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1. 发明授权

US07833608B2 Beam, ink jet recording head having beams, and method for manufacturing ink jet recording head having beams 有权
标题翻译：光束，具有光束的喷墨记录头，以及具有光束的喷墨记录头的制造方法
公开(公告)号：US07833608B2
公开(公告)日：2010-11-16
申请号：US11835746
申请日：2007-08-08
申请人： Takashi Ushijima , Takeo Yamazaki , Makoto Terui , Kazuhiro Hayakawa
发明人： Takashi Ushijima , Takeo Yamazaki , Makoto Terui , Kazuhiro Hayakawa
IPC分类号： B32B3/00 , B41J2/05
CPC分类号： B41J2/1603 , B41J2/14145 , B41J2/1623 , B41J2/1628 , B41J2/1629 , B41J2/1631 , B41J2/1632 , B41J2/1634 , B41J2/1642 , B41J2/1643 , B41J2/1646 , Y10T428/24331 , Y10T428/24479 , Y10T428/24562 , Y10T428/2457 , Y10T428/24612
摘要： A beam having a base material of silicon monocrystal and at least one projection which is integrally formed so as to be supported at least at one end thereof and which has two surfaces having an orientation plane (111), includes a bottom surface in a plane which is common with a plane of the base material; a groove penetrating from the bottom surface to a top of the projection; and a protecting member having a resistance property against a crystal anisotropic etching liquid and covering an inner wall of the groove.
摘要翻译：一种具有单晶硅基材和至少一个突起的光束，其一体地形成为至少在其一端被支撑并且具有两个具有取向平面（111）的表面，该平面包括在平面中的底表面与基材的平面相同; 从所述底表面到所述突起的顶部穿透的凹槽; 以及对结晶各向异性蚀刻液具有抵抗性并覆盖所述槽的内壁的保护构件。

2. 发明授权

US07998555B2 Beam, ink jet recording head having beams, and method for manufacturing ink jet recording head having beams 有权
标题翻译：光束，具有光束的喷墨记录头，以及具有光束的喷墨记录头的制造方法
公开(公告)号：US07998555B2
公开(公告)日：2011-08-16
申请号：US12904539
申请日：2010-10-14
申请人： Takashi Ushijima , Takeo Yamazaki , Makoto Terui , Kazuhiro Hayakawa
发明人： Takashi Ushijima , Takeo Yamazaki , Makoto Terui , Kazuhiro Hayakawa
IPC分类号： B32B3/00 , B41J2/05
CPC分类号： B41J2/1603 , B41J2/14145 , B41J2/1623 , B41J2/1628 , B41J2/1629 , B41J2/1631 , B41J2/1632 , B41J2/1634 , B41J2/1642 , B41J2/1643 , B41J2/1646 , Y10T428/24331 , Y10T428/24479 , Y10T428/24562 , Y10T428/2457 , Y10T428/24612
摘要： A beam having a base material of silicon monocrystal and at least one projection which is integrally formed so as to be supported at least at one end thereof and which has two surfaces having an orientation plane (111), includes a bottom surface in a plane which is common with a plane of the base material; a groove penetrating from the bottom surface to a top of the projection; and a protecting member having a resistance property against a crystal anisotropic etching liquid and covering an inner wall of the groove.
摘要翻译：一种具有单晶硅基材和至少一个突起的光束，其一体地形成为至少在其一端被支撑并且具有两个具有取向平面（111）的表面，该平面包括在平面中的底表面与基材的平面相同; 从所述底表面到所述突起的顶部穿透的凹槽; 以及对结晶各向异性蚀刻液具有抵抗性并覆盖所述槽的内壁的保护构件。

