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1. 发明授权

US6039848A Ultra-high vacuum apparatus and method for high productivity physical vapor deposition. 失效
标题翻译：超高真空装置和高生产率物理气相沉积方法。
公开(公告)号：US6039848A
公开(公告)日：2000-03-21
申请号：US958877
申请日：1997-10-27
申请人： Mehrdad M. Moslehi , Cecil J. Davis , Dorian Heimanson
发明人： Mehrdad M. Moslehi , Cecil J. Davis , Dorian Heimanson
IPC分类号： C23C14/35 , C23C14/56 , H01J37/34 , C23C14/34
CPC分类号： H01J37/3408 , C23C14/35 , C23C14/564
摘要： A magnetron sputtering system is provided that uses a backing plate assembly having an insulating spacer ring coupled between and hermetically sealed to the backing plate and an extender ring. The insulating spacer ring can be constructed from a ceramic material, and the extender ring can be constructed from a metal material. The use of this backing plate assembly allows the backing plate assembly to be coupled directly to the chamber walls with a metal-to-metal contact, while the backing plate remains electrically isolated from the chamber walls. This allows the sealing of a vacuum chamber in the magnetron sputtering system using a seal suitable for creating an ultra-high vacuum in the vacuum chamber.
摘要翻译：提供了一种磁控溅射系统，其使用背板组件，该背板组件具有联接在背衬板和延伸环之间并与气垫密封的绝缘间隔环。绝缘间隔环可以由陶瓷材料构成，并且增量环可以由金属材料构成。使用该背板组件允许背板组件通过金属对金属接触直接耦合到室壁，而背板保持与室壁电隔离。这允许使用适于在真空室中产生超高真空的密封来密封磁控溅射系统中的真空室。

2. 发明授权

US5876573A High magnetic flux cathode apparatus and method for high productivity physical-vapor deposition 失效
标题翻译：高磁通阴极装置和高生产率物理气相沉积方法
公开(公告)号：US5876573A
公开(公告)日：1999-03-02
申请号：US677951
申请日：1996-07-10
申请人： Mehrdad M. Moslehi , Dorian Heimanson , Cecil J. Davis , Thomas R. Omstead
发明人： Mehrdad M. Moslehi , Dorian Heimanson , Cecil J. Davis , Thomas R. Omstead
IPC分类号： C23C14/34 , C23C14/35 , H01J37/34
CPC分类号： H01J37/3435 , C23C14/3407 , C23C14/35 , H01J37/3408 , H01J37/3497
摘要： A magnetron sputtering system is provided that uses cooling channels in the magnetron assembly to cool the target. The magnetron sputtering system also generates low pressure region in the magnetron assembly such that the backing plate sees a pressure differential much lower than atmospheric pressure. The backing plate is reduced in thickness and provides less of a barrier to the generated magnetic field.
摘要翻译：提供磁控溅射系统，其使用磁控管组件中的冷却通道来冷却靶。磁控溅射系统还在磁控管组件中产生低压区域，使得背板看到的压差远低于大气压。背板的厚度减小，并且对产生的磁场提供较少的屏障。

3. 发明授权

US06221217B1 Physical vapor deposition system having reduced thickness backing plate 有权
标题翻译：物理气相沉积系统具有减小厚度的背板
公开(公告)号：US06221217B1
公开(公告)日：2001-04-24
申请号：US09205113
申请日：1998-12-03
申请人： Mehrdad M. Moslehi , Dorian Heimanson , Cecil J. Davis , Thomas R. Omstead
发明人： Mehrdad M. Moslehi , Dorian Heimanson , Cecil J. Davis , Thomas R. Omstead
IPC分类号： C23C1434
CPC分类号： H01J37/3435 , C23C14/3407 , C23C14/35 , H01J37/3408 , H01J37/3497
摘要： A magnetron sputtering system is provided that uses cooling channels in the magnetron assembly to cool the target. The magnetron sputtering system also generates low pressure region in the magnetron assembly such that the backing plate sees a pressure differential much lower than atmospheric pressure. In one embodiment, the backing plate includes a center post to support the backing plate during operation. The backing plate is reduced in thickness and provides less of a barrier to the generated magnetic field.
摘要翻译：提供磁控溅射系统，其使用磁控管组件中的冷却通道来冷却靶。磁控管溅射系统还在磁控管组件中产生低压区域，使得背板看到的压差远低于大气压。在一个实施例中，背板包括在操作期间支撑背板的中心柱。背板的厚度减小，并且对产生的磁场提供较少的屏障。

