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1. 发明授权

US5551459A Semiconductor cleaning apparatus and wafer cassette 失效
标题翻译：半导体清洁装置和晶片盒
公开(公告)号：US5551459A
公开(公告)日：1996-09-03
申请号：US503235
申请日：1995-07-17
申请人： Masashi Ohmori , Hiroshi Tanaka , Akira Nishimoto , Hiroshi Sasai , Naohiko Fujino , Satoru Kotoh
发明人： Masashi Ohmori , Hiroshi Tanaka , Akira Nishimoto , Hiroshi Sasai , Naohiko Fujino , Satoru Kotoh
IPC分类号： B08B3/04 , B08B15/00 , B65G1/00 , B65G49/07 , H01L21/00 , H01L21/304 , H01L21/673 , H01L21/677
CPC分类号： H01L21/67028 , B08B15/00 , B08B3/04 , Y10S134/902
摘要： A semiconductor cleaning apparatus includes a cassette loader/unloader for moving a cassette; a product loader/unloader for loading a wafer into and unloading a wafer from a cassette; a cleaner for cleaning a wafer; a water cleaner for cleaning with water a wafer that has been cleaned in the cleaner; a dryer for drying the wafer that has been cleaned with water in the water cleaner; and a conveyance having a wafer grasping hand for directly holding a wafer unloaded from a cassette and sequentially conveying the wafer held by the wafer hand to the cleaner, the water cleaner, and the dryer.
摘要翻译：半导体清洁装置包括用于移动盒的盒式装载机/卸载机; 用于将晶片装载到盒中并从其中卸载晶片的产品装载器/卸载器; 用于清洁晶片的清洁剂; 用于清洁水的清洁器，用于在清洁器中清洁的晶片; 用于干燥已经用水清洗的水晶片的干燥器; 以及具有晶片抓握手的输送器，用于直接保持从盒子卸载的晶片，并且将由晶片手持有的晶片顺序地输送到清洁器，水清洁器和干燥器。

2. 发明授权

US5590672A Semiconductor cleaning apparatus and wafer cassette 失效
标题翻译：半导体清洁装置和晶片盒
公开(公告)号：US5590672A
公开(公告)日：1997-01-07
申请号：US502890
申请日：1995-07-17
申请人： Masashi Ohmori , Hiroshi Tanaka , Akira Nishimoto , Hiroshi Sasai , Naohiko Fujino , Satoru Kotoh
发明人： Masashi Ohmori , Hiroshi Tanaka , Akira Nishimoto , Hiroshi Sasai , Naohiko Fujino , Satoru Kotoh
IPC分类号： B08B3/04 , B08B15/00 , B65G1/00 , B65G49/07 , H01L21/00 , H01L21/304 , H01L21/673 , H01L21/677 , B08B11/02
CPC分类号： H01L21/67028 , B08B15/00 , B08B3/04 , Y10S134/902
摘要： A semiconductor cleaning apparatus includes a cassette loader/unloader for moving a cassette; a product loader/unloader for loading a wafer into and unloading a wafer from a cassette; a cleaner for cleaning a wafer; a water cleaner for cleaning with water a wafer that has been cleaned in the cleaner; a dryer for drying the wafer that has been cleaned with water in the water cleaner; and a conveyance having a wafer grasping hand for directly holding a wafer unloaded from a cassette and sequentially conveying the wafer held by the wafer hand to the cleaner, the water cleaner, and the dryer.
摘要翻译：半导体清洁装置包括用于移动盒的盒式装载机/卸载机; 用于将晶片装载到盒中并从其中卸载晶片的产品装载器/卸载器; 用于清洁晶片的清洁剂; 用于清洁水的清洁器，用于在清洁器中清洁的晶片; 用于干燥已经用水清洗的水晶片的干燥器; 以及具有晶片抓握手的输送器，用于直接保持从盒子卸载的晶片，并且将由晶片手持有的晶片顺序地输送到清洁器，水清洁器和干燥器。

