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    • 4. 发明授权
    • Surgical microscope
    • 手术显微镜
    • US4763968A
    • 1988-08-16
    • US74842
    • 1987-07-17
    • Kazuyuki MinamiTakashi NaganoHiroshi FujiwaraTakashi FukayaYutaka TakabayashiTakayoshi Togino
    • Kazuyuki MinamiTakashi NaganoHiroshi FujiwaraTakashi FukayaYutaka TakabayashiTakayoshi Togino
    • A61B19/00G02B21/22G02B27/26
    • G02B21/22
    • In order to allow the assistant also to make an observation of the same region of the object as by the surgical operator in the form of a normal and clear stereoscopic image, and to enable the size of the barrel as well as the price to be about the same as that of an ordinary surgical microscope having two optical axes, the surgical microscope of the invention is arranged so that by the employment of two pairs of prisms each having a polarized light beam splitter section and a total reflection surface, a pair of operator's observational optical systems and a pair of assistant's observational optical systems are used partly in common, and one of the polarized beams so split by the polarized beam splitter section is utilized as the operator's observational light, and the other is utilized as the assistant's observational light. One pair among the two pairs of prisms is constructed as a first stereoscopic view adapter, and the other pair as a second stereoscopic view adapter, and the common portion of the observational optical systems mentioned above is constructed in the form of a barrel, and all of these constituent parts are removably coupled to each other.
    • 为了让助手还可以以正常和清晰的立体图像的形式观察与外科手术者相同的对象区域,并且能够使镜筒的尺寸以及价格为约 与具有两个光轴的普通手术显微镜相同,本发明的手术显微镜被配置为通过使用两对棱镜,每对棱镜具有偏振光束分离器部分和全反射面,一对操作者 观察光学系统和一对辅助观测光学系统被部分地共同使用,并且由偏振分束器部分分离的偏振光束之一被用作操作者的观察光,另一个被用作助理的观察光。 两对棱镜中的一对被构造为第一立体视图适配器,另一对被构造为第二立体视图适配器,并且上述观察光学系统的公共部分以桶的形式构造,并且全部 的这些构成部件可拆卸地彼此联接。
    • 9. 发明授权
    • Semiconductor device, its manufacturing method and electronic apparatus thereof
    • 半导体装置及其制造方法及其电子装置
    • US07884407B2
    • 2011-02-08
    • US12362346
    • 2009-01-29
    • Takashi NaganoYasushi Morita
    • Takashi NaganoYasushi Morita
    • H01L21/8238
    • H01L27/14609H01L21/82385H01L21/823864H01L27/092H01L27/10873H01L27/10894H01L27/14689
    • The present invention proposes a semiconductor device, its manufacturing method and to an electronic apparatus thereof equipped with the semiconductor device where it becomes possible to make a CMOS type solid-state imaging device, an imager area formed with a MOS transistor of an LDD structure without having a metal silicide layer of a refractory metal, an area of DRAM cells and the like into a single semiconductor chip. According to the present invention, a semiconductor device is constituted such that an insulating film having a plurality of layers is used, sidewalls at the gate electrodes are formed by etching back the insulating film of the plurality of layers or a single layer film in the region where metal silicide layers are formed and in the region where the metal silicide layers are not formed, sidewalls composed of an upper layer insulating film is formed on a lower layer insulating film whose surface is coated or the insulating film of the plurality of layers remain unchanged.
    • 本发明提出一种半导体器件及其制造方法及其电子设备,其中可以制造CMOS型固态成像器件,形成有LDD结构的MOS晶体管的成像器区域的半导体器件没有 具有难熔金属的金属硅化物层,DRAM单元的面积等形成单个半导体芯片。 根据本发明,半导体器件被构成为使用具有多个层的绝缘膜,通过蚀刻多个层的绝缘膜或在该区域中的单层膜来形成栅电极的侧壁 在形成金属硅化物层的地方,并且在未形成金属硅化物层的区域中,由上层绝缘膜构成的侧壁形成在其表面被涂覆的下层绝缘膜上,或者多层绝缘膜保持不变 。