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1. 发明授权

US07288762B2 Fine-adjustment mechanism for scanning probe microscopy 有权
标题翻译：扫描探针显微镜微调机构
公开(公告)号：US07288762B2
公开(公告)日：2007-10-30
申请号：US11045916
申请日：2005-01-28
申请人： Masato Iyoki , Akihiko Hidaka , Kazutoshi Watanabe
发明人： Masato Iyoki , Akihiko Hidaka , Kazutoshi Watanabe
IPC分类号： H01L41/04
CPC分类号： G01Q10/04 , Y10S977/872
摘要： The invention provides a fine-adjustment mechanism for a scanning probe microscopy with high rigidity and high degree of measurement accuracy wherein a strain gauge displacement sensor which can be installed in a small space is arranged so that temperature compensation is achieved. The fine-adjustment mechanism composed of a piezoelectric device is provided with at least two-piece electrode. One of the electrodes is configured as a dummy electrode, to which no voltage is applied, and the other electrode is configured as an active electrode which generates strain when voltage is applied. One or two resistors are provided on each of the active electrode and dummy electrode, and a bridge circuit is configured by the resistors.
摘要翻译：本发明提供了一种用于具有高刚性和高测量精度的扫描探针显微镜的精细调节机构，其中可以安装在小空间中的应变片位移传感器被布置成实现温度补偿。由压电元件构成的微调机构具有至少两片电极。其中一个电极被配置为没有施加电压的虚拟电极，另一个电极被配置为当施加电压时产生应变的有源电极。有源电极和虚拟电极均设置有一个或两个电阻器，桥接电路由电阻器构成。

2. 发明申请

US20050231066A1 Fine-adjustment mechanism for scanning probe microscopy 有权
标题翻译：扫描探针显微镜微调机构
公开(公告)号：US20050231066A1
公开(公告)日：2005-10-20
申请号：US11045916
申请日：2005-01-28
申请人： Masato Iyoki , Akihiko Hidaka , Kazutoshi Watanabe
发明人： Masato Iyoki , Akihiko Hidaka , Kazutoshi Watanabe
IPC分类号： G01B7/16 , G01B7/34 , G01B21/30 , G01L1/22 , G01N37/00 , G01Q10/00 , G01Q10/04 , H01L41/04 , H01L41/09
CPC分类号： G01Q10/04 , Y10S977/872
摘要： The invention provides a fine-adjustment mechanism for a scanning probe microscopy with high rigidity and high degree of measurement accuracy wherein a strain gauge displacement sensor which can be installed in a small space is arranged so that temperature compensation is achieved. The fine-adjustment mechanism composed of a piezoelectric device is provided with at least two-piece electrode. One of the electrodes is configured as a dummy electrode, to which no voltage is applied, and the other electrode is configured as an active electrode which generates strain when voltage is applied. One or two resistors are provided on each of the active electrode and dummy electrode, and a bridge circuit is configured by the resistors.
摘要翻译：本发明提供了一种用于具有高刚性和高测量精度的扫描探针显微镜的精细调节机构，其中可以安装在小空间中的应变片位移传感器被布置成实现温度补偿。由压电元件构成的微调机构具有至少两片电极。其中一个电极被配置为没有施加电压的虚拟电极，另一个电极被配置为当施加电压时产生应变的有源电极。有源电极和虚拟电极均设置有一个或两个电阻器，桥接电路由电阻器构成。

3. 发明授权

US5466066A Thermogravimetric apparatus with a balance arm vibrating function 失效
标题翻译：具有平衡臂振动功能的热重仪
公开(公告)号：US5466066A
公开(公告)日：1995-11-14
申请号：US184027
申请日：1994-01-21
申请人： Akihiko Hidaka
发明人： Akihiko Hidaka
IPC分类号： G01G3/16 , G01N5/04 , G01N25/00 , G01N5/00
CPC分类号： G01G3/16 , G01N5/04
摘要： In a thermogravimetric apparatus which is composed of a balance-arm 1, a detector 2 for detecting an amount of deviation of the balance-arm 1, a control circuit 3 for controlling equilibrium of the balance, and a driving part 6 for moving the balance-arm to the balanced position, vibration of the balance-arm has been made possible by adding a vibration generating circuit 5 for vibrating the balance-arm 1 and an adding circuit 4 for adding a signal from the control circuit 3 to a signal from the vibration generating circuit 5. A measurement which is excellent in reproducibility and accuracy is thus obtained. Automation of replacement of samples and unattended measurement are also made possible.
摘要翻译：在由平衡臂1，用于检测平衡臂1的偏移量的检测器2，用于控制平衡的平衡的控制电路3和用于移动平衡臂的驱动部6构成的热重分析装置中，通过添加用于使平衡臂1振动的振动产生电路5和用于将来自控制电路3的信号添加到来自控制电路3的信号的加法电路4，使平衡臂的振动成为平衡臂的振动从而获得了再现性和精度优异的测定。也可以自动更换样品和无人值守测量。

4. 发明授权

US5656088A Apparatus for dipping substrates in processing fluid 失效
标题翻译：用于将基材浸渍在处理流体中的装置
公开(公告)号：US5656088A
公开(公告)日：1997-08-12
申请号：US936030
申请日：1992-08-26
申请人： Kenji Sugimoto , Tadashi Maegawa , Akihiko Hidaka , Toshio Hiroe , Hideki Hayashi
发明人： Kenji Sugimoto , Tadashi Maegawa , Akihiko Hidaka , Toshio Hiroe , Hideki Hayashi
IPC分类号： B05C3/04 , B05C3/09 , H01L21/687 , B05C3/00
CPC分类号： H01L21/68707 , B05C3/04 , B05C3/09
摘要： For processing semiconductor substrates in a processing fluid, the substrates are introduced into a processing bath in which the processing fluid is filled. For holding the substrates in the process of introducing them into the processing bath, a holder having a pair of holding rods end a pair of aiding rods is prepared. A periodical linear array of grooves is formed on each rod. The rims of substrates are inserted into respective corresponding grooves on the rods so that the substrates do not touch respective side walls of the grooves in the aiding rod.
摘要翻译：为了在处理流体中处理半导体衬底，将衬底引入到其中填充处理流体的处理槽中。为了在将基板引入处理槽的过程中保持基板，制备具有一对保持杆的保持器，该保持杆端接一对辅助杆。在每个杆上形成周期性的线形阵列。基板的边缘被插入到杆的相应的相应凹槽中，使得基板不接触辅助杆中的槽的相应侧壁。

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