3. 发明申请

US20080032073A1 BEAM, INK JET RECORDING HEAD HAVING BEAMS, AND METHOD FOR MANUFACTURING INK JET RECORDING HEAD HAVING BEAMS 有权
标题翻译：光束，喷墨记录头，以及用于制造喷墨记录头的方法
公开(公告)号：US20080032073A1
公开(公告)日：2008-02-07
申请号：US11835746
申请日：2007-08-08
申请人： TAKASHI USHIJIMA , Takeo Yamazaki , Makoto Terui , Kazuhiro Hayakawa
发明人： TAKASHI USHIJIMA , Takeo Yamazaki , Makoto Terui , Kazuhiro Hayakawa
IPC分类号： B41M5/00
CPC分类号： B41J2/1603 , B41J2/14145 , B41J2/1623 , B41J2/1628 , B41J2/1629 , B41J2/1631 , B41J2/1632 , B41J2/1634 , B41J2/1642 , B41J2/1643 , B41J2/1646 , Y10T428/24331 , Y10T428/24479 , Y10T428/24562 , Y10T428/2457 , Y10T428/24612
摘要： A beam having a base material of silicon monocrystal and at least one projection which is integrally formed so as to be supported at least at one end thereof and which has two surfaces having an orientation plane (111), includes a bottom surface in a plane which is common with a plane of the base material; a groove penetrating from the bottom surface to a top of the projection; and a protecting member having a resistance property against a crystal anisotropic etching liquid and covering an inner wall of the groove.
摘要翻译：一种具有单晶硅基材和至少一个突起的光束，其一体地形成为至少在其一端被支撑并且具有两个具有取向平面（111）的表面，该平面包括在平面中的底表面与基材的平面相同; 从所述底表面到所述突起的顶部穿透的凹槽; 以及对结晶各向异性蚀刻液具有抵抗性并覆盖所述槽的内壁的保护构件。

4. 发明申请

US20050140737A1 Beam, ink jet recording head having beams, and method for manufacturing ink jet recording head having beams 有权
标题翻译：光束，具有光束的喷墨记录头，以及具有光束的喷墨记录头的制造方法
公开(公告)号：US20050140737A1
公开(公告)日：2005-06-30
申请号：US11008101
申请日：2004-12-10
申请人： Takashi Ushijima , Takeo Yamazaki , Makoto Terui , Kazuhiro Hayakawa
发明人： Takashi Ushijima , Takeo Yamazaki , Makoto Terui , Kazuhiro Hayakawa
IPC分类号： B41J2/05 , B41J2/14 , B41J2/16 , B81B1/00
CPC分类号： B41J2/1603 , B41J2/14145 , B41J2/1623 , B41J2/1628 , B41J2/1629 , B41J2/1631 , B41J2/1632 , B41J2/1634 , B41J2/1642 , B41J2/1643 , B41J2/1646 , Y10T428/24331 , Y10T428/24479 , Y10T428/24562 , Y10T428/2457 , Y10T428/24612
摘要： A beam having a base material of silicon monocrystal and at least one projection which is integrally formed so as to be supported at least at one end thereof and which has two surfaces having an orientation plane (111), includes a bottom surface in a plane which is common with a plane of the base material; a groove penetrating from the bottom surface to a top of the projection; and a protecting member having a resistance property against a crystal anisotropic etching liquid and covering an inner wall of the groove.
摘要翻译：一种具有单晶硅基材和至少一个突起的光束，其一体地形成为至少在其一端被支撑并且具有两个具有取向平面（111）的表面，该平面包括在平面中的底表面与基材的平面相同; 从所述底表面到所述突起的顶部穿透的凹槽; 以及对结晶各向异性蚀刻液具有抵抗性并覆盖所述槽的内壁的保护构件。

5. 发明申请

US20110027530A1 BEAM, INK JET RECORDING HEAD HAVING BEAMS, AND METHOD FOR MANUFACTURING INK JET RECORDING HEAD HAVING BEAMS 有权
标题翻译：光束，喷墨记录头，以及用于制造喷墨记录头的方法
公开(公告)号：US20110027530A1
公开(公告)日：2011-02-03
申请号：US12904539
申请日：2010-10-14
申请人： Takashi Ushijima , Takeo Yamazaki , Makoto Terui , Kazuhiro Hayakawa
发明人： Takashi Ushijima , Takeo Yamazaki , Makoto Terui , Kazuhiro Hayakawa
IPC分类号： B32B3/10
CPC分类号： B41J2/1603 , B41J2/14145 , B41J2/1623 , B41J2/1628 , B41J2/1629 , B41J2/1631 , B41J2/1632 , B41J2/1634 , B41J2/1642 , B41J2/1643 , B41J2/1646 , Y10T428/24331 , Y10T428/24479 , Y10T428/24562 , Y10T428/2457 , Y10T428/24612
摘要： A beam having a base material of silicon monocrystal and at least one projection which is integrally formed so as to be supported at least at one end thereof and which has two surfaces having an orientation plane (111), includes a bottom surface in a plane which is common with a plane of the base material; a groove penetrating from the bottom surface to a top of the projection; and a protecting member having a resistance property against a crystal anisotropic etching liquid and covering an inner wall of the groove.
摘要翻译：一种具有单晶硅基材和至少一个突起的光束，其一体地形成为至少在其一端被支撑并且具有两个具有取向平面（111）的表面，该平面包括在平面中的底表面与基材的平面相同; 从所述底表面到所述突起的顶部穿透的凹槽; 以及对结晶各向异性蚀刻液具有抵抗性并覆盖所述槽的内壁的保护构件。

