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1. 发明授权

US09304400B2 Illumination system for EUV microlithography 有权
标题翻译： EUV微光刻照明系统
公开(公告)号：US09304400B2
公开(公告)日：2016-04-05
申请号：US13038453
申请日：2011-03-02
申请人： Michael Layh , Ralf Stuetzle , Damian Fiolka , Martin Endres , Holger Weigand
发明人： Michael Layh , Ralf Stuetzle , Damian Fiolka , Martin Endres , Holger Weigand
IPC分类号： G03B27/54 , G03F7/20 , G02B17/06 , G02B27/00
CPC分类号： G03F7/70083 , G02B17/0605 , G02B17/0647 , G02B27/0043 , G03F7/70033 , G03F7/70075
摘要： An illumination system for EUV microlithography includes an EUV light source which generates EUV illumination light with an etendue that is higher than 0.01 mm2. The EUV light source generates a sequence of EUV light pulses having a pulse sequence frequency. An illumination optics of the illumination system is used to guide the illumination light from the light source to an object field. At least one optical modulation component of the illumination system is preferably modulatable synchronously with the pulse sequence frequency. The result is an illumination system where a homogeneity of an object field illumination is improved.
摘要翻译：用于EUV微光刻的照明系统包括产生具有高于0.01mm 2的光密度的EUV照明光的EUV光源。 EUV光源产生具有脉冲序列频率的EUV光脉冲序列。照明系统的照明光学器件用于将来自光源的照明光引导到物场。照明系统的至少一个光调制部件优选地可以与脉冲序列频率同步地进行调制。其结果是改善了物场照明的均匀性的照明系统。

2. 发明申请

US20110177463A1 ILLUMINATION SYSTEM FOR EUV MICROLITHOGRAPHY 有权
标题翻译： EUV微观照明系统
公开(公告)号：US20110177463A1
公开(公告)日：2011-07-21
申请号：US13038453
申请日：2011-03-02
申请人： Michael Layh , Ralf Stuetzle , Damian Fiolka , Martin Endres , Holger Weigand
发明人： Michael Layh , Ralf Stuetzle , Damian Fiolka , Martin Endres , Holger Weigand
IPC分类号： G03F7/20 , G21K5/00
CPC分类号： G03F7/70083 , G02B17/0605 , G02B17/0647 , G02B27/0043 , G03F7/70033 , G03F7/70075
摘要： An illumination system for EUV microlithography includes an EUV light source which generates EUV illumination light with an etendue that is higher than 0.01 mm2. The EUV light source generates a sequence of EUV light pulses having a pulse sequence frequency. An illumination optics of the illumination system is used to guide the illumination light from the light source to an object field. At least one optical modulation component of the illumination system is preferably modulatable synchronously with the pulse sequence frequency. The result is an illumination system where a homogeneity of an object field illumination is improved.
摘要翻译：用于EUV微光刻的照明系统包括产生具有高于0.01mm 2的光密度的EUV照明光的EUV光源。 EUV光源产生具有脉冲序列频率的EUV光脉冲序列。照明系统的照明光学器件用于将来自光源的照明光引导到物场。照明系统的至少一个光调制部件优选地可以与脉冲序列频率同步地进行调制。其结果是改善了物场照明的均匀性的照明系统。

3. 发明申请

US20110063598A1 ILLUMINATION OPTICS FOR EUV MICROLITHOGRAPHY AND RELATED SYSTEM AND APPARATUS 有权
标题翻译： EUV微观照相和相关系统和装置的照明光学
公开(公告)号：US20110063598A1
公开(公告)日：2011-03-17
申请号：US12915785
申请日：2010-10-29
申请人： Damian Fiolka , Berndt Warm , Christian Steigerwald , Martin Endres , Ralf Stuetzle , Jens Ossmann , Ralf Scharnweber , Markus Hauf , Udo Dinger , Severin Waldis , Marc Kirch , Joachim Hartjes
发明人： Damian Fiolka , Berndt Warm , Christian Steigerwald , Martin Endres , Ralf Stuetzle , Jens Ossmann , Ralf Scharnweber , Markus Hauf , Udo Dinger , Severin Waldis , Marc Kirch , Joachim Hartjes
IPC分类号： G03B27/72
CPC分类号： G03F7/70191 , G03F7/70083
摘要： An illumination optics for EUV microlithography guides an illumination light bundle from a radiation source to an object field with an extension ratio between a longer field dimension and a shorter field dimension, where the ratio is considerably greater than 1. A field facet mirror has a plurality of field facets that set defined illumination conditions in the object field. A following optics downstream of the field facet mirror transmits the illumination light into the object field. The following optics includes a pupil facet mirror with a plurality of pupil facets. The field facets are in each case individually allocated to the pupil facets so that portions of the illumination light bundle impinging upon in each case one of the field facets are guided on to the object field via the associated pupil facet. The field facet mirror not only includes a plurality of basic illumination field facets which provide a basic illumination of the object field via associated basic illumination pupil facets, but also includes a plurality of correction illumination field facets which provide for a correction of the illumination of the object field via associated correction illumination pupil facets. The result is an illumination optics which allows unwanted variations of illumination parameters, for instance an illumination intensity distribution or an illumination angle distribution, to be corrected across the object field.
摘要翻译：用于EUV微光刻的照明光学器件将照射光束从辐射源引导到物场，其具有在较大场尺寸和较短场尺寸之间的延伸比，其中该比率远大于1.场分面镜具有多个的场面在场景中设置定义的照明条件。在场面反射镜下游的以下光学器件将照明光透射到物体场中。以下光学器件包括具有多个光瞳面的光瞳小面镜。场分面在每种情况下分别被分配给光瞳面，使得在各种情况下照射的照明光束的一部分通过相关联的光瞳小面被引导到物场。场面镜不仅包括多个基本照明场面，它们通过相关联的基本照明光瞳面提供物场的基本照明，而且还包括多个校正照明场面，其提供对照射的照明的校正通过相关联的校正照明光瞳面进行物体场。结果是照明光学元件允许在整个对象场校正照明参数的不期望的变化，例如照明强度分布或照明角度分布。