4. 发明授权

US6126790A Method of magnetically orienting thin magnetic films with a multiple-coil electromagnet 有权
标题翻译：用多线圈电磁铁磁性取向薄磁膜的方法
公开(公告)号：US6126790A
公开(公告)日：2000-10-03
申请号：US499144
申请日：2000-02-07
申请人： Mehrdad M. Moslehi , Shiyuan Cheng , Cecil J. Davis , Dorian Heimanson
发明人： Mehrdad M. Moslehi , Shiyuan Cheng , Cecil J. Davis , Dorian Heimanson
IPC分类号： B05D5/12 , C23C14/00 , C23C14/22 , C23C14/35 , C23C14/58 , H01F3/00 , H01F5/00 , H01F7/20 , H01F41/14 , H01F41/18 , H01H1/00
CPC分类号： C23C14/22 , C23C14/351 , H01F41/14 , H01F41/18 , H01F7/20
摘要： An electromagnet assembly magnetically orients a thin magnetic film deposited onto a surface of a substrate. The magnetic orientation can take place in a low-pressure processing environment such as during the deposition of the thin magnetic film or during a subsequent operation such as annealing. The electromagnet assembly includes a plate-shaped core located adjacent to the substrate and two or more electromagnetic coils that are wrapped in different directions around the core. Electrical currents conveyed through the electromagnetic coils are controlled for orienting a substantially uniaxial magnetic field throughout a range of angular positions in a plane of the substrate surface.
摘要翻译：电磁体组件磁性地定向沉积在基底表面上的薄磁膜。磁性取向可以在低压处理环境中进行，例如在薄磁膜的沉积期间或在诸如退火的后续操作期间。电磁体组件包括位于基板附近的板状铁芯和围绕铁芯缠绕在不同方向上的两个或多个电磁线圈。控制通过电磁线圈输送的电流用于在衬底表面的平面中的角位置的整个范围内定向基本上单轴的磁场。

5. 发明授权

US6042707A Multiple-coil electromagnet for magnetically orienting thin films 失效
标题翻译：用于磁取向薄膜的多线圈电磁铁
公开(公告)号：US6042707A
公开(公告)日：2000-03-28
申请号：US83363
申请日：1998-05-22
申请人： Mehrdad M. Moslehi , Shiyuan Cheng , Cecil J. Davis , Dorian Heimanson
发明人： Mehrdad M. Moslehi , Shiyuan Cheng , Cecil J. Davis , Dorian Heimanson
IPC分类号： B05D5/12 , C23C14/00 , C23C14/22 , C23C14/35 , C23C14/58 , H01F3/00 , H01F5/00 , H01F7/20 , H01F41/14 , H01F41/18 , H01H1/00 , C14C14/35
CPC分类号： C23C14/22 , C23C14/351 , H01F41/14 , H01F41/18 , H01F7/20
摘要： An electromagnet assembly magnetically orients a thin magnetic film deposited onto a surface of a substrate. The magnetic orientation can take place in a low-pressure processing environment such as during the deposition of the thin magnetic film or during a subsequent operation such as annealing. The electromagnet assembly includes a plate-shaped core located adjacent to the substrate and two or more electromagnetic coils that are wrapped in different directions around the core. Electrical currents conveyed through the electromagnetic coils are controlled for orienting a substantially uniaxial magnetic field throughout a range of angular positions in a plane of the substrate surface.
摘要翻译：电磁体组件磁性地定向沉积在基底表面上的薄磁膜。磁性取向可以在低压处理环境中进行，例如在薄磁膜的沉积期间或在诸如退火的后续操作期间。电磁体组件包括位于基板附近的板状铁芯和围绕铁芯缠绕在不同方向上的两个或多个电磁线圈。控制通过电磁线圈输送的电流用于在衬底表面的平面中的角位置的整个范围内定向基本上单轴的磁场。