6. 发明授权

US07275813B2 Beam, ink jet recording head having beams, and method for manufacturing ink jet recording head having beams 有权
标题翻译：光束，具有光束的喷墨记录头，以及具有光束的喷墨记录头的制造方法
公开(公告)号：US07275813B2
公开(公告)日：2007-10-02
申请号：US11008101
申请日：2004-12-10
申请人： Takashi Ushijima , Takeo Yamazaki , Makoto Terui , Kazuhiro Hayakawa
发明人： Takashi Ushijima , Takeo Yamazaki , Makoto Terui , Kazuhiro Hayakawa
IPC分类号： B41J2/05
CPC分类号： B41J2/1603 , B41J2/14145 , B41J2/1623 , B41J2/1628 , B41J2/1629 , B41J2/1631 , B41J2/1632 , B41J2/1634 , B41J2/1642 , B41J2/1643 , B41J2/1646 , Y10T428/24331 , Y10T428/24479 , Y10T428/24562 , Y10T428/2457 , Y10T428/24612
摘要： A beam having a base material of silicon monocrystal and at least one projection which is integrally formed so as to be supported at least at one end thereof and which has two surfaces having an orientation plane (111), includes a bottom surface in a plane which is common with a plane of the base material; a groove penetrating from the bottom surface to a top of the projection; and a protecting member having a resistance property against a crystal anisotropic etching liquid and covering an inner wall of the groove.
摘要翻译：一种具有单晶硅基材和至少一个突起的光束，其一体地形成为至少在其一端被支撑并且具有两个具有取向平面（111）的表面，该平面包括在平面中的底表面与基材的平面相同; 从所述底表面到所述突起的顶部穿透的凹槽; 以及对结晶各向异性蚀刻液具有抵抗性并覆盖所述槽的内壁的保护构件。

7. 发明授权

US07934810B2 Ink jet recording head including beams dividing supply ports 有权
标题翻译：喷墨记录头包括分配供应端口的光束
公开(公告)号：US07934810B2
公开(公告)日：2011-05-03
申请号：US12369259
申请日：2009-02-11
申请人： Kazuhiro Hayakawa , Makoto Terui
发明人： Kazuhiro Hayakawa , Makoto Terui
IPC分类号： B41J2/05
CPC分类号： B41J2/1631 , B41J2/14145 , B41J2/1603
摘要： An ink jet recording head has sufficient and uniform ink refill for all orifices and separate flow paths even though the substrate has high rigidity by dividing a supply port into a plurality of ports. The substrate of the ink jet recording head has a plurality of separate flow paths corresponding to discharge pressure generating elements, a common flow path communicating with the separate flow paths, an ink supply port communicating with the common flow path and supplying ink to the common flow path, and a plurality of beam portions dividing the ink supply port. A recess is formed on the common flow path, extending to the separate flow paths formed nearest to the beam portion.
摘要翻译：喷墨记录头对于所有孔和分离的流动路径具有足够且均匀的填充墨水，即使基板通过将供给口分成多个端口而具有高刚性。喷墨记录头的基板具有与排出压力产生元件相对应的多个单独的流路，与分开的流路连通的公共流路，与公共流路连通并将墨水供给到公共流路径和分割供墨口的多个光束部分。在公共流动路径上形成一个凹槽，延伸到最靠近梁部分形成的独立流动路径。