4. 发明授权

US08587767B2 Illumination optics for EUV microlithography and related system and apparatus 有权
标题翻译：用于EUV微光刻的照明光学器件及相关系统和装置
公开(公告)号：US08587767B2
公开(公告)日：2013-11-19
申请号：US12915785
申请日：2010-10-29
申请人： Damian Fiolka , Berndt Warm , Christian Steigerwald , Martin Endres , Ralf Stuetzle , Jens Ossmann , Ralf Scharnweber , Markus Hauf , Udo Dinger , Severin Waldis , Marc Kirch , Joachim Hartjes
发明人： Damian Fiolka , Berndt Warm , Christian Steigerwald , Martin Endres , Ralf Stuetzle , Jens Ossmann , Ralf Scharnweber , Markus Hauf , Udo Dinger , Severin Waldis , Marc Kirch , Joachim Hartjes
IPC分类号： G03B27/72 , G03B27/54 , G03B27/68 , G03B27/42 , G03B27/32
CPC分类号： G03F7/70191 , G03F7/70083
摘要： Illumination optics for EUV microlithography guide an illumination light bundle from a radiation source to an object field with an extension ratio between a longer field dimension and a shorter field dimension, where the ratio is considerably greater than 1.
摘要翻译：用于EUV微光刻的照明光学器件将照射光束从辐射源引导到物场，其具有较长场尺寸和较短场尺寸之间的延伸比，其中该比率显着大于1。

5. 发明授权

US09310692B2 Component for setting a scan-integrated illumination energy in an object plane of a microlithography projection exposure apparatus 有权
标题翻译：用于在微光刻投影曝光设备的物平面中设置扫描集成照明能量的组件
公开(公告)号：US09310692B2
公开(公告)日：2016-04-12
申请号：US12916882
申请日：2010-11-01
申请人： Ralf Stuetzle , Martin Endres , Jens Ossmann , Michael Layh
发明人： Ralf Stuetzle , Martin Endres , Jens Ossmann , Michael Layh
IPC分类号： G03B27/52 , G03F7/20
CPC分类号： G03F7/70191 , G03F7/70066 , G03F7/70083 , G03F7/70558
摘要： A component for setting a scan-integrated illumination energy in an object plane of a microlithography projection exposure apparatus is disclosed. The component includes a plurality of diaphragms which are arranged alongside one another with respect to a direction perpendicular to the scan movement and which differ in their form and the position of which can be altered approximately in the scan direction so that a portion of the illumination energy can be vignetted by at least one diaphragm. The form of the individual diaphragm is specifically adapted to the form of the illumination in a diaphragm plane in which the component is arranged. This has the effect that at least parts of the delimiting edges of two diaphragms always differ in the case of an arbitrary displacement of the diaphragms.
摘要翻译：公开了一种用于在微光刻投影曝光装置的物平面中设置扫描集成照明能量的部件。该部件包括多个隔膜，它们相对于垂直于扫描移动的方向彼此并排布置，并且其形状不同，其位置可以在扫描方向上大致改变，使得照射能量的一部分可以由至少一个隔膜取消。单个隔膜的形式特别适用于其中布置有该部件的隔膜平面中的照明形式。这具有以下效果：在隔膜的任意位移的情况下，两个隔膜的至少一部分限界边缘总是不同。

