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1. 发明申请

US20130011632A1 MICROFINE STRUCTURE, METHOD FOR PRODUCING MICROFINE STRUCTURE, AND POLYMERIZABLE RESIN COMPOSITION FOR PRODUCING THE SAME 审中-公开
标题翻译：微晶结构，微晶纤维结构体的制造方法及其制造方法的聚合性树脂组合物
公开(公告)号：US20130011632A1
公开(公告)日：2013-01-10
申请号：US13519589
申请日：2010-12-22
申请人： Masahiko Ogino , Susumu Komoriya , Akihiro Miyauchi , Ryuta Washiya , Kyoichi Mori , Noritake Shizawa
发明人： Masahiko Ogino , Susumu Komoriya , Akihiro Miyauchi , Ryuta Washiya , Kyoichi Mori , Noritake Shizawa
IPC分类号： B05D1/36 , B44C1/22 , B32B3/10
CPC分类号： C08F283/02 , B82Y10/00 , B82Y40/00 , C09D4/06 , G03F7/0002 , G03F7/027 , G03F7/038 , G03F7/0388 , Y10T428/24802 , C08F220/30 , C08F220/40 , C08F222/1006
摘要： Provided is a method for producing a microfine structure comprising the steps of: forming a resin film by applying a liquid polymerizable resin composition containing a high molecular weight component, a low molecular weight component and a reactive dilution component to an adhesion promoting layer formed on a substrate; imprinting a mold with an extremely fine convex concave pattern onto the resin film; and transferring the convex concave pattern to the resin film. Herein, components of the adhesion promoting layer, the high molecular weight component, the low molecular weight component and the reactive dilution component respectively have cross-linking reactive functional groups which react with each other.
摘要翻译：提供一种微细结构体的制造方法，其特征在于，包括以下工序：通过将含有高分子量成分，低分子量成分和反应性稀释成分的液体聚合性树脂组合物涂布在形成于基质; 将具有非常细的凸凹图案的模具印刷到树脂膜上; 并将凸凹图案转印到树脂膜上。这里，粘合促进层，高分子量组分，低分子量组分和反应性稀释组分的组分分别具有彼此反应的交联反应性官能团。

2. 发明授权

US08096802B2 Nanoimprint stamper and a fine-structure transfer apparatus using the stamper 有权
标题翻译：纳米压印模和使用压模的精细结构转印装置
公开(公告)号：US08096802B2
公开(公告)日：2012-01-17
申请号：US12534232
申请日：2009-08-03
申请人： Kyoichi Mori , Noritake Shizawa , Susumu Komoriya , Akihiro Miyauchi , Takashi Ando , Tetsuhiro Hatogai
发明人： Kyoichi Mori , Noritake Shizawa , Susumu Komoriya , Akihiro Miyauchi , Takashi Ando , Tetsuhiro Hatogai
IPC分类号： B29C59/00 , B29B13/08
CPC分类号： B29C35/0888 , B29C33/0088 , B29C33/20 , B29C33/30 , B29C33/305 , B29C43/003 , B29C43/021 , B29C43/10 , B29C43/36 , B29C2035/0827 , B29C2043/025 , B29C2043/3634 , B29C2043/3652 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： A nanoimprint stamper can simultaneously conform to two types of anomaly in the shape of a transfer substrate, for example warpage and surface protrusions (including foreign objects) that differ greatly in the wavelength of variation. The nanoimprint stamper is capable of performing transfer with a smaller number of defects and in a uniform way. The nanoimprint stamper includes a light-transmitting rigid substrate, a light-transmitting resilient plate, a light-trarsmitting and flexible rigid stamper base, a light-transmitting stamper buffer layer, and a light-transmitting patterned stamp layer. The stamper buffer layer has a lower Young's modulus than the patterned stamp layer.
摘要翻译：纳米压印模具可以同时符合转印基板形状的两种异常，例如在变化波长上差别很大的翘曲和表面突起（包括异物）。纳米压印压模能够以较少数量的缺陷和均匀的方式进行转印。纳米压印压模包括透光刚性基板，透光弹性板，光束和柔性刚性压模基座，透光压模缓冲层和透光图案印刷层。压模缓冲层具有比图案化的印模层更低的杨氏模量。

3. 发明授权

US08016585B2 Nanoimprint resin stamper 有权
标题翻译：纳米压印树脂压模
公开(公告)号：US08016585B2
公开(公告)日：2011-09-13
申请号：US12270376
申请日：2008-11-13
申请人： Susumu Komoriya , Kyoichi Mori , Noritake Shizawa , Takanori Yamasaki , Tetsuhiro Hatogai , Koji Tsushima
发明人： Susumu Komoriya , Kyoichi Mori , Noritake Shizawa , Takanori Yamasaki , Tetsuhiro Hatogai , Koji Tsushima
IPC分类号： B29C59/00 , B29B13/08
CPC分类号： B29C35/0888 , B29C33/424 , B29C37/0053 , B29C2035/0827 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： A resin stamper is provided that is intended for use in an optical transfer-based nanostructure transfer apparatus and which is capable of automatic transport and alignment. The resin stamper includes a support member made of a light transmitting material and having mechanical strength, an intermediate layer also made of a light transmitting material, and a patterned resin layer which is also made of a light transmitting material. The support member is larger in size than the intermediate layer and the patterned resin layer. The intermediate layer is more flexible than the patterned resin layer. Also, the patterned resin layer has a pattern of high and low areas formed in a surface thereof that is the obverse of the pattern of high and low areas in a mold.
摘要翻译：提供了一种用于基于光学转印的纳米结构转印装置并且能够自动输送和对准的树脂压模。树脂压模包括由透光材料制成并具有机械强度的支撑构件，也由透光材料制成的中间层以及也由透光材料制成的图案化树脂层。支撑构件的尺寸大于中间层和图案化树脂层。中间层比图案化树脂层更柔软。此外，图案化树脂层具有形成在模具中的高低区域图案的表面的高低区域的图案。

4. 发明申请

US20100104682A1 IMPRINTING DEVICE 失效
标题翻译：印刷设备
公开(公告)号：US20100104682A1
公开(公告)日：2010-04-29
申请号：US12359402
申请日：2009-01-26
申请人： Takashi ANDO , Noritake Shizawa , Kyoichi Mori , Susumu Komoriya
发明人： Takashi ANDO , Noritake Shizawa , Kyoichi Mori , Susumu Komoriya
IPC分类号： B29C35/08
CPC分类号： G11B5/855
摘要： An optical imprinting device capable of simultaneously imprinting fine patterns to both surfaces of an opaque substrate is provided. The imprinting device includes a stamper having a fine pattern on its surface to imprint the fine pattern onto a surface of an object to be imprinted by pressing the stamper against the object composed of a substrate and a photo-curing resin layer formed on the substrate. The imprinting device further includes a light source for applying light to the photo-curing resin layer of the object when imprinting the fine pattern of the stamper onto the photo-curing resin layer of the object. The light source applies light to the stamper at a predetermined incident angle to the surface of the stamper.
摘要翻译：提供了能够同时将精细图案压印到不透明基板的两个表面的光学压印装置。压印装置包括在其表面上具有精细图案的压模，通过将压模压在由基板构成的物体和形成在基板上的光固化树脂层的物体上，将精细图案印刷到待印刷对象的表面上。压印装置还包括将压模的精细图案压印到物体的光固化树脂层上时将光施加到物体的光固化树脂层的光源。光源以与预压件表面成预定入射角的方式将光施加于压模。

5. 发明授权

US08092209B2 Imprinting device 失效
标题翻译：印刷装置
公开(公告)号：US08092209B2
公开(公告)日：2012-01-10
申请号：US12359402
申请日：2009-01-26
申请人： Takashi Ando , Noritake Shizawa , Kyoichi Mori , Susumu Komoriya
发明人： Takashi Ando , Noritake Shizawa , Kyoichi Mori , Susumu Komoriya
IPC分类号： B29C59/00 , B29B13/08
CPC分类号： G11B5/855
摘要： An optical imprinting device capable of simultaneously imprinting fine patterns to both surfaces of an opaque substrate is provided. The imprinting device includes a stamper having a fine pattern on its surface to imprint the fine pattern onto a surface of an object to be imprinted by pressing the stamper against the object composed of a substrate and a photo-curing resin layer formed on the substrate. The imprinting device further includes a light source for applying light to the photo-curing resin layer of the object when imprinting the fine pattern of the stamper onto the photo-curing resin layer of the object. The light source applies light to the stamper at a predetermined incident angle to the surface of the stamper.
摘要翻译：提供了能够同时将精细图案压印到不透明基板的两个表面的光学压印装置。压印装置包括在其表面上具有精细图案的压模，通过将压模压在由基板构成的物体和形成在基板上的光固化树脂层的物体上，将精细图案印刷到待印刷对象的表面上。压印装置还包括将压模的精细图案压印到物体的光固化树脂层上时将光施加到物体的光固化树脂层的光源。光源以与预压件表面成预定入射角的方式将光施加于压模。

