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1. 发明授权

US08796905B2 Motor device, method of manufacturing motor device, and robot device 有权
标题翻译：电动机装置，电动机装置的制造方法以及机器人装置
公开(公告)号：US08796905B2
公开(公告)日：2014-08-05
申请号：US13064545
申请日：2011-03-30
申请人： Takashi Nagase , Masashi Okada , Akimitsu Ebihara
发明人： Takashi Nagase , Masashi Okada , Akimitsu Ebihara
IPC分类号： H02N2/12
CPC分类号： H02N2/101 , Y10T29/49009
摘要： A motor device includes a base portion; a transmission portion that is formed with the base portion as one member and is wound around at least a part of an outer periphery of a rotator; and a driving portion which is supported by the base portion, moves the transmission portion by a certain distance in a state in which a rotational force is transmitted between the rotator and the transmission portion, and returns the transmission portion to a predetermined position in a state in which the rotation force transmission state is released.
摘要翻译：电动机装置包括：基部; 传动部分，其形成有基部作为一个部件，并缠绕在旋转体的外周的至少一部分上; 以及由所述基部支撑的驱动部，在所述旋转体与所述传递部之间传递旋转力的状态下，使所述透射部移动一定距离，并且将所述透射部返回至所述状态下的规定位置旋转力传递状态被释放。

2. 发明授权

US08441171B2 Motor device, method of manufacturing motor device, and robot device 有权
标题翻译：电动机装置，电动机装置的制造方法以及机器人装置
公开(公告)号：US08441171B2
公开(公告)日：2013-05-14
申请号：US13064544
申请日：2011-03-30
申请人： Masashi Okada , Akimitsu Ebihara
发明人： Masashi Okada , Akimitsu Ebihara
IPC分类号： H02N2/00 , H01L41/09
CPC分类号： H02N2/105 , Y10T29/42
摘要： A motor device comprises a transmission substrate formed with a transmission portion that is wound around at least part of the outer periphery of a rotator; and a driving substrate that has a driving portion which moves the transmission portion by a certain distance in a state in which a rotational force is transmitted between the rotator and the transmission portion returns the transmission portion to a predetermined position in a state in which the rotation force transmission state is released, and is connected to the transmission substrate so that the driving force due to the driving portion acts on the transmission portion.
摘要翻译：电动机装置包括：传动基板，其形成有绕旋转体的外周的至少一部分缠绕的传动部; 以及驱动基板，其具有在旋转体和传递部之间传递旋转力的状态下将传动部分移动一定距离的驱动部，使传动部返回至旋转的状态下的规定位置力传递状态被释放，并且连接到传动基板，使得由驱动部分引起的驱动力作用在传动部分上。

3. 发明申请

US20110241485A1 Motor device, method of manufacturing motor device, and robot device 有权
标题翻译：电动机装置，电动机装置的制造方法以及机器人装置
公开(公告)号：US20110241485A1
公开(公告)日：2011-10-06
申请号：US13064545
申请日：2011-03-30
申请人： Takashi Nagase , Masashi Okada , Akimitsu Ebihara
发明人： Takashi Nagase , Masashi Okada , Akimitsu Ebihara
IPC分类号： H02N2/12 , H02K15/00
CPC分类号： H02N2/101 , Y10T29/49009
摘要： A motor device includes a base portion; a transmission portion that is formed with the base portion as one member and is wound around at least a part of an outer periphery of a rotator; and a driving portion which is supported by the base portion, moves the transmission portion by a certain distance in a state in which a rotational force is transmitted between the rotator and the transmission portion, and returns the transmission portion to a predetermined position in a state in which the rotation force transmission state is released.
摘要翻译：电动机装置包括：基部; 传动部分，其形成有基部作为一个部件，并缠绕在旋转体的外周的至少一部分上; 以及由所述基部支撑的驱动部，在所述旋转体与所述传递部之间传递旋转力的状态下，使所述透射部移动一定距离，并且将所述透射部返回至所述状态下的规定位置旋转力传递状态被释放。