6. 发明授权

US06705394B1 Rapid cycle chuck for low-pressure processing 失效
标题翻译：快速循环卡盘用于低压处理
公开(公告)号：US06705394B1
公开(公告)日：2004-03-16
申请号：US09664011
申请日：2000-09-19
申请人： Mehrdad M. Moslehi , Xiangqun Chen , Shiyuan Cheng , Cecil J. Davis
发明人： Mehrdad M. Moslehi , Xiangqun Chen , Shiyuan Cheng , Cecil J. Davis
IPC分类号： C23C1602
CPC分类号： H01L21/67248 , C23C16/4586 , C23C16/46 , C23C16/463 , H01L21/67109
摘要： Rapid thermal cycling of substrates in low-pressure processing environments is achieved by movable temperature conditioners located outside the processing environments. The substrates are mounted on thermally conductive pedestals for processing in the low-pressure environment. The temperature conditioners are movable both into and out of thermal contact with the pedestals outside the low-pressure environment to regulate transfers of heat through the pedestals between the substrates and the temperature conditioners. A translatable cooler block with a high thermal mass and a large interface area with the pedestal can be used as a temperature conditioner for more rapidly withdrawing heat from the substrate.
摘要翻译：在低压处理环境中，基板的快速热循环是通过位于加工环境之外的可移动温度调节器实现的。基板安装在导热底座上，用于在低压环境中进行加工。温度调节器可以与低压环境之外的基座进行热接触，以便调节通过基板和温度调节器之间的基座的热传递。可以使用具有高热质量和与基座的大的接口面积的可翻转的冷却器块作为用于更快速地从基板排出热量的温度调节器。

7. 发明授权

US5217559A Apparatus and method for in-situ deep ultraviolet photon-assisted semiconductor wafer processing 失效
标题翻译：用于原位深紫外光子辅助半导体晶片加工的装置和方法
公开(公告)号：US5217559A
公开(公告)日：1993-06-08
申请号：US625186
申请日：1990-12-10
申请人： Mehrdad M. Moslehi , Ajit P. Paranjpe , Cecil J. Davis
发明人： Mehrdad M. Moslehi , Ajit P. Paranjpe , Cecil J. Davis
IPC分类号： H01L21/302 , H01L21/00 , H01L21/205 , H01L21/268 , H01L21/3065
CPC分类号： H01L21/67115 , H01L21/02381 , H01L21/02532 , H01L21/0262 , H01L21/2686
摘要： An in-situ deep-ultraviolet light generation module (126) for photon-assisted processing of semiconductor wafers (44) comprises a process environment space (152) for photochemical processing applications. Process gas injection space (182) receives reactive process gases and injects them into process environment space (152). Plasma fill space (124) receives a plasma (120) and may direct plasma (120) away from or into the process environment space (152) according to the presence or absence of control gas (160) flow. Control gas space (174) and flow/pressure switch space (154) receive control gas (160) to selectively permit deep-ultraviolet photons or plasma to reach process environment space (152) and interact with wafer (44) for photo-enhanced or plasma-enhanced wafer processing.
摘要翻译：用于半导体晶片（44）的光子辅助处理的原位深紫外光发生模块（126）包括用于光化学处理应用的工艺环境空间（152）。工艺气体注入空间（182）接收反应性工艺气体并将其注入工艺环境空间（152）。等离子体填充空间（124）接收等离子体（120）并且可以根据是否存在控制气体（160）流将等离子体（120）引导到过程环境空间（152）或进入过程环境空间（152）。控制气体空间（174）和流量/压力开关空间（154）接收控制气体（160）以选择性地允许深紫外光子或等离子体到达处理环境空间（152）并与晶片（44）相互作用以进行光增强或等离子体增强晶片处理。

8. 发明授权

US5082542A Distributed-array magnetron-plasma processing module and method 失效
标题翻译：分布式阵列磁控管等离子体处理模块及方法
公开(公告)号：US5082542A
公开(公告)日：1992-01-21
申请号：US561851
申请日：1990-08-02
申请人： Mehrdad M. Moslehi , Cecil J. Davis
发明人： Mehrdad M. Moslehi , Cecil J. Davis
IPC分类号： H01J37/32
CPC分类号： H01J37/32623 , H01J37/3266
摘要： A semiconductor wafer plasma processing magnetron module (12) for magnetron-plasma-enhanced processing of semiconductor wafers comprises a base (50) and distributed magnet array (52). The magnet array (52) comprises a plurality of associated magnet unit cells (54). Unit cells (54) associated for producing a periodic magnetic field at the semiconductor wafer (22). The magnetron (12), including the magnetic array (52), mounts to base (50). Unit cells (54) form a repetitive pattern across the surface of magnet array (52). Magnetron module (12) produces a magnetic field possessing periodic uniformity. Unit cells (54) associate to permit expansion of magnet array (52) for any wafer size. A preferred embodiment of the invention includes a hexagonal configuration of magnets (56) and (58) that form unit cells (54).
摘要翻译：用于半导体晶片的磁控管等离子体增强处理的半导体晶片等离子体处理磁控管模块（12）包括基座（50）和分布磁体阵列（52）。磁体阵列（52）包括多个相关联的磁体单元电池（54）。用于在半导体晶片（22）处产生周期性磁场的单元电池（54）。包括磁性阵列（52）的磁控管（12）安装到基座（50）上。单元电池（54）在磁体阵列（52）的表面上形成重复的图案。磁控管模块（12）产生具有周期性均匀性的磁场。单元电池（54）关联以允许用于任何晶片尺寸的磁体阵列（52）的扩展。本发明的优选实施例包括形成单位电池（54）的磁体（56）和（58）的六边形构造。

