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    • 5. 发明申请
    • Polishing Apparatus and Polishing Method
    • 抛光装置和抛光方法
    • US20090239446A1
    • 2009-09-24
    • US11884746
    • 2005-08-30
    • Akira FukudaYoshihiro MochizukiKazuto Hirokawa
    • Akira FukudaYoshihiro MochizukiKazuto Hirokawa
    • B24B49/00B24B1/00B24B49/08B24B49/16B24D11/00B24B37/04
    • B24B37/005
    • A polishing apparatus is provided for polishing wafers at a high yield rate even if roll-off exists. The polishing apparatus polishes a wafer W by applying a pressure between a polishing member (polishing pad) 201 and the wafer W held by a holding member (top ring) 52 and relatively moving the polishing member 201 to the wafer W. The polishing apparatus comprises a top ring 52 for holding the wafer W, a pressure adjusting mechanism 206 for adjusting a supporting pressure with which the wafer W is supported on a supporting surface by a retainer ring 203, and a control unit 208 for controlling the pressure adjusting mechanism 206 to bring the supporting pressure to a desired pressure based on a roll off quantity of the wafer W. The top ring 52 comprises an air bag 202 for pressing the wafer W against the polishing pad 201, a retainer ring 203 which surrounds the wafer W, and an air bag 204 for pressing the retainer ring 203.
    • 提供抛光装置用于以高屈服率抛光晶片,即使存在滚降。 抛光装置通过在抛光构件(抛光垫)201和由保持构件(顶环))52保持的晶片W之间施加压力并将抛光构件201相对移动到晶片W来对晶片W进行抛光。抛光装置包括 用于保持晶片W的顶环52,用于调节通过保持环203将晶片W支撑在支撑表面上的支撑压力的压力调节机构206以及用于将压力调节机构206控制到 基于晶片W的滚降量将支撑压力提高到期望的压力。顶环52包括用于将晶片W压靠在抛光垫201上的气囊202,围绕晶片W的保持环203和 用于按压保持环203的气囊204。
    • 6. 发明授权
    • Ink jet recording method
    • 喷墨记录方法
    • US06217166B1
    • 2001-04-17
    • US09104706
    • 1998-06-25
    • Yoichi SaitoMasaru TsuchiyaYoshihiro Mochizuki
    • Yoichi SaitoMasaru TsuchiyaYoshihiro Mochizuki
    • G01D1100
    • B41M5/52B41M5/506B41M5/508B41M5/5218B41M5/5254
    • An ink-jet recording method is disclosed, including recording on an ink-jet recording sheet containing a non-water-absorbing support and provided thereon an ink absorbing layer containing polyvinyl alcohol, fine inorganic particles and boric acid or its salt, using an ink-jet recording apparatus and a water-based recording liquid containing a high boiling solvent compound having a hydroxy group, wherein the amount of boric acid or its salt contained in the ink absorbing layer of the recording sheet (X), the amount of a hydroxy group contained in polyvinyl alcohol contained in the ink absorbing layer of the recording sheet (Y) and the maximum amount of the the hydroxy group contained in the high boiling solvent contained in a unit area when recorded on the recording sheet at a maximum ejecting amount of the water-based recording liquid (Z) satisfy the following requirements: 0.05≦X/Y≦0.5  (1) Z/Y≦4.  (2)
    • 公开了一种喷墨记录方法,包括在含有非吸水性载体的喷墨记录纸上记录,并在其上设置含有聚乙烯醇,无机微粒和硼酸或其盐的油墨吸收层,使用油墨 喷墨记录装置和含有具有羟基的高沸点溶剂化合物的水性记录液,其中记录片材(X)的油墨吸收层中所含的硼酸或其盐的含量,羟基 包含在记录片材(Y)的油墨吸收层中的聚乙烯醇中所含的羟基的最大量和记录在记录纸上的单位面积中包含的高沸点溶剂中的羟基的最大量, 水性记录液(Z)满足以下要求: