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1. 发明授权

US07704353B2 Electrode assembly for the electrochemical treatment of liquids with a low conductivity 失效
标题翻译：电极组件，用于电导率低的液体电化学处理
公开(公告)号：US07704353B2
公开(公告)日：2010-04-27
申请号：US10599267
申请日：2005-03-24
申请人： Manuela Stadelmann , Manfred Blaschke , Maja Wuensche , Helmut Petzer , Alexander Kraft , Thorsten Matthee , Matthias Fryda
发明人： Manuela Stadelmann , Manfred Blaschke , Maja Wuensche , Helmut Petzer , Alexander Kraft , Thorsten Matthee , Matthias Fryda
IPC分类号： C25B9/08
CPC分类号： C02F1/46109 , C02F1/4672 , C02F2001/46138 , C02F2103/04 , C02F2201/46195 , C25B9/18 , C25B9/203
摘要： The invention relates to an electrode assembly for the electrochemical treatment of liquids with a low conductivity. Said assembly comprises electrodes (1, 2), between which a polymer solid electrolyte (3) is situated. The electrodes are pressed against one another by means of a compression device (9, 10; 91) and are configured in such a way that the assembly can be traversed by the liquid. To produce said assembly simply and to ensure that it is flexible and easy to use, the compression device (9, 10; 91) is supported on the electrodes (1, 2).
摘要翻译：本发明涉及一种用于电化学处理低导电性液体的电极组件。所述组件包括电极（1,2），其间位于聚合物固体电解质（3）之间。电极通过压缩装置（9,10; 91）彼此压靠，并且被构造成使得组件能够被液体横穿。为了简单地制造所述组件并且确保其柔性且易于使用，压缩装置（9,10; 91）被支撑在电极（1,2）上。

2. 发明授权

US08597731B2 Method for applying a diamond layer onto a graphite substrate 有权
标题翻译：在金刚石基底上涂布金刚石层的方法
公开(公告)号：US08597731B2
公开(公告)日：2013-12-03
申请号：US12338107
申请日：2008-12-18
申请人： Matthias Fryda , Thorsten Matthee , Shane Mulcahy
发明人： Matthias Fryda , Thorsten Matthee , Shane Mulcahy
IPC分类号： C23C16/44
CPC分类号： C23C16/0218 , C04B41/009 , C04B41/52 , C04B41/89 , C23C16/0236 , C23C16/27 , C30B25/02 , C30B25/18 , C30B29/04 , C04B41/5346 , C04B41/4539 , C04B41/5002 , C04B41/4531 , C04B35/522
摘要： A diamond layer can be applied stably onto a graphite substrate in a CVD process when the graphite substrate is subjected to the following pretreatment steps before the CVD process: fine cleaning of the surface in a vacuum at a temperature >500° C., preferably >800° C., in an etching gas atmosphere, mechanical removal of loose particles, seeding of the substrate surface with very small diamond particles and at least one degassing treatment in a vacuum to remove adsorbed hydrocarbons and adsorbed air at a temperature T>500° C., preferably T>700° C.
摘要翻译：在CVD工艺之前对石墨基板进行以下预处理步骤时，可以在CVD工艺中将金刚石层稳定地应用于石墨基板上：在温度> 500℃的真空中对表面进行精细清洗，优选> 800℃，在蚀刻气体气氛中，机械去除松散颗粒，用非常小的金刚石颗粒接种基材表面，并在真空中进行至少一次脱气处理以在温度T> 500°C下除去吸附的烃和吸附的空气 C.，优选T> 700℃

