专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US08642988B2 Non-volatile memory device 有权
标题翻译：非易失性存储器件
公开(公告)号：US08642988B2
公开(公告)日：2014-02-04
申请号：US13588112
申请日：2012-08-17
申请人： Masaharu Kinoshita , Yoshitaka Sasago , Takashi Kobayashi , Hiroyuki Minemura
发明人： Masaharu Kinoshita , Yoshitaka Sasago , Takashi Kobayashi , Hiroyuki Minemura
IPC分类号： H01L29/02
CPC分类号： H01L45/144 , G11C13/0004 , G11C2213/71 , G11C2213/74 , G11C2213/75 , G11C2213/78 , H01L27/2409 , H01L27/2481 , H01L45/06
摘要： A non-volatile memory device includes: a first line extending along a main surface of a substrate; a stack provided above the first line; a second line formed above the stack; a select element provided where the first and second lines intersect, the select element adapted to pass current in a direction perpendicular to the main surface; a second insulator film provided along a side surface of the stack; a channel layer provided along the second insulator film; an adhesion layer provided along the channel layer; and a variable resistance material layer provided along the adhesion layer, wherein the first and second lines are electrically connected via the select element and channel layer, a contact resistance via the adhesion layer between the channel layer and variable resistance material layer is low, and a resistance of the adhesion layer is high with respect to an extending direction of the channel layer.
摘要翻译：非易失性存储器件包括：沿衬底的主表面延伸的第一线; 提供在第一行之上的堆栈; 在堆叠之上形成第二线; 设置在所述第一和第二线相交的选择元件，所述选择元件适于在垂直于所述主表面的方向上传递电流; 沿着所述堆叠的侧表面设置的第二绝缘膜; 沿所述第二绝缘膜设置的沟道层; 沿着沟道层提供的粘合层; 以及沿着粘合层设置的可变电阻材料层，其中第一和第二线经由选择元件和沟道层电连接，通过沟道层和可变电阻材料层之间的粘合层的接触电阻低，并且粘合层的电阻相对于沟道层的延伸方向高。

2. 发明授权

US08830740B2 Semiconductor storage device 有权
标题翻译：半导体存储设备
公开(公告)号：US08830740B2
公开(公告)日：2014-09-09
申请号：US13814104
申请日：2011-08-26
申请人： Yoshitaka Sasago , Hiroyuki Minemura , Takashi Kobayashi , Toshimichi Shintani , Satoru Hanzawa , Masaharu Kinoshita
发明人： Yoshitaka Sasago , Hiroyuki Minemura , Takashi Kobayashi , Toshimichi Shintani , Satoru Hanzawa , Masaharu Kinoshita
IPC分类号： G11C11/00 , H01L47/00 , G11C13/00
CPC分类号： G11C13/0004 , G11C2213/71 , G11C2213/72 , G11C2213/75 , H01L27/2436 , H01L27/2463 , H01L27/2481 , H01L45/06 , H01L45/1233
摘要： The purpose of the present invention is to improve a rewriting transmission rate and reliability of a phase change memory. To attain the purpose, a plurality of phase change memory cells (SMC or USMC) which are provided in series between a word line (2) and a bit line (3) and have a selection element and a storage element that are parallel connected with each other are entirely set, and after that, a part of the cells corresponding to a data pattern is reset. Alternatively, the reverse of the operation is carried out.
摘要翻译：本发明的目的是提高相变存储器的重写传输速率和可靠性。为了实现该目的，在串行（2）和位线（3）之间串联提供多个相变存储单元（SMC或USMC），并且具有并联连接的选择元件和存储元件彼此完全设置，之后，与数据模式对应的单元的一部分被重置。或者，执行相反的操作。

3. 发明申请

US20130141968A1 SEMICONDUCTOR STORAGE DEVICE 有权
标题翻译：半导体存储设备
公开(公告)号：US20130141968A1
公开(公告)日：2013-06-06
申请号：US13814104
申请日：2011-08-26
申请人： Yoshitaka Sasago , Hiroyuki Minemura , Takashi Kobayashi , Toshimichi Shintani , Satoru Hanzawa , Masaharu Kinoshita
发明人： Yoshitaka Sasago , Hiroyuki Minemura , Takashi Kobayashi , Toshimichi Shintani , Satoru Hanzawa , Masaharu Kinoshita
IPC分类号： G11C13/00
CPC分类号： G11C13/0004 , G11C2213/71 , G11C2213/72 , G11C2213/75 , H01L27/2436 , H01L27/2463 , H01L27/2481 , H01L45/06 , H01L45/1233
摘要： The purpose of the present invention is to improve a rewriting transmission rate and reliability of a phase change memory. To attain the purpose, a plurality of phase change memory cells (SMC or USMC) which are provided in series between a word line (2) and a bit line (3) and have a selection element and a storage element that are parallel connected with each other are entirely set, and after that, a part of the cells corresponding to a data pattern is reset. Alternatively, the reverse of the operation is carried out.
摘要翻译：本发明的目的是提高相变存储器的重写传输速率和可靠性。为了实现该目的，在串行（2）和位线（3）之间串联提供多个相变存储单元（SMC或USMC），并且具有并联连接的选择元件和存储元件彼此完全设置，之后，与数据模式对应的单元的一部分被重置。或者，执行相反的操作。

