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1. 发明授权

US08420422B2 Pattern forming method, processing method, and processing apparatus 有权
标题翻译：图案形成方法，处理方法和处理装置
公开(公告)号：US08420422B2
公开(公告)日：2013-04-16
申请号：US13041917
申请日：2011-03-07
申请人： Masafumi Asano , Ryoichi Inanami , Masayuki Hatano
发明人： Masafumi Asano , Ryoichi Inanami , Masayuki Hatano
IPC分类号： H01L21/00
CPC分类号： H01L22/20 , B82Y10/00 , B82Y40/00 , G03F7/0002 , H01L22/12
摘要： According to the embodiments, a distribution of a recess portion shape is calculated based on a result obtained by measuring the recess portion shape of a first projection and recess pattern formed on a surface of a template. Next, a distribution of an application amount of a curing agent to a processing target layer is calculated based on the distribution of the recess portion shape, and the curing agent is applied to the processing target layer based on this distribution of the application amount of the curing agent. Next, a second projection and recess pattern is formed by transferring the first projection and recess pattern onto the curing agent by causing the curing agent to cure in a state where the first projection and recess pattern is in contact with the curing agent.
摘要翻译：根据实施例，基于通过测量形成在模板的表面上的第一突起和凹部图案的凹部形状获得的结果来计算凹部形状的分布。接下来，基于凹部形状的分布计算固化剂的涂布量到处理对象层的分布，并且基于该涂布量的分布将固化剂施加到处理对象层固化剂。接下来，通过使固化剂在第一突起和凹部图案与固化剂接触的状态下固化而将第一突起和凹陷图案转印到固化剂上形成第二突起和凹陷图案。

2. 发明申请

US20110229988A1 PATTERN FORMING METHOD, PROCESSING METHOD, AND PROCESSING APPARATUS 有权
标题翻译：图案形成方法，处理方法和处理装置
公开(公告)号：US20110229988A1
公开(公告)日：2011-09-22
申请号：US13041917
申请日：2011-03-07
申请人： Masafumi ASANO , Ryoichi Inanami , Masayuki Hatano
发明人： Masafumi ASANO , Ryoichi Inanami , Masayuki Hatano
IPC分类号： H01L21/66 , G06F19/00
CPC分类号： H01L22/20 , B82Y10/00 , B82Y40/00 , G03F7/0002 , H01L22/12
摘要： According to the embodiments, a distribution of a recess portion shape is calculated based on a result obtained by measuring the recess portion shape of a first projection and recess pattern formed on a surface of a template. Next, a distribution of an application amount of a curing agent to a processing target layer is calculated based on the distribution of the recess portion shape, and the curing agent is applied to the processing target layer based on this distribution of the application amount of the curing agent. Next, a second projection and recess pattern is formed by transferring the first projection and recess pattern onto the curing agent by causing the curing agent to cure in a state where the first projection and recess pattern is in contact with the curing agent.
摘要翻译：根据实施例，基于通过测量形成在模板的表面上的第一突起和凹部图案的凹部形状获得的结果来计算凹部形状的分布。接下来，基于凹部形状的分布计算固化剂的涂布量到处理对象层的分布，并且基于该涂布量的分布将固化剂施加到处理对象层固化剂。接下来，通过使固化剂在第一突起和凹部图案与固化剂接触的状态下固化而将第一突起和凹陷图案转印到固化剂上形成第二突起和凹陷图案。

3. 发明申请

US20130222782A1 SUBSTRATE HOLDING APPARATUS, PATTERN TRANSFER APPARATUS, AND PATTERN TRANSFER METHOD 有权
标题翻译：基板保持装置，图案转印装置和图案转印方法
公开(公告)号：US20130222782A1
公开(公告)日：2013-08-29
申请号：US13600123
申请日：2012-08-30
申请人： Kentaro KASA , Manabu Takakuwa , Ryoichi Inanami , Kazuto Matsuki , Tetsuro Nakasugi , Hiroshi Koizumi , Minoru Inomoto
发明人： Kentaro KASA , Manabu Takakuwa , Ryoichi Inanami , Kazuto Matsuki , Tetsuro Nakasugi , Hiroshi Koizumi , Minoru Inomoto
IPC分类号： G03B27/58
CPC分类号： G03F7/70783 , G03F7/707
摘要： According to one embodiment, a substrate holding apparatus includes a main unit and a plurality of first support units. The main unit has a major surface. The main unit has a plate configuration. The first support units are disposed on the major surface. Each of the first support units includes a suction-holding unit capable of holding a substrate by suction. The suction-holding unit is movable along a first direction perpendicular to the major surface and a second direction parallel to the major surface.
摘要翻译：根据一个实施例，一种基板保持装置包括主单元和多个第一支撑单元。主机具有主要表面。主机具有板配置。第一支撑单元设置在主表面上。每个第一支撑单元包括能够通过抽吸来保持基板的吸持保持单元。抽吸保持单元可沿垂直于主表面的第一方向和平行于主表面的第二方向移动。