3. 发明授权

US08366945B2 Diamond electrode and process for producing it 有权
标题翻译：金刚石电极及其生产工艺
公开(公告)号：US08366945B2
公开(公告)日：2013-02-05
申请号：US12337770
申请日：2008-12-18
申请人： Matthias Fryda , Thorsten Matthee
发明人： Matthias Fryda , Thorsten Matthee
IPC分类号： H01B13/00 , B44C1/22
CPC分类号： C25B11/0447 , C02F2001/46138 , Y10T428/24355
摘要： Diamond electrodes with improved adhesion of the diamond layer to the electrode are produced by sandblasting a surface of the electrode body, and then non-oxidatively etching the roughened (sandblasted) surface so as to remove at least 5 μm of material from under the roughened surface. By removing at least 5 μm of material, the sand particulates in the surface of the electrode body are eliminated, and damage in the form of cracks in the electrode body which result from sandblasting is reduced or eliminated, and further, a surface metal oxide coating is not created. All of these contribute to preparing a surface where spalling of the diamond layer is less likely to occur. Concentrated phosphoric acid is an exemplary non-oxidative etchant used in the process.
摘要翻译：金刚石层与电极的附着力提高的金刚石电极是通过对电极体的表面进行喷砂，然后非氧化蚀刻粗糙（喷砂）表面，从而从粗糙表面下面除去至少5微米的材料。通过除去至少5微米的材料，消除了电极体表面的砂粒，减少或消除了由喷砂造成的电极体中的裂纹形式的损伤，此外，表面金属氧化物涂层没有创建所有这些都有助于制备难以发生金刚石层剥落的表面。浓磷酸是本方法中使用的示例性非氧化蚀刻剂。

4. 发明申请

US20090162549A1 Method for Applying a Diamond Layer Onto a Graphite Substrate 有权
标题翻译：将金刚石层应用于石墨基材的方法
公开(公告)号：US20090162549A1
公开(公告)日：2009-06-25
申请号：US12338107
申请日：2008-12-18
申请人： Matthias Fryda , Thorsten Matthee , Shane Mulcahy
发明人： Matthias Fryda , Thorsten Matthee , Shane Mulcahy
IPC分类号： C23C16/44
CPC分类号： C23C16/0218 , C04B41/009 , C04B41/52 , C04B41/89 , C23C16/0236 , C23C16/27 , C30B25/02 , C30B25/18 , C30B29/04 , C04B41/5346 , C04B41/4539 , C04B41/5002 , C04B41/4531 , C04B35/522
摘要： A diamond layer can be applied stably onto a graphite substrate in a CVD process when the graphite substrate is subjected to the following pretreatment steps before the CVD process: fine cleaning of the surface in a vacuum at a temperature >500° C., preferably >800° C., in an etching gas atmosphere, mechanical removal of loose particles, seeding of the substrate surface with very small diamond particles and at least one degassing treatment in a vacuum to remove adsorbed hydrocarbons and adsorbed air at a temperature T>500° C., preferably T>700° C.
摘要翻译：在CVD工艺之前对石墨基板进行以下预处理步骤时，可以在CVD工艺中将金刚石层稳定地应用于石墨基板上：在温度> 500℃的真空中对表面进行精细清洗，优选> 800℃，在蚀刻气体气氛中，机械去除松散颗粒，用非常小的金刚石颗粒接种基材表面，并在真空中进行至少一次脱气处理以在温度T> 500°C下除去吸附的烃和吸附的空气 C.，优选T> 700℃

5. 发明申请

US20090169815A1 Diamond electrode and process for producing it 有权
标题翻译：金刚石电极及其生产工艺
公开(公告)号：US20090169815A1
公开(公告)日：2009-07-02
申请号：US12337770
申请日：2008-12-18
申请人： Matthias Fryda , Thorsten Matthee
发明人： Matthias Fryda , Thorsten Matthee
IPC分类号： H01B13/00 , B32B5/00
CPC分类号： C25B11/0447 , C02F2001/46138 , Y10T428/24355
摘要： A process for producing a diamond electrode, comprising the following process steps roughening the surface of the electrode body by sand blasting, etching the roughened surface, and building up the diamond layer on the electrode body, results in improved adhesion of the diamond layer to the electrode body by virtue of non-oxidative etching of the electrode body being performed in such a way that more than 5 μm of the material of the electrode body under the roughened surface is removed.
摘要翻译：一种用于制造金刚石电极的方法，包括以下工艺步骤：通过喷砂，使粗糙化表面腐蚀电极体的表面，以及在电极体上建立金刚石层，从而改善金刚石层与通过非电氧化蚀刻电极体的方式，使电极体的粗糙表面下方的5μm以上的材料被去除。

