23C16/44C23C16/52
    • C23C16/22C23C16/24C23C16/26C23C16/44C23C16/4405C23C16/52
    • A coating installation includes at least one recipient which can be evacuated and which is provided to receive a substrate, at least one gas supply device which can introduce at least one gaseous precursor into the recipient, and at least one activation device which contains at least one heatable activation element, the end thereof being secured to a securing point on a support element. A shielding element which can protect at least the securing point at least partially against the effect of the gaseous precursor is provided. The shielding element has a longitudinal extension having a first side and a second side, the first side being arranged on the support element and a locking element being arranged on the second side of the shielding element, the locking element having at least one outlet. At least one separation wall is arranged inside the shielding element, the wall separating the inner volume of the shielding element into a first partial volume and into a second partial volume.
    • 一种涂覆装置包括至少一个可被抽空的接收器,其被提供以接收基底,至少一个气体供应装置,其能够将至少一种气态前体引入接收器;以及至少一个激活装置,其包含至少一个 可加热激活元件,其端部固定到支撑元件上的固定点。 提供了可以至少部分地抵御气态前体的影响来保护至少保护点的屏蔽元件。 屏蔽元件具有纵向延伸部,其具有第一侧面和第二侧面,第一侧面布置在支撑元件上,锁定元件布置在屏蔽元件的第二侧上,锁定元件具有至少一个出口。 至少一个分隔壁布置在屏蔽元件内部,壁将屏蔽元件的内部容积分成第一部分体积并进入第二部分体积。
    • 10. 发明申请
    • COATING DEVICE AND COATING METHOD
    • 涂层设备和涂层方法
    • US20120107501A1
    • 2012-05-03
    • US13375957
    • 2010-05-13
    • Tino HarigMarkus HöferArtur LaukartLothar SchäferMarkus Armgardt
    • Tino HarigMarkus HöferArtur LaukartLothar SchäferMarkus Armgardt
    • C23C16/52C23C16/50C23C16/448C23C16/455
    • C23C16/00C23C16/22C23C16/24C23C16/26C23C16/44C23C16/4404C23C16/52
    • A coating installation containing at least one recipient which can be evacuated and which is provided to receive a substrate, at least one gas supply device which can introduce at least one gaseous precursor into the recipient, and at least one activation device which contains at least one heatable activation element, the end thereof being secured to a securing point on a support element. In the related method, the activation element can be heated by at least one first heating device and at least one second heating device, the first heating device enabling energy to be input in a uniform manner over the longitudinal extension of the activation element and the second heating device enabling energy to be input in a changeable manner over the longitudinal extension of the activation element such that the temperature of the activation element, in at least one longitudinal section, can be brought to over 1300° C. due to the effect of the second heating element.
    • 一种涂覆装置,其至少包含一个可被排空的接收器,并且被提供以接纳基底,至少一个可将至少一种气态前体引入到接收器中的气体供应装置,以及至少一个包含至少一个 可加热激活元件,其端部固定到支撑元件上的固定点。 在相关方法中,激活元件可以被至少一个第一加热装置和至少一个第二加热装置加热,第一加热装置使能量能够以均匀的方式输入到激活元件的纵向延伸部上,而第二加热装置 加热装置能够在活动元件的纵向延伸部上以可更改的方式输入能量,使得在至少一个纵向截面中的激活元件的温度可以达到超过1300℃,这是由于 第二加热元件。