6. 发明申请

US20090123590A1 NANOIMPRINT RESIN STAMPER 有权
标题翻译： NANOIMPRINT树脂印章
公开(公告)号：US20090123590A1
公开(公告)日：2009-05-14
申请号：US12270376
申请日：2008-11-13
申请人： Susumu Komoriya , Kyoichi Mori , Noritake Shizawa , Takanori Yamasaki , Tetsuhiro Hatogai , Koji Tsushima
发明人： Susumu Komoriya , Kyoichi Mori , Noritake Shizawa , Takanori Yamasaki , Tetsuhiro Hatogai , Koji Tsushima
IPC分类号： B29C35/08
CPC分类号： B29C35/0888 , B29C33/424 , B29C37/0053 , B29C2035/0827 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： A resin stamper is provided that is intended for use in an optical transfer-based nanostructure transfer apparatus and which is capable of automatic transport and alignment. The resin stamper comprises a support member made of a light transmitting material and having mechanical strength, an intermediate layer also made of a light transmitting material, and a patterned resin layer which is also made of a light transmitting material, the support member being larger in size than the intermediate layer and the patterned resin layer, the intermediate layer being more flexible than the patterned resin layer, and the patterned resin layer having a pattern of high and low areas formed in a surface thereof that is the obverse of the pattern of high and low areas in a mold.
摘要翻译：提供了一种用于基于光学转印的纳米结构转印装置并且能够自动输送和对准的树脂压模。树脂压模包括由透光材料制成并具有机械强度的支撑构件，也由透光材料制成的中间层，以及也由透光材料制成的图案化树脂层，支撑构件尺寸比中间层和图案化树脂层，中间层比图案化树脂层更具柔性，并且图案化树脂层具有形成在其表面上的高和低区域的图案，其是高图案的图案和模具中的低面积。

7. 发明授权

US08133418B2 Pattern transfer method and imprint device 失效
标题翻译：图案转印方法和印版装置
公开(公告)号：US08133418B2
公开(公告)日：2012-03-13
申请号：US11833284
申请日：2007-08-03
申请人： Takashi Ando , Susumu Komoriya , Masahiko Ogino , Akihiro Miyauchi
发明人： Takashi Ando , Susumu Komoriya , Masahiko Ogino , Akihiro Miyauchi
IPC分类号： B29C45/76
CPC分类号： G11B7/263 , B29C33/303 , B29C43/003 , B29C43/021 , B29C43/58 , B29C2043/025 , B29C2043/043 , B29C2043/3602 , B29C2043/3634 , B29C2043/5833 , B29L2011/0075 , B29L2017/005 , B29L2031/756
摘要： In order to allow for aligning a relative position between a transferred object and a stamper with high accuracy without providing an alignment pattern in the transferred object, there are provided: a pattern transfer method, including: when adjusting the relative position between the stamper and the transferred object, a step of detecting at least two or more edge positions of the transferred object and calculating an arbitrary point from the detected edge positions; a step of detecting a position of the stamper from an edge of the stamper or an alignment mark formed in the stamper; and a step of adjusting the relative position between the transferred object and the stamper from the arbitrary point and the position of the stamper; and an imprint device using the same.
摘要翻译：为了允许高精度地对准被转印物体与压模之间的相对位置，而不在被转移物体中提供对准图案，提供了一种图案转印方法，包括：当调节压模和检测被转移对象的至少两个以上边缘位置的步骤，并从检测到的边缘位置计算任意点; 从压模的边缘或形成在压模中的对准标记检测压模的位置的步骤; 以及从任意点和压模的位置调整被转印物体与压模之间的相对位置的步骤; 以及使用其的压印装置。

