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1. 发明申请

US20060109457A1 Surface inspection system with improved capabilities 有权
标题翻译：表面检测系统具有改进的能力
公开(公告)号：US20060109457A1
公开(公告)日：2006-05-25
申请号：US11243349
申请日：2005-10-03
申请人： Lawrence Miller , Mehdi Vaez-Iravani
发明人： Lawrence Miller , Mehdi Vaez-Iravani
IPC分类号： G01N21/00
CPC分类号： G01N21/9501 , G01N21/8806 , G01N2021/8822
摘要： Pixel intensities indicative of scattered radiation from portions of the inspected surface surrounding a location of a potential anomaly are also stored so that such data is available for quick review of the pixel intensities within a patch on the surface containing the location of the potential anomaly. Where rotational motion is caused between the illumination beam and the inspected surface, signal-to-noise ratio may be improved by comparing the pixel intensities of pixels at corresponding positions on two different surfaces that are inspected, where corresponding pixels at the same relative locations on the two different surfaces are illuminated and scattered radiation therefrom collected and detected under the same optical conditions.
摘要翻译：还存储指示围绕潜在异常位置的被检查表面的部分的散射辐射的像素强度，使得这样的数据可用于快速查看包含潜在异常位置的表面上的贴片内的像素强度。在照明光束和被检查表面之间产生旋转运动的情况下，可以通过比较被检查的两个不同表面上的相应位置处的像素的像素强度来改善信噪比，其中相同相对位置处的相应像素两个不同的表面被照射，并且在相同的光学条件下收集和检测散射的辐射。

2. 发明申请

US20070153265A1 Simultaneous Multi-Spot Inspection and Imaging 有权
标题翻译：同时多点检测和成像
公开(公告)号：US20070153265A1
公开(公告)日：2007-07-05
申请号：US11553174
申请日：2006-10-26
申请人： Mehdi Vaez-Iravani , Lawrence Miller
发明人： Mehdi Vaez-Iravani , Lawrence Miller
IPC分类号： G01N21/88
CPC分类号： G01N21/95623 , G01N21/8806
摘要： A compact and versatile multi-spot inspection imaging system employs an objective for focusing an array of radiation beams to a surface and a second reflective or refractive objective having a large numerical aperture for collecting scattered radiation from the array of illuminated spots. The scattered radiation from each illuminated spot is focused to a corresponding optical fiber channel so that information about a scattering may be conveyed to a corresponding detector in a remote detector array for processing. For patterned surface inspection, a cross-shaped filter is rotated along with the surface to reduce the effects of diffraction by Manhattan geometry. A spatial filter in the shape of an annular aperture may also be employed to reduce scattering from patterns such as arrays on the surface. In another embodiment, different portions of the same objective may be used for focusing the illumination beams onto the surface and for collecting the scattered radiation from the illuminated spots simultaneously. In another embodiment, a one-dimensional array of illumination beams are directed at an oblique angle to the surface to illuminate a line of illuminated spots at an angle to the plane of incidence. Radiation scattered from the spots are collected along directions perpendicular to the line of spots or in a double dark field configuration.
摘要翻译：紧凑且通用的多点检查成像系统采用将辐射束阵列聚焦到表面的目标和具有大数值孔径的第二反射或折射物镜，用于收集来自照明点阵列的散射辐射。来自每个照明点的散射辐射被聚焦到相应的光纤通道，使得关于散射的信息可以被传送到用于处理的远程检测器阵列中的相应检测器。对于图案化表面检查，十字形过滤器与表面一起旋转，以减少曼哈顿几何形状的衍射效应。也可以采用环形孔形状的空间滤光器，以减少从诸如表面上的阵列的图案的散射。在另一个实施例中，相同物镜的不同部分可用于将照明光束聚焦到表面上并且用于从同时收集来自照明斑点的散射辐射。在另一个实施例中，照明光束的一维阵列以与入射平面成一定角度的一定角度照射到该表面上的倾斜角度。从斑点散射的辐射沿垂直于斑点线的方向或双暗场构型收集。