3. 发明授权

US5568821A Semiconductor cleaning apparatus and wafer cassette 失效
公开(公告)号：US5568821A
公开(公告)日：1996-10-29
申请号：US502891
申请日：1995-07-17
申请人： Masashi Ohmori , Hiroshi Tanaka , Akira Nishimoto , Hiroshi Sasai , Naohiko Fujino , Satoru Kotoh
发明人： Masashi Ohmori , Hiroshi Tanaka , Akira Nishimoto , Hiroshi Sasai , Naohiko Fujino , Satoru Kotoh
IPC分类号： B08B3/04 , B08B15/00 , B65G1/00 , B65G49/07 , H01L21/00 , H01L21/304 , H01L21/673 , H01L21/677
CPC分类号： H01L21/67028 , B08B15/00 , B08B3/04 , Y10S134/902
摘要： A semiconductor cleaning apparatus includes a cassette loader/unloader for moving a cassette; a product loader/unloader for loading a wafer into and unloading a wafer from a cassette; a cleaner for cleaning a wafer; a water cleaner for cleaning with water a wafer that has been cleaned in the cleaner; a dryer for drying the wafer that has been cleaned with water in the water cleaner; and a conveyance having a wafer grasping hand for directly holding a wafer unloaded from a cassette and sequentially conveying the wafer held by the wafer hand to the cleaner, the water cleaner, and the dryer.

4. 发明授权

US5445171A Semiconductor cleaning apparatus and wafer cassette 失效
标题翻译：半导体清洁装置和晶片盒
公开(公告)号：US5445171A
公开(公告)日：1995-08-29
申请号：US123244
申请日：1993-09-20
申请人： Masashi Ohmori , Hiroshi Tanaka , Akira Nishimoto , Hiroshi Sasai , Naohiko Fujino , Satoru Kotoh
发明人： Masashi Ohmori , Hiroshi Tanaka , Akira Nishimoto , Hiroshi Sasai , Naohiko Fujino , Satoru Kotoh
IPC分类号： B08B3/04 , B08B15/00 , B65G1/00 , B65G49/07 , H01L21/00 , H01L21/304 , H01L21/673 , H01L21/677
CPC分类号： H01L21/67028 , B08B15/00 , B08B3/04 , Y10S134/902
摘要： A semiconductor cleaning apparatus having: a loader/unloader portion for injecting/ejecting a product cassette which accommodates a wafer; a product injecting/ejecting portion for injecting/ejecting the wafer from the product cassette; a cleaning portion for cleaning the wafer; a water cleaning portion for, with water, cleaning the wafer which has been cleaned in the cleaning portion; a drying portion for drying the wafer which has been cleaned with water in the water cleaning portion; and a conveyance portion having a wafer hand for directly holding the wafer ejected from the product cassette in the product injecting/ejecting portion and sequentially conveying the wafer held by the wafer hand to the cleaning portion, the water cleaning portion and the drying portion.
摘要翻译：一种半导体清洁装置，其具有：装载/卸载部，用于喷射/喷射容纳晶片的产品盒; 用于从产品盒中注入/排出晶片的产品注入/喷射部分; 用于清洁晶片的清洁部分; 水清洗部分，用于与水清洁在清洁部分中已被清洁的晶片; 用于干燥已经在水清洗部分中用水清洗的晶片的干燥部分; 以及输送部，其具有用于将从产品盒喷出的晶片直接保持在产品注入/喷射部分中并顺序地将由晶片手保持的晶片传送到清洁部分，水清洁部分和干燥部分的晶片手。

5. 发明授权

US5379785A Cleaning apparatus 失效
标题翻译：清洁装置
公开(公告)号：US5379785A
公开(公告)日：1995-01-10
申请号：US849455
申请日：1992-03-11
申请人： Masashi Ohmori , Satoru Kotoh , Shinji Nakajima
发明人： Masashi Ohmori , Satoru Kotoh , Shinji Nakajima
IPC分类号： H01L21/304 , H01L21/00 , H01L21/027 , B08B3/10
CPC分类号： H01L21/67057 , Y10S134/902
摘要： A cleaning apparatus and a cleaning method effectively clean the entire surface of a substrate to be cleaned by uniformly irradiating ultrasonic waves to the substrate. Ultrasonic waves generated by an ultrasonic oscillator provided on the side wall of an outer tank are transmitted through an ultrasonic wave transmission medium provided between the outer tank and an inner tank, for example, water, and are irradiated on a substrate to be cleaned, for example, a semiconductor wafer, in the inner tank through a cleaning chemical in the inner tank. By irradiating the ultrasonic waves from the side of the cleaning apparatus, a support base blocks the least amount of ultrasonic waves from reaching the substrate. This is effective to uniformly clean the substrate.
摘要翻译：清洁装置和清洁方法通过将超声波均匀地照射到基板上来有效地清洁待清洁的基板的整个表面。通过设置在外箱侧壁上的超声波振荡器产生的超声波通过设置在外箱和内箱例如水之间的超声波传输介质传送，并照射在待清洗的基板上，例如，半导体晶片，通过内罐中的清洁化学品在内罐中。通过从清洁装置侧照射超声波，支撑基座阻止最少量的超声波到达基板。这对于均匀地清洁基底是有效的。

