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1. 发明申请

US20110240610A1 METHODS OF AND APPARATUSES FOR MAINTENANCE, DIAGNOSIS, AND OPTIMIZATION OF PROCESSES 有权
标题翻译：维护，诊断和过程优化的方法和装置
公开(公告)号：US20110240610A1
公开(公告)日：2011-10-06
申请号：US13159266
申请日：2011-06-13
申请人： Randall S. Mundt , Paul D. MacDonald , Andrew Beers , Mason L. Freed , Costas J. Spanos
发明人： Randall S. Mundt , Paul D. MacDonald , Andrew Beers , Mason L. Freed , Costas J. Spanos
IPC分类号： B23K10/00
CPC分类号： G01N27/60 , G01K7/25 , G01N33/0004 , G01R15/24 , G01R29/12 , H01L21/67248 , H01L21/67253 , H01L2924/0002 , H01L2924/00
摘要： A sensor apparatus for measuring a plasma process parameter for processing a workpiece. The sensor apparatus includes a base, an information processor supported on or in the base, and at least one sensor supported on or in the base. The at least one sensor includes at least one sensing element configured for measuring an electrical property of a plasma and may include a transducer coupled to the at least one sensing element. The transducer can be configured to receive a signal from the sensing element and convert the signal into a second signal for input to the information processor.
摘要翻译：一种用于测量用于处理工件的等离子体工艺参数的传感器装置。传感器装置包括基座，支撑在基座上或底座中的信息处理器以及支撑在基座上或基座中的至少一个传感器。所述至少一个传感器包括被配置用于测量等离子体的电性能的至少一个感测元件，并且可以包括耦合到所述至少一个感测元件的换能器。换能器可被配置为从感测元件接收信号并将信号转换成第二信号以输入到信息处理器。

2. 发明授权

US08698037B2 Methods of and apparatuses for maintenance, diagnosis, and optimization of processes 有权
标题翻译：过程的维护，诊断和优化的方法和设备
公开(公告)号：US08698037B2
公开(公告)日：2014-04-15
申请号：US13159266
申请日：2011-06-13
申请人： Randall S. Mundt , Paul Douglas MacDonald , Andrew Beers , Mason L. Freed , Costas J. Spanos
发明人： Randall S. Mundt , Paul Douglas MacDonald , Andrew Beers , Mason L. Freed , Costas J. Spanos
IPC分类号： B23K10/00
CPC分类号： G01N27/60 , G01K7/25 , G01N33/0004 , G01R15/24 , G01R29/12 , H01L21/67248 , H01L21/67253 , H01L2924/0002 , H01L2924/00
摘要： A sensor apparatus for measuring a plasma process parameter for processing a workpiece. The sensor apparatus includes a base, an information processor supported on or in the base, and at least one sensor supported on or in the base. The at least one sensor includes at least one sensing element configured for measuring an electrical property of a plasma and may include a transducer coupled to the at least one sensing element. The transducer can be configured to receive a signal from the sensing element and convert the signal into a second signal for input to the information processor.
摘要翻译：一种用于测量用于处理工件的等离子体工艺参数的传感器装置。传感器装置包括基座，支撑在基座上或底座中的信息处理器以及支撑在基座上或基座中的至少一个传感器。所述至少一个传感器包括被配置用于测量等离子体的电性能的至少一个感测元件，并且可以包括耦合到所述至少一个感测元件的换能器。换能器可被配置为从感测元件接收信号并将信号转换成第二信号以输入到信息处理器。

3. 发明授权

US06691068B1 Methods and apparatus for obtaining data for process operation, optimization, monitoring, and control 有权
标题翻译：用于获取过程操作，优化，监控和控制数据的方法和设备
公开(公告)号：US06691068B1
公开(公告)日：2004-02-10
申请号：US09643614
申请日：2000-08-22
申请人： Mason L. Freed , Randall S. Mundt , Costas J. Spanos
发明人： Mason L. Freed , Randall S. Mundt , Costas J. Spanos
IPC分类号： H01L2170
CPC分类号： G05B19/41865 , G05B2219/32019 , G05B2219/45031 , Y02P90/02 , Y02P90/20
摘要： Data are collected for deriving response models and information required for developing and maintaining processes and process tools. Methods and apparatus for collecting the data include a sensor apparatus capable of collecting data with less perturbation and fewer disruptions than is usually possible using standard methods. The sensor apparatus is capable of being loaded into a process tool. From within the process tool, the sensor apparatus is capable of measuring data, processing data, storing data, and transmitting data. The sensor apparatus has capabilities for near real time data collection and communication.
摘要翻译：收集数据以得出响应模型和开发和维护过程和过程工具所需的信息。用于收集数据的方法和装置包括能够采用标准方法通常可能采集较少干扰和较少中断的数据的传感器装置。传感器装置能够被加载到处理工具中。传感器装置可以在处理工具内测量数据，处理数据，存储数据和发送数据。传感器装置具有接近实时数据收集和通信的能力。