3. 发明授权

US08765496B2 Methods and systems for measuring a characteristic of a substrate or preparing a substrate for analysis 失效
标题翻译：用于测量衬底特性或制备用于分析的衬底的方法和系统
公开(公告)号：US08765496B2
公开(公告)日：2014-07-01
申请号：US12110759
申请日：2008-04-28
申请人： Mehran Nasser-Ghodsi , Mark Borowicz , Dave Bakker , Mehdi Vaez-Iravani , Prashant Aji , Rudy Garcia , Tzu Chin Chuang
发明人： Mehran Nasser-Ghodsi , Mark Borowicz , Dave Bakker , Mehdi Vaez-Iravani , Prashant Aji , Rudy Garcia , Tzu Chin Chuang
IPC分类号： H01L21/00
CPC分类号： H01J37/317 , G01N1/32 , H01J37/244 , H01J37/3005 , H01J2237/2814 , H01J2237/3174 , H01J2237/31745
摘要： Methods and systems for measuring a characteristic of a substrate or preparing a substrate for analysis are provided. One method for measuring a characteristic of a substrate includes removing a portion of a feature on the substrate using an electron beam to expose a cross-sectional profile of a remaining portion of the feature. The feature may be a photoresist feature. The method also includes measuring a characteristic of the cross-sectional profile. A method for preparing a substrate for analysis includes removing a portion of a material on the substrate proximate to a defect using chemical etching in combination with an electron beam. The defect may be a subsurface defect or a partially subsurface defect. Another method for preparing a substrate for analysis includes removing a portion of a material on a substrate proximate to a defect using chemical etching in combination with an electron beam and a light beam.
摘要翻译：提供了用于测量基板的特性或准备用于分析的基板的方法和系统。用于测量衬底的特性的一种方法包括使用电子束去除衬底上的特征的一部分以暴露特征的剩余部分的横截面轮廓。该特征可以是光致抗蚀剂特征。该方法还包括测量横截面轮廓的特性。制备用于分析的基板的方法包括使用化学蚀刻与电子束结合来去除靠近缺陷的衬底上的材料的一部分。缺陷可能是地下缺陷或部分地下缺陷。制备用于分析的衬底的另一种方法包括使用化学蚀刻与电子束和光束组合地去除邻近缺陷的衬底上的材料的一部分。

4. 发明授权

US07869023B2 System for detecting anomalies and/or features of a surface 有权
标题翻译：用于检测表面的异常和/或特征的系统
公开(公告)号：US07869023B2
公开(公告)日：2011-01-11
申请号：US12123393
申请日：2008-05-19
申请人： Guoheng Zhao , Stanley Stokowski , Mehdi Vaez-Iravani
发明人： Guoheng Zhao , Stanley Stokowski , Mehdi Vaez-Iravani
IPC分类号： G01N21/00
CPC分类号： G01N21/9501
摘要： A cylindrical mirror or lens is used to focus an input collimated beam of light onto a line on the surface to be inspected, where the line is substantially in the plane of incidence of the focused beam. An image of the beam is projected onto an array of charge-coupled devices parallel to the line for detecting anomalies and/or features of the surface, where the array is outside the plane of incidence of the focused beam.
摘要翻译：使用圆柱形镜或透镜将输入的准直光束聚焦到要检查的表面上的线上，其中线基本上在聚焦束的入射平面中。光束的图像被投影到平行于线的电荷耦合器件的阵列上，用于检测表面的异常和/或特征，其中阵列位于聚焦光束的入射平面之外。

5. 发明授权

US07607647B2 Stabilizing a substrate using a vacuum preload air bearing chuck 有权
标题翻译：使用真空预压空气轴承卡盘稳定基板
公开(公告)号：US07607647B2
公开(公告)日：2009-10-27
申请号：US11688720
申请日：2007-03-20
申请人： Guoheng Zhao , Alexander Belyaev , Christian H. Wolters , Paul Andrew Doyle , Howard W. Dando , Mehdi Vaez-Iravani
发明人： Guoheng Zhao , Alexander Belyaev , Christian H. Wolters , Paul Andrew Doyle , Howard W. Dando , Mehdi Vaez-Iravani
IPC分类号： B25B11/00
CPC分类号： B25B11/005 , F16C29/025 , F16C32/0603 , H01L21/67784 , H01L21/6838
摘要： Substrate processing method and apparatus are disclosed. The substrate processing apparatus includes a non-contact air bearing chuck with a vacuum preload.
摘要翻译：公开了基板处理方法和装置。基板处理装置包括具有真空预载的非接触式空气轴承卡盘。

