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1. 发明授权

US08694929B2 Method and apparatus for the position determination of structures on a mask for microlithography 有权
标题翻译：用于微光刻掩模的结构位置确定的方法和装置
公开(公告)号：US08694929B2
公开(公告)日：2014-04-08
申请号：US13543083
申请日：2012-07-06
申请人： Dirk Seidel , Michael Arnz
发明人： Dirk Seidel , Michael Arnz
IPC分类号： G06F17/50 , G06F19/00 , G03F1/00 , G21K5/00 , G06K9/00
CPC分类号： G06F17/5009 , G03F1/00 , G03F1/42 , G03F1/84 , G03F7/705 , G03F7/70616 , G03F7/70666 , G06F17/5081 , G06F19/00 , G06K9/00 , G21K5/00
摘要： A method and an apparatus for determining the position of a structure on a mask for microlithography, in which the position is determined by comparing an aerial image, measured by a recording device, of a portion of the mask with an aerial image determined by simulation. The position determination includes carrying out a plurality of such comparisons which differ from one another with regard to the input parameters of the simulation.
摘要翻译：一种用于确定用于微光刻的掩模上的结构的位置的方法和装置，其中通过将由记录装置测量的空间图像与掩模的一部分与由模拟确定的空中图像进行比较来确定位置。位置确定包括对于模拟的输入参数执行彼此不同的多个这样的比较。

2. 发明申请

US20120063666A1 Method For Determining The Registration Of A Structure On A Photomask And Apparatus To Perform The Method 有权
标题翻译：用于确定光掩模上的结构的注册和执行该方法的装置的方法
公开(公告)号：US20120063666A1
公开(公告)日：2012-03-15
申请号：US13229396
申请日：2011-09-09
申请人： Michael Arnz , Dirk Seidel , Gerd Klose
发明人： Michael Arnz , Dirk Seidel , Gerd Klose
IPC分类号： G06K9/00
CPC分类号： G01B11/26 , G01B11/00 , G03F1/42 , G03F1/84
摘要： A method for determining a registration error of a feature on a mask, including providing a first aerial image that was captured by means of a position measuring device and includes at least the feature, simulating, from pattern specifications of the mask, a second aerial image that includes at least the feature, taking into account at least one effect that causes distortion of the first aerial image, and determining the registration error of the feature as the distance of the position of the feature in the first aerial image from the position of the feature in the second aerial image. Also provided is a method for simulating an aerial image from pattern specifications of a mask and a position measuring device for carrying out the method.
摘要翻译：一种用于确定掩模上的特征的配准误差的方法，包括提供通过位置测量装置捕获的第一空间图像，并且至少包括从掩模的图案规格模拟第二空间图像的特征考虑到引起第一空间图像失真的至少一个效应，以及确定特征的登记误差作为第一空间图像中的特征的位置与第一空间图像的位置的距离，至少包括该特征功能在第二个航空图像。还提供了一种用于从掩模的图案规格和用于执行该方法的位置测量装置模拟空中图像的方法。

3. 发明授权

US09303975B2 Method for determining the registration of a structure on a photomask and apparatus to perform the method 有权
标题翻译：用于确定光掩模上的结构的配准和执行该方法的装置的方法
公开(公告)号：US09303975B2
公开(公告)日：2016-04-05
申请号：US13229396
申请日：2011-09-09
申请人： Michael Arnz , Dirk Seidel , Gerd Klose
发明人： Michael Arnz , Dirk Seidel , Gerd Klose
IPC分类号： G01B11/00 , G03F1/42 , G03F1/84
CPC分类号： G01B11/26 , G01B11/00 , G03F1/42 , G03F1/84
摘要： A method for determining a registration error of a feature on a mask, including providing a first aerial image that was captured by means of a position measuring device and includes at least the feature, simulating, from pattern specifications of the mask, a second aerial image that includes at least the feature, taking into account at least one effect that causes distortion of the first aerial image, and determining the registration error of the feature as the distance of the position of the feature in the first aerial image from the position of the feature in the second aerial image. Also provided is a method for simulating an aerial image from pattern specifications of a mask and a position measuring device for carrying out the method.
摘要翻译：一种用于确定掩模上的特征的配准误差的方法，包括提供通过位置测量装置捕获的第一空间图像，并且至少包括从掩模的图案规格模拟第二空间图像的特征考虑到引起第一空间图像失真的至少一个效应，以及确定特征的登记误差作为第一空间图像中的特征的位置与第一空间图像的位置的距离，至少包括该特征功能在第二个航空图像。还提供了一种用于从掩模的图案规格和用于执行该方法的位置测量装置模拟空中图像的方法。