6. 发明授权

US6124142A Method for analyzing minute foreign substance elements 失效
标题翻译：微量异物元素分析方法
公开(公告)号：US6124142A
公开(公告)日：2000-09-26
申请号：US600142
申请日：1996-02-12
申请人： Naohiko Fujino , Isamu Karino , Masashi Ohmori , Masatoshi Yasutake , Shigeru Wakiyama
发明人： Naohiko Fujino , Isamu Karino , Masashi Ohmori , Masatoshi Yasutake , Shigeru Wakiyama
IPC分类号： G01N21/88 , G01N15/00 , G01N21/93 , G01N21/94 , G01N21/95 , G01N21/956 , G01Q30/02 , G01Q30/20 , G01Q60/10 , G01Q60/24 , G01Q60/50 , H01L21/66
CPC分类号： H01L22/12 , G01N2021/8861 , G01N2021/9513 , G01N21/93 , G01N21/9501 , H01L2924/0002 , Y10S977/88 , Y10S977/901 , Y10S977/953
摘要： To provide a minute foreign matter analysis method and device wherein the observation, analysis and estimation of minute foreign matter is permitted by linking the device coordinate of a particle inspection device and those of other analysis devices with by far higher accuracy.A minute foreign matter analysis method comprising the steps of: determining the position of a minute foreign substance on the surface of a sample in a particle test unit; transferring said sample onto a coordinate stage of an analysis unit; inputting the position determined by said particle test unit for the minute foreign substance to the coordinate stage of the analysis unit; and analyzing the contents of the relevant minute foreign substance wherein at least one of the unit coordinate to be employed in said particle test unit and the unit coordinate to be employed in said analysis unit is previously corrected using a standard wafer which has a scale on the surface so that coordination systems of said particle test unit and said analysis unit can be linked each other.
摘要翻译：为了提供一种微小的异物分析方法和装置，其中通过以更高的精度将颗粒检查装置的装置坐标与其他分析装置的装置坐标联系起来，允许对微小异物的观察，分析和估计。一种微小异物分析方法，包括以下步骤：确定颗粒测试单元中样品表面上的微小异物的位置; 将所述样品转移到分析单元的坐标台上; 将由所述粒子测试单元确定的微小异物的位置输入到分析单元的坐标台; 并分析其中在所述粒子测试单元中使用的单位坐标中的至少一个和所述分析单元中使用的单位坐标中的至少一个使用标准晶片预先校正的相关微小异物的内容，使得所述粒子测试单元和所述分析单元的协调系统可以彼此连接。

