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1. 发明授权

US5379785A Cleaning apparatus 失效
标题翻译：清洁装置
公开(公告)号：US5379785A
公开(公告)日：1995-01-10
申请号：US849455
申请日：1992-03-11
申请人： Masashi Ohmori , Satoru Kotoh , Shinji Nakajima
发明人： Masashi Ohmori , Satoru Kotoh , Shinji Nakajima
IPC分类号： H01L21/304 , H01L21/00 , H01L21/027 , B08B3/10
CPC分类号： H01L21/67057 , Y10S134/902
摘要： A cleaning apparatus and a cleaning method effectively clean the entire surface of a substrate to be cleaned by uniformly irradiating ultrasonic waves to the substrate. Ultrasonic waves generated by an ultrasonic oscillator provided on the side wall of an outer tank are transmitted through an ultrasonic wave transmission medium provided between the outer tank and an inner tank, for example, water, and are irradiated on a substrate to be cleaned, for example, a semiconductor wafer, in the inner tank through a cleaning chemical in the inner tank. By irradiating the ultrasonic waves from the side of the cleaning apparatus, a support base blocks the least amount of ultrasonic waves from reaching the substrate. This is effective to uniformly clean the substrate.
摘要翻译：清洁装置和清洁方法通过将超声波均匀地照射到基板上来有效地清洁待清洁的基板的整个表面。通过设置在外箱侧壁上的超声波振荡器产生的超声波通过设置在外箱和内箱例如水之间的超声波传输介质传送，并照射在待清洗的基板上，例如，半导体晶片，通过内罐中的清洁化学品在内罐中。通过从清洁装置侧照射超声波，支撑基座阻止最少量的超声波到达基板。这对于均匀地清洁基底是有效的。

2. 发明授权

US5551459A Semiconductor cleaning apparatus and wafer cassette 失效
标题翻译：半导体清洁装置和晶片盒
公开(公告)号：US5551459A
公开(公告)日：1996-09-03
申请号：US503235
申请日：1995-07-17
申请人： Masashi Ohmori , Hiroshi Tanaka , Akira Nishimoto , Hiroshi Sasai , Naohiko Fujino , Satoru Kotoh
发明人： Masashi Ohmori , Hiroshi Tanaka , Akira Nishimoto , Hiroshi Sasai , Naohiko Fujino , Satoru Kotoh
IPC分类号： B08B3/04 , B08B15/00 , B65G1/00 , B65G49/07 , H01L21/00 , H01L21/304 , H01L21/673 , H01L21/677
CPC分类号： H01L21/67028 , B08B15/00 , B08B3/04 , Y10S134/902
摘要： A semiconductor cleaning apparatus includes a cassette loader/unloader for moving a cassette; a product loader/unloader for loading a wafer into and unloading a wafer from a cassette; a cleaner for cleaning a wafer; a water cleaner for cleaning with water a wafer that has been cleaned in the cleaner; a dryer for drying the wafer that has been cleaned with water in the water cleaner; and a conveyance having a wafer grasping hand for directly holding a wafer unloaded from a cassette and sequentially conveying the wafer held by the wafer hand to the cleaner, the water cleaner, and the dryer.
摘要翻译：半导体清洁装置包括用于移动盒的盒式装载机/卸载机; 用于将晶片装载到盒中并从其中卸载晶片的产品装载器/卸载器; 用于清洁晶片的清洁剂; 用于清洁水的清洁器，用于在清洁器中清洁的晶片; 用于干燥已经用水清洗的水晶片的干燥器; 以及具有晶片抓握手的输送器，用于直接保持从盒子卸载的晶片，并且将由晶片手持有的晶片顺序地输送到清洁器，水清洁器和干燥器。

