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1. 发明申请

US20090170827A1 Acid Addition Salt of Dihydropyridine Derivative 审中-公开
标题翻译：二氢吡啶衍生物的酸加成盐
公开(公告)号：US20090170827A1
公开(公告)日：2009-07-02
申请号：US12085688
申请日：2006-11-28
申请人： Masahiko Hagihara , Motohisa Shimizu , Yasuo Seta , Katsuhiro Kobayashi , Yasushi Yoshigae
发明人： Masahiko Hagihara , Motohisa Shimizu , Yasuo Seta , Katsuhiro Kobayashi , Yasushi Yoshigae
IPC分类号： A61K31/4427 , C07D401/12 , A61P9/12
CPC分类号： C07D401/12
摘要： There is provided an excellent medicine for treating or preventing hypertension or the like. A specific acid addition salt of 2-amino-1,4-dihydro-6-methyl-4-(3-nitrophenyl)-3,5-pyridinedicarboxylic acid 3-(1-diphenylmethylazetidin-3-yl)ester 5-isopropyl ester is useful as a medicine for treating or preventing hypertension or the like.
摘要翻译：提供了用于治疗或预防高血压等的优良药物。 2-氨基-1,4-二氢-6-甲基-4-（3-硝基苯基）-3,5-吡啶二羧酸3-（1-二苯基甲基氮杂环丁烷-3-基）酯-5-异丙酯的特定酸加成盐作为治疗或预防高血压等的药物是有用的。

2. 发明申请

US20090170826A1 Acid Addition Salt of Optically Active Dihydropyridine Derivative 审中-公开
标题翻译：光活性二氢吡啶衍生物的酸加成盐
公开(公告)号：US20090170826A1
公开(公告)日：2009-07-02
申请号：US12085684
申请日：2006-11-28
申请人： Masahiko Hagihara , Motohisa Shimizu , Katsuhiro Kobayashi , Yasushi Yoshigae
发明人： Masahiko Hagihara , Motohisa Shimizu , Katsuhiro Kobayashi , Yasushi Yoshigae
IPC分类号： A61K31/4427 , C07D401/12 , A61K31/397 , A61P9/12
CPC分类号： C07D401/12
摘要： There is provided an excellent medicine for treating or preventing hypertension or the like. A specific acid addition salt of (R)-2-amino-1,4-dihydro-6-methyl-4-(3-nitrophenyl)-3,5-pyridinedicarboxylic acid 3-(1-diphenyl-methylazetidin-3-yl) ester 5-isopropyl ester is useful as a medicine for treating or preventing hypertension or the like.
摘要翻译：提供了用于治疗或预防高血压等的优良药物。（R）-2-氨基-1,4-二氢-6-甲基-4-（3-硝基苯基）-3,5-吡啶二羧酸3-（1-二苯基 - 甲基氮杂环丁烷-3-基））酯5-异丙酯可用作治疗或预防高血压等的药物。

3. 发明授权

US07565774B2 Seismic isolation apparatus 有权
标题翻译：隔震装置
公开(公告)号：US07565774B2
公开(公告)日：2009-07-28
申请号：US11294438
申请日：2005-12-06
申请人： Takahisa Shizuku , Masami Kikuchi , Katsuhiro Kobayashi , Yoshikatsu Sakai , Wataru Seki , Takashi Yokoi
发明人： Takahisa Shizuku , Masami Kikuchi , Katsuhiro Kobayashi , Yoshikatsu Sakai , Wataru Seki , Takashi Yokoi
IPC分类号： E04H9/00 , E04B1/98 , F16M13/00
CPC分类号： E04H9/022
摘要： A seismic isolation apparatus features damping characteristics equivalent to or better than prior art, without burdening the environment. In this seismic isolation apparatus, a cylindrical cavity portion is formed at the middle of an outer side laminated body, which has a form in which respective pluralities of resiliently deformable rubber rings and metal rings for maintaining rigidity are alternately laminated. A helically formed coil spring is disposed in this cavity portion so as to be snugly fitted. An inner side laminated body, which has a form in which respective pluralities of resiliently deformable rubber plates and metal plates for maintaining rigidity are alternately laminated, is disposed at an inner peripheral side of the coil spring.
摘要翻译：抗震隔离装置具有与现有技术相当或优于现有技术的阻尼特性，而不会对环境造成负担。在该隔震装置中，在外侧层叠体的中央部形成有圆筒状的空腔部，该外侧层叠体的形状为多个可弹性变形的橡胶环和保持刚性的金属环交替层叠。螺旋形螺旋弹簧设置在该空腔部分中以便紧密配合。具有多个可弹性变形的橡胶板和用于保持刚性的金属板交替层叠的形式的内侧层叠体设置在螺旋弹簧的内周侧。