4. 发明授权

US07531984B2 Sensor apparatus power transfer, communication and maintenance methods and apparatus 有权
标题翻译：传感器装置的电力传输，通信和维护方法和装置
公开(公告)号：US07531984B2
公开(公告)日：2009-05-12
申请号：US11366303
申请日：2006-03-01
申请人： Mason L. Freed , Randall S. Mundt , Costas J. Spanos
发明人： Mason L. Freed , Randall S. Mundt , Costas J. Spanos
IPC分类号： H01M10/46
CPC分类号： H02J7/025 , H02J50/12
摘要： Presented are methods, systems, and apparatuses for managing and maintaining an electronic device such as a sensor apparatus.
摘要翻译：提出了用于管理和维护诸如传感器装置的电子设备的方法，系统和装置。

5. 发明授权

US07960670B2 Methods of and apparatuses for measuring electrical parameters of a plasma process 有权
标题翻译：测量等离子体工艺电参数的方法和装置
公开(公告)号：US07960670B2
公开(公告)日：2011-06-14
申请号：US11281238
申请日：2005-11-16
申请人： Randall S. Mundt , Paul D. MacDonald , Andrew Beers , Mason L. Freed , Costas J. Spanos
发明人： Randall S. Mundt , Paul D. MacDonald , Andrew Beers , Mason L. Freed , Costas J. Spanos
IPC分类号： B23K10/00
CPC分类号： G01N27/60 , G01K7/25 , G01N33/0004 , G01R15/24 , G01R29/12 , H01L21/67248 , H01L21/67253 , H01L2924/0002 , H01L2924/00
摘要： A sensor apparatus for measuring a plasma process parameter for processing a workpiece. The sensor apparatus includes a base, an information processor supported on or in the base, and at least one sensor supported on or in the base. The at least one sensor includes at least one sensing element configured for measuring an electrical property of a plasma and at least one transducer coupled to the at least one sensing element. The transducer is configured so as to receive a signal from the sensing element and converting the signal into a second signal for input to the information processor.
摘要翻译：一种用于测量用于处理工件的等离子体工艺参数的传感器装置。传感器装置包括基座，支撑在基座上或底座中的信息处理器以及支撑在基座上或基座中的至少一个传感器。所述至少一个传感器包括被配置用于测量等离子体的电特性的至少一个感测元件和耦合到所述至少一个感测元件的至少一个换能器。传感器被配置为接收来自感测元件的信号并将信号转换成第二信号以输入到信息处理器。

6. 发明授权

US07282889B2 Maintenance unit for a sensor apparatus 失效
标题翻译：传感器装置的维护单元
公开(公告)号：US07282889B2
公开(公告)日：2007-10-16
申请号：US10888526
申请日：2004-07-10
申请人： Mason L. Freed , Randall S. Mundt , Costas J. Spanos
发明人： Mason L. Freed , Randall S. Mundt , Costas J. Spanos
IPC分类号： H01M10/46
CPC分类号： H02J7/025 , H02J50/12
摘要： Presented are methods, systems, and apparatuses for managing and maintaining an electronic device such as a sensor apparatus.
摘要翻译：提出了用于管理和维护诸如传感器装置的电子设备的方法，系统和装置。

7. 发明申请

US20090292506A1 METHODS OF AND APPARATUSES FOR MAINTENANCE, DIAGNOSIS, AND OPTIMIZATION OF PROCESSES 审中-公开
标题翻译：维护，诊断和过程优化的方法和装置
公开(公告)号：US20090292506A1
公开(公告)日：2009-11-26
申请号：US12538066
申请日：2009-08-07
申请人： Paul Douglas MacDonald , Michiel V.P. Kruger , Michael Welch , Mason L. Freed , Costas J. Spanos
发明人： Paul Douglas MacDonald , Michiel V.P. Kruger , Michael Welch , Mason L. Freed , Costas J. Spanos
IPC分类号： G06F15/00
CPC分类号： G05B23/0235 , G05B13/04 , G05B13/045
摘要： One aspect of the present invention is a method of monitoring processes, optimizing processes, and diagnosing problems in the performance of a process tool for processing a workpiece. Another aspect of the present invention is a system configured for monitoring processes, optimizing processes, and diagnosing problems in the performance of a process tool for processing a workpiece. One embodiment of the present invention includes a software program that can be implemented in a computer for optimizing the performance of a process tool for processing a workpiece.
摘要翻译：本发明的一个方面是监视处理工艺，优化处理和诊断处理工具处理工具的执行中的问题的方法。本发明的另一方面是被配置为用于监视处理，优化处理和诊断用于处理工件的处理工具的执行中的问题的系统。本发明的一个实施例包括可以在计算机中实现的用于优化用于处理工件的处理工具的性能的软件程序。