6. 发明申请

US20080229811A1 STABILIZING A SUBSTRATE USING A VACUUM PRELOAD AIR BEARING CHUCK 有权
标题翻译：使用真空预紧空气轴承座稳定基板
公开(公告)号：US20080229811A1
公开(公告)日：2008-09-25
申请号：US11688720
申请日：2007-03-20
申请人： Guoheng Zhao , Alexander Belyaev , Christian H. Wolters , Paul Andrew Doyle , Howard W. Dando , Mehdi Vaez-Iravani
发明人： Guoheng Zhao , Alexander Belyaev , Christian H. Wolters , Paul Andrew Doyle , Howard W. Dando , Mehdi Vaez-Iravani
IPC分类号： G01N21/00
CPC分类号： B25B11/005 , F16C29/025 , F16C32/0603 , H01L21/67784 , H01L21/6838
摘要： Substrate processing method and apparatus are disclosed. The substrate processing apparatus includes a non-contact air bearing chuck with a vacuum preload.
摘要翻译：公开了基板处理方法和装置。基板处理装置包括具有真空预载的非接触式空气轴承卡盘。

7. 发明授权

US07345754B1 Fourier filters and wafer inspection systems 有权
标题翻译：傅立叶滤波器和晶圆检查系统
公开(公告)号：US07345754B1
公开(公告)日：2008-03-18
申请号：US11228584
申请日：2005-09-16
申请人： Guoheng Zhao , Mehdi Vaez-Iravani , Andrew V. Hill , Avijit K. Ray-Chaudhuri
发明人： Guoheng Zhao , Mehdi Vaez-Iravani , Andrew V. Hill , Avijit K. Ray-Chaudhuri
IPC分类号： G01N21/00 , G02B27/46
CPC分类号： G01N21/9501 , G01N21/4738 , G01N21/956 , G03F7/7065
摘要： Fourier filters and wafer inspection systems are provided. One embodiment relates to a one-dimensional Fourier filter configured to be included in a bright field inspection system such that the bright field inspection system can be used for broadband dark field inspection of a wafer. The Fourier filter includes an asymmetric illumination aperture configured to be positioned in an illumination path of the inspection system. The Fourier filter also includes an asymmetric imaging aperture complementary to the illumination aperture. The imaging aperture is configured to be positioned in a light collection path of the inspection system such that the imaging aperture blocks light reflected and diffracted from structures on the wafer and allows light scattered from defects on the wafer to pass through the imaging aperture.
摘要翻译：提供傅立叶滤波器和晶片检测系统。一个实施例涉及被配置为包括在明场检查系统中的一维傅立叶滤波器，使得明场检查系统可以用于晶片的宽带暗视场检查。傅里叶滤波器包括被配置为定位在检查系统的照明路径中的非对称照明孔。傅立叶滤波器还包括与照明孔径互补的非对称成像孔。成像孔被配置为定位在检查系统的光采集路径中，使得成像孔口阻挡从晶片上的结构反射和衍射的光，并允许从晶片上的缺陷散射的光通过成像孔。

8. 发明授权

US07130039B2 Simultaneous multi-spot inspection and imaging 有权
公开(公告)号：US07130039B2
公开(公告)日：2006-10-31
申请号：US10418352
申请日：2003-04-17
申请人： Mehdi Vaez-Iravani , Lawrence Robert Miller
发明人： Mehdi Vaez-Iravani , Lawrence Robert Miller
IPC分类号： G01N21/68
CPC分类号： G01N21/95623 , G01N21/8806
摘要： A compact and versatile multi-spot inspection imaging system employs an objective for focusing an array of radiation beams to a surface and a second reflective or refractive objective having a large numerical aperture for collecting scattered radiation from the array of illuminated spots. The scattered radiation from each illuminated spot is focused to a corresponding optical fiber channel so that information about a scattering may be conveyed to a corresponding detector in a remote detector array for processing. For patterned surface inspection, a cross-shaped filter is rotated along with the surface to reduce the effects of diffraction by Manhattan geometry. A spatial filter in the shape of an annular aperture may also be employed to reduce scattering from patterns such as arrays on the surface. In another embodiment, different portions of the same objective may be used for focusing the illumination beams onto the surface and for collecting the scattered radiation from the illuminated spots simultaneously. In another embodiment, a one-dimensional array of illumination beams are directed at an oblique angle to the surface to illuminate a line of illuminated spots at an angle to the plane of incidence. Radiation scattered from the spots are collected along directions perpendicular to the line of spots or in a double dark field configuration.

