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1. 发明申请

US20100108154A1 MATERIAL GAS CONCENTRATION CONTROL SYSTEM 有权
标题翻译：材料气体浓度控制系统
公开(公告)号：US20100108154A1
公开(公告)日：2010-05-06
申请号：US12610019
申请日：2009-10-30
申请人： Masakazu Minami , Daisuke Hayashi , Yuhei Sakaguchi , Katsumi Nishimura , Masaki Inoue , Kotaro Takijiri
发明人： Masakazu Minami , Daisuke Hayashi , Yuhei Sakaguchi , Katsumi Nishimura , Masaki Inoue , Kotaro Takijiri
IPC分类号： G05D11/08
CPC分类号： G05D11/132 , Y10T137/0396 , Y10T137/2499 , Y10T137/2509 , Y10T137/2708
摘要： A material gas concentration control system for keeping a concentration of a material gas in a mixed gas constant comprising a tank to accommodate the material, an inlet line to input a carrier gas for evaporating the accommodated material into the tank, and an outlet line to output the mixed gas consisting of the material gas evaporated in the tank and the carrier gas, and further comprising a first valve arranged in the inlet line, a concentration measuring part that measures the concentration of the material gas in the mixed gas, and a concentration control part that controls an open degree of the first valve so as to make the measured concentration of the material gas measured by the concentration measuring part become the previously determined set concentration.
摘要翻译：一种材料气体浓度控制系统，用于保持包含罐的混合气体中的材料气体的浓度恒定以容纳材料，输入用于将所容纳的材料蒸发到罐中的载气的输入管线和输出的出口管线所述混合气体由在所述罐中的所述原料气体和所述载气组成，还包括配置在所述入口管路中的第一阀，测量所述混合气体中的原料气体的浓度的浓度测定部，以及浓度控制控制第一阀的开度的部分，使得由浓度测量部测量的材料气体的测量浓度变为预先确定的设定浓度。

2. 发明授权

US08459290B2 Material gas concentration control system 有权
标题翻译：物质气体浓度控制系统
公开(公告)号：US08459290B2
公开(公告)日：2013-06-11
申请号：US12610019
申请日：2009-10-30
申请人： Masakazu Minami , Daisuke Hayashi , Yuhei Sakaguchi , Katsumi Nishimura , Masaki Inoue , Kotaro Takijiri
发明人： Masakazu Minami , Daisuke Hayashi , Yuhei Sakaguchi , Katsumi Nishimura , Masaki Inoue , Kotaro Takijiri
IPC分类号： B05C11/00
CPC分类号： G05D11/132 , Y10T137/0396 , Y10T137/2499 , Y10T137/2509 , Y10T137/2708
摘要： A material gas concentration control system for keeping a concentration of a material gas in a mixed gas constant comprising a tank to accommodate the material, an inlet line to input a carrier gas for evaporating the accommodated material into the tank, and an outlet line to output the mixed gas consisting of the material gas evaporated in the tank and the carrier gas, and further comprising a first valve arranged in the inlet line, a concentration measuring part that measures the concentration of the material gas in the mixed gas, and a concentration control part that controls an open degree of the first valve so as to make the measured concentration of the material gas measured by the concentration measuring part become the previously determined set concentration.
摘要翻译：一种材料气体浓度控制系统，用于保持包含罐的混合气体中的材料气体的浓度恒定以容纳材料，输入用于将所容纳的材料蒸发到罐中的载气的输入管线和输出的出口管线所述混合气体由在所述罐中的所述原料气体和所述载气组成，还包括配置在所述入口管路中的第一阀，测量所述混合气体中的原料气体的浓度的浓度测定部，控制第一阀的开度的部分，使得由浓度测量部测量的材料气体的测量浓度变为预先确定的设定浓度。