4. 发明申请

US20130075684A1 NON-VOLATILE MEMORY DEVICE 有权
标题翻译：非易失性存储器件
公开(公告)号：US20130075684A1
公开(公告)日：2013-03-28
申请号：US13588112
申请日：2012-08-17
申请人： Masaharu Kinoshita , Yoshitaka Sasago , Takashi Kobayashi , Hiroyuki Minemura
发明人： Masaharu Kinoshita , Yoshitaka Sasago , Takashi Kobayashi , Hiroyuki Minemura
IPC分类号： H01L45/00 , B82Y99/00
CPC分类号： H01L45/144 , G11C13/0004 , G11C2213/71 , G11C2213/74 , G11C2213/75 , G11C2213/78 , H01L27/2409 , H01L27/2481 , H01L45/06
摘要： A non-volatile memory device includes: a first line extending along a main surface of a substrate; a stack provided above the first line; a second line formed above the stack; a select element provided where the first and second lines intersect, the select element adapted to pass current in a direction perpendicular to the main surface; a second insulator film provided along a side surface of the stack; a channel layer provided along the second insulator film; an adhesion layer provided along the channel layer; and a variable resistance material layer provided along the adhesion layer, wherein the first and second lines are electrically connected via the select element and channel layer, a contact resistance via the adhesion layer between the channel layer and variable resistance material layer is low, and a resistance of the adhesion layer is high with respect to an extending direction of the channel layer.
摘要翻译：非易失性存储器件包括：沿衬底的主表面延伸的第一线; 提供在第一行之上的堆栈; 在堆叠之上形成第二线; 设置在所述第一和第二线相交的选择元件，所述选择元件适于在垂直于所述主表面的方向上传递电流; 沿着所述堆叠的侧表面设置的第二绝缘膜; 沿所述第二绝缘膜设置的沟道层; 沿着沟道层提供的粘合层; 以及沿着粘合层设置的可变电阻材料层，其中第一和第二线经由选择元件和沟道层电连接，通过沟道层和可变电阻材料层之间的粘合层的接触电阻低，并且粘合层的电阻相对于沟道层的延伸方向高。

5. 发明申请

US20130228739A1 NONVOLATILE MEMORY DEVICE AND METHOD FOR MANUFACTURING SAME 有权
标题翻译：非易失性存储器件及其制造方法
公开(公告)号：US20130228739A1
公开(公告)日：2013-09-05
申请号：US13884263
申请日：2010-12-06
申请人： Yoshitaka Sasago , Masaharu Kinoshita , Mitsuharu Tai , Akio Shima , Kenzo Kurotsuchi , Takashi Kobayashi
发明人： Yoshitaka Sasago , Masaharu Kinoshita , Mitsuharu Tai , Akio Shima , Kenzo Kurotsuchi , Takashi Kobayashi
IPC分类号： H01L45/00
CPC分类号： H01L45/1608 , G11C13/0004 , G11C2213/75 , H01L27/0688 , H01L27/1021 , H01L27/11578 , H01L27/11582 , H01L27/2409 , H01L27/2454 , H01L27/2481 , H01L27/249 , H01L29/7926 , H01L45/04 , H01L45/06 , H01L45/1233 , H01L45/1253 , H01L45/144 , H01L45/16 , H01L45/1675
摘要： When a thin channel semiconductor layer formed on a side wall of a stacked film in which insulating films and gate electrodes are alternately stacked together is removed on the stacked film, a contact resistance between a vertical transistor including the channel semiconductor layer and the gate electrode, and a bit line formed on the stacked film is prevented from rising. As its means, a conductive layer electrically connected to the channel semiconductor layer is disposed immediately above the stacked film.
摘要翻译：当在叠层薄膜上除去形成在绝缘膜和栅电极交替层叠在一起的叠层膜的侧壁上的薄沟道半导体层时，包括沟道半导体层的垂直晶体管与栅电极之间的接触电阻，并且防止形成在层叠膜上的位线上升。作为其手段，电连接到沟道半导体层的导电层设置在堆叠膜的正上方。

