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1. 发明申请

US20070083012A1 Curable polymer compound 审中-公开
标题翻译：可固化高分子化合物
公开(公告)号：US20070083012A1
公开(公告)日：2007-04-12
申请号：US10579066
申请日：2004-11-01
申请人： Masanao Kamijo , Mina Onishi , Katsumi Murofushi
发明人： Masanao Kamijo , Mina Onishi , Katsumi Murofushi
IPC分类号： C08F20/32
CPC分类号： C08F220/32 , C08F8/00 , C08F8/14 , C08F222/1006 , C08F290/12 , C08F290/126 , C08F2800/10 , C08F2800/20 , C08F2810/30 , G03F7/0007 , G03F7/0388 , C08F220/06 , C08F212/00
摘要： There are provided a novel curable polymer compound of the present invention comprises having a structure represented by the following Formula (I): CH2═C(R1)COO(R2O)nCH2CH(OH)CH2OOC— Formula (I) wherein R1 represents a hydrogen atom or a methyl group, R2 independently has one or more organic residues selected from the group consisting of an alkylene group, a branched alkylene group, an alkenylene group, a branched alkenylene group, a cycloalkylene group, a cycloalkenylene group and an arylene group, and n represents an integer of 0 to 1, a method of preparing the polymer compound, a radical polymerizable and curable composition using the polymer compound, and a cured product obtained by photo-curing the radical polymerizable and curable composition.
摘要翻译：提供了本发明的新颖的可固化聚合物化合物，其包含具有由下式（I）表示的结构：<？in-line-formula description =“In-line formula”end =“lead”？> CH

2. 发明申请

US20050258406A1 Black resist composition for color filter 审中-公开
标题翻译：用于滤色片的黑色抗蚀剂组合物
公开(公告)号：US20050258406A1
公开(公告)日：2005-11-24
申请号：US11128167
申请日：2005-05-13
申请人： Mina Onishi , Masanao Kamijo , Katsumi Murofushi
发明人： Mina Onishi , Masanao Kamijo , Katsumi Murofushi
IPC分类号： C09D11/02 , F21V9/00 , G02B5/20 , G02F1/1335 , G03F7/00 , G03F7/004 , G03F7/027
CPC分类号： G03F7/0043 , C08L33/10 , C09D11/037 , C09J133/14 , G02F1/133512 , G03F7/0007 , G03F7/0047
摘要： The present invention relates to a black resist composition for color filter which contains titanium black (A) with an average primary particle size of 100 nm, carbon black (B) with an average primary particle size of 60 nm or less, an acrylic copolymer dispersant (C) with an amino group and/or a quaternary ammonium salt, an organic solvent (D) and a binder resin (E) with a carboxyl group and an ethylenic unsaturated group, where the ratio in mass between the titanium black (A) and the titanium black (B) is 100:5 to 1000. According to the black resist composition for color filter of the present invention, patterns can readily be formed by photolithography, and the composition has high light resistance and high insulation property, and can be made into a thin film to attain sufficient sensitivity and resolution property.
摘要翻译：本发明涉及一种含有平均一次粒径为100nm的钛黑（A），平均一次粒径为60nm以下的炭黑（B），丙烯酸共聚物分散剂（C）与氨基和/或季铵盐，有机溶剂（D）和具有羧基和烯属不饱和基团的粘合剂树脂（E），其中钛黑（A）钛黑（B）为100:5〜1000。根据本发明的滤色器用黑色抗蚀剂组合物，可以通过光刻法容易地形成图案，该组合物具有高耐光性和高绝缘性，并且可以制成薄膜以获得足够的灵敏度和分辨率。