4. 发明授权

US07211367B2 Photo acid generator, chemical amplification resist material 有权
标题翻译：照片酸发生器，化学放大抗蚀材料
公开(公告)号：US07211367B2
公开(公告)日：2007-05-01
申请号：US11373925
申请日：2006-03-13
申请人： Tomohiro Kobayashi , Satoshi Watanabe , Tsunehiro Nishi , Youichi Ohsawa , Katsuhiro Kobayashi
发明人： Tomohiro Kobayashi , Satoshi Watanabe , Tsunehiro Nishi , Youichi Ohsawa , Katsuhiro Kobayashi
IPC分类号： G03F7/031
CPC分类号： G03F7/0045 , C07D327/06 , G03F7/0395 , G03F7/0397 , G03F7/0758
摘要： A high resolution resist material comprising an acid generator is provided so that high sensitivity and high resolution for high energy rays of 300 nm or less, small line-edge roughness, and excellence in heat stability and storage stability are obtained. Moreover, a pattern formation method using this resist material are provided. Specifically, a novel compound of the following general formula (1); and a positive resist material comprising this compound preferably as a photo acid generator, and a base resin; are provided. This positive resist material may contain a basic compound or a dissolution inhibitor. Further, the present invention provides a pattern formation method comprising the steps of applying this positive resist material on a substrate, then heat-treating the material, exposing the treated material to a high energy ray having a wavelength of 300 nm or less via a photo mask, optionally heat-treating the exposed material, and developing the material using a developer
摘要翻译：提供了包含酸产生器的高分辨率抗蚀剂材料，从而获得了300nm以下的高能量射线的高灵敏度和高分辨率，小的线边缘粗糙度，以及热稳定性和储存稳定性方面的优异性。此外，提供了使用该抗蚀剂材料的图案形成方法。具体地，下述通式（1）的新化合物; 以及优选含有该化合物作为光酸发生剂的正性抗蚀剂材料和基础树脂; 被提供。该正性抗蚀剂材料可含有碱性化合物或溶解抑制剂。此外，本发明提供了一种图案形成方法，包括以下步骤：将该正性抗蚀剂材料涂布在基板上，然后对该材料进行热处理，通过照片将经处理的材料暴露于波长为300nm以下的高能量射线掩模，任选地热处理暴露的材料，以及使用显影剂显影材料

5. 发明申请

US20070021234A1 Golf club 有权
标题翻译：高尔夫俱乐部
公开(公告)号：US20070021234A1
公开(公告)日：2007-01-25
申请号：US11482117
申请日：2006-07-07
申请人： Masaei Tsurumaki , Katsuhiro Kobayashi , Takayuki Ando
发明人： Masaei Tsurumaki , Katsuhiro Kobayashi , Takayuki Ando
IPC分类号： A63B53/00
CPC分类号： A63B53/0466 , A63B2053/0416 , A63B2053/0433 , A63B2053/045
摘要： In a driver golf head (1) comprising a face (4) having a hitting surface, a sole (3) forming a lower portion, and a crown (5) forming an upper portion, the sole (3) is improved. The sole (3) in the position close to the face (4) was formed into an elastically deformable recess-projection shape, and part of the face (4) was formed into a projecting shape and integrated with the sole (3) to increase rigidity. Using a configuration with increased rigidity and decreased rigidity between the face (4) and sole to obtain an elastically deformable portion and providing a high-rigidity body (12) increased the repulsion force in the lower portion of the face and extended the traveling distance of the golf ball.
摘要翻译：在包括具有击打面的面（4）的驱动器高尔夫球头（1）中，形成下部的鞋底（3）和形成上部的胎冠（5）被改善。在靠近面（4）的位置处的鞋底（3）形成为可弹性变形的凹凸形状，并且面部（4）的一部分形成为突出形状并与鞋底（3）一体化以增加刚性。使用具有增加的刚性并且在面部（4）和鞋底之间的刚性降低的构造以获得可弹性变形部分并且提供高刚性体（12）的构造增加了面部下部的排斥力并延长了高尔夫球。

6. 发明授权

US06945877B2 Golf club 失效
标题翻译：高尔夫俱乐部
公开(公告)号：US06945877B2
公开(公告)日：2005-09-20
申请号：US10781633
申请日：2004-02-20
申请人： Katsuhiro Kobayashi , Kuniji Kobe
发明人： Katsuhiro Kobayashi , Kuniji Kobe
IPC分类号： A63B53/04
CPC分类号： A63B53/04 , A63B53/0466 , A63B60/00 , A63B2053/0408 , A63B2053/0491
摘要： A golf club is provided in which, whether the loft angle is small or large, backspin is reduced and there is no decrease in carry. A golf club construction is obtained wherein, in a driver club head (1) comprising a face section 4 having a striking surface, a sole section (3) forming the bottom, a crown section (2) forming the top and a back section (3a) forming the back portion, when the loft angle is small, the amount of backspin is reduced and performance is maintained, and even when the loft angle is large, the amount of backspin is reduced and a good carry distance is achieved. For this purpose, the crown section (2) is improved, with the provision of a weight (8) on the inside surface thereof nearer to the face section than the center of the surface
摘要翻译：提供了一种高尔夫球杆，其中无论倾角是小还是大，后旋都减小，而且进位没有减小。获得高尔夫球杆结构，其中在包括具有打击表面的面部4的驾驶员球杆头（1）中，形成底部的鞋底部分（3），形成顶部的顶部部分（2）和后部（如图3（a）所示，形成后部，当倾斜角度小时，反旋转的量减少并且性能得以保持，并且即使当倾斜角大时，反向旋转的量也减小，并且实现良好的行进距离。为此目的，改进了冠部（2），在其表面上设置比表面中心更靠近面部的重量（8）

7. 发明申请

US20050048395A1 Novel sulfonyldiazomethane compounds, photoacid generator, resist materials and patterning process using the same 有权
标题翻译：新型磺酰基重氮甲烷化合物，光致酸发生剂，抗蚀剂材料和使用其的图案化工艺
公开(公告)号：US20050048395A1
公开(公告)日：2005-03-03
申请号：US10929059
申请日：2004-08-27
申请人： Katsuhiro Kobayashi , Youichi Ohsawa , Takeshi Kinsho , Eiji Fukuda , Shigeo Tanaka
发明人： Katsuhiro Kobayashi , Youichi Ohsawa , Takeshi Kinsho , Eiji Fukuda , Shigeo Tanaka
IPC分类号： C07C317/28 , C07D317/56 , C07D317/72 , C07D319/08 , C09K3/00 , G03C5/18 , G03F7/004 , G03F7/038 , G03F7/039 , H01L21/027
CPC分类号： C07D317/72 , C07C317/28 , C07C2601/14 , C07D319/08 , G03F7/0045 , G03F7/0382 , G03F7/0392 , G03F7/0395 , Y10S430/106 , Y10S430/111
摘要： Provided are sulfonyldiazomethane compounds and photoacid generators suited for resist materials which generate less foreign matters after application, development and peeling, and in particular, are excellent in the pattern profile after the development; and resist materials and patterning process using them. Provided are sulfonyldiazomethane compounds represented by formula (1): Also provides are photoacid generators containing the sulfonyldiazomethane compounds, and a chemical amplification resist material comprising (A) a resin which changes its solubility in an alkali developer by action of an acid, and (B) a sulfonyldiazomethane compound of formula (1) capable of generating an acid by exposure to radiation. Provided is a patterning process comprising steps of applying the above-described resist material onto a substrate to form a coating, heating the coating, exposing the coating, and developing the exposed coating in a developer after an optional heat treatment.
摘要翻译：本发明提供了适用于在涂布，显影和剥离后产生较少外来物质的抗蚀剂材料的磺酰基重氮甲烷化合物和光致酸发生剂，特别是显影后的图案特征优异; 并使用它们抵抗材料和图案化工艺。提供由式（1）表示的磺酰基重氮甲烷化合物：还提供含有磺酰基重氮甲烷化合物的光酸产生剂和化学扩增抗蚀剂材料，其包含（A）通过酸的作用改变其在碱性显影剂中的溶解度的树脂和（B ）能够通过暴露于辐射而产生酸的式（1）的磺酰基重氮甲烷化合物。提供了一种图案化方法，包括以下步骤：在任选的热处理之后，将上述抗蚀剂材料施加到基底上以形成涂层，加热涂层，暴露涂层，以及将曝光的涂层显影在显影剂中。

8. 发明授权

US07919226B2 Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process 有权
标题翻译：磺酸盐和衍生物，光酸产生剂，抗蚀剂组合物和图案化方法
公开(公告)号：US07919226B2
公开(公告)日：2011-04-05
申请号：US12222645
申请日：2008-08-13
申请人： Youichi Ohsawa , Takeru Watanabe , Takeshi Kinsho , Katsuhiro Kobayashi
发明人： Youichi Ohsawa , Takeru Watanabe , Takeshi Kinsho , Katsuhiro Kobayashi
IPC分类号： G03F7/004 , G03F7/30 , C07C309/06
CPC分类号： C07C309/12 , C07C381/12 , C07D307/64 , C07D307/68 , C07D333/46 , G03F7/0045 , Y10S430/106 , Y10S430/111 , Y10S430/122 , Y10S430/126
摘要： Sulfonate salts have the formula:CF3—CH(OCOR)—CF2SO3−M+ wherein R is C1-C20 alkyl or C6-C14 aryl, and M+ is a lithium, sodium, potassium, ammonium or tetramethylammonium ion. Onium salts, oximesulfonates and sulfonyloxyimides and other compounds derived from these sulfonate salts are effective photoacid generators in chemically amplified resist compositions.
摘要翻译：磺酸盐具有式：CF 3 -CH（OCOR）-CF 2 SO 3 -M +，其中R是C 1 -C 20烷基或C 6 -C 14芳基，M +是锂，钠，钾，铵或四甲基铵离子。鎓盐，肟磺酸盐和磺酰氧基酰亚胺以及衍生自这些磺酸盐的其它化合物是化学放大抗蚀剂组合物中有效的光致酸产生剂。

9. 发明授权

US07833694B2 Lactone-containing compound, polymer, resist composition, and patterning process 有权
标题翻译：含内酯的化合物，聚合物，抗蚀剂组合物和图案化工艺
公开(公告)号：US07833694B2
公开(公告)日：2010-11-16
申请号：US12403317
申请日：2009-03-12
申请人： Koji Hasegawa , Satoshi Shinachi , Katsuhiro Kobayashi , Tsunehiro Nishi , Takeshi Kinsho
发明人： Koji Hasegawa , Satoshi Shinachi , Katsuhiro Kobayashi , Tsunehiro Nishi , Takeshi Kinsho
IPC分类号： G03F7/004 , G03F7/30 , C08F28/06 , C07D407/04 , C07C69/74
CPC分类号： C07D307/83 , C07D307/85 , C07D311/74 , C07D313/08 , C07D493/22 , Y10S430/108 , Y10S430/111
摘要： Lactone-containing compounds having formula (1) are novel wherein R1 is H, F, methyl or trifluoromethyl, R2 and R3 are H or monovalent hydrocarbon groups, or R2 and R3 may together form an aliphatic hydrocarbon ring, R4 is H or CO2R5, R5 is a monovalent hydrocarbon group, W is CH2, O or S, and k1 is 3, 4 or 5. They are useful as monomers to produce polymers which are transparent to radiation ≦500 nm. Radiation-sensitive resist compositions comprising the polymers as base resin exhibit excellent properties including resolution, LER, pattern density dependency and exposure margin.
摘要翻译：具有式（1）的含内酯的化合物是新的，其中R 1是H，F，甲基或三氟甲基，R 2和R 3是H或一价烃基，或者R 2和R 3可以一起形成脂族烃环，R 4是H或CO 2 R 5， R5是单价烃基，W是CH2，O或S，k1是3,4或5.它们可用作产生对辐射透明的聚合物500奈米。包含作为基础树脂的聚合物的辐射敏感性抗蚀剂组合物表现出优异的性能，包括分辨率，LER，图案密度依赖性和曝光余量。

10. 发明授权

US07531290B2 Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process 有权
标题翻译：磺酸盐和衍生物，光酸产生剂，抗蚀剂组合物和图案化方法
公开(公告)号：US07531290B2
公开(公告)日：2009-05-12
申请号：US11588413
申请日：2006-10-27
申请人： Katsuhiro Kobayashi , Youichi Ohsawa , Takeshi Kinsho , Takeru Watanabe
发明人： Katsuhiro Kobayashi , Youichi Ohsawa , Takeshi Kinsho , Takeru Watanabe
IPC分类号： G03C1/73 , G03F7/039 , G03F7/20 , G03F7/30 , C07C303/32
CPC分类号： C07C381/12 , C07C309/07 , G03F7/0045 , G03F7/2041 , Y10S430/106 , Y10S430/108 , Y10S430/12 , Y10S430/121 , Y10S430/122 , Y10S430/126
摘要： Sulfonate salts have the formula: R1SO3—CH(Rf)—CF2SO3−M+ wherein R1 is alkyl or aryl, Rf is H or trifluoromethyl, and M+ is a Li, Na, K, ammonium or tetramethylammonium ion. Onium salts, oximesulfonates and sulfonyloxyimides and other compounds derived from these sulfonate salts are effective photoacid generators in chemically amplified resist compositions.
摘要翻译：磺酸盐具有下式：<？in-line-formula description =“In-line Formulas”end =“lead”？> R1SO3-CH（Rf）-CF2SO3-M + <？in-line-formula description =“In- 其中R1是烷基或芳基，Rf是H或三氟甲基，M +是Li，Na，K，铵或四甲基铵离子。鎓盐，肟磺酸盐和磺酰氧基酰亚胺以及衍生自这些磺酸盐的其它化合物是化学放大抗蚀剂组合物中有效的光致酸产生剂。

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