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1. 发明授权

US08021562B2 Method for manufacturing a filter substrate, inkjet recording head, and method for manufacturing the inkjet recording head 有权
标题翻译：用于制造过滤器基板的方法，喷墨记录头以及用于制造喷墨记录头的方法
公开(公告)号：US08021562B2
公开(公告)日：2011-09-20
申请号：US12174559
申请日：2008-07-16
申请人： Masataka Kato , Makoto Terui , Ryoji Kanri
发明人： Masataka Kato , Makoto Terui , Ryoji Kanri
IPC分类号： G01D15/00 , G11B5/127 , B44C1/22 , C03C15/00 , C03C25/68 , H01L21/302 , H01L21/461 , C23F1/00
CPC分类号： B41J2/1639 , B41J2/1603 , B41J2/1623 , B41J2/1628 , B41J2/1631 , B41J2/1632 , B41J2/1635
摘要： A filter capable of separating or filtering micro foreign particles in a flow passage is provided. A first mask and a second mask are formed on a silicon substrate by dry etching. Before performing the dry etching, a resist of the first mask is subjected to a heat treatment performed at a temperature equal to or higher than a glass transition point. A resist of the second mask is not subjected to such a heat treatment. This processing simultaneously forms in the substrate a groove portion and a wall having a hole that is located in the groove portion. A silicon material located beneath a wide portion of the first mask remains as a wall portion separating the holes.
摘要翻译：提供了能够分离或过滤流路中的微小异物的过滤器。通过干蚀刻在硅衬底上形成第一掩模和第二掩模。在进行干蚀刻之前，对第一掩模的抗蚀剂进行在玻璃化转变点以上的温度下进行的热处理。第二掩模的抗蚀剂不进行这种热处理。这种处理在基板中同时形成有槽部分和具有位于槽部分中的孔的壁。位于第一掩模的宽部分下方的硅材料保留为分离孔的壁部分。

2. 发明申请

US20050248623A1 Method of manufacturing substrate for ink jet recording head and method of manufacturing recording head using substrate manufactured by this method 有权
标题翻译：喷墨记录头用基板的制造方法以及使用该方法制造的基板的记录头的制造方法
公开(公告)号：US20050248623A1
公开(公告)日：2005-11-10
申请号：US11118404
申请日：2005-05-02
申请人： Hirokazu Komuro , Teruo Ozaki , Shuji Koyama , Kousuke Kubo , Makoto Terui , Kazuhiro Hayakawa , Ryoji Kanri , Masataka Kato
发明人： Hirokazu Komuro , Teruo Ozaki , Shuji Koyama , Kousuke Kubo , Makoto Terui , Kazuhiro Hayakawa , Ryoji Kanri , Masataka Kato
IPC分类号： B41J2/14 , B41J2/16 , B41J2/05
CPC分类号： B41J2/1601 , B41J2/14129 , B41J2/1628 , B41J2/1629 , B41J2/1631 , B41J2/1642 , B41J2/1646
摘要： In order to form a more homogenous heat generating resistive layer, the present invention provides a method of manufacturing a substrate for an ink jet recording head having a support which has an insulative layer on its surface, a pair of electrode layers disposed on the surface of the support, and a heat generating resistive layer which continuously covers the pair of electrode layers and a section between the pair of electrode layers. The method includes the step of forming an electrode layer on the support and the step of forming the pair of electrode layers by etching the electrode layer. In the step of forming the pair of electrode layers by etching the electrode layer, by etching a surface portion of the insulative layer positioned between the pair of insulative layers, a recess is formed in the surface portion of the insulative layer.
摘要翻译：为了形成更均匀的发热电阻层，本发明提供一种制造喷墨记录头用基板的方法，所述喷墨记录头具有在其表面上具有绝缘层的支撑体，设置在其表面上的一对电极层所述支撑体和连续地覆盖所述一对电极层的所述发热电阻层和所述一对电极层之间的部分。该方法包括在支撑体上形成电极层的步骤和通过蚀刻电极层形成一对电极层的步骤。在通过蚀刻电极层形成一对电极层的步骤中，通过蚀刻位于一对绝缘层之间的绝缘层的表面部分，在绝缘层的表面部分形成凹部。

