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    • 1. 发明授权
    • Magneto-resistive sensor having small track width and sensor height using stopper layer
    • 磁阻传感器具有小的轨道宽度和传感器高度,使用阻挡层
    • US07561384B2
    • 2009-07-14
    • US11289798
    • 2005-11-29
    • Masahiro OsugiTaku ShintaniKatsuro WatanabeNobuo Yoshida
    • Masahiro OsugiTaku ShintaniKatsuro WatanabeNobuo Yoshida
    • G11B5/39
    • G11B5/39G01R33/09G11B5/3163G11B5/3169
    • A high output magneto-resistive sensor is provided by suppressing leftover resist mask after lift-off and generation of a fence, and by making it easy to remove the redepositions deposited on the side wall in the track width direction or on the side wall in the sensor height direction of the magnetoresistive film. As a means to solve a fence and lift-off leftover of a resist in a process for forming a track and a process for forming a sensor height, a stopper layer is provided on the magnetoresistive film and the stopper layer on the refill film, and performing lift-off by CMP. By using a metallic material which has a small CMP polishing rate for at least the first stopper layer, the magnetoresistive film and the first stopper layer can be etched simultaneously and a pattern formed. As a result, decrease of the height of the resist mask by RIE can be suppressed and lift-off leftover can be prevented.
    • 通过在剥离和产生栅栏之后抑制剩余抗蚀剂掩模来提供高输出磁阻传感器,并且通过使得容易地去除在轨道宽度方向上或侧壁上沉积在侧壁上的再沉积 磁阻膜的传感器高度方向。 作为用于形成轨迹的工序中的抗蚀剂的栅栏和剥离残留的手段以及形成传感器高度的工序,在磁阻膜和再填充膜上的阻挡层上设置有阻挡层, 通过CMP执行剥离。 通过使用对于至少第一阻挡层具有小的CMP抛光速率的金属材料,可以同时蚀刻磁阻膜和第一阻挡层并形成图案。 结果,可以抑制RIE的抗蚀剂掩模的高度的降低,并且可以防止剥离残留物。
    • 2. 发明申请
    • Magneto-resistive sensor with stopper layer and fabrication process
    • 具有阻塞层和制造工艺的磁阻传感器
    • US20060132983A1
    • 2006-06-22
    • US11289798
    • 2005-11-29
    • Masahiro OsugiTaku ShintaniKatsuro WatanabeNobuo Yoshida
    • Masahiro OsugiTaku ShintaniKatsuro WatanabeNobuo Yoshida
    • G11B5/33G11B5/127
    • G11B5/39G01R33/09G11B5/3163G11B5/3169
    • A high output magneto-resistive sensor is provided by suppressing leftover resist mask after lift-off and generation of a fence, and by making it easy to remove the redepositions deposited on the side wall in the track width direction or on the side wall in the sensor height direction of the magnetoresistive film. As a means to solve a fence and lift-off leftover of a resist in a process for forming a track and a process for forming a sensor height, a stopper layer is provided on the magnetoresistive film and the stopper layer on the refill film, and performing lift-off by CMP. By using a metallic material which has a small CMP polishing rate for at least the first stopper layer, the magnetoresistive film and the first stopper layer can be etched simultaneously and a pattern formed. As a result, decrease of the height of the resist mask by RIE can be suppressed and lift-off leftover can be prevented.
    • 通过在剥离和产生栅栏之后抑制剩余抗蚀剂掩模来提供高输出磁阻传感器,并且通过使得容易地去除在轨道宽度方向上或侧壁上沉积在侧壁上的再沉积 磁阻膜的传感器高度方向。 作为用于形成轨迹的工序中的抗蚀剂的栅栏和剥离残留的手段以及形成传感器高度的工序,在磁阻膜和再填充膜上的阻挡层上设置有阻挡层, 通过CMP执行剥离。 通过使用对于至少第一阻挡层具有小的CMP抛光速率的金属材料,可以同时蚀刻磁阻膜和第一阻挡层并形成图案。 结果,可以抑制RIE的抗蚀剂掩模的高度的降低,并且可以防止剥离残留物。
    • 3. 发明授权
    • Magnetoresistive head and a manufacturing method thereof
    • 磁阻头及其制造方法
    • US07859799B2
    • 2010-12-28
    • US11706152
    • 2007-02-13
    • Katsuro WatanabeTaku ShintaniKazuhiro UedaMasahiro Osugi
    • Katsuro WatanabeTaku ShintaniKazuhiro UedaMasahiro Osugi
    • G11B5/127
    • G11B5/3903G11B5/3163G11B5/398
    • Embodiments in accordance with the present invention reduce the influence of etching damage at junction edge of a magnetoresistive film in the sensor height direction, lower the deterioration of dielectric breakdown voltage between an upper magnetic shield layer and a lower magnetic shield layer and instability of reproducing property resulting from shield process, and maintain electrostatic capacity to a small value in a CPP magnetoresistive head. In an embodiment of a magnetoresistive head of the present invention, length in the sensor height direction of bottom surface of a pinning layer is longer than the length in the sensor height direction of bottom surface of a first ferromagnetic layer. The angle formed by an edge in the sensor height direction of the pinning layer to the surface extended from a bottom surface of a magnetoresistive film is smaller than the angle formed by an edge in the sensor height direction of a second ferromagnetic layer to the surface extended from a bottom surface of the magnetoresistive film. Height of top surface of a sensor height direction refill film is equal to or higher than the top surface of the magnetoresistive film.