4. 发明授权

US08767172B2 Projection optical device and exposure apparatus 有权
标题翻译：投影光学装置和曝光装置
公开(公告)号：US08767172B2
公开(公告)日：2014-07-01
申请号：US12926159
申请日：2010-10-28
申请人： Akimitsu Ebihara , Martin E. Lee , Bausan Yuan
发明人： Akimitsu Ebihara , Martin E. Lee , Bausan Yuan
IPC分类号： G03B27/42
CPC分类号： G03F7/709 , G03F7/70808 , G03F7/70833 , G03F7/70891
摘要： A projection optical device includes a projection optical system which projects an image of a pattern, a support member attached to the projection optical system, and a plurality of coupling members connected to the support member. The coupling members suspend and support the projection optical system through the support member from an upper direction of the support member. The projection optical device can include a frame to which one end of each of the coupling members is attached, such that the projection optical system hangs from the frame via the support member and the coupling members. A projection optical device also can include a liquid supply which supplies a temperature-controlled liquid to a side surface of a projection optical system utilizing gravity to cause the temperature-controlled liquid to flow along the side surface of the projection optical system.
摘要翻译：投影光学装置包括投影图案的投影光学系统，附接到投影光学系统的支撑构件和连接到支撑构件的多个联接构件。联接构件从支撑构件的上方通过支撑构件悬挂并支撑投影光学系统。投影光学装置可以包括框架，每个联接构件的一端被附接到框架，使得投影光学系统经由支撑构件和联接构件从框架悬挂。投影光学装置还可以包括液体供应源，其利用重力将温度控制的液体供应到投影光学系统的侧表面，以使温度控制的液体沿着投影光学系统的侧表面流动。

5. 发明授权

US08705001B2 Exposure apparatus, and device manufacturing method 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US08705001B2
公开(公告)日：2014-04-22
申请号：US12923717
申请日：2010-10-05
申请人： Akimitsu Ebihara
发明人： Akimitsu Ebihara
IPC分类号： G03B27/42 , G03B27/52 , G03F7/20
CPC分类号： G03F7/70333 , B82Y10/00 , G03F7/70225 , G03F7/70325 , G03F7/70341 , G03F7/70716 , G03F7/70725 , G03F7/70733 , G03F7/70758 , G03F7/70816 , Y10T29/49826
摘要： An immersion liquid is supplied to a space between a projection system and a substrate, and a patterned beam of radiation is projected through the liquid onto a target portion of the substrate using the projection system. A liquid retaining member is replaced with a table member that holds the substrate at an opposite position to the projection system while the liquid is maintained in contact with the projection system so as to transit from a first state to a second state, the first state in which the liquid is maintained between the projection system and the liquid retaining member, the second state in which the liquid is maintained between the projection system and the table member.
摘要翻译：将浸没液体供应到投影系统和基板之间的空间，并且使用投影系统将图案化的辐射束通过液体投射到基板的目标部分上。液体保持构件被替换为将基板保持在与投影系统相对的位置的台面构件，同时液体保持与投影系统接触以便从第一状态转移到第二状态，液体保持在投影系统和液体保持构件之间的液体保持在投影系统和台面构件之间的第二状态。

6. 发明授权

US08027027B2 Exposure apparatus, and device manufacturing method 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US08027027B2
公开(公告)日：2011-09-27
申请号：US11785716
申请日：2007-04-19
申请人： Akimitsu Ebihara
发明人： Akimitsu Ebihara
IPC分类号： G03B27/58 , G03B27/42
CPC分类号： G03F7/70333 , B82Y10/00 , G03F7/70225 , G03F7/70325 , G03F7/70341 , G03F7/70716 , G03F7/70725 , G03F7/70733 , G03F7/70758 , G03F7/70816 , Y10T29/49826
摘要： A lithographic projection apparatus includes a substrate table that holds a substrate, a projection system that projects a patterned beam of radiation onto the substrate, and a liquid confinement structure that confines a liquid in a space between the projection system and the substrate, the substrate, the substrate table, or both, to form a part of a boundary of the space. In addition, a closing plate forms a part of a boundary of the space in place of the substrate, the substrate table, or both, when moved without substantially disturbing the liquid, the liquid confinement structure, or both.
摘要翻译：光刻投影装置包括：保持基板的基板台，将图案化的辐射束投影到基板上的投影系统，以及将液体限制在投影系统和基板之间的空间中的液体限制结构，衬底台或两者，以形成空间的边界的一部分。此外，当基本上不干扰液体，液体限制结构或两者时，闭合板形成空间的边界的一部分来代替基板，基板台或两者。

