专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US09297994B2 Grating-assisted autofocus device and autofocusing method for an imaging device 有权
标题翻译：用于成像装置的光栅辅助自动对焦装置和自动对焦方法
公开(公告)号：US09297994B2
公开(公告)日：2016-03-29
申请号：US13606997
申请日：2012-09-07
申请人： Sascha Perlitz , Michael Arnz , Dirk Seidel
发明人： Sascha Perlitz , Michael Arnz , Dirk Seidel
IPC分类号： G02B7/04 , H04N5/232 , G02B21/24
CPC分类号： G02B21/244 , G02B21/245
摘要： There is provided an autofocus device for an imaging device which has an imaging lens system with a first focal plane, an object stage for holding an object and a first movement module for the relative movement of object stage and imaging lens system, wherein the autofocus device comprises an image-recording module with a second focal plane the position of which relative to the first focal plane is known, a second movement module for the relative movement of object stage and image-recording module, a focus module for producing a two-dimensional, intensity-modulated focusing image in a focus module plane which intersects the second focal plane and a control module which controls the image-recording module for focusing the imaging device, which then records a first two-dimensional image of the object together with the focusing image during a predetermined first exposure time, and wherein the control module, using the first two-dimensional image recorded by means of the image-recording module and taking into account the relative position of the first and second focal plane, evaluates the required changes in distance between the object stage and the imaging lens system and controls the first movement module such that the evaluated change in distance is carried out, wherein the control module controls the second movement module such that, during the first exposure time for recording the first two-dimensional image, the object stage is moved relative to the image-recording module in a plane parallel to the second focal plane.
摘要翻译：提供了一种用于成像装置的自动对焦装置，其具有具有第一焦平面的成像透镜系统，用于保持物体的物体台和用于物体台和成像透镜系统的相对运动的第一移动模块，其中自动对焦装置包括具有第二焦平面的图像记录模块，其相对于第一焦平面的位置是已知的，用于对象台和图像记录模块的相对移动的第二移动模块，用于产生二维，在与第二焦平面相交的聚焦模块平面中的强度调制聚焦图像和控制图像记录模块以控制成像装置聚焦的控制模块，该成像装置然后将对象的第一二维图像与聚焦在预定的第一曝光时间期间的图像，并且其中所述控制模块使用通过图像记录模式记录的第一二维图像并且考虑到第一和第二焦平面的相对位置，评估对象台和成像透镜系统之间所需的距离变化，并且控制第一移动模块，使得执行评估的距离变化，其中控制模块控制第二移动模块，使得在用于记录第一二维图像的第一曝光时间期间，物体台在平行于第二焦平面的平面中相对于图像记录模块移动。

2. 发明申请

US20130062501A1 Autofocus Device and Autofocussing Method For An Imaging Device 有权
标题翻译：成像装置的自动对焦装置和自动聚焦方法
公开(公告)号：US20130062501A1
公开(公告)日：2013-03-14
申请号：US13606997
申请日：2012-09-07
申请人： Sascha Perlitz , Michael Arnz , Dirk Seidel
发明人： Sascha Perlitz , Michael Arnz , Dirk Seidel
IPC分类号： G02B27/40
CPC分类号： G02B21/244 , G02B21/245
摘要： There is provided an autofocus device for an imaging device which has an imaging lens system with a first focal plane, an object stage for holding an object, and a first movement module for the relative movement of object stage and imaging lens system. The autofocus device comprises an image-recording module with a second focal plane, a second movement module for the relative movement of object stage and image-recording module, and a control module which controls the image-recording module for focusing the imaging device. The control module controls the first movement module such that evaluated change in distance between the object stage and the imaging lens system is carried out, and controls the second movement module such that, during the first exposure time for recording the first two-dimensional image, the object stage is moved relative to the image-recording module in a plane parallel to the second focal plane.
摘要翻译：提供了一种用于成像装置的自动对焦装置，其具有具有第一焦平面的成像透镜系统，用于保持物体的物体台和用于物体台和成像透镜系统的相对运动的第一移动模块。自动对焦装置包括具有第二焦平面的图像记录模块，用于对象台和图像记录模块的相对移动的第二移动模块，以及控制图像记录模块以聚焦成像装置的控制模块。所述控制模块控制所述第一移动模块，使得执行所述对象台和所述成像镜头系统之间的距离的评估变化，并且控制所述第二移动模块，使得在用于记录所述第一二维图像的所述第一曝光时间期间，物体台在与第二焦平面平行的平面中相对于图像记录模块移动。

3. 发明授权

US09213003B2 Method for characterizing a structure on a mask and device for carrying out said method 有权
标题翻译：用于表征用于执行所述方法的掩模和装置上的结构的方法
公开(公告)号：US09213003B2
公开(公告)日：2015-12-15
申请号：US13995250
申请日：2011-12-13
申请人： Sascha Perlitz
发明人： Sascha Perlitz
IPC分类号： G01N21/956 , G03F1/84 , G03F7/20
CPC分类号： G01B11/046 , G01N21/956 , G03F1/84 , G03F7/70483
摘要： A method is provided for characterizing a mask having a structure, comprising the steps of: —illuminating said mask under at least one illumination angle with monochromatic illuminating radiation, so as to produce a diffraction pattern of said structure that includes at least two maxima of adjacent diffraction orders, —capturing said diffraction pattern, —determining the intensities of the maxima of the adjacent diffraction orders, —determining an intensity quotient of the intensities. A mask inspection microscope for characterizing a mask in conjunction with the performance of the inventive method is also provided.
摘要翻译：提供了一种用于表征具有结构的掩模的方法，包括以下步骤：在单色照明辐射下以至少一个照明角度对所述掩模进行曝光，以便产生所述结构的衍射图案，其包括至少两个相邻的最大值衍射顺序， - 获取所述衍射图，确定相邻衍射级的最大值的强度， - 确定强度的强度商。还提供了与本发明方法的性能一起表征掩模的掩模检查显微镜。

4. 发明申请

US20130308125A1 METHOD FOR CHARACTERIZING A STRUCTURE ON A MASK AND DEVICE FOR CARRYING OUT SAID METHOD 有权
标题翻译：用于表征掩蔽物的结构的方法和用于实施方法的装置
公开(公告)号：US20130308125A1
公开(公告)日：2013-11-21
申请号：US13995250
申请日：2011-12-13
申请人： Sascha Perlitz
发明人： Sascha Perlitz
IPC分类号： G01N21/956
CPC分类号： G01B11/046 , G01N21/956 , G03F1/84 , G03F7/70483
摘要： A method is provided for characterizing a mask having a structure, comprising the steps of: —illuminating said mask under at least one illumination angle with monochromatic illuminating radiation, so as to produce a diffraction pattern of said structure that includes at least two maxima of adjacent diffraction orders, —capturing said diffraction pattern, —determining the intensities of the maxima of the adjacent diffraction orders, —determining an intensity quotient of the intensities. A mask inspection microscope for characterizing a mask in conjunction with the performance of the inventive method is also provided.
摘要翻译：提供了一种用于表征具有结构的掩模的方法，包括以下步骤：在单色照明辐射下以至少一个照明角度对所述掩模进行曝光，以便产生所述结构的衍射图案，其包括至少两个相邻的最大值衍射顺序， - 获取所述衍射图，确定相邻衍射级的最大值的强度， - 确定强度的强度商。还提供了与本发明方法的性能一起表征掩模的掩模检查显微镜。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式