6. 发明授权

US08866123B2 Non-volatile memory device and production method thereof 有权
标题翻译：非易失性存储器件及其制造方法
公开(公告)号：US08866123B2
公开(公告)日：2014-10-21
申请号：US13884331
申请日：2010-11-22
申请人： Yoshitaka Sasago , Masaharu Kinoshita , Takahiro Morikawa , Akio Shima , Takashi Kobayashi
发明人： Yoshitaka Sasago , Masaharu Kinoshita , Takahiro Morikawa , Akio Shima , Takashi Kobayashi
IPC分类号： H01L47/00 , H01L45/00 , H01L29/792 , H01L27/24 , H01L29/66 , H01L27/115
CPC分类号： H01L27/2436 , H01L27/1157 , H01L27/11582 , H01L27/2409 , H01L27/2454 , H01L27/2481 , H01L27/249 , H01L29/66833 , H01L29/7926 , H01L45/06 , H01L45/1226 , H01L45/1233 , H01L45/144 , H01L45/1608 , H01L45/1616 , H01L45/1683
摘要： A vertical chain memory includes two-layer select transistors having first select transistors which are vertical transistors arranged in a matrix, and second select transistors which are vertical transistors formed on the respective first select transistors, and a plurality of memory cells connected in series on the two-layer select transistors. With this configuration, the adjacent select transistors are prevented from being selected by respective shared gates, the plurality of two-layer select transistors can be selected, independently, and a storage capacity of a non-volatile storage device is prevented from being reduced.
摘要翻译：垂直链式存储器包括具有第一选择晶体管的两层选择晶体管，它们是以矩阵形式排列的垂直晶体管，第二选择晶体管是形成在各个第一选择晶体管上的垂直晶体管，以及多个存储单元串联连接双层选择晶体管。利用这种配置，防止相邻的选择晶体管被相应的共享栅极选择，可以独立地选择多个两层选择晶体管，并且防止非易失性存储装置的存储容量减小。

7. 发明授权

US08772746B2 Semiconductor memory device 有权
标题翻译：半导体存储器件
公开(公告)号：US08772746B2
公开(公告)日：2014-07-08
申请号：US13349653
申请日：2012-01-13
申请人： Masaharu Kinoshita , Yoshitaka Sasago , Takashi Kobayashi
发明人： Masaharu Kinoshita , Yoshitaka Sasago , Takashi Kobayashi
IPC分类号： H01L47/00
CPC分类号： H01L45/06 , H01L27/2454 , H01L27/2472 , H01L45/144 , H01L45/1675
摘要： A semiconductor memory device in which the cell area can be decreased and the minimum feature size is not restricted by the thickness of the material forming the memory cell. In a semiconductor memory device, a gate insulating film, a channel extending in a direction X, and a resistance change element extending in the direction X are formed successively above multiple word lines extending in a direction Y, and a portion of the channel and a portion of the resistance change element are disposed above each of the plurality of the word lines. Such configuration can decrease the cell area and ensure the degree of design freedom.
摘要翻译：可以减小单元面积并且最小特征尺寸不受形成存储单元的材料的厚度的半导体存储器件。在半导体存储器件中，连续地沿着Y方向延伸的多个字线形成栅极绝缘膜，沿X方向延伸的沟道和沿X方向延伸的电阻变化元件，并且沟道的一部分和电阻变化元件的一部分设置在多条字线的上方。这样的配置可以减小单元面积并确保设计自由度。

8. 发明授权

US09153774B2 Nonvolatile memory device and method for manufacturing same 有权
标题翻译：非易失性存储器件及其制造方法
公开(公告)号：US09153774B2
公开(公告)日：2015-10-06
申请号：US13884263
申请日：2010-12-06
申请人： Yoshitaka Sasago , Masaharu Kinoshita , Mitsuharu Tai , Akio Shima , Kenzo Kurotsuchi , Takashi Kobayashi
发明人： Yoshitaka Sasago , Masaharu Kinoshita , Mitsuharu Tai , Akio Shima , Kenzo Kurotsuchi , Takashi Kobayashi
IPC分类号： H01L27/06 , H01L45/00 , H01L27/102 , H01L29/792 , H01L27/24 , H01L27/115 , G11C13/00
CPC分类号： H01L45/1608 , G11C13/0004 , G11C2213/75 , H01L27/0688 , H01L27/1021 , H01L27/11578 , H01L27/11582 , H01L27/2409 , H01L27/2454 , H01L27/2481 , H01L27/249 , H01L29/7926 , H01L45/04 , H01L45/06 , H01L45/1233 , H01L45/1253 , H01L45/144 , H01L45/16 , H01L45/1675
摘要： When a thin channel semiconductor layer formed on a side wall of a stacked film in which insulating films and gate electrodes are alternately stacked together is removed on the stacked film, a contact resistance between a vertical transistor including the channel semiconductor layer and the gate electrode, and a bit line formed on the stacked film is prevented from rising. As its means, a conductive layer electrically connected to the channel semiconductor layer is disposed immediately above the stacked film.
摘要翻译：当在叠层薄膜上除去形成在绝缘膜和栅电极交替层叠在一起的叠层膜的侧壁上的薄沟道半导体层时，包括沟道半导体层的垂直晶体管与栅电极之间的接触电阻，并且防止形成在层叠膜上的位线上升。作为其手段，电连接到沟道半导体层的导电层设置在堆叠膜的正上方。