3. 发明申请

US20060041053A1 Color filter black matrix resist composition and carbon black dispersion composition used for the composition 审中-公开
标题翻译：用于组合物的滤色器黑色矩阵抗蚀剂组合物和炭黑分散体组合物
公开(公告)号：US20060041053A1
公开(公告)日：2006-02-23
申请号：US10539283
申请日：2003-12-17
申请人： Hirotoshi Kamata , Masanao Kamijo , Mina Onishi
发明人： Hirotoshi Kamata , Masanao Kamijo , Mina Onishi
IPC分类号： C08L31/00
CPC分类号： G03F7/0007 , G02F1/133512
摘要： The present invention provides a carbon black dispersion composition for a color filter black matrix resist composition, containing (A) a carbon black having specified physical properties (average primary particle diameter, concentration of surface carboxyl groups), (B) a copolymer having an amino group and/or its quaternary ammonium salt, and (C) an organic solvent, and a color filter black matrix resist composition that contains the above-mentioned dispersion composition, (D) a binder resin having a carboxyl group, (E) an ethylenically unsaturated monomer, (F) a photopolymerization initiator, and (G) specified multifunctional thiol compound and can easily form a thin film or pattern having high light-shielding property by photolithographic method pattern, has excellent storage stability, and exhibits sufficient sensitivity and resolution.
摘要翻译：本发明提供一种用于滤色器黑矩阵抗蚀剂组合物的炭黑分散组合物，其含有（A）具有特定物理性质（平均一次粒径，表面羧基浓度）的炭黑，（B）具有氨基基团和/或其季铵盐，和（C）有机溶剂，以及含有上述分散组合物的滤色器黑矩阵抗蚀剂组合物，（D）具有羧基的粘合剂树脂，（E）烯属不饱和单体，（F）光聚合引发剂和（G）指定的多官能硫醇化合物，并且可以通过光刻方法图案容易地形成具有高遮光性的薄膜或图案，具有优异的储存稳定性，并且显示出足够的灵敏度和分辨率。

4. 发明申请

US20060036023A1 Color filter black matrix resist composition 审中-公开
标题翻译：滤色片黑矩阵抗蚀剂组成
公开(公告)号：US20060036023A1
公开(公告)日：2006-02-16
申请号：US10539037
申请日：2003-12-15
申请人： Hirotoshi Kamata , Masanao Kamijo , Mina Onishi
发明人： Hirotoshi Kamata , Masanao Kamijo , Mina Onishi
IPC分类号： C08L31/00
CPC分类号： C08K5/3472 , C08K5/37 , G02F1/133512 , G03F7/0007 , G03F7/0275 , G03F7/031
摘要： The present invention relates to (1) a photosensitive composition for color filter black matrix resists, containing (A) a binder resin having a carboxyl group, (B) a compound having an ethylenically unsaturated bond, (C) a photopolymerizing initiator, (D) a thiol compound having two or more mercapto-group-containing groups in which carbon atoms at the a-position and/or n-position with respect to the mercapto group have a substituent, and (E) an organic solvent, and having high sensitivity and excellent storage stability; and (2) color filterblack blackmatrix resist containing (1) the photosensitive composition for color filter black matrix resists and a black pigment (F).
摘要翻译：本发明涉及（1）一种用于滤色器黑底抗蚀剂的感光组合物，其包含（A）具有羧基的粘合剂树脂，（B）具有烯属不饱和键的化合物，（C）光聚合引发剂，（D ）具有两个或多个含巯基的基团的硫醇化合物，其中在α-位和/或n位相对于巯基的碳原子具有取代基，和（E）有机溶剂，并且具有高的灵敏度和优良的储存稳定性; 和（2）含有（1）用于滤色器黑底抗蚀剂的光敏组合物和黑色颜料（F）的彩色黑色黑矩阵抗蚀剂。