3. 发明申请

US20060092246A1 Method for manufacturing a filter substrate, inkjet recording head, and method for manufacturing the inkjet recording head 失效
标题翻译：用于制造过滤器基板的方法，喷墨记录头以及用于制造喷墨记录头的方法
公开(公告)号：US20060092246A1
公开(公告)日：2006-05-04
申请号：US11263425
申请日：2005-10-31
申请人： Masataka Kato , Makoto Terui , Ryoji Kanri
发明人： Masataka Kato , Makoto Terui , Ryoji Kanri
IPC分类号： B41J2/05 , B41J2/175
CPC分类号： B41J2/1639 , B41J2/1603 , B41J2/1623 , B41J2/1628 , B41J2/1631 , B41J2/1632 , B41J2/1635
摘要： A filter capable of separating or filtering micro foreign particles in a flow passage is provided. A first mask and a second mask are formed on a silicon substrate by dry etching. Before performing the dry etching, a resist of the first mask is subjected to a heat treatment performed at a temperature equal to or higher than a glass transition point. A resist of the second mask is not subjected to such a heat treatment. This processing simultaneously forms in the substrate a groove portion and a wall having a hole that is located in the groove portion. A silicon material located beneath a wide portion of the first mask remains as a wall portion separating the holes.
摘要翻译：提供了能够分离或过滤流路中的微小异物的过滤器。通过干蚀刻在硅衬底上形成第一掩模和第二掩模。在进行干蚀刻之前，对第一掩模的抗蚀剂进行在玻璃化转变点以上的温度下进行的热处理。第二掩模的抗蚀剂不进行这种热处理。这种处理在基板中同时形成有槽部分和具有位于槽部分中的孔的壁。位于第一掩模的宽部分下方的硅材料保留为分离孔的壁部分。

4. 发明授权

US07452474B2 Method of manufacturing substrate for ink jet recording head and method of manufacturing recording head using substrate manufactured by this method 有权
标题翻译：喷墨记录头用基板的制造方法以及使用该方法制造的基板的记录头的制造方法
公开(公告)号：US07452474B2
公开(公告)日：2008-11-18
申请号：US11118404
申请日：2005-05-02
申请人： Hirokazu Komuro , Teruo Ozaki , Shuji Koyama , Kousuke Kubo , Makoto Terui , Kazuhiro Hayakawa , Ryoji Kanri , Masataka Kato
发明人： Hirokazu Komuro , Teruo Ozaki , Shuji Koyama , Kousuke Kubo , Makoto Terui , Kazuhiro Hayakawa , Ryoji Kanri , Masataka Kato
IPC分类号： G01D15/00
CPC分类号： B41J2/1601 , B41J2/14129 , B41J2/1628 , B41J2/1629 , B41J2/1631 , B41J2/1642 , B41J2/1646
摘要： In order to form a more homogenous heat generating resistive layer, the present invention provides a method of manufacturing a substrate for an ink jet recording head having a support which has an insulative layer on its surface, a pair of electrode layers disposed on the surface of the support, and a heat generating resistive layer which continuously covers the pair of electrode layers and a section between the pair of electrode layers. The method includes the step of forming an electrode layer on the support and the step of forming the pair of electrode layers by etching the electrode layer. In the step of forming the pair of electrode layers by etching the electrode layer, by etching a surface portion of the insulative layer positioned between the pair of insulative layers, a recess is formed in the surface portion of the insulative layer.
摘要翻译：为了形成更均匀的发热电阻层，本发明提供一种制造喷墨记录头用基板的方法，所述喷墨记录头具有在其表面上具有绝缘层的支撑体，设置在其表面上的一对电极层所述支撑体和连续地覆盖所述一对电极层的所述发热电阻层和所述一对电极层之间的部分。该方法包括在支撑体上形成电极层的步骤和通过蚀刻电极层形成一对电极层的步骤。在通过蚀刻电极层形成一对电极层的步骤中，通过蚀刻位于一对绝缘层之间的绝缘层的表面部分，在绝缘层的表面部分形成凹部。

5. 发明申请

US20080277379A1 METHOD FOR MANUFACTURING A FILTER SUBSTRATE, INKJET RECORDING HEAD, AND METHOD FOR MANUFACTURING THE INKJET RECORDING HEAD 有权
标题翻译：用于制造过滤器基板的方法，喷墨记录头和用于制造喷墨记录头的方法
公开(公告)号：US20080277379A1
公开(公告)日：2008-11-13
申请号：US12174559
申请日：2008-07-16
申请人： Masataka Kato , Makoto Terui , Ryoji Kanri
发明人： Masataka Kato , Makoto Terui , Ryoji Kanri
IPC分类号： B44C1/22
CPC分类号： B41J2/1639 , B41J2/1603 , B41J2/1623 , B41J2/1628 , B41J2/1631 , B41J2/1632 , B41J2/1635
摘要： A filter capable of separating or filtering micro foreign particles in a flow passage is provided. A first mask and a second mask are formed on a silicon substrate by dry etching. Before performing the dry etching, a resist of the first mask is subjected to a heat treatment performed at a temperature equal to or higher than a glass transition point. A resist of the second mask is not subjected to such a heat treatment. This processing simultaneously forms in the substrate a groove portion and a wall having a hole that is located in the groove portion. A silicon material located beneath a wide portion of the first mask remains as a wall portion separating the holes.
摘要翻译：提供了能够分离或过滤流路中的微小异物的过滤器。通过干蚀刻在硅衬底上形成第一掩模和第二掩模。在进行干蚀刻之前，对第一掩模的抗蚀剂进行在玻璃化转变点以上的温度下进行的热处理。第二掩模的抗蚀剂不进行这种热处理。这种处理在基板中同时形成有槽部分和具有位于槽部分中的孔的壁。位于第一掩模的宽部分下方的硅材料保留为分离孔的壁部分。