6. 发明申请

US20080156642A1 System for the Disinfection of Low-Conductivity Liquids 审中-公开
标题翻译：低电导率液体消毒系统
公开(公告)号：US20080156642A1
公开(公告)日：2008-07-03
申请号：US11817655
申请日：2006-03-01
申请人： Matthias Fryda , Thorsten Matthee
发明人： Matthias Fryda , Thorsten Matthee
IPC分类号： C02F1/467
CPC分类号： A61L2/03 , C02F1/281 , C02F1/32 , C02F1/4672 , C02F2201/4613 , C02F2201/46195
摘要： A system for the disinfecting of low-conductivity liquids, in particular water, is provided. The system includes an electrochemical cell in which electrodes are arranged such that the liquid flushes or flows around them, and in which oxidizing agents are produced from the liquid by applying a current. A mixing unit is mounted downstream of the electrochemical cell in the flow direction, in which mixing unit the oxidizing agents are intermixed with the liquid.
摘要翻译：提供了用于消除低电导率液体，特别是水的系统。该系统包括电化学电池，其中电极布置成使得液体在其周围闪烁或流动，并且其中通过施加电流从液体产生氧化剂。混合单元沿流动方向安装在电化学电池的下游，其中混合单元将氧化剂与液体混合。

7. 发明申请

US20070095655A1 Electrode assembly for the electrochemical treatment of liquids with a low conductivity 失效
标题翻译：电极组件，用于电导率低的液体电化学处理
公开(公告)号：US20070095655A1
公开(公告)日：2007-05-03
申请号：US10599267
申请日：2005-03-24
申请人： Manuela Stadelmann , Manfred Blaschke , Maja Wuensche , Helmut Petzer , Alexander Kraft , Thorsten Matthee , Matthias Fryda
发明人： Manuela Stadelmann , Manfred Blaschke , Maja Wuensche , Helmut Petzer , Alexander Kraft , Thorsten Matthee , Matthias Fryda
IPC分类号： C25B9/00
CPC分类号： C02F1/46109 , C02F1/4672 , C02F2001/46138 , C02F2103/04 , C02F2201/46195 , C25B9/18 , C25B9/203
摘要： The invention relates to an electrode assembly for the electrochemical treatment of liquids with a low conductivity. Said assembly comprises electrodes (1, 2), between which a polymer solid electrolyte (3) is situated. The electrodes are pressed against one another by means of a compression device (9, 10; 91) and are configured in such a way that the assembly can be traversed by the liquid To produce said assembly simply and to ensure that it is flexible and easy to use, the compression device (9, 10; 91) is supported on the electrodes (1, 2).
摘要翻译：本发明涉及一种用于电化学处理低导电性液体的电极组件。所述组件包括电极（1,2），其间位于聚合物固体电解质（3）之间。电极通过压缩装置（9,10; 91）彼此压靠，并且被构造成使得组件能够被液体穿过。为了简单地产生所述组件并确保其柔性和容易为了使用，压缩装置（9,10; 91）被支撑在电极（1,2）上。