9. 发明授权

US08563961B2 Semiconductor storage device and method for manufacturing same 有权
标题翻译：半导体存储装置及其制造方法
公开(公告)号：US08563961B2
公开(公告)日：2013-10-22
申请号：US13515435
申请日：2010-12-13
申请人： Yoshitaka Sasago , Akio Shima , Satoru Hanzawa , Takashi Kobayashi , Masaharu Kinoshita , Norikastsu Takaura
发明人： Yoshitaka Sasago , Akio Shima , Satoru Hanzawa , Takashi Kobayashi , Masaharu Kinoshita , Norikastsu Takaura
IPC分类号： H01L47/00
CPC分类号： H01L45/1666 , H01L27/224 , H01L27/2409 , H01L27/2454 , H01L27/2481 , H01L45/04 , H01L45/06 , H01L45/12 , H01L45/1206 , H01L45/1233 , H01L45/144 , H01L45/1608 , H01L45/1641 , H01L45/1675 , H01L45/1683
摘要： Disclosed are a semiconductor storage device and a method for manufacturing the semiconductor storage device, whereby the bit cost of memory using a variable resistance material is reduced. The semiconductor storage device has: a substrate; a first word line (2) which is provided above the substrate; a first laminated body, which is disposed above the first word line (2), and which has the N+1 (N≧1) number of first inter-gate insulating layers (11-15) and the N number of first semiconductor layers (21p-24p) alternately laminated in the height direction of the substrate; a first bit line (3), which extends in the direction that intersects the first word line (2), and which is disposed above the laminated body; a first gate insulating layer (9) which is provided on the side surface of the N+1 number of the first inter-gate insulating layers (11-15) and those of the N number of the first semiconductor layers (21p-24p); a first channel layer (8p) which is provided on the side surface of the first gate insulating layer (9); and a first variable resistance material layer (7) which is provided on the side surface of the first channel layer. The first variable material layer (7) is in a region where the first word line (2) and the first bit line (3) intersect each other. Furthermore, a polysilicon diode (PD) is used as a selection element.
摘要翻译：公开了一种半导体存储装置和用于制造半导体存储装置的方法，由此降低了使用可变电阻材料的存储器的位成本。半导体存储装置具有：基板; 设置在基板上方的第一字线（2）第一层叠体，其设置在第一字线（2）的上方，并且具有N + 1（N> = 1）个第一栅极间绝缘层（11-15）和N个第一半导体层（21p-24p）在基板的高度方向交替层叠; 第一位线（3），其在与所述第一字线（2）相交的方向上延伸，并且位于所述层叠体的上方; 设置在N + 1个第一栅极绝缘层（11-15）的侧表面和N个第一半导体层（21p-24p）的侧表面上的第一栅极绝缘层（9） ; 设置在第一栅极绝缘层（9）的侧面上的第一沟道层（8p）; 以及设置在第一沟道层的侧表面上的第一可变电阻材料层（7）。第一可变材料层（7）在第一字线（2）和第一位线（3）彼此相交的区域中。此外，使用多晶硅二极管（PD）作为选择元件。

10. 发明申请

US20130234101A1 NON-VOLATILE MEMORY DEVICE AND PRODUCTION METHOD THEREOF 有权
公开(公告)号：US20130234101A1
公开(公告)日：2013-09-12
申请号：US13884331
申请日：2010-11-22
申请人： Yoshitaka Sasago , Masaharu Kinoshita , Takahiro Morikawa , Akio Shima , Takashi Kobayashi
发明人： Yoshitaka Sasago , Masaharu Kinoshita , Takahiro Morikawa , Akio Shima , Takashi Kobayashi
IPC分类号： H01L45/00
CPC分类号： H01L27/2436 , H01L27/1157 , H01L27/11582 , H01L27/2409 , H01L27/2454 , H01L27/2481 , H01L27/249 , H01L29/66833 , H01L29/7926 , H01L45/06 , H01L45/1226 , H01L45/1233 , H01L45/144 , H01L45/1608 , H01L45/1616 , H01L45/1683
摘要： A vertical chain memory includes two-layer select transistors having first select transistors which are vertical transistors arranged in a matrix, and second select transistors which are vertical transistors formed on the respective first select transistors, and a plurality of memory cells connected in series on the two-layer select transistors. With this configuration, the adjacent select transistors are prevented from being selected by respective shared gates, the plurality of two-layer select transistors can be selected, independently, and a storage capacity of a non-volatile storage device is prevented from being reduced.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式