5. 发明授权

US07622613B2 Thiol compound and photosensitive composition using the same 失效
标题翻译：硫醇化合物和使用其的感光组合物
公开(公告)号：US07622613B2
公开(公告)日：2009-11-24
申请号：US11666223
申请日：2005-10-25
申请人： Hirotoshi Kamata , Mina Onishi , Katsumi Murofushi
发明人： Hirotoshi Kamata , Mina Onishi , Katsumi Murofushi
IPC分类号： C07C319/00 , C07C319/02 , C07C319/08 , C07C319/12 , C07C321/04 , C07C321/06 , C07C323/04 , C07C323/03
CPC分类号： C07C323/52 , C07C2603/18 , G03F7/0007 , G03F7/031 , H05K3/0076 , H05K3/287
摘要： The present invention relates to a thiol compound represented by formula (1): wherein R1, R2 and n have the same meanings as in the specification, method for producing the compound, and to a photosensitive composition and a black matrix resist composition using the same which have high sensitivity and excellent property of retaining a line width in fine line patterns at the time of alkaline development, that is, being excellent in development latitude.
摘要翻译：本发明涉及由式（1）表示的硫醇化合物：其中R1，R2和n具有与说明书中相同的含义，该化合物的制备方法以及使用该化合物的光敏组合物和黑矩阵抗蚀剂组合物其在碱性显影时具有高的灵敏度和保持细线图案的线宽的优异性能，即显影性能优异。

6. 发明申请

US20080286690A1 THIOL COMPOUND AND PHOTOSENSITIVE COMPOSITION USING THE SAME 失效
标题翻译： THIOL化合物和使用它的光敏组合物
公开(公告)号：US20080286690A1
公开(公告)日：2008-11-20
申请号：US12179727
申请日：2008-07-25
申请人： Hirotoshi KAMATA , Mina Onishi , Katsumi Murofushi
发明人： Hirotoshi KAMATA , Mina Onishi , Katsumi Murofushi
IPC分类号： G03F7/004
CPC分类号： C07C323/52 , C07C2603/18 , G03F7/0007 , G03F7/031 , H05K3/0076 , H05K3/287
摘要： The present invention relates to a thiol compound represented by formula (1): wherein R1, R2 and n have the same meanings as in the specification, method for producing the compound, and to a photosensitive composition and a black matrix resist composition using the same which have high sensitivity and excellent property of retaining a line width in fine line patterns at the time of alkaline development, that is, being excellent in development latitude.
摘要翻译：本发明涉及由式（1）表示的硫醇化合物：其中R 1，R 2和n具有与说明书中相同的含义，化合物，以及使用它们的光敏组合物和使用该组合物的黑矩阵抗蚀剂组合物，其具有在碱性显影时保持细线图案中线宽的高灵敏度和优异性能，即显影性能优异。

7. 发明授权

US07714032B2 Thiol compound and photosensitive composition using the same 失效
标题翻译：硫醇化合物和使用其的感光组合物
公开(公告)号：US07714032B2
公开(公告)日：2010-05-11
申请号：US12179727
申请日：2008-07-25
申请人： Hirotoshi Kamata , Mina Onishi , Katsumi Murofushi
发明人： Hirotoshi Kamata , Mina Onishi , Katsumi Murofushi
IPC分类号： A61L27/34 , C08G59/42
CPC分类号： C07C323/52 , C07C2603/18 , G03F7/0007 , G03F7/031 , H05K3/0076 , H05K3/287
摘要： The present invention relates to a thiol compound represented by formula (1): wherein R1, R2 and n have the same meanings as in the specification, method for producing the compound, and to a photosensitive composition and a black matrix resist composition using the same which have high sensitivity and excellent property of retaining a line width in fine line patterns at the time of alkaline development, that is, being excellent in development latitude.
摘要翻译：本发明涉及由式（1）表示的硫醇化合物：其中R1，R2和n具有与说明书中相同的含义，该化合物的制备方法以及使用该化合物的光敏组合物和黑矩阵抗蚀剂组合物其在碱性显影时具有高的灵敏度和保持细线图案的线宽的优异性能，即显影性能优异。

