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1. 发明授权

US07416330B2 Method and apparatus for measuring temperature of substrate 有权
标题翻译：测量基板温度的方法和装置
公开(公告)号：US07416330B2
公开(公告)日：2008-08-26
申请号：US11196402
申请日：2005-08-04
申请人： Masafumi Ito , Yasuyuki Okamura , Tatsuo Shiina , Nobuo Ishii , Tomohiro Suzuki , Chishio Koshimizu
发明人： Masafumi Ito , Yasuyuki Okamura , Tatsuo Shiina , Nobuo Ishii , Tomohiro Suzuki , Chishio Koshimizu
IPC分类号： G01J5/08 , G01N25/00
CPC分类号： G01J5/0003 , G01K11/12
摘要： The temperature of the surface and/or inside of a substrate is measured by irradiating the front surface or rear surface of the substrate, whose temperature is to be measured, with light and measuring the interference of a reflected light from the substrate and a reference light. A method and apparatus for measuring temperature or thickness which is suitable for directly measuring the temperature of the outermost surface layer of a substrate, and an apparatus for treating a substrate for an electronic device, which uses such method, are provided.
摘要翻译：基板的表面和/或内部的温度通过用光照射待测温度的基板的前表面或后表面并测量来自基板的反射光的干涉和参考光来测量。提供了一种用于测量温度或厚度的方法和装置，其适用于直接测量基板的最外表面层的温度，以及使用这种方法的用于处理电子设备的基板的设备。

2. 发明申请

US20050271116A1 Method and apparatus for measuring temperature of substrate 有权
公开(公告)号：US20050271116A1
公开(公告)日：2005-12-08
申请号：US11196402
申请日：2005-08-04
申请人： Masafumi Ito , Yasuyuki Okamura , Tatsuo Shiina , Nobuo Ishii , Tomohiro Suzuki , Chishio Koshimizu
发明人： Masafumi Ito , Yasuyuki Okamura , Tatsuo Shiina , Nobuo Ishii , Tomohiro Suzuki , Chishio Koshimizu
IPC分类号： G01J5/00 , G01K11/12 , H01L21/324 , G01K1/16
CPC分类号： G01J5/0003 , G01K11/12
摘要： The temperature of the surface and/or inside of a substrate is measured by irradiating the front surface or rear surface of the substrate, whose temperature is to be measured, with light and measuring the interference of a reflected light from the substrate and a reference light. A method and apparatus for measuring temperature or thickness which is suitable for directly measuring the temperature of the outermost surface layer of a substrate, and an apparatus for treating a substrate for an electronic device, which uses such method, are provided.

3. 发明申请

US20050259716A1 Method and apparatus for measuring temperature of substrate 审中-公开
标题翻译：测量基板温度的方法和装置
公开(公告)号：US20050259716A1
公开(公告)日：2005-11-24
申请号：US10964647
申请日：2004-10-15
申请人： Masafumi Ito , Yasuyuki Okamura , Tatsuo Shiina , Nobuo Ishii
发明人： Masafumi Ito , Yasuyuki Okamura , Tatsuo Shiina , Nobuo Ishii
IPC分类号： G01J5/00 , G01K11/12 , H01L21/324 , G01K11/00 , G01K1/16
CPC分类号： G01J5/0003 , G01K11/12
摘要： The temperature of the surface and/or inside of a substrate is measured by irradiating the front surface or rear surface of the substrate, whose temperature is to be measured, with light and measuring the interference of a reflected light from the substrate and a reference light. A method and apparatus for measuring temperature or thickness which is suitable for directly measuring the temperature of the outermost surface layer of a substrate, and an apparatus for treating a substrate for an electronic device, which uses such method, are provided.
摘要翻译：基板的表面和/或内部的温度通过用光照射待测温度的基板的前表面或后表面并测量来自基板的反射光的干涉和参考光来测量。提供了一种用于测量温度或厚度的方法和装置，其适用于直接测量基板的最外表面层的温度，以及使用这种方法的用于处理电子设备的基板的设备。