6. 发明申请

US20110096317A1 COMPONENT FOR SETTING A SCAN-INTEGRATED ILLUMINATION ENERGY IN AN OBJECT PLANE OF A MICROLITHOGRAPHY PROJECTION EXPOSURE APPARATUS 有权
标题翻译：用于在微观投影曝光装置的对象平面中设置扫描一体化照明能量的组件
公开(公告)号：US20110096317A1
公开(公告)日：2011-04-28
申请号：US12916882
申请日：2010-11-01
申请人： Ralf Stuetzle , Martin Endres , Jens Ossmann , Michael Layh
发明人： Ralf Stuetzle , Martin Endres , Jens Ossmann , Michael Layh
IPC分类号： G03B27/72 , G02B26/02 , G03F7/20
CPC分类号： G03F7/70191 , G03F7/70066 , G03F7/70083 , G03F7/70558
摘要： A component for setting a scan-integrated illumination energy in an object plane of a microlithography projection exposure apparatus is disclosed. The component includes a plurality of diaphragms which are arranged alongside one another with respect to a direction perpendicular to the scan movement and which differ in their form and the position of which can be altered approximately in the scan direction so that a portion of the illumination energy can be vignetted by at least one diaphragm. The form of the individual diaphragm is specifically adapted to the form of the illumination in a diaphragm plane in which the component is arranged. This has the effect that at least parts of the delimiting edges of two diaphragms always differ in the case of an arbitrary displacement of the diaphragms.
摘要翻译：公开了一种用于在微光刻投影曝光装置的物平面中设置扫描集成照明能量的部件。该部件包括多个隔膜，它们相对于垂直于扫描移动的方向彼此并排布置，并且其形状不同，其位置可以在扫描方向上大致改变，使得照射能量的一部分可以由至少一个隔膜取消。单个隔膜的形式特别适用于其中布置有该部件的隔膜平面中的照明形式。这具有以下效果：在隔膜的任意位移的情况下，两个隔膜的至少一部分限界边缘总是不同。

7. 发明申请

US20120293785A1 OPTICAL ELEMENT HAVING A PLURALITY OF REFLECTIVE FACET ELEMENTS 有权
标题翻译：具有多重反射面元素的光学元件
公开(公告)号：US20120293785A1
公开(公告)日：2012-11-22
申请号：US13486073
申请日：2012-06-01
申请人： Marc Kirch , Martin Endres , Damian Fiolka , Joachim Hartjes
发明人： Marc Kirch , Martin Endres , Damian Fiolka , Joachim Hartjes
IPC分类号： G03B27/72
CPC分类号： G02B26/0816 , G02B5/0891 , G02B5/09 , G02B7/1822 , G02B27/0927 , G02B27/0977 , G03F7/70075 , G03F7/70116
摘要： An optical element for use in an illumination optical unit of an EUV microlithography projection exposure apparatus includes a plurality of reflective facet elements. Each reflective facet element has at least one reflective surface. In this case, at least one facet element is arranged in a manner rotatable about a rotation axis. The rotation axis intersects the at least one reflective surface of the facet element. With such an optical element, it is possible to alter the direction and/or the intensity of at least part of the illumination radiation within the illumination optical unit in a simple manner.
摘要翻译：用于EUV微光刻投影曝光装置的照明光学单元的光学元件包括多个反射小面元件。每个反射小面元件具有至少一个反射表面。在这种情况下，以围绕旋转轴线旋转的方式布置至少一个小面元件。旋转轴与小面元件的至少一个反射表面相交。利用这种光学元件，可以以简单的方式改变照明光学单元内的照明辐射的至少一部分的方向和/或强度。

8. 发明申请

US20080259303A1 PROJECTION EXPOSURE APPARATUS FOR MICROLITHOGRAPHY 审中-公开
标题翻译：投影曝光装置用于微结构
公开(公告)号：US20080259303A1
公开(公告)日：2008-10-23
申请号：US12103185
申请日：2008-04-15
申请人： Jens Ossmann , Martin Endres , Ralf Stuetzle
发明人： Jens Ossmann , Martin Endres , Ralf Stuetzle
IPC分类号： G03B27/70 , G03B27/54
CPC分类号： G03F7/70841 , G03F7/702 , G03F7/70808 , G03F7/70833
摘要： A projection exposure apparatus for microlithography is disclosed. The apparatus can include a radiation source to generate illumination radiation and a reticle holder to receive a reticle in an object plane. The apparatus can further include illumination optics to guide the illumination radiation to an object field, which is to be illuminated, in the object plane. The apparatus can also include a wafer holder to receive a wafer in an image plane and projection optics to image the object field into an image field in the image plane. The radiation source and projection optics can be arranged in separate chambers (e.g., one above the other). The chambers can be separated by a wall. There can be an illumination radiation leadthrough in the wall. In some embodiments, the projection exposure apparatus can guide the illumination radiation with low loss.
摘要翻译：公开了一种用于微光刻的投影曝光装置。该装置可以包括用于产生照明辐射的辐射源和用于在物平面中接收光罩的光罩保持器。该装置还可以包括照明光学器件，以将照射辐射引导到物体平面中要被照明的物体场。该装置还可以包括用于在图像平面中接收晶片的晶片保持器和用于将对象场成像到图像平面中的图像场的投影光学器件。辐射源和投影光学器件可以布置在分开的腔室中（例如，彼此之一）。这些室可以被墙隔开。墙壁上可以有一个照明辐射引线。在一些实施例中，投影曝光装置可以低损耗地引导照射辐射。