9. 发明授权

US06475359B1 Thin-film processing electromagnet with modified core for producing low-skew magnetic orientation 有权
标题翻译：具有改性芯的薄膜加工电磁铁，用于产生低偏磁磁取向
公开(公告)号：US06475359B1
公开(公告)日：2002-11-05
申请号：US09595932
申请日：2000-06-16
申请人： Mehrdad M. Moslehi , Shiyuan Cheng , Xiangqun Chen , Cecil J. Davis
发明人： Mehrdad M. Moslehi , Shiyuan Cheng , Xiangqun Chen , Cecil J. Davis
IPC分类号： C14C1435
CPC分类号： C23C14/3414 , C23C14/351 , C23C16/08 , C23C16/10 , C23C16/16 , C23C16/18 , H01F7/20
摘要： An electromagnet having one or more coils wrapped around a plate-shaped core produces a uniaxial magnetic field in the vicinity of a substrate surface for orienting a magnetic film deposited onto the substrate surface. Variations in the magnetic mass of the plate-shaped core or in the magnetic permeability of the core mass are made to reduce angular skew and to improve uniformity of the uniaxial magnetic field. The variations generally involve a reduction in magnetic mass or permeability near a center of the core with respect to a periphery of the core. Cavities of various sizes and shapes but having symmetry with a magnetic axis can be formed in the core for this purpose.
摘要翻译：具有缠绕在板状芯上的一个或多个线圈的电磁体在基板表面附近产生单轴磁场，用于使沉积在基板表面上的磁性膜定向。制成板状芯的磁性质量或芯体的磁导率的变化，以减小角偏移并提高单轴磁场的均匀性。这些变化通常涉及相对于芯的周边在芯的中心附近减小磁性质量或磁导率。为此，可以在芯中形成各种尺寸和形状但具有与磁轴对称的腔体。

10. 发明授权

US5435379A Method and apparatus for low-temperature semiconductor processing 失效
标题翻译：低温半导体加工方法和装置
公开(公告)号：US5435379A
公开(公告)日：1995-07-25
申请号：US930074
申请日：1992-08-14
申请人： Mehrdad M. Moslehi , Habib N. Najm , Ajit P. Paranjpe , Cecil J. Davis
发明人： Mehrdad M. Moslehi , Habib N. Najm , Ajit P. Paranjpe , Cecil J. Davis
IPC分类号： H01L21/302 , F04B23/02 , F04B49/24 , H01J37/34 , H01L21/00 , H01L21/3065 , H01L21/683 , F28D15/00
CPC分类号： H01L21/67103 , F04B23/028 , F04B49/24 , H01J37/34 , H01J2237/2001 , H01J2237/32
摘要： A chilling system (12) has a container (20) filled with a coolant (22). A pipe (16) traverses within the container (20) and the coolant (22) to a housing (18). Fluid flows within the pipe (16) and becomes chilled through the pipe (16) upon entering the container (20) and the coolant (22). The chilled fluid enters the housing (18) chilling the housing (18) through the pipe (16). In turn, semiconductor substrate (19) in contact with the housing (18) also is chilled.
摘要翻译：冷却系统（12）具有填充有冷却剂（22）的容器（20）。管道（16）在容器（20）和冷却剂（22）内移动到壳体（18）。流体在管道（16）内流动，并且在进入容器（20）和冷却剂（22）时通过管道（16）变冷。冷冻流体通过管道（16）进入冷却壳体（18）的壳体（18）。反过来，与壳体（18）接触的半导体衬底（19）也被冷却。

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