8. 发明申请

US20060286193A1 Imprint device and microstructure transfer method 审中-公开
标题翻译：压印装置和微结构转印方法
公开(公告)号：US20060286193A1
公开(公告)日：2006-12-21
申请号：US11438336
申请日：2006-05-23
申请人： Takashi Ando , Susumu Komoriya , Masahiko Ogino , Chiseki Haginoya , Akihiro Miyauchi
发明人： Takashi Ando , Susumu Komoriya , Masahiko Ogino , Chiseki Haginoya , Akihiro Miyauchi
IPC分类号： B28B11/08
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F9/703 , G03F9/7088
摘要： In an imprint device and a microstructure transfer method, a fluid is ejected at the back of at least either a stamper or a transfer target body during pressurization of the stamper and the transfer target body. The fluid is ejected through plural holes formed in a stage disposed at the back of at least either the stamper or the transfer target body. The plural holes are connected to independent pressure regulating mechanisms, which can individually control the amount of fluid ejection, the timing of start of ejection, and so on. When the stamper is peeled from the transfer target body, the plural holes are evacuated to fix the stamper or the transfer target body to the stage by suction so as to peel the stamper. The present invention enables to apply uniform pressure to the stamper against the surface of the target substrate, to control the in-plane pressure distribution according to the surface profile or external appearance of the stamper or the target substrate, and to peel the stamper from the target substrate immediately after pressurization.
摘要翻译：在压印装置和微结构转印方法中，在压模和转印体的加压期间，在至少压模或转印体的至少一个的背面喷射流体。流体通过形成在设置在压模或转印体中的至少一个的背面的台中的多个孔喷出。多个孔连接到独立的压力调节机构，其可以单独控制流体喷射的量，喷射开始的时间等。当压模从转印体上剥离时，将多个孔抽真空，通过抽吸将压模或转印目标体固定在平台上，从而剥离压模。本发明能够对压模施加均匀的压力以抵抗目标基板的表面，以根据压模或目标基板的表面轮廓或外观来控制平面内的压力分布，并且将压模从加压后立即进行目标基材。

9. 发明授权

US08491291B2 Pattern transfer method and imprint device 失效
标题翻译：图案转印方法和印版装置
公开(公告)号：US08491291B2
公开(公告)日：2013-07-23
申请号：US13366792
申请日：2012-02-06
申请人： Takashi Ando , Susumu Komoriya , Masahiko Ogino , Akihiro Miyauchi
发明人： Takashi Ando , Susumu Komoriya , Masahiko Ogino , Akihiro Miyauchi
IPC分类号： B29C59/16
CPC分类号： G11B7/263 , B29C33/303 , B29C43/003 , B29C43/021 , B29C43/58 , B29C2043/025 , B29C2043/043 , B29C2043/3602 , B29C2043/3634 , B29C2043/5833 , B29L2011/0075 , B29L2017/005 , B29L2031/756
摘要： In order to allow for aligning a relative position between a transferred object and a stamper with high accuracy without providing an alignment pattern in the transferred object, there are provided: a pattern transfer method, including: when adjusting the relative position between the stamper and the transferred object, a step of detecting at least two or more edge positions of the transferred object and calculating an arbitrary point from the detected edge positions; a step of detecting a position of the stamper from an edge of the stamper or an alignment mark formed in the stamper; and a step of adjusting the relative position between the transferred object and the stamper from the arbitrary point and the position of the stamper; and an imprint device using the same.
摘要翻译：为了允许高精度地对准被转印物体与压模之间的相对位置，而不在被转移物体中提供对准图案，提供了一种图案转印方法，包括：当调节压模和检测被转移物体的至少两个以上边缘位置的步骤，并从检测到的边缘位置计算任意点; 从压模的边缘或形成在压模中的对准标记检测压模的位置的步骤; 以及从任意点和压模的位置调整被转印物体与压模之间的相对位置的步骤; 以及使用其的压印装置。

10. 发明授权

US08268209B2 Pattern forming method and its mold 失效
标题翻译：图案成型方法及其模具
公开(公告)号：US08268209B2
公开(公告)日：2012-09-18
申请号：US11623776
申请日：2007-01-17
申请人： Masahiko Ogino , Akihiro Miyauchi , Takashi Ando , Chiseki Haginoya , Susumu Komoriya , Yasunari Sohda , Souichi Katagiri , Hiroya Ohta , Yoshinori Nakayama
发明人： Masahiko Ogino , Akihiro Miyauchi , Takashi Ando , Chiseki Haginoya , Susumu Komoriya , Yasunari Sohda , Souichi Katagiri , Hiroya Ohta , Yoshinori Nakayama
IPC分类号： H01L23/544
CPC分类号： H01L21/76838 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/7076 , G11B5/855 , H01L23/544 , H01L2223/54453 , H01L2924/0002 , H01L2924/00
摘要： In a mold in which a pattern is formed of a fine concavo-convex shape, two or more of alignment marks for determining a relative positional relation between a substrate and a mold are formed concentrically. Moreover, a damaged mark is identified from the positional information and shape of the respective marks, and an alignment between the mold and the substrate to which a resin film is applied is carried out excluding the damaged mark.
摘要翻译：在图案形成为微细凹凸形状的模具中，同心地形成用于确定基板和模具之间的相对位置关系的两个或更多个对准标记。此外，根据各个标记的位置信息和形状来识别损坏的标记，并且除了损坏的标记之外，执行模具和施加了树脂膜的基板之间的对准。

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