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    • 1. 发明专利
    • Home gateway unit and ip communication method
    • 首页网关单元和IP通信方法
    • JP2006148241A
    • 2006-06-08
    • JP2004332142
    • 2004-11-16
    • Matsushita Electric Ind Co Ltd松下電器産業株式会社
    • MORITA NAOKI
    • H04L12/46
    • PROBLEM TO BE SOLVED: To simplify the operation for registering an IP address and a name in a DNS server, when a household information terminal is connected to a home gateway unit that copes with IPv6 service.
      SOLUTION: In a home network system 100, a home information terminal 101 is connected with an LAN 104 in the home network system 100; and when a router request message is delivered from the home information terminal 101 to a home gateway unit 103, processing for creating the global scope address of the home information terminal 101 and processing for collecting the name information of the home information terminal 101 are performed at a name collecting section 202, and processing for registering the name information and the global scope address in a name database 204 under management of a DNS server 205 is performed at a name registering section 203.
      COPYRIGHT: (C)2006,JPO&NCIPI
    • 要解决的问题:为了简化在DNS服务器中注册IP地址和名称的操作,当家用信息终端连接到处理IPv6服务的家庭网关单元时。 解决方案:在家庭网络系统100中,家庭信息终端101与家庭网络系统100中的LAN 104连接; 并且当路由器请求消息从家庭信息终端101传送到家庭网关单元103时,用于创建家庭信息终端101的全局范围地址的处理和用于收集家庭信息终端101的名称信息的处理在 名称收集部分202,以及在DNS服务器205的管理下在名称数据库204中注册名称信息和全局范围地址的处理在名称注册部分203执行。版权所有(C)2006,JPO&NCIPI
    • 5. 发明专利
    • OPERATION METHOD OF LITHOGRAPHY DEVICE
    • JPH0444387A
    • 1992-02-14
    • JP15353890
    • 1990-06-11
    • MATSUSHITA ELECTRIC IND CO LTD
    • HANADA KEIJIFUJIWARA HIROAKIMORITA NAOKI
    • B41F17/36H05K3/10
    • PURPOSE:To avoid the projection of a pattern by offsetting an outer line of a pattern to be drawn, responding to the size of a drawing nozzle, determining its transfer locus, transferring said drawing nozzle along this transfer locus, and forming the outer line. CONSTITUTION:When an attempt is made to transfer an circular-shaped aperture along an open line, both ends of th aperture locus is extended linearly by half of the aperture while a circular arc-shaped section is extended in a tangential direction. Then, a pattern offset by half the aperture size is prepared for each side of the aperture locus on both sides. The circular arc-shaped section is prepared so that it may be concentrical. Then, the intersection point of offset patterns is determined and the line up to the intersection point is defined as an outer line. However, when there are two intersection points at the circular arc-shaped section, the section near the locus point of the intended aperture is adopted. In the case of circular arc, the line is extended in a tangential direction so that the intersection point may be determined. It is also possible to generate the outer line in automatic mode by tying up the outer lines on both sides thus offset on both ends.