4. 发明授权

US06501082B1 Plasma deposition apparatus and method with controller 失效
标题翻译：等离子体沉积设备及方法与控制器
公开(公告)号：US06501082B1
公开(公告)日：2002-12-31
申请号：US09527562
申请日：2000-03-16
申请人： Toshio Goto , Masaru Hori , Masafumi Ito , Nobuo Ishii , Satoru Kawakami
发明人： Toshio Goto , Masaru Hori , Masafumi Ito , Nobuo Ishii , Satoru Kawakami
IPC分类号： G21K510
CPC分类号： H01J37/32192 , H01J37/3233 , H01J37/32623
摘要： A controlled plasma deposition system and method are provided including a vacuum vessel. An electron adding mass spectrometer is connected to a vacuum vessel for carrying out a gas treatment for a semi-conductor wafer. In the mass spectrometer, a gas in the vacuum vessel is incorporated, and electrons are added to the particles in the gas. Then the value of negative ions obtained by ionizing the particles, for example specific radicals, is measured. Once measured, the information is forwarded to a controller that may optimize the plasma deposition method.
摘要翻译：提供了包括真空容器的受控等离子体沉积系统和方法。将电子加入质谱仪连接到用于对半导体晶片进行气体处理的真空容器。在质谱仪中，并入真空容器中的气体，并将电子加到气体中的颗粒中。然后测量通过电离粒子，例如特定基团获得的负离子的值。一旦测量，信息被转发到可优化等离子体沉积方法的控制器。

5. 外观设计

USD742304S1 Motorcycle tire 有权
公开(公告)号：USD742304S1
公开(公告)日：2015-11-03
申请号：US29466214
申请日：2013-09-05
申请人： Masafumi Ito
设计人： Masafumi Ito

6. 外观设计

USD730324S1 Digital mixer 有权
标题翻译：数字调音台
公开(公告)号：USD730324S1
公开(公告)日：2015-05-26
申请号：US29415737
申请日：2012-03-14
申请人： Masafumi Ito
设计人： Masafumi Ito

7. 发明授权

US09041937B2 Interference measurement device and measurement method 有权
标题翻译：干涉测量装置及测量方法
公开(公告)号：US09041937B2
公开(公告)日：2015-05-26
申请号：US13577044
申请日：2011-02-02
申请人： Masaru Hori , Masafumi Ito , Yasuhiro Higashijima , Takayuki Ohta
发明人： Masaru Hori , Masafumi Ito , Yasuhiro Higashijima , Takayuki Ohta
IPC分类号： G01B11/02 , G01B9/02 , G01K11/00
CPC分类号： G01B9/02023 , G01B9/02058 , G01B9/0209 , G01K11/00
摘要： [Problem to be Solved] To improve the measurement accuracy of an interference measurement device which utilizes interference of light.[Means for Solution] An interference measurement device includes a light source 10 for emitting supercontinuum light (SC light), an optical fiber coupler 11 for splitting the SC light into measurement light and reference light, a dispersion compensation element 12, a drive unit 13 for moving the dispersion compensation element 12, and light-receiving means 14 for measuring an interference waveform produced as a result of interference between the measurement light and the reference light. A measurement object 15 to be measured is an Si substrate having a thickness of 800 μm. The dispersion compensation element 12 is an Si substrate having a thickness of 780 μm. Namely, the dispersion compensation element 12 is formed of the same material as that of the measurement object 15 and is 20 μm thinner than the measurement object 15. The interference caused by reflection on the back surface of the measurement object 15 and reflection on the back surface of the dispersion compensation element 12 has a narrow peak width because wavelength dispersion is cancelled almost completely. Thus, the accuracy in measuring the peak position improves. As a result, the accuracy in measuring temperature, etc., improves.
摘要翻译： [待解决的问题]提高利用干扰的干涉测量装置的测量精度。解决方案干扰测量装置包括用于发射超连续光（SC灯）的光源10，用于将SC光分解为测量光和参考光的光纤耦合器11，色散补偿元件12，驱动单元13 用于移动色散补偿元件12和用于测量作为测量光和参考光之间的干涉的结果而产生的干涉波形的光接收装置14。待测量的测量对象15是厚度为800μm的Si衬底。色散补偿元件12是厚度为780μm的Si衬底。也就是说，色散补偿元件12由与测量对象15相同的材料形成，并且比测量对象15薄20μm。由测量对象15的背面上的反射引起的干涉和背面的反射由于波长色散几乎完全消除，所以色散补偿元件12的表面具有窄的峰宽。因此，测量峰值位置的精度提高。结果，测量温度等的精度提高。