    • 根据本发明的实施例减小了在传感器高度方向上的磁阻膜的接合边缘处的蚀刻损伤的影响,降低了上磁屏蔽层和下磁屏蔽层之间的介电击穿电压的劣化以及再现性能的不稳定性 由屏蔽过程产生,并且在CPP磁阻头中将静电容量维持在较小的值。 在本发明的磁阻头的一个实施例中,钉扎层的底表面的传感器高度方向上的长度比第一铁磁层的底表面的传感器高度方向上的长度长。 由钉扎层的传感器高度方向的边缘到从磁阻膜的底面延伸的表面形成的角度小于由第二铁磁层的传感器高度方向上的边缘延伸到表面延伸的角度 从磁阻膜的底表面。 传感器高度方向充填膜的顶表面的高度等于或高于磁阻膜的顶表面。
    • 4. 发明申请
    • Magnetoresistive head and a manufacturing method thereof
    • 磁阻头及其制造方法
    • US20070206333A1
    • 2007-09-06
    • US11706152
    • 2007-02-13
    • Katsuro WatanabeTaku ShintaniKazuhiro UedaMasahiro Osugi
    • Katsuro WatanabeTaku ShintaniKazuhiro UedaMasahiro Osugi
    • G11B5/33
    • G11B5/3903G11B5/3163G11B5/398
    • Embodiments in accordance with the present invention reduce the influence of etching damage at junction edge of a magnetoresistive film in the sensor height direction, lower the deterioration of dielectric breakdown voltage between an upper magnetic shield layer and a lower magnetic shield layer and instability of reproducing property resulting from shield process, and maintain electrostatic capacity to a small value in a CPP magnetoresistive head. In an embodiment of a magnetoresistive head of the present invention, length in the sensor height direction of bottom surface of a pinning layer is longer than the length in the sensor height direction of bottom surface of a first ferromagnetic layer. The angle formed by an edge in the sensor height direction of the pinning layer to the surface extended from a bottom surface of a magnetoresistive film is smaller than the angle formed by an edge in the sensor height direction of a second ferromagnetic layer to the surface extended from a bottom surface of the magnetoresistive film. Height of top surface of a sensor height direction refill film is equal to or higher than the top surface of the magnetoresistive film.
    • 根据本发明的实施例减小了在传感器高度方向上的磁阻膜的接合边缘处的蚀刻损伤的影响,降低了上磁屏蔽层和下磁屏蔽层之间的介电击穿电压的劣化以及再现性能的不稳定性 由屏蔽过程产生,并且在CPP磁阻头中将静电容量维持在较小的值。 在本发明的磁阻头的一个实施例中,钉扎层的底表面的传感器高度方向上的长度比第一铁磁层的底表面的传感器高度方向上的长度长。 由钉扎层的传感器高度方向的边缘到从磁阻膜的底面延伸的表面形成的角度小于由第二铁磁层的传感器高度方向上的边缘延伸到表面延伸的角度 从磁阻膜的底表面。 传感器高度方向充填膜的顶表面的高度等于或高于磁阻膜的顶表面。
    • 9. 发明申请
    • Magnetoresistive head with larger longitudinal biasing
    • 磁阻头具有较大的纵向偏置
    • US20080212238A1
    • 2008-09-04
    • US12012341
    • 2008-01-31
    • Katsuro WatanabeSatoru OkamotoMasahiro OsugiKoji Okazaki
    • Katsuro WatanabeSatoru OkamotoMasahiro OsugiKoji Okazaki
    • G11B5/33
    • G11B5/59633G11B5/59666
    • Embodiments of the present invention help to efficiently apply a longitudinal biasing with appropriate strength from a longitudinal biasing layer to a free layer even in a small read gap length. According to one embodiment, in the track width direction of the magnetoresistive film, the longitudinal biasing layer excluding its portion close to the magnetoresistive film is made approximately uniform in thickness. An edge toward the magnetoresistive film of the longitudinal biasing layer is positioned more outwardly in the track width direction than an edge in the track width direction of the free layer. A portion closest to the substrate of the interface between the longitudinal biasing layer and the insulator on the track-width sides is positioned lower than the interface between the magnetoresistive film and the lower magnetic shield layer.
    • 本发明的实施例有助于即使在小的读取间隙长度中也可以将具有适当强度的纵向偏置从纵向偏置层施加到自由层。 根据一个实施例,在磁阻膜的磁道宽度方向上,除了靠近磁阻膜的部分之外的纵向偏置层的厚度大致均匀。 朝向纵向偏置层的磁阻膜的边缘比沿自由层的轨道宽度方向的边缘更靠外侧位于轨道宽度方向上。 在纵向偏置层和轨道宽度侧的绝缘体之间的界面最靠近的部分位于低于磁阻膜和下部磁屏蔽层之间的界面的位置。