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    • 6. 发明授权
    • Support for lithographic printing plate and lithographic printing plate
    • 支持平版印刷版和平版印刷版
    • US4547274A
    • 1985-10-15
    • US500203
    • 1983-06-01
    • Azusa OhashiHirokazu SakakiHaruo NakanishiZenichi TanabeShin TsuchidaYoshikatsu Hayashi
    • Azusa OhashiHirokazu SakakiHaruo NakanishiZenichi TanabeShin TsuchidaYoshikatsu Hayashi
    • C23F1/14B41N1/08B41N3/00C22C21/00C25F3/04C25F3/00
    • B41N1/083C22C21/00
    • A lithographic printing plate support and a process for producing it are disclosed. The plate is produced by providing an aluminum alloy material which is comprised of 0.20 to 1.0% Fe, 0.005 to 0.1% of an element selected from the group consisting of Sn, In, Ga and Zn and the remainder being aluminum. The alloy may further contain 0.1 to 2% Cu. After providing the aluminum material either or both of its surfaces are subjected to a chemical etching treatment in order to provide a uniform and dense grain structure on the surface forming primary pits in the surface having a particularly defined average size. The surface is then subjected to electrochemical etching treatment in an acidic electrolytic solution in order to provide secondary pits on the surface also having a particularly defined average size. The support base may be further treated to provide in additional coating thereon or directly coated with a light-sensitive layer in order to provide a light-sensitive lithographic printing plate. By providing the particular alloy material and subjecting it to the disclosed treatment the light-sensitive layer has good adhesion with respect to the support.
    • 公开了平版印刷版支撑体及其制造方法。 通过提供由0.20〜1.0%的Fe,0.005〜0.1%的选自Sn,In,Ga和Zn的元素和余量为铝的铝合金材料制成。 该合金还可以含有0.1〜2%的Cu。 在提供铝材料之后,对其表面之一或两者进行化学蚀刻处理,以便在具有特别限定的平均尺寸的表面上形成初始凹坑的表面上提供均匀且致密的晶粒结构。 然后将表面在酸性电解液中进行电化学蚀刻处理,以便在具有特别限定的平均尺寸的表面上提供二次凹坑。 可以进一步处理支撑基底以在其上附加涂层或直接涂覆感光层,以便提供感光平版印刷版。 通过提供特定的合金材料并对其进行所公开的处理,感光层相对于载体具有良好的粘合性。