4. 发明申请

US20130019212A1 Method And Apparatus For The Position Determination Of Structures On A Mask For Microlithography 有权
标题翻译：用于微光刻的掩模上的结构位置确定的方法和装置
公开(公告)号：US20130019212A1
公开(公告)日：2013-01-17
申请号：US13543083
申请日：2012-07-06
申请人： Dirk Seidel , Michael Arnz
发明人： Dirk Seidel , Michael Arnz
IPC分类号： G06F17/50
CPC分类号： G06F17/5009 , G03F1/00 , G03F1/42 , G03F1/84 , G03F7/705 , G03F7/70616 , G03F7/70666 , G06F17/5081 , G06F19/00 , G06K9/00 , G21K5/00
摘要： A method and an apparatus for determining the position of a structure on a mask for microlithography, in which the position is determined by comparing an aerial image, measured by a recording device, of a portion of the mask with an aerial image determined by simulation. The position determination includes carrying out a plurality of such comparisons which differ from one another with regard to the input parameters of the simulation.
摘要翻译：一种用于确定用于微光刻的掩模上的结构的位置的方法和装置，其中通过将由记录装置测量的空间图像与掩模的一部分与由模拟确定的空中图像进行比较来确定位置。位置确定包括对于模拟的输入参数执行彼此不同的多个这样的比较。

5. 发明授权

US09297994B2 Grating-assisted autofocus device and autofocusing method for an imaging device 有权
标题翻译：用于成像装置的光栅辅助自动对焦装置和自动对焦方法
公开(公告)号：US09297994B2
公开(公告)日：2016-03-29
申请号：US13606997
申请日：2012-09-07
申请人： Sascha Perlitz , Michael Arnz , Dirk Seidel
发明人： Sascha Perlitz , Michael Arnz , Dirk Seidel
IPC分类号： G02B7/04 , H04N5/232 , G02B21/24
CPC分类号： G02B21/244 , G02B21/245
摘要： There is provided an autofocus device for an imaging device which has an imaging lens system with a first focal plane, an object stage for holding an object and a first movement module for the relative movement of object stage and imaging lens system, wherein the autofocus device comprises an image-recording module with a second focal plane the position of which relative to the first focal plane is known, a second movement module for the relative movement of object stage and image-recording module, a focus module for producing a two-dimensional, intensity-modulated focusing image in a focus module plane which intersects the second focal plane and a control module which controls the image-recording module for focusing the imaging device, which then records a first two-dimensional image of the object together with the focusing image during a predetermined first exposure time, and wherein the control module, using the first two-dimensional image recorded by means of the image-recording module and taking into account the relative position of the first and second focal plane, evaluates the required changes in distance between the object stage and the imaging lens system and controls the first movement module such that the evaluated change in distance is carried out, wherein the control module controls the second movement module such that, during the first exposure time for recording the first two-dimensional image, the object stage is moved relative to the image-recording module in a plane parallel to the second focal plane.
摘要翻译：提供了一种用于成像装置的自动对焦装置，其具有具有第一焦平面的成像透镜系统，用于保持物体的物体台和用于物体台和成像透镜系统的相对运动的第一移动模块，其中自动对焦装置包括具有第二焦平面的图像记录模块，其相对于第一焦平面的位置是已知的，用于对象台和图像记录模块的相对移动的第二移动模块，用于产生二维，在与第二焦平面相交的聚焦模块平面中的强度调制聚焦图像和控制图像记录模块以控制成像装置聚焦的控制模块，该成像装置然后将对象的第一二维图像与聚焦在预定的第一曝光时间期间的图像，并且其中所述控制模块使用通过图像记录模式记录的第一二维图像并且考虑到第一和第二焦平面的相对位置，评估对象台和成像透镜系统之间所需的距离变化，并且控制第一移动模块，使得执行评估的距离变化，其中控制模块控制第二移动模块，使得在用于记录第一二维图像的第一曝光时间期间，物体台在平行于第二焦平面的平面中相对于图像记录模块移动。

6. 发明授权

US08693805B2 Determination of the relative position of two structures 有权
标题翻译：确定两个结构的相对位置
公开(公告)号：US08693805B2
公开(公告)日：2014-04-08
申请号：US13375830
申请日：2010-07-23
申请人： Michael Arnz , Dirk Seidel
发明人： Michael Arnz , Dirk Seidel
IPC分类号： G06K9/36 , G06K9/20 , G06K9/32
CPC分类号： G03F7/70633 , G03F7/70625
摘要： A method is provided for determining the position of a first structure (8a) relative to a second structure (8b) or a part thereof, said method having the steps of: a) providing a first picture (F1) having a multiplicity of pixels and which contains the first structure, b) providing a second picture (F2) having a multiplicity of pixels and which contains the second structure, c) forming an optimization function with the displacement of the two pictures relative to one another as parameter, the optimization function overlying the two pictures and masking the overlay such that in a determination of an extreme value of the optimization function a contribution is made only by the region of the overlay that corresponds to the second structure or the part thereof, d) ascertaining the extreme value of the optimization function and determining the optimal value of the displacement based on the extreme value of the optimization function, and e) determining the position of the first structure relative to the second structure or a part thereof with the optimal displacement value ascertained in step d).
摘要翻译：提供了一种用于确定第一结构（8a）相对于第二结构（8b）或其一部分的位置的方法，所述方法具有以下步骤：a）提供具有多个像素的第一图像（F1）和其包括第一结构，b）提供具有多个像素并且包含第二结构的第二图像（F2），c）形成具有两个图像相对于彼此的位移的优化函数作为参数，优化函数覆盖两幅图像并掩盖覆盖层，使得在确定最优化函数的极值时，仅通过对应于第二结构或其部分的覆盖区域进行贡献，d）确定最优值优化函数，并基于优化函数的极值确定位移的最优值，以及e）确定第一结构rel的位置具有在步骤d）中确定的最佳位移值的第二结构或其一部分。