9. 发明授权

US09063336B2 Optical element having a plurality of reflective facet elements 有权
标题翻译：具有多个反射小面元件的光学元件
公开(公告)号：US09063336B2
公开(公告)日：2015-06-23
申请号：US13486073
申请日：2012-06-01
申请人： Marc Kirch , Martin Endres , Damian Fiolka , Joachim Hartjes
发明人： Marc Kirch , Martin Endres , Damian Fiolka , Joachim Hartjes
IPC分类号： G03B27/68 , G03B27/54 , G03B27/72 , G02B26/08 , G02B5/09 , G02B7/182 , G02B27/09 , G03F7/20 , G02B5/08
CPC分类号： G02B26/0816 , G02B5/0891 , G02B5/09 , G02B7/1822 , G02B27/0927 , G02B27/0977 , G03F7/70075 , G03F7/70116
摘要： An optical element for use in an illumination optical unit of an EUV microlithography projection exposure apparatus includes a plurality of reflective facet elements. Each reflective facet element has at least one reflective surface. In this case, at least one facet element is arranged in a manner rotatable about a rotation axis. The rotation axis intersects the at least one reflective surface of the facet element. With such an optical element, it is possible to alter the direction and/or the intensity of at least part of the illumination radiation within the illumination optical unit in a simple manner.
摘要翻译：用于EUV微光刻投影曝光装置的照明光学单元的光学元件包括多个反射小面元件。每个反射小面元件具有至少一个反射表面。在这种情况下，以围绕旋转轴线旋转的方式布置至少一个小面元件。旋转轴与小面元件的至少一个反射表面相交。利用这种光学元件，可以以简单的方式改变照明光学单元内的照明辐射的至少一部分的方向和/或强度。

10. 发明申请

US20110235015A1 ILLUMINATION OPTICS FOR EUV MICROLITHOGRAPHY 审中-公开
标题翻译： EUV微观光谱的照明光学
公开(公告)号：US20110235015A1
公开(公告)日：2011-09-29
申请号：US13076730
申请日：2011-03-31
申请人： Guenther Dengel , Gero Wittich , Udo Dinger , Ralf Stuetzle , Martin Endres , Jens Ossmann , Berndt Warm
发明人： Guenther Dengel , Gero Wittich , Udo Dinger , Ralf Stuetzle , Martin Endres , Jens Ossmann , Berndt Warm
IPC分类号： G03B27/72
CPC分类号： G03F7/7085 , G03F7/70141 , G03F7/702 , G03F7/70558
摘要： An illumination optics for EUV microlithography illuminates an object field with the aid of an EUV used radiation beam. Preset devices preset illumination parameters. An illumination correction device corrects the intensity distribution and/or the angular distribution of the object field illumination. The latter has an optical component to which the used radiation beam is at least partially applied upstream of the object field and which can be driven in a controlled manner. A detector acquires one of the illumination parameters. An evaluation device evaluates the detector data and converts the latter into control signals. At least one actuator displaces the optical component. During exposures, the actuators are controlled with the aid of the detector signals during the period of a projection exposure. A maximum displacement of below 8 μm is ensured for edges of the object field towards an object to be exposed. The result is an illumination optics that is used to ensure conformance with preset illumination parameters even given the most stringent demands upon precision.
摘要翻译：用于EUV微光刻的照明光学器件借助EUV使用的辐射束照亮物体场。预设设备预设照明参数。照明校正装置校正物场照明的强度分布和/或角分布。后者具有光学部件，使用的辐射束至少部分地施加在物场的上游，并且可以以受控的方式驱动。检测器获取照明参数之一。评估装置评估检测器数据并将其转换成控制信号。至少一个致动器移动光学部件。在曝光期间，在投影曝光期间借助于检测器信号来控制致动器。确保物体边缘朝向待曝光物体的8μm以下的最大位移。结果是一个照明光学器件，用于确保符合预设的照明参数，即使在最严格的精度要求下。

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