9. 发明授权

US07119897B2 Sample inspection system 有权
公开(公告)号：US07119897B2
公开(公告)日：2006-10-10
申请号：US11007729
申请日：2004-12-07
申请人： Mehdi Vaez-Iravani , Stanley Stokowski , Guoheng Zhao
发明人： Mehdi Vaez-Iravani , Stanley Stokowski , Guoheng Zhao
IPC分类号： G01N21/00
CPC分类号： G01N21/956 , G01N21/47 , G01N21/9501
摘要： A curved mirrored surface is used to collect radiation scattered by a sample surface and originating from a normal illumination beam and an oblique illumination beam. The collected radiation is focused to a detector. Scattered radiation originating from the normal and oblique illumination beams may be distinguished by employing radiation at two different wavelengths, by intentionally introducing an offset between the spots illuminated by the two beams or by switching the normal and oblique illumination beams on and off alternately. Beam position error caused by change in sample height may be corrected by detecting specular reflection of an oblique illumination beam and changing the direction of illumination in response thereto. Butterfly-shaped spatial filters may be used in conjunction with curved mirror radiation collectors to restrict detection to certain azimuthal angles.

10. 发明授权

US07116413B2 Inspection system for integrated applications 有权
标题翻译：综合应用检测系统
公开(公告)号：US07116413B2
公开(公告)日：2006-10-03
申请号：US10659556
申请日：2003-09-09
申请人： Mehdi Vaez-Iravani
发明人： Mehdi Vaez-Iravani
IPC分类号： G01N21/00
CPC分类号： G01N21/9501 , G01N21/474 , G01N21/956
摘要： A compact surface inspection optical head is disclosed which comprises a frame with two rings of apertures therein. The first set of apertures surrounding and close to a normal direction to the surface to be inspected is connected to fibers used to collect scattered radiation useful for the detection of micro-scratches caused by chemical and mechanical polishing. Where the position of these apertures is selected to be away from patterned scattering or diffraction, these apertures and their associated fibers may be useful for anomaly detection on patterned surfaces. A second ring of apertures at low elevation angles to the surface inspected is connected to fibers to collect radiation scattered by the surface inspected for anomaly detection on patterned surfaces. This ring of apertures segments azimuthally the collection space so that the signal outputs from detectors that are saturated by the pattern diffraction or scattering may be discarded and only the outputs of unsaturated detectors are used for anomaly detection. A pair of larger apertures in the double dark field positions may be employed for anomaly detection on unpatterned surfaces. Scattered radiation passing through the two larger apertures may be collected by objectives or fiber bundles.
摘要翻译：公开了一种紧凑的表面检查光学头，其包括其中具有两个孔环的框架。围绕和接近待检查表面的正常方向的第一组孔径连接到用于收集用于检测由化学和机械抛光引起的微划痕的散射辐射的纤维。在这些孔的位置被选择为远离图案化散射或衍射的情况下，这些孔及其相关联的纤维可用于图案化表面上的异常检测。与被检查的表面的低仰角的第二个孔环连接到纤维上以收集由被检查的表面散射的辐射以在图案化表面上的异常检测。这个孔环以方位方式分段收集空间，从而可以丢弃由图案衍射或散射饱和的检测器的信号输出，并且仅使用不饱和检测器的输出进行异常检测。双暗场位置中的一对较大的孔可用于未图案化表面上的异常检测。通过两个较大孔径的散射辐射可以被物镜或纤维束收集。

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