8. 发明申请

US20050139487A1 Method for the oxidative treatment of components comprised of or containing elementary silicon and/or substantially inorganic silicon compounds 审中-公开
标题翻译：用于氧化处理包含或含有基本硅和/或基本无机硅化合物的组分的方法
公开(公告)号：US20050139487A1
公开(公告)日：2005-06-30
申请号：US10512765
申请日：2003-05-02
申请人： Gerfried Zwicker , Matthias Fryda , Thorsten Matthee
发明人： Gerfried Zwicker , Matthias Fryda , Thorsten Matthee
IPC分类号： A61L2/18 , C02F1/461 , C25B1/28 , C25B1/30
CPC分类号： C25B1/30 , C25B1/285
摘要： In a method for the treatment of an object made of silicon or an inorganic, optionally organically modified, silicon compound, an oxidizing agent is prepared by electrolysis of an aqueous solution in an electrolysis device. The anode of the electrolysis device is a silicon electrode. The anode has an overvoltage for oxygen so that upon electrolysis of water the formation of hydrogen peroxide is preferred over that of oxygen. The aqueous solution used in electrolysis contains at least one reactive component or a constituent that is converted by electrolysis of the solution into a reactive component. The object to be treated is contacted with the freshly prepared oxidizing agent. The oxidizing agent is circulated and returned into the electrolysis device to be regenerated.
摘要翻译：在用于处理由硅或无机，任选有机改性的硅化合物制成的物体的方法中，通过在电解装置中电解水溶液来制备氧化剂。电解装置的阳极是硅电极。阳极具有氧的过电压，因此在电解水时，过氧化氢的形成优于氧气。用于电解的水溶液含有至少一种反应性组分或通过溶液电解转化成反应性组分的组分。将待处理的物体与新制备的氧化剂接触。氧化剂循环并返回到电解装置中以再生。

9. 发明授权

US6042886A Method for the manufacturing of a coating on a grinding tool 失效
标题翻译：在研磨工具上制造涂层的方法
公开(公告)号：US6042886A
公开(公告)日：2000-03-28
申请号：US61920
申请日：1998-04-17
申请人： Thorsten Matthee , Lothar Schafer
发明人： Thorsten Matthee , Lothar Schafer
IPC分类号： B24D3/06 , B24D18/00 , C23C16/02 , C23C16/27 , C23C16/26
CPC分类号： C23C16/0254 , B24D18/0018 , B24D3/06 , C23C16/271 , Y10T407/27
摘要： In a method for the manufacture of a coating on a grinding tool, a rough diamond layer (8, 10) is produced as an abrasive layer on the surface (2) of the body (1) of the grinding tool by vapor-phase deposition. This diamond layer is deposited on the grinding tool by the Hot Filament Chemical Vapor Deposition (HF-CVD) process.
摘要翻译：在用于在研磨工具上制造涂层的方法中，通过气相沉积在研磨工具的主体（1）的表面（2）上产生粗金刚石层（8,10）作为研磨层，。该金刚石层通过热丝化学气相沉积（HF-CVD）工艺沉积在研磨工具上。

10. 发明授权

US06794014B2 Gemstone 失效
标题翻译：宝石
公开(公告)号：US06794014B2
公开(公告)日：2004-09-21
申请号：US09319142
申请日：1999-07-29
申请人： Ernst Michael Winter , Lothar Schäfer , Thorsten Matthee
发明人： Ernst Michael Winter , Lothar Schäfer , Thorsten Matthee
IPC分类号： B32B900
CPC分类号： A44C27/007 , Y10T428/24479 , Y10T428/24612
摘要： A gemstone is provided and has a large surface-area, plate-shaped support having a surface with least one pyramid-shaped depression. A thin vapor phase deposit layer comprises a thin, surface-shaped precious synthetic gemstone layer disposed on the large surface-area, plate-shaped support and has an upper surface facing away from the plate-shaped support and an underside having at least one pyramid-shaped projection disposed in and coinciding with the pyramid-shaped depression of the support. Side faces of the pyramid-shaped projections of the underside of the vapor phase deposit layer upon the plate-shaped support impart decorative, diamond-light-reflective qualities to the synthetic gemstone layer.
摘要翻译：提供了宝石，并且具有大的表面积的板状支撑件，其具有至少一个金字塔形凹陷的表面。薄的气相沉积层包括设置在大表面积的板状支撑件上的薄的表面形状的珍贵的合成宝石层，并且具有背离板状支撑件的上表面和具有至少一个金字塔该突起设置在支撑体的金字塔状的凹部中并与其一致。在板状支撑体上的气相沉积层下侧的金字塔形突起的侧面赋予合成宝石层装饰性的金刚石光反射性质。

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