8. 发明授权

US07580767B2 Methods of and apparatuses for maintenance, diagnosis, and optimization of processes 有权
标题翻译：过程的维护，诊断和优化的方法和设备
公开(公告)号：US07580767B2
公开(公告)日：2009-08-25
申请号：US11179440
申请日：2005-07-11
申请人： Paul Douglas MacDonald , Michiel V. P. Krüger , Michael Welch , Mason L. Freed , Costas J. Spanos
发明人： Paul Douglas MacDonald , Michiel V. P. Krüger , Michael Welch , Mason L. Freed , Costas J. Spanos
IPC分类号： G06F19/00
CPC分类号： G05B23/0235 , G05B13/04 , G05B13/045
摘要： One aspect of the present invention is a method of monitoring processes, optimizing processes, and diagnosing problems in the performance of a process tool for processing a workpiece. Another aspect of the present invention is a system configured for monitoring processes, optimizing processes, and diagnosing problems in the performance of a process tool for processing a workpiece. One embodiment of the present invention includes a software program that can be implemented in a computer for optimizing the performance of a process tool for processing a workpiece.
摘要翻译：本发明的一个方面是监视处理工艺，优化处理和诊断处理工具处理工具的执行中的问题的方法。本发明的另一方面是被配置为用于监视处理，优化处理和诊断用于处理工件的处理工具的执行中的问题的系统。本发明的一个实施例包括可以在计算机中实现的用于优化用于处理工件的处理工具的性能的软件程序。

9. 发明授权

US07299148B2 Methods and apparatus for low distortion parameter measurements 失效
标题翻译：用于低失真参数测量的方法和装置
公开(公告)号：US07299148B2
公开(公告)日：2007-11-20
申请号：US11177922
申请日：2005-07-08
申请人： Dean Hunt , Costas J. Spanos , Michael Welch , Kameshwar Poolla , Mason L. Freed
发明人： Dean Hunt , Costas J. Spanos , Michael Welch , Kameshwar Poolla , Mason L. Freed
IPC分类号： G01K1/12
CPC分类号： G01K1/18 , H05K1/147 , H05K1/148
摘要： This invention seeks to provide methods and apparatus that can improve the accuracy of measured parameter data used for processing workpieces. One aspect of the present invention includes methods of measuring process conditions with low distortion of the measurements caused by the measuring apparatus. The measurements include data for applications such as data for monitoring, controlling, and optimizing processes and process tools. Another aspect of the present invention includes apparatus for measuring substantially correct data for applications such as generating data for monitoring, controlling, and optimizing processes and process tools.
摘要翻译：本发明寻求提供可以提高用于处理工件的测量参数数据的精度的方法和装置。本发明的一个方面包括测量由测量装置引起的测量的低变形的工艺条件的方法。这些测量包括应用程序的数据，例如用于监视，控制和优化流程和流程工具的数据。本发明的另一方面包括用于测量用于诸如生成用于监控，控制和优化过程和处理工具的数据的应用的基本上正确的数据的装置。

10. 发明授权

US07016754B2 Methods of and apparatus for controlling process profiles 有权
标题翻译：控制过程简档的方法和设备
公开(公告)号：US07016754B2
公开(公告)日：2006-03-21
申请号：US10673049
申请日：2003-09-26
申请人： Kameshwar Poolla , Costas J. Spanos
发明人： Kameshwar Poolla , Costas J. Spanos
IPC分类号： G06F19/00
CPC分类号： H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： Presented are methods and apparatus for controlling the processing of a substrate during a process step that is sensitive to one or more process conditions. One embodiment includes a method performed with corresponding apparatus that includes a controller. One step includes constructing a perturbation model relating changes in control parameters for the apparatus to one or more resulting changes in the process. The method also includes the step of using the perturbation model with at least one of a performance objective and a constraint to derive optimized control parameters for the controller. Another step in the method includes operating the controller with the optimized control parameters. Another embodiment includes an apparatus for processing substrates where the apparatus comprises optimized control parameters.
摘要翻译：提出了在对一个或多个工艺条件敏感的工艺步骤期间控制衬底的处理的方法和装置。一个实施例包括用包括控制器的相应设备执行的方法。一步包括构造一个扰动模型，将该装置的控制参数的变化与过程中的一个或多个所产生的变化相关联。该方法还包括使用具有性能目标和约束中的至少一个的扰动模型来导出用于控制器的优化控制参数的步骤。该方法的另一步骤包括使用优化的控制参数操作控制器。另一个实施例包括用于处理衬底的装置，其中装置包括优化的控制参数。

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