8. 发明申请

US20080139688A1 Thiol Compound And Photosensitive Composition Using The Same 失效
标题翻译：硫醇化合物和使用它的光敏组合物
公开(公告)号：US20080139688A1
公开(公告)日：2008-06-12
申请号：US11666223
申请日：2005-10-25
申请人： Hirotoshi Kamata , Mina Onishi , Katsumi Murofushi
发明人： Hirotoshi Kamata , Mina Onishi , Katsumi Murofushi
IPC分类号： C08F2/46 , C07C323/56
CPC分类号： C07C323/52 , C07C2603/18 , G03F7/0007 , G03F7/031 , H05K3/0076 , H05K3/287
摘要： The present invention relates to a thiol compound represented by formula (1): wherein R1, R2 and n have the same meanings as in the specification, method for producing the compound, and to a photosensitive composition and a black matrix resist composition using the same which have high sensitivity and excellent property of retaining a line width in fine line patterns at the time of alkaline development, that is, being excellent in development latitude.
摘要翻译：本发明涉及由式（1）表示的硫醇化合物：其中R 1，R 2和n具有与说明书中相同的含义，化合物，以及使用它们的光敏组合物和使用该组合物的黑矩阵抗蚀剂组合物，其具有在碱性显影时保持细线图案中线宽的高灵敏度和优异性能，即显影性能优异。

9. 发明申请

US20130308233A1 DISCHARGE GAP-FILLING COMPOSITION AND ELECTROSTATIC DISCHARGE PROTECTOR 审中-公开
标题翻译：放电填充组合物和静电放电保护器
公开(公告)号：US20130308233A1
公开(公告)日：2013-11-21
申请号：US13982845
申请日：2012-01-30
申请人： Yoshimitsu Ishihara , Mina Onishi , Shunsuke Yoshida
发明人： Yoshimitsu Ishihara , Mina Onishi , Shunsuke Yoshida
IPC分类号： H02H9/04
CPC分类号： H02H9/044 , H01T4/10 , H05K1/0259 , H05K1/026
摘要： A discharge gap-filling composition including a metal powder (A), a binder component (B) and a diluent (C). The diluent (C) has two or more characteristic groups in a molecule, and the characteristic groups are not directly bonded to each other in a molecule but are bonded to each other through a hydrocarbon group or a silicon atom.
摘要翻译：包含金属粉末（A），粘合剂成分（B）和稀释剂（C）的排出间隙填充组合物。稀释剂（C）在分子中具有两个以上的特征基团，特征基团在分子中不直接键合，而是通过烃基或硅原子彼此键合。

10. 发明申请

US20050153231A1 Thiol compound, photopolymerization initiator composition and photosensitive composition 有权
标题翻译：硫醇化合物，光聚合引发剂组合物和感光组合物
公开(公告)号：US20050153231A1
公开(公告)日：2005-07-14
申请号：US10505778
申请日：2003-02-27
申请人： Tsuyoshi Katoh , Hirotoshi Kamata , Mina Onishi
发明人： Tsuyoshi Katoh , Hirotoshi Kamata , Mina Onishi
IPC分类号： C07C69/28 , C07C323/52 , C08F2/00 , C08F2/48 , C08F2/50 , G03F3/10 , G03F7/00 , G03F7/004 , G03F7/027 , G03F7/031 , G03C1/76
CPC分类号： G03F7/031 , C07C323/52 , C08F2/48 , C08F2/50 , G03F3/106 , G03F7/0007 , G03F7/0275 , Y10S430/117 , Y10S430/122 , Y10S430/127
摘要： A photopolymerization initiator composition containing a thiol compound having a mercapto group-containing group that has at least one substituent on the carbon atoms on carbon atom(s) at the α- and/or β-position with respect to the mercapto group and a photopolymerization initiator; a photosensitive composition containing the composition; and a novel thiol compound for use in these compositions. The photosensitive composition containing the photopolymerizazion initiator composition of the present invention has high sensitivity and excellent storage stability and enables reduction in cost due by increasing productivity.
摘要翻译：含有具有巯基的硫醇化合物的光聚合引发剂组合物，所述巯基化合物在相对于巯基的α-和/或β-位置的碳原子上具有至少一个取代基，并且光聚合发起者含有该组合物的光敏组合物; 和用于这些组合物的新型硫醇化合物。含有本发明的光聚合引发剂组合物的感光性组合物具有高灵敏度和优异的储存稳定性，能够通过提高生产率降低成本。

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