7. 发明申请

US20130062501A1 Autofocus Device and Autofocussing Method For An Imaging Device 有权
标题翻译：成像装置的自动对焦装置和自动聚焦方法
公开(公告)号：US20130062501A1
公开(公告)日：2013-03-14
申请号：US13606997
申请日：2012-09-07
申请人： Sascha Perlitz , Michael Arnz , Dirk Seidel
发明人： Sascha Perlitz , Michael Arnz , Dirk Seidel
IPC分类号： G02B27/40
CPC分类号： G02B21/244 , G02B21/245
摘要： There is provided an autofocus device for an imaging device which has an imaging lens system with a first focal plane, an object stage for holding an object, and a first movement module for the relative movement of object stage and imaging lens system. The autofocus device comprises an image-recording module with a second focal plane, a second movement module for the relative movement of object stage and image-recording module, and a control module which controls the image-recording module for focusing the imaging device. The control module controls the first movement module such that evaluated change in distance between the object stage and the imaging lens system is carried out, and controls the second movement module such that, during the first exposure time for recording the first two-dimensional image, the object stage is moved relative to the image-recording module in a plane parallel to the second focal plane.
摘要翻译：提供了一种用于成像装置的自动对焦装置，其具有具有第一焦平面的成像透镜系统，用于保持物体的物体台和用于物体台和成像透镜系统的相对运动的第一移动模块。自动对焦装置包括具有第二焦平面的图像记录模块，用于对象台和图像记录模块的相对移动的第二移动模块，以及控制图像记录模块以聚焦成像装置的控制模块。所述控制模块控制所述第一移动模块，使得执行所述对象台和所述成像镜头系统之间的距离的评估变化，并且控制所述第二移动模块，使得在用于记录所述第一二维图像的所述第一曝光时间期间，物体台在与第二焦平面平行的平面中相对于图像记录模块移动。

8. 发明申请

US20120121205A1 DETERMINATION OF THE RELATIVE POSITION OF TWO STRUCTURES 有权
标题翻译：确定两个结构的相对位置
公开(公告)号：US20120121205A1
公开(公告)日：2012-05-17
申请号：US13375830
申请日：2010-07-23
申请人： Michael Arnz , Dirk Seidel
发明人： Michael Arnz , Dirk Seidel
IPC分类号： G06K9/36
CPC分类号： G03F7/70633 , G03F7/70625
摘要： A method is provided for determining the position of a first structure (8a) relative to a second structure (8b) or a part thereof, said method having the steps of: a) providing a first picture (F1) having a multiplicity of pixels and which contains the first structure, b) providing a second picture (F2) having a multiplicity of pixels and which contains the second structure, c) forming an optimization function with the displacement of the two pictures relative to one another as parameter, the optimization function overlying the two pictures and masking the overlay such that in a determination of an extreme value of the optimization function a contribution is made only by the region of the overlay that corresponds to the second structure or the part thereof, d) ascertaining the extreme value of the optimization function and determining the optimal value of the displacement based on the extreme value of the optimization function, and e) determining the position of the first structure relative to the second structure or a part thereof with the optimal displacement value ascertained in step d).
摘要翻译：提供了一种用于确定第一结构（8a）相对于第二结构（8b）或其一部分的位置的方法，所述方法具有以下步骤：a）提供具有多个像素的第一图像（F1）和其包括第一结构，b）提供具有多个像素并且包含第二结构的第二图像（F2），c）形成具有两个图像相对于彼此的位移的优化函数作为参数，优化函数覆盖两幅图像并掩盖覆盖层，使得在确定最优化函数的极值时，仅通过对应于第二结构或其部分的覆盖区域进行贡献，d）确定最优值优化函数，并基于优化函数的极值确定位移的最优值，以及e）确定第一结构rel的位置具有在步骤d）中确定的最佳位移值的第二结构或其一部分。

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