3. 发明授权

US5590672A Semiconductor cleaning apparatus and wafer cassette 失效
标题翻译：半导体清洁装置和晶片盒
公开(公告)号：US5590672A
公开(公告)日：1997-01-07
申请号：US502890
申请日：1995-07-17
申请人： Masashi Ohmori , Hiroshi Tanaka , Akira Nishimoto , Hiroshi Sasai , Naohiko Fujino , Satoru Kotoh
发明人： Masashi Ohmori , Hiroshi Tanaka , Akira Nishimoto , Hiroshi Sasai , Naohiko Fujino , Satoru Kotoh
IPC分类号： B08B3/04 , B08B15/00 , B65G1/00 , B65G49/07 , H01L21/00 , H01L21/304 , H01L21/673 , H01L21/677 , B08B11/02
CPC分类号： H01L21/67028 , B08B15/00 , B08B3/04 , Y10S134/902
摘要： A semiconductor cleaning apparatus includes a cassette loader/unloader for moving a cassette; a product loader/unloader for loading a wafer into and unloading a wafer from a cassette; a cleaner for cleaning a wafer; a water cleaner for cleaning with water a wafer that has been cleaned in the cleaner; a dryer for drying the wafer that has been cleaned with water in the water cleaner; and a conveyance having a wafer grasping hand for directly holding a wafer unloaded from a cassette and sequentially conveying the wafer held by the wafer hand to the cleaner, the water cleaner, and the dryer.
摘要翻译：半导体清洁装置包括用于移动盒的盒式装载机/卸载机; 用于将晶片装载到盒中并从其中卸载晶片的产品装载器/卸载器; 用于清洁晶片的清洁剂; 用于清洁水的清洁器，用于在清洁器中清洁的晶片; 用于干燥已经用水清洗的水晶片的干燥器; 以及具有晶片抓握手的输送器，用于直接保持从盒子卸载的晶片，并且将由晶片手持有的晶片顺序地输送到清洁器，水清洁器和干燥器。

4. 发明授权

US5568821A Semiconductor cleaning apparatus and wafer cassette 失效
公开(公告)号：US5568821A
公开(公告)日：1996-10-29
申请号：US502891
申请日：1995-07-17
申请人： Masashi Ohmori , Hiroshi Tanaka , Akira Nishimoto , Hiroshi Sasai , Naohiko Fujino , Satoru Kotoh
发明人： Masashi Ohmori , Hiroshi Tanaka , Akira Nishimoto , Hiroshi Sasai , Naohiko Fujino , Satoru Kotoh
IPC分类号： B08B3/04 , B08B15/00 , B65G1/00 , B65G49/07 , H01L21/00 , H01L21/304 , H01L21/673 , H01L21/677
CPC分类号： H01L21/67028 , B08B15/00 , B08B3/04 , Y10S134/902
摘要： A semiconductor cleaning apparatus includes a cassette loader/unloader for moving a cassette; a product loader/unloader for loading a wafer into and unloading a wafer from a cassette; a cleaner for cleaning a wafer; a water cleaner for cleaning with water a wafer that has been cleaned in the cleaner; a dryer for drying the wafer that has been cleaned with water in the water cleaner; and a conveyance having a wafer grasping hand for directly holding a wafer unloaded from a cassette and sequentially conveying the wafer held by the wafer hand to the cleaner, the water cleaner, and the dryer.

5. 发明授权

US5445171A Semiconductor cleaning apparatus and wafer cassette 失效
标题翻译：半导体清洁装置和晶片盒
公开(公告)号：US5445171A
公开(公告)日：1995-08-29
申请号：US123244
申请日：1993-09-20
申请人： Masashi Ohmori , Hiroshi Tanaka , Akira Nishimoto , Hiroshi Sasai , Naohiko Fujino , Satoru Kotoh
发明人： Masashi Ohmori , Hiroshi Tanaka , Akira Nishimoto , Hiroshi Sasai , Naohiko Fujino , Satoru Kotoh
IPC分类号： B08B3/04 , B08B15/00 , B65G1/00 , B65G49/07 , H01L21/00 , H01L21/304 , H01L21/673 , H01L21/677
CPC分类号： H01L21/67028 , B08B15/00 , B08B3/04 , Y10S134/902
摘要： A semiconductor cleaning apparatus having: a loader/unloader portion for injecting/ejecting a product cassette which accommodates a wafer; a product injecting/ejecting portion for injecting/ejecting the wafer from the product cassette; a cleaning portion for cleaning the wafer; a water cleaning portion for, with water, cleaning the wafer which has been cleaned in the cleaning portion; a drying portion for drying the wafer which has been cleaned with water in the water cleaning portion; and a conveyance portion having a wafer hand for directly holding the wafer ejected from the product cassette in the product injecting/ejecting portion and sequentially conveying the wafer held by the wafer hand to the cleaning portion, the water cleaning portion and the drying portion.
摘要翻译：一种半导体清洁装置，其具有：装载/卸载部，用于喷射/喷射容纳晶片的产品盒; 用于从产品盒中注入/排出晶片的产品注入/喷射部分; 用于清洁晶片的清洁部分; 水清洗部分，用于与水清洁在清洁部分中已被清洁的晶片; 用于干燥已经在水清洗部分中用水清洗的晶片的干燥部分; 以及输送部，其具有用于将从产品盒喷出的晶片直接保持在产品注入/喷射部分中并顺序地将由晶片手保持的晶片传送到清洁部分，水清洁部分和干燥部分的晶片手。

