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    • 5. 发明授权
    • Method and apparatus for adjusting imaging performance of projection
optical apparatus
    • 用于调整投影光学装置成像性能的方法和装置
    • US4871237A
    • 1989-10-03
    • US120232
    • 1987-11-12
    • Satoru AnzaiKoichi Ohno
    • Satoru AnzaiKoichi Ohno
    • G02B7/04G03F7/20
    • G03F7/70241G02B7/04G03F7/70825G03F7/70858G03F7/70883Y10S359/90
    • In a method and apparatus for highly precisely adjusting the optical performance including the imaging plane and the magnification factor of a projection lens in a projection optical apparatus, adjustment of the projection lens is achieved by changing the barometric pressure, i.e., the refractive index of at least one space which is located on an optical path and which is shielded from the outer atmosphere is changed by changing the barometric pressure therein. At this space, a space or gap present between any two adjacent elements of a plurality of lens elements or a group of lenses constituting a projection lens is preferably selected. The selected space is independent from and is shielded from the outer atmosphere by the lenses defining itself and a housing supporting these lenses, and is filled with air or a gas. The pressure of the air or gas inside the independent space is controlled by a barometric controller.
    • 在用于在投影光学装置中高精度地调整包括成像平面和投影透镜的放大倍数的光学性能的方法和装置中,通过改变大气压(即, 通过改变其中的大气压来改变位于光路上并且被外部大气屏蔽的至少一个空间。 在该空间中,优选地选择存在于多个透镜元件的任意两个相邻元件之间的空间或间隙或构成投影透镜的一组透镜。 所选择的空间与限定自身的透镜和支撑这些透镜的壳体独立于外部空气并被外部空间屏蔽,并且被空气或气体填充。 独立空间内的空气或气体的压力由气压控制器控制。
    • 6. 发明授权
    • Method of and apparatus for detecting the accuracy of superposition
exposure in an exposure apparatus
    • 用于检测曝光装置中叠加曝光精度的方法和装置
    • US4803524A
    • 1989-02-07
    • US60021
    • 1987-06-09
    • Koichi OhnoKenji HigashiHiroki Tateno
    • Koichi OhnoKenji HigashiHiroki Tateno
    • G03F7/20G03F9/00G03B27/42
    • G03F9/7076G03F7/70358
    • An apparatus having stage means on which a substrate is placed, holding means for holding a mask formed with at least one mark, and exposing means for exposing the image of said at least one mark on the exposure surface of the substrate which is coated with photoresist includes displacing means for imparting relative displacement between the stage means and the holding means, control means for controlling the exposing means and the displacing means and executing first exposure and second exposure successively, the control means executing the first and the second exposure of exposing the image of said at least one mark on a plurality of predetermined areas of the exposure surface of the substrate placed on the stage means, and controlling the exposing means and the displacing means so that the amount of deviation between the position of the image of said at least one mark in each of the predetermined areas during the first exposure and the position of said image during the second exposure assumes a predetermined value, developing means for developing the substrate in response to the termination of the second exposure, deviation amount detecting means for detecting the amount of deviation between the position of the image of said at least one mark in each of the predetermined areas of the developed substrate during the first exposure and the position of said image during the second exposure and making a detection signal, and determining means for determining the accuracy of the apparatus in accordance with the detection signal and the predetermined value.
    • 一种装置,具有放置基板的载置装置,用于保持形成有至少一个标记的掩模的保持装置,以及用于将涂覆有光致抗蚀剂的基板的曝光表面上的所述至少一个标记的图像曝光的曝光装置 包括用于在平台装置和保持装置之间施加相对位移的移位装置,用于控制曝光装置和移动装置的控制装置,并且连续执行第一曝光和第二曝光,控制装置执行曝光图像的第一和第二曝光 所述至少一个标记在放置在所述台装置上的所述基板的所述曝光表面的多个预定区域上,并且控制所述曝光装置和所述移动装置,使得所述至少一个图像的图像位置之间的偏差量 在第一曝光期间的每个预定区域中的一个标记以及在第二曝光期间所述图像的位置 重新设定预定值,响应于第二曝光的终止而显影衬底的显影装置,用于检测每个预定区域中的所述至少一个标记的图像的位置之间的偏离量的偏差量检测装置 在第一次曝光期间显影的衬底和在第二次曝光期间所述图像的位置并产生检测信号,以及确定装置,用于根据检测信号和预定值确定装置的精度。
    • 7. 发明授权
    • Apparatus for regulating the optical characteristics of a projection
optical system
    • 用于调节投影光学系统的光学特性的装置
    • US4676614A
    • 1987-06-30
    • US744175
    • 1985-06-13
    • Koichi Ohno
    • Koichi Ohno
    • H01L21/30G03F1/62G03F7/20H01L21/027G03B3/10
    • G03F7/70241G03F7/70883
    • An optical apparatus for projecting a pattern on a first plane onto a second plane comprises a projection optical system disposed between the first plane and the second plane to form an imaging optical path, a structure for forming a space independent from the ambient space and filled with a gas between the first plane and the second plane in such a manner that the imaging optical path passes therethrough, the structure including a first transparent flat member perpendicular to the optic axis of the projection optical system and forming the entrance surface of the imaging light beam to the independent space and a second transparent flat member parallel to the first transparent flat member and forming the exit surface of the imaging light beam from the independent space, the gas filling the independent space having a refractive index different from the refractive index of the ambient space, and a device for regulating the distance between the first transparent flat member and the second transparent flat member and varying the thickness of the independent space in the direction of the optic axis.
    • 一种用于将第一平面上的图案投影到第二平面上的光学装置包括设置在第一平面和第二平面之间的投影光学系统,以形成成像光路,用于形成与环境空间无关的空间并填充有 第一平面和第二平面之间的气体,使得成像光路穿过其中,该结构包括垂直于投影光学系统的光轴的第一透明平面构件并且形成成像光束的入射表面 独立空间和平行于第一透明平板部件的第二透明平板部件,并且从独立空间形成成像光束的出射表面,填充独立空间的气体具有不同于环境的折射率的折射率 空间和用于调节第一透明平板构件与第二透明平板构件之间的距离的装置 透明的平坦构件,并且在光轴的方向上改变独立空间的厚度。