8. 发明申请

US20120300218A1 INTERFERENCE MEASUREMENT DEVICE AND MEASUREMENT METHOD 有权
标题翻译：干扰测量装置和测量方法
公开(公告)号：US20120300218A1
公开(公告)日：2012-11-29
申请号：US13577044
申请日：2011-02-02
申请人： Masaru Hori , Masafumi Ito , Yasuhiro Higashijima , Takayuki Ohta
发明人： Masaru Hori , Masafumi Ito , Yasuhiro Higashijima , Takayuki Ohta
IPC分类号： G01B9/02 , G01B11/06
CPC分类号： G01B9/02023 , G01B9/02058 , G01B9/0209 , G01K11/00
摘要： [Problem to be Solved]To improve the measurement accuracy of an interference measurement device which utilizes interference of light.[Means for Solution]An interference measurement device includes a light source 10 for emitting supercontinuum light (SC light), an optical fiber coupler 11 for splitting the SC light into measurement light and reference light, a dispersion compensation element 12, a drive unit 13 for moving the dispersion compensation element 12, and light-receiving means 14 for measuring an interference waveform produced as a result of interference between the measurement light and the reference light. A measurement object 15 to be measured is an Si substrate having a thickness of 800 μm. The dispersion compensation element 12 is an Si substrate having a thickness of 780 μm. Namely, the dispersion compensation element 12 is formed of the same material as that of the measurement object 15 and is 20 μm thinner than the measurement object 15. The interference caused by reflection on the back surface of the measurement object 15 and reflection on the back surface of the dispersion compensation element 12 has a narrow peak width because wavelength dispersion is cancelled almost completely. Thus, the accuracy in measuring the peak position improves. As a result, the accuracy in measuring temperature, etc., improves.
摘要翻译： [待解决的问题]提高利用干扰的干涉测量装置的测量精度。解决方案干扰测量装置包括用于发射超连续光（SC灯）的光源10，用于将SC光分解为测量光和参考光的光纤耦合器11，色散补偿元件12，驱动单元13 用于移动色散补偿元件12和用于测量作为测量光和参考光之间的干涉的结果而产生的干涉波形的光接收装置14。待测量的测量对象15是厚度为800μm的Si衬底。色散补偿元件12是厚度为780μm的Si衬底。也就是说，色散补偿元件12由与测量对象15相同的材料形成，并且比测量对象15薄20μm。由测量对象15的背面上的反射引起的干涉和背面的反射由于波长色散几乎完全消除，所以色散补偿元件12的表面具有窄的峰宽。因此，测量峰值位置的精度提高。结果，测量温度等的精度提高。

9. 外观设计

USD609220S1 Audio mixer 有权
公开(公告)号：USD609220S1
公开(公告)日：2010-02-02
申请号：US29335694
申请日：2009-04-20
申请人： Masafumi Ito
设计人： Masafumi Ito

10. 发明申请

US20090122317A1 Spectroscopy Method and Spectroscope 失效
标题翻译：光谱法和光谱仪
公开(公告)号：US20090122317A1
公开(公告)日：2009-05-14
申请号：US11991542
申请日：2006-09-06
申请人： Masafumi Ito , Norihiko Nishizawa , Masaru Hori , Toshio Goto , Hiroyuki Kano
发明人： Masafumi Ito , Norihiko Nishizawa , Masaru Hori , Toshio Goto , Hiroyuki Kano
IPC分类号： G01N21/31 , G02B6/26
CPC分类号： G01N21/39 , G01J3/02 , G01J3/0218 , G01J3/0224 , G01J3/10 , G01J3/42 , G01J2001/4242 , G01N2201/0697 , G02B6/2861
摘要： To achieve an apparatus capable of measuring a light absorption coefficient f a sample with high sensitivity. A ring down spectroscope uses a wavelength-variable femtosecond soliton pulse light source 1. Pulse light is input to a loop optical fiber 6 through a first light waveguide 4 and a wavelength selective switch 5. Ring down pulse light is input to a homodyne detector through the wavelength selective switch 5. On the other hand, pulse light propagating in the first light waveguide 4 is split and input to light waveguides constituting a second light waveguide 20 through an optical directional coupler 8 and a first optical switching element 12. The pulse light propagating in the second light waveguide 20 is input to the homodyne detector as reference light and used for synchronous detection. The plural light waveguides constituting the second light waveguide 20 differ in optical length in accordance with the length of the optical fiber 6, and can slightly change the optical length.
摘要翻译：实现能够以高灵敏度测量样品的光吸收系数f的装置。环形光谱仪使用波长可变飞秒激光脉冲光源1.脉冲光通过第一光波导4和波长选择开关5输入到环形光纤6中。环形脉冲光通过波长选择开关5.另一方面，在第一光波导4中传播的脉冲光通过光学定向耦合器8和第一光开关元件12被分离并输入到构成第二光波导20的光波导上。脉冲光在第二光波导20中传播的信号被输入到零差检测器作为参考光，并用于同步检测。构成第二光波导路20的多个光波导根据光纤6的长度的光学长度不同，并且可以稍微改变光学长度。

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