6. 发明授权

US5833532A Air-direction adjusting apparatus for air-conditioning equipment 失效
标题翻译：空调设备空气调节装置
公开(公告)号：US5833532A
公开(公告)日：1998-11-10
申请号：US852453
申请日：1997-05-07
申请人： Satoru Kotoh , Kiyoshi Sakuma , Takayuki Yoshida , Hiromi Sano , Katuyuki Aoki , Shin'ichi Suzuki , Hideaki Koizumi , Kaoru Yamamoto , Kunio Matsushita , Kenichi Unno , Tomoko Oguma
发明人： Satoru Kotoh , Kiyoshi Sakuma , Takayuki Yoshida , Hiromi Sano , Katuyuki Aoki , Shin'ichi Suzuki , Hideaki Koizumi , Kaoru Yamamoto , Kunio Matsushita , Kenichi Unno , Tomoko Oguma
IPC分类号： F16K1/16 , F24F1/00 , F24F13/075 , F24F13/15
CPC分类号： F24F13/075 , F16K1/165 , F24F1/00
摘要： In an apparatus in which a blow-out nozzle is provided at a lower end of an air course formed in the inside of a body of the air-conditioning equipment and blown air passed through the air course is blown out of a blow-outlet while guided in the left/right direction by a plurality of parallel guide vanes pivotally held by the blow-out nozzle, wherein each vane has a C-shaped annular pivotal bearing and a sleeve fitted into the bearing, a shaft extending from an inner wall of the nozzle being inserted into the sleeve, the shaft having claws which project from the upper end portion of the shaft so as to retain the sleeve.
摘要翻译：在形成在空气调节装置的主体内部的空气流路的下端设有吹出喷嘴的装置中，通过空气流路的吹入空气从吹出口吹出，通过由吹出喷嘴枢转地保持的多个平行导向叶片在左/右方向上引导，其中每个叶片具有C形环形枢转轴承和装配到轴承中的套筒，轴从内壁延伸所述喷嘴插入到所述套筒中，所述轴具有从所述轴的上端部突出的爪，以保持所述套筒。

7. 发明授权

US5771708A Blowoff orifice 失效
公开(公告)号：US5771708A
公开(公告)日：1998-06-30
申请号：US867255
申请日：1997-06-02
申请人： Tomoko Suzuki , Takayuki Yoshida , Satoru Kotoh , Hiroaki Ishikawa , Kazunobu Jojima , Itsutarou Akiyama , Akihiro Matsushita , Masataka Kabuki
发明人： Tomoko Suzuki , Takayuki Yoshida , Satoru Kotoh , Hiroaki Ishikawa , Kazunobu Jojima , Itsutarou Akiyama , Akihiro Matsushita , Masataka Kabuki
IPC分类号： F24F13/14 , F24F1/00 , F24F13/06 , F24F13/075 , F24F13/15 , F25D21/14
CPC分类号： F24F13/06 , F24F1/0011 , F24F13/075 , F24F2001/0037 , F24F2001/0048
摘要： A blowoff orifice is constituted by an upper wall, a lower wall and a vertical wind deflecting plate. The upper wall inclines so that a flow passage becomes narrow toward downstream and provided with a protrusion at its end portion. The lower wall has a horizontal linear portion on the downstream side and an end portion forming an acute angle at the tip of the linear portion. The vertical wind deflecting plate is provided between the upper wall and the lower wall, and capable of changing an airflow from a horizontal direction to a downward direction. The upper wall protrusion is located more downstream than the lower wall end portion.