7. 发明授权

US06255127B1 Analyzing method and apparatus for minute foreign substances, and manufacturing methods for manufacturing semiconductor device and liquid crystal display device using the same 有权
标题翻译：分析微小异物的方法和装置，以及使用其制造半导体器件的制造方法和液晶显示装置
公开(公告)号：US06255127B1
公开(公告)日：2001-07-03
申请号：US09187938
申请日：1998-11-06
申请人： Naohiko Fujino , Isamu Karino , Masashi Ohmori , Masatoshi Yasutake , Shigeru Wakiyama
发明人： Naohiko Fujino , Isamu Karino , Masashi Ohmori , Masatoshi Yasutake , Shigeru Wakiyama
IPC分类号： H01L3126
CPC分类号： G01N21/94 , G01N21/9501 , G01N21/9503 , H01L22/12 , H01L22/20 , H01L2223/54453 , H01L2924/0002 , H01L2924/00
摘要： To enable observation, analysis and evaluation of minute foreign substances by adopting a method for enabling performance of linkage between equipment coordinates of a particle examination equipment and apparatus coordinates of an analyzing apparatus such as SEM which is not a particle examination equipment with a precision higher than that with which coordinate linkage is performed between conventional equipment and apparatus coordinates. An analyzing method for analyzing minute foreign substances comprises the steps of determining the position of a minute foreign substance on the surface of a sample in a particle examination equipment, transferring the sample to a coordinate stage of an analyzing apparatus and inputting the position of the minute foreign substance determined by the particle examination equipment to thereby analyze the contents of this minute foreign substance. It is characterized by linking the equipment coordinates adopted by the particle examination equipment with the apparatus coordinates adopted by the analyzing apparatus by use of the same coordinate system based on the configurations of the sample.
摘要翻译：为了能够观察，分析和评估微小的异物，通过采用能够实现粒子检查设备的设备坐标与不是具有高于在常规设备和设备坐标之间进行哪个坐标连接。用于分析微小异物的分析方法包括以下步骤：在粒子检查设备中确定样品表面上的微小异物的位置，将样品转移到分析设备的坐标台并输入分钟的位置外来物质由颗粒检测设备确定，从而分析该微量异物的含量。其特征在于，基于样本的构造，通过使用相同的坐标系将粒子检查装置采用的设备坐标与分析装置采用的装置坐标相连接。

8. 发明授权

US5517027A Method for detecting and examining slightly irregular surface states, scanning probe microscope therefor, and method for fabricating a semiconductor device or a liquid crystal display device using these 失效
标题翻译：用于检查和检查稍微不规则表面状态的方法，扫描探针显微镜及其制造方法或使用这些的半导体器件的液晶显示装置
公开(公告)号：US5517027A
公开(公告)日：1996-05-14
申请号：US254771
申请日：1994-06-06
申请人： Yoshitsugu Nakagawa , Fusami Soeda , Naohiko Fujino , Isamu Karino , Osamu Wada , Hiroshi Kurokawa , Koichiro Hori , Nobuyoshi Hattori , Masahiro Sekine , Masashi Ohmori , Kazuo Kuramoto , Junji Kobayashi
发明人： Yoshitsugu Nakagawa , Fusami Soeda , Naohiko Fujino , Isamu Karino , Osamu Wada , Hiroshi Kurokawa , Koichiro Hori , Nobuyoshi Hattori , Masahiro Sekine , Masashi Ohmori , Kazuo Kuramoto , Junji Kobayashi
IPC分类号： G01B7/34 , G01N21/88 , G01N21/94 , G01N27/00 , G01Q10/00 , G01Q20/02 , G01Q30/04 , G01Q30/06 , G01Q60/10 , G01Q60/24 , H01J37/00
CPC分类号： G01Q20/02 , B82Y35/00 , G01N21/94 , G01Q30/06 , Y10S977/868
摘要： Method for detecting and examining a slightly irregular surface state is provided which includes the steps of: illuminating a surface of a sample with light beam for detecting the slightly irregular surface state; observing a variation of the light beam occurring due to the slightly irregular surface state to specify the location of the slightly irregular surface state in an x-y plane of the sample; making the location of a probe needle of a scanning probe microscope and the location of the slightly irregular surface state on the sample coincide with each other; and measuring a three-dimensional image of the slightly irregular surface state by means of the scanning probe microscope. The scanning probe microscope for use in the aforementioned method and a method for fabricating a semiconductor device or a liquid crystal display device which utilizes the aforementioned method are also provided.
摘要翻译：提供了用于检测和检查稍微不规则的表面状态的方法，其包括以下步骤：用光束照射样品的表面以检测稍微不规则的表面状态; 观察由于略微不规则的表面状态而发生的光束的变化，以指定样品的x-y平面中略微不规则的表面状态的位置; 使扫描探针显微镜的探针的位置和样品上稍微不规则的表面状态的位置相互重合; 并通过扫描探针显微镜测量稍微不规则表面状态的三维图像。还提供了用于上述方法的扫描探针显微镜以及利用上述方法制造半导体器件或液晶显示器件的方法。