6. 发明授权

US07416285B2 Method for manufacturing a filter substrate, inkjet recording head, and method for manufacturing the inkjet recording head 失效
标题翻译：用于制造过滤器基板的方法，喷墨记录头以及用于制造喷墨记录头的方法
公开(公告)号：US07416285B2
公开(公告)日：2008-08-26
申请号：US11263425
申请日：2005-10-31
申请人： Masataka Kato , Makoto Terui , Ryoji Kann
发明人： Masataka Kato , Makoto Terui , Ryoji Kann
IPC分类号： B41J2/05
CPC分类号： B41J2/1639 , B41J2/1603 , B41J2/1623 , B41J2/1628 , B41J2/1631 , B41J2/1632 , B41J2/1635
摘要： A filter capable of separating or filtering micro foreign particles in a flow passage is provided. A first mask and a second mask are formed on a silicon substrate by dry etching. Before performing the dry etching, a resist of the first mask is subjected to a heat treatment performed at a temperature equal to or higher than a glass transition point. A resist of the second mask is not subjected to such a heat treatment. This processing simultaneously forms in the substrate a groove portion and a wall having a hole that is located in the groove portion. A silicon material located beneath a wide portion of the first mask remains as a wall portion separating the holes.
摘要翻译：提供了能够分离或过滤流路中的微小异物的过滤器。通过干蚀刻在硅衬底上形成第一掩模和第二掩模。在进行干蚀刻之前，对第一掩模的抗蚀剂进行在玻璃化转变点以上的温度下进行的热处理。第二掩模的抗蚀剂不进行这种热处理。这种处理在基板中同时形成有槽部分和具有位于槽部分中的孔的壁。位于第一掩模的宽部分下方的硅材料保留为分离孔的壁部分。

7. 发明申请

US20110171779A1 SEMICONDUCTOR DEVICE MANUFACTURING METHOD 有权
标题翻译：半导体器件制造方法
公开(公告)号：US20110171779A1
公开(公告)日：2011-07-14
申请号：US13071741
申请日：2011-03-25
申请人： Makoto Terui , Yasushi Shiraishi
发明人： Makoto Terui , Yasushi Shiraishi
IPC分类号： H01L21/58
CPC分类号： H01L23/42 , H01L23/3121 , H01L23/4334 , H01L23/5385 , H01L24/45 , H01L24/48 , H01L24/73 , H01L24/81 , H01L25/0652 , H01L25/0655 , H01L25/18 , H01L25/50 , H01L2224/16145 , H01L2224/32145 , H01L2224/32245 , H01L2224/48091 , H01L2224/48227 , H01L2224/48465 , H01L2224/73204 , H01L2224/73207 , H01L2224/73253 , H01L2224/73257 , H01L2224/73265 , H01L2224/81193 , H01L2224/81801 , H01L2224/83102 , H01L2224/92125 , H01L2924/00011 , H01L2924/00014 , H01L2924/01005 , H01L2924/01006 , H01L2924/01013 , H01L2924/01029 , H01L2924/01033 , H01L2924/01057 , H01L2924/01079 , H01L2924/014 , H01L2924/12041 , H01L2924/14 , H01L2924/1433 , H01L2924/15153 , H01L2924/1517 , H01L2924/15311 , H01L2924/1532 , H01L2924/16195 , H01L2924/167 , H01L2924/00 , H01L2924/00012 , H01L2224/0401 , H01L2224/45099 , H01L2224/45015 , H01L2924/207
摘要： A BGA substrate which has a back surface to which a heat radiating plate is attached and an opening for accommodating a relay wiring substrate therein, which is provided in the center of its surface, is used. The relay wiring substrate to which an ASIC chip and a memory chip are flip-chip connected, is bonded to the heat radiating plate in the opening with a thermal conductive bonding material. Further, each of the back surfaces of the ASIC chip and the memory chip is connected to a metal cap for sealing the opening through a thermal conductive material interposed therebetween.
摘要翻译：使用具有安装有散热板的背面的BGA基板和设置在其表面的中心的用于容纳中继布线基板的开口。将ASIC芯片和存储器芯片倒装连接到的中继布线基板通过导热接合材料接合到开口中的散热板。此外，ASIC芯片和存储芯片的每个后表面连接到金属盖，用于通过介于其间的导热材料密封开口。