7. 发明授权

US07812925B2 Exposure apparatus, and device manufacturing method 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US07812925B2
公开(公告)日：2010-10-12
申请号：US11339683
申请日：2006-01-26
申请人： Akimitsu Ebihara
发明人： Akimitsu Ebihara
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F7/70333 , B82Y10/00 , G03F7/70225 , G03F7/70325 , G03F7/70341 , G03F7/70716 , G03F7/70725 , G03F7/70733 , G03F7/70758 , G03F7/70816 , Y10T29/49826
摘要： A lithographic projection apparatus includes an illumination system that conditions a radiation beam, a support structure that holds a patterning device, the patterning device being capable of imparting the radiation beam with a pattern. a substrate table that holds a substrate, and a projection system that projects the patterned radiation beam onto a target portion of the substrate. In addition, a liquid supply system provides a liquid to a space between the projection system and the substrate, the liquid supply system having a member. A liquid seal device forms a liquid seal between the member and the substrate.
摘要翻译：光刻投影设备包括调节辐射束的照明系统，保持图案形成装置的支撑结构，图案形成装置能够赋予辐射束图案。保持衬底的衬底台，以及将图案化的辐射束投影到衬底的目标部分上的投影系统。此外，液体供应系统向投影系统和基板之间的空间提供液体，液体供应系统具有一个构件。液体密封装置在构件和衬底之间形成液体密封。

8. 发明申请

US20100164326A1 Motor device, apparatus and driving method for rotor 有权
标题翻译：电机装置，转子的驱动方法
公开(公告)号：US20100164326A1
公开(公告)日：2010-07-01
申请号：US12654546
申请日：2009-12-22
申请人： Akimitsu Ebihara
发明人： Akimitsu Ebihara
IPC分类号： H02N2/12 , H01L41/04
CPC分类号： H02N2/101 , H02N2/16
摘要： A motor device includes a rotor, a transmission member wound around at least a portion of an outer periphery of the rotor, a moving part connected to the transmission member to move the transmission member, and a control unit which makes the moving part perform the driving operation of moving the transmission member by a predetermined distance in a state where a torque transmission state is brought between the rotor and the transmission member, and the returning operation of returning the transmission member to a predetermined position in a state where the torque transmission state is released.
摘要翻译：电动机装置包括转子，绕转子的外周的至少一部分卷绕的传动部件，连接到传动部件以移动传动部件的移动部件，以及使运动部件进行驱动的控制部在转子和传动部件之间转矩传递状态的状态下使传动部件移动预定距离的动作，以及在转矩传递状态为释放

9. 发明申请

US20090190112A1 Exposure apparatus, and device manufacturing method 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US20090190112A1
公开(公告)日：2009-07-30
申请号：US12382807
申请日：2009-03-24
申请人： Akimitsu Ebihara
发明人： Akimitsu Ebihara
IPC分类号： G03B27/32
CPC分类号： G03F7/70333 , B82Y10/00 , G03F7/70225 , G03F7/70325 , G03F7/70341 , G03F7/70716 , G03F7/70725 , G03F7/70733 , G03F7/70758 , G03F7/70816 , Y10T29/49826
摘要： A lithographic projection apparatus includes an illumination system that conditions a radiation beam, a support structure that holds a patterning device, the patterning device being capable of imparting the radiation beam with a pattern. a substrate table that holds a substrate, and a projection system that projects the patterned radiation beam onto a target portion of the substrate. In addition, a liquid supply system provides a liquid to a space between the projection system and the substrate, the liquid supply system having a member. A liquid seal device forms a liquid seal between the member and the substrate.
摘要翻译：光刻投影设备包括调节辐射束的照明系统，保持图案形成装置的支撑结构，图案形成装置能够赋予辐射束图案。保持衬底的衬底台，以及将图案化的辐射束投影到衬底的目标部分上的投影系统。此外，液体供应系统向投影系统和基板之间的空间提供液体，液体供应系统具有一个构件。液体密封装置在构件和衬底之间形成液体密封。

10. 发明申请

US20070095739A1 Utility transfer apparatus, stage apparatus, exposure apparatus, and device manufacturing method 审中-公开
标题翻译：实用转移装置，舞台装置，曝光装置和装置制造方法
公开(公告)号：US20070095739A1
公开(公告)日：2007-05-03
申请号：US11584633
申请日：2006-10-23
申请人： Akimitsu Ebihara
发明人： Akimitsu Ebihara
IPC分类号： C02F1/48 , B24B51/00 , B01D35/06 , B24B49/00 , B03C1/02 , B03C1/30
CPC分类号： H01F3/00 , H01F17/06 , H01F27/24 , H01F29/10
摘要： A utility transfer apparatus includes: a magnetic member being secured to a first member; a first coil provided on the first member and wound on the magnetic member; and a second coil provided on a second member and wound on the magnetic member so that the second member is movable relative to the first member. The magnetic member forms a magnetic circuit that does not have an air gap.
摘要翻译：一种公用事业转移装置，包括：磁性部件固定于第一部件; 设置在第一构件上并缠绕在磁性构件上的第一线圈; 以及设置在第二构件上并缠绕在磁性构件上的第二线圈，使得第二构件相对于第一构件是可移动的。磁性部件形成不具有气隙的磁路。

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