9. 发明授权

US5877035A Analyzing method and apparatus for minute foreign substances, and manufacturing methods for manufacturing semiconductor device and liquid crystal display device using the same 失效
标题翻译：分析微小异物的方法和装置，以及使用其制造半导体器件的制造方法和液晶显示装置
公开(公告)号：US5877035A
公开(公告)日：1999-03-02
申请号：US600141
申请日：1996-02-12
申请人： Naohiko Fujino , Isamu Karino , Masashi Ohmori , Masatoshi Yasutake , Shigeru Wakiyama
发明人： Naohiko Fujino , Isamu Karino , Masashi Ohmori , Masatoshi Yasutake , Shigeru Wakiyama
IPC分类号： G01B11/30 , G01N15/00 , G01N21/88 , G01N21/94 , G01N21/95 , G01N21/956 , G01Q30/02 , G01Q60/10 , G01Q60/24 , G01Q60/50 , H01L21/66 , G01R31/26
CPC分类号： G01N21/94 , G01N21/9501 , H01L22/20 , G01N21/9503 , H01L22/12 , H01L2223/54453 , H01L2924/0002
摘要： To enable observation, analysis and evaluation of minute foreign substances by adopting a method for enabling performance of linkage between equipment coordinates of a particle examination equipment and apparatus coordinates of an analyzing apparatus such as SEM which is not a particle examination equipment with a precision higher than that with which coordinate linkage is performed between conventional equipment and apparatus coordinates. An analyzing method for analyzing minute foreign substances includes the steps of determining the position of a minute foreign substance on the surface of a sample in a particle examination equipment, transferring the sample to a coordinate stage of an analyzing apparatus and inputting the position of the minute foreign substance determined by the particle examination equipment to thereby analyze the contents of this minute foreign substance. It is characterized by linking the equipment coordinates adopted by the particle examination equipment with the apparatus coordinates adopted by the analyzing apparatus by use of the same coordinate system based on the configurations of the sample.
摘要翻译：为了能够观察，分析和评估微小的异物，通过采用能够实现粒子检查设备的设备坐标与不是具有高于在常规设备和设备坐标之间进行哪个坐标连接。用于分析微小异物的分析方法包括以下步骤：在颗粒检查设备中确定样品表面上的微小异物的位置，将样品转移到分析设备的坐标台并输入分钟的位置外来物质由颗粒检测设备确定，从而分析该微量异物的含量。其特征在于，基于样本的构造，通过使用相同的坐标系将粒子检查装置采用的设备坐标与分析装置采用的装置坐标相连接。

10. 发明授权

US5432601A Fine particle analyzing device 失效
标题翻译：细颗粒分析装置
公开(公告)号：US5432601A
公开(公告)日：1995-07-11
申请号：US167086
申请日：1993-12-16
申请人： Hiroshi Tanaka , Masashi Ohmori
发明人： Hiroshi Tanaka , Masashi Ohmori
IPC分类号： G01N15/02 , G01N15/10 , G01N15/14 , G01N21/71 , G01N1/10
CPC分类号： G01N15/0205 , G01N21/718
摘要： A device for analyzing fine particles in a sample gas includes a light source for emitting light, a convergent device for converting the light emitted by the light source into a convergent light beam having a light focus point and an energy density sufficient to dissociate the fine particles to be analyzed. The device also includes a transparent analyzer tube having a window for admitting the convergent light beam and a throat located at the light focus point of the convergent light beam, the analyzer tube receiving the sample gas and passing the sample gas through the throat. The device includes a light collecting device for collecting, through the analyzer tube, light emitted from dissociated fine particles, dissociated by the convergent light beam in the throat of the analyzer tube, and an analyzing device for analyzing the light from the dissociated fine particles collected by the collecting device.
摘要翻译：用于分析样品气体中的细颗粒的装置包括用于发射光的光源，用于将由光源发射的光转换成具有光聚焦点的会聚光束和足以使细颗粒解离的能量密度的会聚装置待分析。该装置还包括透明分析器管，其具有用于允许会聚光束的入口和位于会聚光束的光聚焦点处的喉部，分析器管接收样品气体并使样品气体通过喉部。该装置包括：收集装置，用于通过分析器管收集由分解管的喉部中的收敛光束解离的解离的微粒发射的光，以及分析装置，用于分析收集的解离的微粒的光由收集装置。

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