8. 发明申请

US20060191862A1 Ink jet recording head, manufacturing method therefor, and substrate for ink jet recording head manufacture 失效
公开(公告)号：US20060191862A1
公开(公告)日：2006-08-31
申请号：US11410104
申请日：2006-04-25
申请人： Kazuhiro Hayakawa , Makoto Terui
发明人： Kazuhiro Hayakawa , Makoto Terui
IPC分类号： B41J2/04 , B44C1/22 , C23F1/00 , G01D15/00
CPC分类号： B41J2/1631 , B41J2/1603 , B41J2/1628 , B41J2/1629 , B41J2/1632 , B41J2/1634 , B41J2/1639 , B41J2/1642
摘要： A base member for use in manufacturing an ink jet recording head, which includes a supply port, an ejection outlet, a liquid flow path for directing liquid supplied from the supply port to the ejection outlet, and an ejection pressure generating element, disposed in the liquid flow path, for ejecting the liquid. The supply port is formed as a through-opening in a substrate on which the ejection pressure generation element is provided. The base member includes a recessed portion formed on the side of the substrate provided with the ejection pressure generation. The recessed portion extends from an edge of the supply port to a neighborhood of the ejection pressure generation element. A protection layer is provided at least on a portion of the substrate surface constituting the recessed portion.

9. 发明申请

US20090212008A1 LIQUID EJECTION HEAD AND MANUFACTURING METHOD THEREOF 有权
标题翻译：液体喷射头及其制造方法
公开(公告)号：US20090212008A1
公开(公告)日：2009-08-27
申请号：US12393235
申请日：2009-02-26
申请人： Masaya Uyama , Makoto Terui , Kazuhiro Hayakawa
发明人： Masaya Uyama , Makoto Terui , Kazuhiro Hayakawa
IPC分类号： B44C1/22 , B05B7/00
CPC分类号： B41J2/14145 , B41J2/1603 , B41J2/1628 , B41J2/1629 , B41J2/1631 , B41J2/1632 , B41J2/1634 , B41J2/1635 , B41J2/1642 , B41J2/1646
摘要： A liquid ejection head includes a substrate, having a front surface and a back surface, provided on the front surface with an energy generating element for generating energy used for ejecting liquid; a supply port, provided so as to penetrate between the front surface and the back surface of the substrate, for supplying the liquid to the energy generating element; a first film provided on the front surface of the substrate; and a second film provided so as to coat a wall of the substrate defining the supply port. The first film and the second film surface-contact each other with respect to two directions substantially perpendicular to each other.
摘要翻译：液体喷射头包括具有前表面和后表面的基底，其在前表面上设置有用于产生用于喷射液体的能量的能量产生元件; 供应端口，设置成穿透基板的前表面和后表面之间，用于将液体供应到能量产生元件; 设置在所述基板的前表面上的第一膜; 以及第二膜，其设置成涂覆限定供给口的基板的壁。第一膜和第二膜相对于彼此大致垂直的两个方向表面接触。

10. 发明授权

US07323115B2 Substrate processing method and ink jet recording head substrate manufacturing method 失效
标题翻译：基板处理方法和喷墨记录头基板的制造方法
公开(公告)号：US07323115B2
公开(公告)日：2008-01-29
申请号：US10777108
申请日：2004-02-13
申请人： Kazuhiro Hayakawa , Makoto Terui
发明人： Kazuhiro Hayakawa , Makoto Terui
IPC分类号： G01D15/02
CPC分类号： B41J2/1603 , B41J2/14145 , B41J2/1629
摘要： A substrate (wafer) processing method for producing an ink jet recording head substrate in which the reverse surface thereof, that is, the surface having the larger of the two openings of the ink supply hole, is precisely covered by a protective film to the very edge of the hole, including: a step for forming a protective film on the substrate; a step for etching the surface of the protective film; a step for forming an etching resistant film on the etched surface of the protective film; a step for forming an ink supply hole pattern through the etchant-resistant film and protective film; a step for forming the ink supply hole through the substrate by etching; a step for removing a portion of the protective film left projecting into the ink supply hole while forming the ink supply hole; and a step for removing the etchant-resistant film.
摘要翻译：用于制造喷墨记录头基板的基板（晶片）处理方法，其中其反面，即具有供墨孔的两个开口中较大的表面的表面被正好被保护膜覆盖所述孔的边缘包括：在所述基板上形成保护膜的步骤; 蚀刻保护膜的表面的步骤; 在保护膜的蚀刻表面上形成耐蚀刻膜的步骤; 通过耐蚀刻膜和保护膜形成供墨孔图案的步骤; 通过蚀刻形成通过基板的供墨孔的步骤; 在形成供墨孔的同时除去留在供墨孔中的保护膜的一部分的步骤; 以及去除耐蚀刻膜的步骤。

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