3. 发明授权

US08800589B2 Material gas concentration control system 有权
标题翻译：物质气体浓度控制系统
公开(公告)号：US08800589B2
公开(公告)日：2014-08-12
申请号：US12609965
申请日：2009-10-30
申请人： Masakazu Minami , Masaki Inoue
发明人： Masakazu Minami , Masaki Inoue
IPC分类号： C23C16/448 , G05D11/13 , C30B25/14
CPC分类号： G05D11/139 , C23C16/4482 , C30B25/14 , Y10T137/2499 , Y10T137/2509
摘要： An object of this invention is to provide a responsive material gas concentration control system that can be mounted on a bubbling system and that can control a concentration of a material gas in a mixed gas at a constant value even though a partial pressure of the material gas fluctuates. The material gas concentration control system is used for a material evaporation system, and comprises a body that is connected to an outlet line and that has an internal flow channel for flowing the mixed gas, a concentration measuring part that measures the concentration of the material gas in the mixed gas, and a first valve that is arranged downstream of the concentration measuring part and that adjusts the measured concentration measured by the concentration measuring part at a previously determined set concentration, wherein the concentration measuring part and the first valve are mounted on the body.
摘要翻译：本发明的目的是提供一种响应性材料气体浓度控制系统，其可以安装在鼓泡系统上，并且即使材料气体的分压也可以将混合气体中的原料气体的浓度控制在恒定值波动材料气体浓度控制系统用于材料蒸发系统，并且包括连接到出口管线并具有用于使混合气体流动的内部流动通道的主体，测量材料气体浓度的浓度测量部件在所述混合气体中配置有第一阀，所述第一阀配置在所述浓度测定部的下游，并且以预先设定的浓度调整由所述浓度测定部测定的测定浓度，其中，所述浓度测定部和所述第一阀安装在身体。

4. 发明申请

US20110155264A1 SOURCE GAS CONCENTRATION CONTROL SYSTEM 有权
标题翻译：源气浓度控制系统
公开(公告)号：US20110155264A1
公开(公告)日：2011-06-30
申请号：US12976754
申请日：2010-12-22
申请人： Masakazu Minami , Masaki Inoue
发明人： Masakazu Minami , Masaki Inoue
IPC分类号： F16K17/00
CPC分类号： G05D11/138 , Y10T137/0396 , Y10T137/2509 , Y10T137/2708 , Y10T137/7736
摘要： To prevent loss of control of a pressure of a source gas within a movable range of a control valve, a source gas concentration control system is provided. The system may include a first valve that is provided on an outlet line, a concentration measurement part that measures a concentration of the source gas in mixed gas, and a concentration control part that controls a stroke of the first valve such that the measured concentration of the source gas becomes equal to a predetermined concentration setting. The measured concentration may be measured in the concentration measurement part. The system may further include a temperature controller that controls a temperature inside the tank to meet a temperature setting, and a temperature setting part that sets the temperature setting of the temperature controller.
摘要翻译：为了防止在控制阀的可移动范围内的源气体的压力的控制的丧失，提供了源气体浓度控制系统。该系统可以包括设置在出口管路上的第一阀，测量混合气体中的源气体浓度的浓度测量部件和控制第一阀门的行程的浓度控制部件，源气体变得等于预定浓度设定。测量浓度可以在浓度测量部分测量。该系统还可以包括温度控制器，其控制罐内的温度以满足温度设定;以及温度设定部分，其设定温度控制器的温度设置。

5. 发明授权

US08459291B2 Source gas concentration control system 有权
标题翻译：源气浓度控制系统
公开(公告)号：US08459291B2
公开(公告)日：2013-06-11
申请号：US12976754
申请日：2010-12-22
申请人： Masakazu Minami , Masaki Inoue
发明人： Masakazu Minami , Masaki Inoue
IPC分类号： B05C11/00
CPC分类号： G05D11/138 , Y10T137/0396 , Y10T137/2509 , Y10T137/2708 , Y10T137/7736
摘要： To prevent loss of control of a pressure of a source gas within a movable range of a control valve, a source gas concentration control system is provided. The system may include a first valve that is provided on an outlet line, a concentration measurement part that measures a concentration of the source gas in mixed gas, and a concentration control part that controls a stroke of the first valve such that the measured concentration of the source gas becomes equal to a predetermined concentration setting. The measured concentration may be measured in the concentration measurement part. The system may further include a temperature controller that controls a temperature inside the tank to meet a temperature setting, and a temperature setting part that sets the temperature setting of the temperature controller.
摘要翻译：为了防止在控制阀的可移动范围内的源气体的压力的控制的丧失，提供了源气体浓度控制系统。该系统可以包括设置在出口管路上的第一阀，测量混合气体中的源气体浓度的浓度测量部件和控制第一阀门的行程的浓度控制部件，源气体变得等于预定浓度设定。测量浓度可以在浓度测量部分测量。该系统还可以包括温度控制器，其控制罐内的温度以满足温度设定;以及温度设定部分，其设定温度控制器的温度设置。

