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    • 2. 发明授权
    • Support for lithographic printing plate and lithographic printing plate
    • 支持平版印刷版和平版印刷版
    • US4547274A
    • 1985-10-15
    • US500203
    • 1983-06-01
    • Azusa OhashiHirokazu SakakiHaruo NakanishiZenichi TanabeShin TsuchidaYoshikatsu Hayashi
    • Azusa OhashiHirokazu SakakiHaruo NakanishiZenichi TanabeShin TsuchidaYoshikatsu Hayashi
    • C23F1/14B41N1/08B41N3/00C22C21/00C25F3/04C25F3/00
    • B41N1/083C22C21/00
    • A lithographic printing plate support and a process for producing it are disclosed. The plate is produced by providing an aluminum alloy material which is comprised of 0.20 to 1.0% Fe, 0.005 to 0.1% of an element selected from the group consisting of Sn, In, Ga and Zn and the remainder being aluminum. The alloy may further contain 0.1 to 2% Cu. After providing the aluminum material either or both of its surfaces are subjected to a chemical etching treatment in order to provide a uniform and dense grain structure on the surface forming primary pits in the surface having a particularly defined average size. The surface is then subjected to electrochemical etching treatment in an acidic electrolytic solution in order to provide secondary pits on the surface also having a particularly defined average size. The support base may be further treated to provide in additional coating thereon or directly coated with a light-sensitive layer in order to provide a light-sensitive lithographic printing plate. By providing the particular alloy material and subjecting it to the disclosed treatment the light-sensitive layer has good adhesion with respect to the support.
    • 公开了平版印刷版支撑体及其制造方法。 通过提供由0.20〜1.0%的Fe,0.005〜0.1%的选自Sn,In,Ga和Zn的元素和余量为铝的铝合金材料制成。 该合金还可以含有0.1〜2%的Cu。 在提供铝材料之后,对其表面之一或两者进行化学蚀刻处理,以便在具有特别限定的平均尺寸的表面上形成初始凹坑的表面上提供均匀且致密的晶粒结构。 然后将表面在酸性电解液中进行电化学蚀刻处理,以便在具有特别限定的平均尺寸的表面上提供二次凹坑。 可以进一步处理支撑基底以在其上附加涂层或直接涂覆感光层,以便提供感光平版印刷版。 通过提供特定的合金材料并对其进行所公开的处理,感光层相对于载体具有良好的粘合性。
    • 9. 发明授权
    • Method for developing positive acting light-sensitive planographic
printing plate
    • 正性光敏平版印刷版的开发方法
    • US4259434A
    • 1981-03-31
    • US145105
    • 1980-04-30
    • Kotaro YamasueHiroshi TakahashiHirokazu SakakiAkira Nishioka
    • Kotaro YamasueHiroshi TakahashiHirokazu SakakiAkira Nishioka
    • G03F7/32G03F7/02
    • G03F7/322
    • A development method which comprises imagewise exposing a positive acting light-sensitive planographic printing plate comprising an aluminum support and a light-sensitive layer of an o-quinonediazide compound formed thereon, and then developing the exposed plate with a developer, comprising an aqueous solution of an alkali metal silicate, adding a supplementary solution comprising an aqueous solution of an alkali metal silicate to the developer to compensate for the degradation of the developer brought about by development and/or by carbon dioxide in the air; wherein the developer comprises an aqueous solution of an alkali metal salt having an [SiO.sub.2 ]/[M] ratio of from 0.5 to 0.75 and an SiO.sub.2 concentration of from 1 to 4% by weight based on the total weight of the developer, where [SiO.sub.2 ] represents the concentration of SiO.sub.2 per unit volume expressed as gram-molecules, and [M] represents the concentration of the alkali metal per unit volume expressed as gram-atoms, and the supplementary solution comprises an aqueous solution of an alkali metal silicate having an [SiO.sub.2 ]/[M] ratio of from 0.25 to 0.75.
    • 一种显影方法,其包括成像曝光包含铝载体和形成在其上的邻醌二叠氮化合物的感光层的正性光敏平版印刷版,然后用显影剂将曝光的板显影, 碱金属硅酸盐,将含有碱金属硅酸盐水溶液的补充溶液加入到显影剂中以补偿由显影产生的显影剂和/或二氧化碳在空气中的降解; 其中显影剂包含基于显影剂总重量的[SiO 2] / [M]比为0.5至0.75和SiO 2浓度为1至4重量%的碱金属盐的水溶液,其中[ SiO 2]表示以克分子表示的每单位体积的SiO 2浓度,[M]表示以克原子表示的每单位体积的碱金属的浓度,补充溶液包含碱金属硅酸盐的水溶液, 0.25〜0.75的[SiO 2] / [M]比。