8. 发明授权

US5740463A Information processing system and method of computation performed with an information processing system 失效
标题翻译：用信息处理系统执行的信息处理系统和计算方法
公开(公告)号：US5740463A
公开(公告)日：1998-04-14
申请号：US504583
申请日：1995-07-20
申请人： Takeharu Oshima , Toshiyuki Tamura , Satoru Kotoh , Hirono Tsubota , Shinji Komori , Shinji Nakashima , Hiroaki Terada , Makoto Iwata , Katsuhito Yamaguchi , Junji Onishi , Akira Kondo
发明人： Takeharu Oshima , Toshiyuki Tamura , Satoru Kotoh , Hirono Tsubota , Shinji Komori , Shinji Nakashima , Hiroaki Terada , Makoto Iwata , Katsuhito Yamaguchi , Junji Onishi , Akira Kondo
IPC分类号： G06F15/173 , G06F15/80 , G06F15/82 , G06F17/13 , G06F13/38 , G06F15/16
CPC分类号： G06F15/803 , G06F17/13
摘要： Intercommunication of data between adjacent element processors (3) is performed through a memory unit (6) which is independently accessible to the respective element processors (3) without interfere with the operations of the other element processors (3). Thus, memory access and data transfer can be achieved without interfere with the operations of individual element processor (3). Furthermore, it becomes possible to solve differential equations by asynchronous communication system.
摘要翻译：相邻元件处理器（3）之间的数据互通是通过对各个元件处理器（3）可独立访问的存储器单元执行的，而不干扰其它元件处理器（3）的操作。因此，可以在不干扰单个元件处理器（3）的操作的情况下实现存储器访问和数据传送。此外，可以通过异步通信系统求解微分方程。

9. 发明授权

US06234015B1 Flow rate measuring device 有权
标题翻译：流量测量装置
公开(公告)号：US06234015B1
公开(公告)日：2001-05-22
申请号：US09285037
申请日：1999-04-01
申请人： Shingo Hamada , Tomoya Yamakawa , Fumiyoshi Yonezawa , Hiroyuki Uramachi , Takeharu Oshima , Satoru Kotoh
发明人： Shingo Hamada , Tomoya Yamakawa , Fumiyoshi Yonezawa , Hiroyuki Uramachi , Takeharu Oshima , Satoru Kotoh
IPC分类号： G01F168
CPC分类号： G01F1/69 , G01F1/684 , G01F1/72 , G01F5/00
摘要： A flow rate measuring device includes a flow rate measuring duct for placement in a primary passage for a fluid, extending substantially parallel to the primary passage, and a flow rate detector in the flow rate measuring duct for measuring a flow rate of the fluid in the primary passage, the flow rate measuring duct having a downstream wall including a notch or a through hole. The downstream wall may include an air-permeable member. The flow rate measuring device may include a projection on an outer wall of the flow rate measuring duct upstream of the notch, through hole, or air-permeable member, the projection extending in a circumferential direction with respect to the flow rate measuring duct.
摘要翻译：流量测量装置包括用于放置在基本平行于主通道的流体的主通道中的流量测量管道和流量测量管道中的流量检测器，用于测量流体的流速初级通道，流量测量管道具有包括缺口或通孔的下游壁。下游壁可以包括透气构件。流量测量装置可以包括在凹口，通孔或透气构件的上游的流量测量管道的外壁上的突起，该突起在相对于流量测量导管的圆周方向上延伸。

10. 发明授权

US06189380B1 Flow rate sensor 有权
标题翻译：流量传感器
公开(公告)号：US06189380B1
公开(公告)日：2001-02-20
申请号：US09154983
申请日：1998-09-17
申请人： Tomoya Yamakawa , Shingo Hamada , Fumiyoshi Yonezawa , Takeharu Oshima , Satoru Kotoh , Hiroyuki Uramachi
发明人： Tomoya Yamakawa , Shingo Hamada , Fumiyoshi Yonezawa , Takeharu Oshima , Satoru Kotoh , Hiroyuki Uramachi
IPC分类号： G01F168
CPC分类号： G01F1/6842
摘要： A flow rate sensor comprises a fluid passage for a fluid to flow therealong; a main body structure arranged so as to turn its front end to the upstream side of the fluid and coaxially positioned within the fluid passage; and a detecting element disposed between the main body structure and the internal surface of the fluid passage. The main body structure is formed such that its cross section perpendicular to its central axis, at first becomes gradually larger from its front end towards its rear end and then becomes gradually smaller. The detecting element includes a ceramic substrate coated with a film made of a thermo-sensitive electrically resistant material. The film is formed into a meander pattern so as to form a flow rate detecting resistance. The detecting element further includes a fluid temperature compensating resistance.
摘要翻译：流量传感器包括用于流体流过其的流体通道; 主体结构，其布置成将其前端转动到流体的上游侧并同轴地定位在流体通道内; 以及设置在主体结构和流体通道的内表面之间的检测元件。主体结构形成为使得其垂直于其中心轴线的截面首先从其前端朝向后端逐渐变大，然后逐渐变小。检测元件包括涂覆有由热敏电阻材料制成的膜的陶瓷基板。该膜形成为曲折图案，以形成流量检测电阻。检测元件还包括流体温度补偿电阻。

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