8. 发明授权

US07934810B2 Ink jet recording head including beams dividing supply ports 有权
标题翻译：喷墨记录头包括分配供应端口的光束
公开(公告)号：US07934810B2
公开(公告)日：2011-05-03
申请号：US12369259
申请日：2009-02-11
申请人： Kazuhiro Hayakawa , Makoto Terui
发明人： Kazuhiro Hayakawa , Makoto Terui
IPC分类号： B41J2/05
CPC分类号： B41J2/1631 , B41J2/14145 , B41J2/1603
摘要： An ink jet recording head has sufficient and uniform ink refill for all orifices and separate flow paths even though the substrate has high rigidity by dividing a supply port into a plurality of ports. The substrate of the ink jet recording head has a plurality of separate flow paths corresponding to discharge pressure generating elements, a common flow path communicating with the separate flow paths, an ink supply port communicating with the common flow path and supplying ink to the common flow path, and a plurality of beam portions dividing the ink supply port. A recess is formed on the common flow path, extending to the separate flow paths formed nearest to the beam portion.
摘要翻译：喷墨记录头对于所有孔和分离的流动路径具有足够且均匀的填充墨水，即使基板通过将供给口分成多个端口而具有高刚性。喷墨记录头的基板具有与排出压力产生元件相对应的多个单独的流路，与分开的流路连通的公共流路，与公共流路连通并将墨水供给到公共流路径和分割供墨口的多个光束部分。在公共流动路径上形成一个凹槽，延伸到最靠近梁部分形成的独立流动路径。

9. 发明授权

US07833608B2 Beam, ink jet recording head having beams, and method for manufacturing ink jet recording head having beams 有权
标题翻译：光束，具有光束的喷墨记录头，以及具有光束的喷墨记录头的制造方法
公开(公告)号：US07833608B2
公开(公告)日：2010-11-16
申请号：US11835746
申请日：2007-08-08
申请人： Takashi Ushijima , Takeo Yamazaki , Makoto Terui , Kazuhiro Hayakawa
发明人： Takashi Ushijima , Takeo Yamazaki , Makoto Terui , Kazuhiro Hayakawa
IPC分类号： B32B3/00 , B41J2/05
CPC分类号： B41J2/1603 , B41J2/14145 , B41J2/1623 , B41J2/1628 , B41J2/1629 , B41J2/1631 , B41J2/1632 , B41J2/1634 , B41J2/1642 , B41J2/1643 , B41J2/1646 , Y10T428/24331 , Y10T428/24479 , Y10T428/24562 , Y10T428/2457 , Y10T428/24612
摘要： A beam having a base material of silicon monocrystal and at least one projection which is integrally formed so as to be supported at least at one end thereof and which has two surfaces having an orientation plane (111), includes a bottom surface in a plane which is common with a plane of the base material; a groove penetrating from the bottom surface to a top of the projection; and a protecting member having a resistance property against a crystal anisotropic etching liquid and covering an inner wall of the groove.
摘要翻译：一种具有单晶硅基材和至少一个突起的光束，其一体地形成为至少在其一端被支撑并且具有两个具有取向平面（111）的表面，该平面包括在平面中的底表面与基材的平面相同; 从所述底表面到所述突起的顶部穿透的凹槽; 以及对结晶各向异性蚀刻液具有抵抗性并覆盖所述槽的内壁的保护构件。

10. 发明授权

US07687283B2 Method of producing a semiconductor device having a magnetic layer formed thereon 有权
标题翻译：制造其上形成有磁性层的半导体器件的方法
公开(公告)号：US07687283B2
公开(公告)日：2010-03-30
申请号：US11159145
申请日：2005-06-23
申请人： Makoto Terui
发明人： Makoto Terui
IPC分类号： H01L21/00
CPC分类号： H01L23/552 , H01L23/3114 , H01L2224/05001 , H01L2224/05008 , H01L2224/05022 , H01L2224/05124 , H01L2224/05147 , H01L2224/05569 , H01L2224/16 , H01L2924/00014 , H01L2924/01046 , H01L2924/01078 , H01L2924/3025 , H01L2224/05599
摘要： A semiconductor device of a wafer level chip size package type is formed by cutting a semiconductor wafer with a plurality of semiconductor elements formed thereon in pieces. The semiconductor device includes a semiconductor substrate as the semiconductor wafer having a magnetic layer formed on at least one of a front surface and a backside surface of the semiconductor wafer.
摘要翻译：通过用形成有多个半导体元件的半导体晶片切割晶片级芯片尺寸封装形式的半导体器件。半导体器件包括作为半导体晶片的半导体衬底，其具有形成在半导体晶片的前表面和后侧表面中的至少一个上的磁性层。

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