6. 发明申请

US20100108153A1 MATERIAL GAS CONCENTRATION CONTROL SYSTEM 有权
标题翻译：材料气体浓度控制系统
公开(公告)号：US20100108153A1
公开(公告)日：2010-05-06
申请号：US12609965
申请日：2009-10-30
申请人： Masakazu Minami , Masaki Inoue
发明人： Masakazu Minami , Masaki Inoue
IPC分类号： G05D11/00
CPC分类号： G05D11/139 , C23C16/4482 , C30B25/14 , Y10T137/2499 , Y10T137/2509
摘要： An object of this invention is to provide a responsive material gas concentration control system that can be mounted on a bubbling system and that can control a concentration of a material gas in a mixed gas at a constant value even though a partial pressure of the material gas fluctuates. The material gas concentration control system is used for a material evaporation system, and comprises a body that is connected to an outlet line and that has an internal flow channel for flowing the mixed gas, a concentration measuring part that measures the concentration of the material gas in the mixed gas, and a first valve that is arranged downstream of the concentration measuring part and that adjusts the measured concentration measured by the concentration measuring part at a previously determined set concentration, wherein the concentration measuring part and the first valve are mounted on the body.
摘要翻译：本发明的目的是提供一种响应性材料气体浓度控制系统，其可以安装在鼓泡系统上，并且即使材料气体的分压也可以将混合气体中的原料气体的浓度控制在恒定值波动材料气体浓度控制系统用于材料蒸发系统，并且包括连接到出口管线并具有用于使混合气体流动的内部流动通道的主体，测量材料气体浓度的浓度测量部件在所述混合气体中配置有第一阀，所述第一阀配置在所述浓度测定部的下游，并且以预先设定的浓度调整由所述浓度测定部测定的测定浓度，其中，所述浓度测定部和所述第一阀安装在身体。

7. 发明授权

US09456600B2 Agricultural chemical-spreading agent composition 有权
标题翻译：农药扩散剂组成
公开(公告)号：US09456600B2
公开(公告)日：2016-10-04
申请号：US13820357
申请日：2011-09-01
申请人： Masaki Inoue , Masatoshi Kamei
发明人： Masaki Inoue , Masatoshi Kamei
IPC分类号： A01N25/30 , A01N25/04 , A01N25/24
CPC分类号： A01N25/30 , A01N25/04 , A01N25/24 , A01N47/38 , A01N57/14 , A01N57/20
摘要： The present invention provides the agricultural chemical-spreading agent composition, containing: (A) a polysaccharide in an amount of 5 to 30% by weight; (B) a polyoxyalkylene sorbitan fatty acid ester in an amount of 5 to 40% by weight; and (C) at least one nonionic surfactant selected from polyoxyalkylene alkyl ethers, sorbitan fatty acid esters, and silicone surfactants in an amount of 5 to 40% by weight, wherein the component (A) has a viscosity of not less than 5000 mPa·s in the form of a 5% by weight aqueous solution at 25° C., and a weight ratio of contents of the component (A) to the sum of components (B) and (C), (A)/[(B)+(C)], is 10/90 to 40/60.
摘要翻译：本发明提供农药扩散剂组合物，其含有：（A）5〜30重量％的多糖; （B）5-40重量％的聚氧化烯脱水山梨醇脂肪酸酯; 和（C）至少一种选自聚氧化烯烷基醚，脱水山梨醇脂肪酸酯和硅氧烷表面活性剂的非离子表面活性剂，其量为5-40重量％，其中组分（A）的粘度不小于5000mPa·s （A）与组分（B）和（C），（A）/ [（B）的总和的含量的重量比）为5重量％）+（C）]为10/90〜40/60。

