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    • 1. 发明授权
    • Electron gun, CRT with electron gun
    • 电子枪,CRT电子枪
    • US06328621B2
    • 2001-12-11
    • US09845302
    • 2001-05-01
    • Masatoshi KudohRyuichi MuraiMitsuhiro OhtaniKatuyoshi YamashitaHideharu OhmaeMasahiko Konda
    • Masatoshi KudohRyuichi MuraiMitsuhiro OhtaniKatuyoshi YamashitaHideharu OhmaeMasahiko Konda
    • H01J2962
    • H01J9/02H01J9/42H01J2229/48
    • Method and apparatus for manufacturing an electron gun. A beam spot coefficient is obtained from an electrostatic lens magnification and a spherical aberration coefficient of a set resistance distribution. Then, a first process loop is executed to select another resistance distribution that provides an approximate minimum value of the beam spot coefficient. It is then determined whether the beam spot coefficient is an approximate minimum value. The first process loop is repeatedly executed until the beam spot coefficient is determined to be equal to the approximate minimum value. At this point, a second process loop is executed to confirm the minimum value of the beam spot coefficient using an aberration-independent function that is dependent upon the electrostatic lens magnification and is not dependent upon the spherical aberration coefficient. Processing returns to the first process loop using still another resistance distribution as a selected resistance distribution when the beam spot coefficient is not the approximate minimum value.
    • 电子枪制造方法及装置。 从静电透镜放大率和设定的电阻分布的球面像差系数获得束斑系数。 然后,执行第一处理循环以选择提供束斑系数的近似最小值的另一电阻分布。 然后确定束斑系数是否是近似最小值。 重复执行第一处理循环,直到确定束斑系数等于近似最小值。 此时,执行第二处理循环,以使用取决于静电透镜倍率的像差独立函数来确认束斑系数的最小值,并且不依赖于球面像差系数。 当光斑系数不是近似最小值时,处理返回到第一处理循环,使用另一个电阻分布作为选择的电阻分布。
    • 2. 发明授权
    • Method for making electron gun
    • 电子枪制作方法
    • US06270390B1
    • 2001-08-07
    • US09593137
    • 2000-06-14
    • Masatoshi KudohRyuichi MuraiMitsuhiro OhtaniKatuyoshi YamashitaHideharu OhmaeMasahiko Konda
    • Masatoshi KudohRyuichi MuraiMitsuhiro OhtaniKatuyoshi YamashitaHideharu OhmaeMasahiko Konda
    • H01J902
    • H01J9/02H01J9/42H01J2229/48
    • Method and apparatus for manufacturing an electron gun. A beam spot coefficient is obtained from an electrostatic lens magnification and a spherical aberration coefficient of a set resistance distribution. Then, a first process loop is executed to select another resistance distribution that provides an approximate minimum value of the beam spot coefficient. It is then determined whether the beam spot coefficient is an approximate minimum value. The first process loop is repeatedly executed until the beam spot coefficient is determined to be equal to the approximate minimum value. At this point, a second process loop is executed to confirm the minimum value of the beam spot coefficient using an aberration-independent function that is dependent upon the electrostatic lens magnification and is not dependent upon the spherical aberration coefficient. Processing returns to the first process loop using still another resistance distribution as a selected resistance distribution when the beam spot coefficient is not the approximate minimum value.
    • 电子枪制造方法及装置。 从静电透镜放大率和设定的电阻分布的球面像差系数获得束斑系数。 然后,执行第一处理循环以选择提供束斑系数的近似最小值的另一电阻分布。 然后确定束斑系数是否是近似最小值。 重复执行第一处理循环,直到确定束斑系数等于近似最小值。 此时,执行第二处理循环,以使用取决于静电透镜倍率的像差独立函数来确认束斑系数的最小值,并且不依赖于球面像差系数。 当光斑系数不是近似最小值时,处理返回到第一处理循环,使用另一个电阻分布作为选择的电阻分布。
    • 9. 发明授权
    • Gas discharge panel and gas light-emitting device
    • 气体放电面板和气体发光装置
    • US06291943B1
    • 2001-09-18
    • US09254886
    • 1999-06-04
    • Ryuichi MuraiAkira ShiokawaHiroyosi TanakaYoshiki SasakiMasaki AokiMasatoshi KudohYuusuke TakadaHiroyuki Kado
    • Ryuichi MuraiAkira ShiokawaHiroyosi TanakaYoshiki SasakiMasaki AokiMasatoshi KudohYuusuke TakadaHiroyuki Kado
    • H01J1312
    • H01J11/12H01J11/14H01J11/50
    • The object of the present invention is to provide a gas discharge panel, where the conversion efficiency of discharge energy into visible rays and the panel brightness are improved, with the color purity being improved as far as possible. To achieve this object, in a gas discharge panel, the pressure of discharge gas is set in a range of 800-4000 Torr, that is higher than a conventional gas pressure. Also, a rare gas mixture including helium, neon, xenon, and argon is used as discharge gas charged into discharge spaces, instead of conventional discharge gas. Here, it is preferable that the proportion of Xe is set to 5% by volume or less, that of Ar 0.5% by volume or less, and that of He under 55% by volume. With this rare gas mixture, the light-emission efficiency is improved, with the firing voltage being suppressed. Furthermore, display electrodes and address electrodes are arranged on the surface of either of a front cover plate and a back plate, with a dielectric layer existing between the display electrodes and the address electrodes. With this construction, addressing is performed with a relatively low voltage even if the gas pressure is high.
    • 本发明的目的是提供一种气体放电面板,其中放电能量转换成可见光的转换效率和面板亮度得到改善,色纯度尽可能地得到改善。 为了达到这个目的,在气体放电面板中,放电气体的压力设定在比常规气体压力高的800-4000乇的范围内。 此外,使用包含氦,氖,氙和氩的稀有气体混合物作为放电气体,而不是传统的放电气体。 这里,优选Xe的比例为5体积%以下,Ar为0.5体积%以下,He为55体积%以下。 利用这种稀有气体混合物,随着点火电压的抑制,发光效率提高。 此外,显示电极和寻址电极布置在前盖板和背板之一的表面上,在显示电极和寻址电极之间存在电介质层。 利用这种结构,即使气体压力高,也以相对低的电压进行寻址。