8. 发明授权

US08830538B2 Illuminating device 有权
标题翻译：照明装置
公开(公告)号：US08830538B2
公开(公告)日：2014-09-09
申请号：US12926120
申请日：2010-10-27
申请人： Masaki Inoue , Hiroshige Hata , Kiyoyuki Kabuki , Yutaka Shiozaki
发明人： Masaki Inoue , Hiroshige Hata , Kiyoyuki Kabuki , Yutaka Shiozaki
IPC分类号： H04N1/04 , H04N1/028
CPC分类号： H04N1/02815 , H04N1/02835 , H04N1/02885
摘要： A illuminating device used for an document reading apparatus that has two rod shape light guides and light emitting elements where each of the light guides has a light emitting face and two flat light reflection faces, which may have a group of minute prisms that are formed along the longitudinal direction of the faces, and where light from each light emitting element is guided in the longitudinal direction by the light guide and reflected by that faces, such that the light is emitted from the light emitting face of each light guide and a virtual plane that is vertical to a longitudinal direction of each of the two light guides has two light intensity peaks.
摘要翻译：一种用于具有两个棒状光导和文件读取装置的照明装置，其中每个光导具有发光面和两个平坦的光反射面，所述两个平面光反射面可以具有一组沿着面的纵向方向，并且来自每个发光元件的光在光线导向下被纵向引导并被该面反射，使得光从每个光导的发光面发射出来，并且虚拟平面与两个光导中的每一个的纵向方向垂直的方向具有两个光强度峰值。

9. 发明申请

US20130029494A1 PLASMA ETCHING METHOD, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, AND PLASMA ETCHING DEVICE 有权
标题翻译：等离子体蚀刻方法，生产半导体器件的方法和等离子体蚀刻器件
公开(公告)号：US20130029494A1
公开(公告)日：2013-01-31
申请号：US13582523
申请日：2011-03-03
申请人： Masaru Sasaki , Kazuki Moyama , Masaki Inoue , Yoko Noto
发明人： Masaru Sasaki , Kazuki Moyama , Masaki Inoue , Yoko Noto
IPC分类号： H01L21/3065
CPC分类号： H01L21/31116 , H01J37/32192 , H01J37/32238 , H01L29/6653 , H01L29/6659 , H01L29/66795 , H01L29/7833
摘要： Provided is a plasma etching method increasing the selectivity of a silicon nitride film in relation to the silicon oxide film or silicon functioning as a base. In a plasma etching method setting a pressure in a processing container as a predetermined level by exhausting a processing gas while supplying the processing gas into the processing container, generating plasma by supplying external energy to the processing container, and setting a bias applied to a holding stage holding a substrate in the processing container as predetermined value to selectively etch the silicon nitride film with respect to a silicon and/or silicon oxide film, the processing gas includes a plasma excitation gas, a CHxFy gas, and at least one oxidizing gas selected from the group consisting of O2, CO2, CO, and a flow rate of the oxidizing gas with respect to the CHxFy gas is set to be 4/9 or greater.
摘要翻译：提供了提高氮化硅膜相对于用作基底的氧化硅膜或硅的选择性的等离子体蚀刻方法。在等离子体蚀刻方法中，通过在将处理气体供应到处理容器中的同时排出处理气体而将处理容器中的压力设定为预定水平，通过向处理容器供给外部能量来产生等离子体，并且设定施加到保持将处理容器中的基板保持为预定值，以相对于硅和/或氧化硅膜选择性地蚀刻氮化硅膜，处理气体包括等离子体激发气体，CH x F y气体和至少一种选择的氧化气体来自由O 2，CO 2，CO组成的组和氧化气体相对于CH x F y气体的流量设定为4/9以上。

10. 发明授权

US08188024B2 Surfactant composition 有权
标题翻译：表面活性剂组成
公开(公告)号：US08188024B2
公开(公告)日：2012-05-29
申请号：US13128195
申请日：2009-12-24
申请人： Masaki Inoue , Yasuhiro Doi
发明人： Masaki Inoue , Yasuhiro Doi
IPC分类号： C11D1/29 , C11D1/72 , C11D1/83
CPC分类号： A61Q19/10 , A61K8/345 , A61K8/39 , A61K8/463 , C11D1/146 , C11D1/29 , C11D1/72 , C11D1/83 , C11D3/0094
摘要： According to the present invention, provided is a surfactant composition having excellent fluidity after long-term storage at a low temperature (5 degrees Celsius) and excellent foamability when diluted. It is considered that the reason why the composition of the present invention has excellent fluidity after long-term storage at a low temperature (5 degrees Celsius) and excellent foamability when diluted is because the sulfate surfactant has a predetermined amount of oxypropylene groups, thereby suppressing crystallization.
摘要翻译：根据本发明，提供了在低温（5摄氏度）长期保存后具有优异的流动性，稀释时的起泡性优异的表面活性剂组合物。认为本发明的组合物在低温（5摄氏度）长期保存后具有优异的流动性，当稀释时具有优异的发泡性，因为硫酸盐表面活性剂具有预定量的氧化丙烯基，因此抑制结晶。

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