4. 发明授权

US08392855B2 Transferring pattern onto semiconductor substrate using optimum transfer condition determined for each divided area 有权
标题翻译：使用为每个分割区域确定的最佳转印条件将图案转印到半导体衬底上
公开(公告)号：US08392855B2
公开(公告)日：2013-03-05
申请号：US13040294
申请日：2011-03-04
申请人： Hiroyuki Morinaga , Ryoichi Inanami
发明人： Hiroyuki Morinaga , Ryoichi Inanami
IPC分类号： G06F17/50
CPC分类号： H01L22/20 , B82Y10/00 , B82Y40/00 , G03F7/0002 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： According to one embodiment, a pattern forming method comprises transferring a pattern formed in a surface of a template to a plurality of chip areas in a semiconductor substrate under different transfer conditions. Furthermore, the transferring the pattern formed in the surface of the template to the plurality of chip areas in the semiconductor substrate under the different transfer conditions comprises transferring the pattern formed in the surface of the template to the semiconductor substrate at least twice under each identical transfer condition. Moreover, the pattern forming method comprises dividing each of the plurality of chip areas into a plurality of areas, determining an optimum condition for each set of corresponding divided areas in the plurality of chip areas, and transferring the pattern onto the semiconductor substrate using the optimum transfer condition determined for each divided area.
摘要翻译：根据一个实施例，图案形成方法包括在不同的转移条件下将形成在模板的表面中的图案转移到半导体衬底中的多个芯片区域。此外，在不同的转移条件下将形成在模板表面上的图案转移到半导体衬底中的多个芯片区域包括在每个相同转移下将形成在模板表面中的图案转移到半导体衬底至少两次条件。此外，图案形成方法包括将多个芯片区域中的每一个划分成多个区域，为多个芯片区域中的每组对应的分割区域确定最佳条件，并使用最优的方法将图案转移到半导体衬底上为每个划分区域确定转移条件。

5. 发明申请

US20120068372A1 NANOIMPRINT TEMPLATE AND PATTERN TRANSCRIPTION APPARATUS 审中-公开
标题翻译： NANOIMPRINT模板和图案转录装置
公开(公告)号：US20120068372A1
公开(公告)日：2012-03-22
申请号：US13233426
申请日：2011-09-15
申请人： Akiko Mimotogi , Ryoichi Inanami , Kentaro Kasa , Masato Suzuki , Manabu Takakuwa , Yohko Furutono , Yumi Nakajima
发明人： Akiko Mimotogi , Ryoichi Inanami , Kentaro Kasa , Masato Suzuki , Manabu Takakuwa , Yohko Furutono , Yumi Nakajima
IPC分类号： B28B11/08 , B29C45/76
CPC分类号： G03F7/002 , G03F9/7042
摘要： According to one embodiment, a nanoimprint template using a pattern transcription to a substrate by a nanoimprint technique, the template includes a transcription pattern and an alignment mark on a main surface of a main body, wherein the alignment mark comprises a polarizer.
摘要翻译：根据一个实施方案，使用通过纳米压印技术将图案转录到底物的纳米压印模板，所述模板包括在主体的主表面上的转录图案和对准标记，其中所述对准标记包括偏振器。

6. 发明申请

US20120045854A1 INSPECTING METHOD, TEMPLATE MANUFACTURING METHOD, SEMICONDUCTOR INTEGRATED CIRCUIT MANUFACTURING METHOD, AND INSPECTING SYSTEM 审中-公开
标题翻译：检测方法，模板制造方法，半导体集成电路制造方法及检测系统
公开(公告)号：US20120045854A1
公开(公告)日：2012-02-23
申请号：US13208605
申请日：2011-08-12
申请人： Yasuo Matsuoka , Ryoichi Inanami
发明人： Yasuo Matsuoka , Ryoichi Inanami
IPC分类号： H01L21/66 , G06F17/50
CPC分类号： G11C29/006 , G11C29/56008 , G11C29/804 , H01L22/12
摘要： According to one embodiment, a template for manufacturing a memory cell array comprising a relievable area and a redundant area replaceable with the relievable area is to be inspected. First, based on a defect position of a defect-detected template and position information on a relievable area, a decision is made as to whether the detected defect is positioned within the relievable area. A decision is made as to whether the number of defect-detected relievable areas exceeds the preset permissible number. When the detected defect is positioned outside the relievable area or when the number of defect-detected relievable areas exceeds the permissible number, a notification that the template has failed the inspection is output.
摘要翻译：根据一个实施例，将检查用于制造包括可释放区域和可释放区域可替换的冗余区域的存储单元阵列的模板。首先，基于缺陷检测模板的缺陷位置和关于可解除区域的位置信息，判断检测到的缺陷是否位于可解除区域内。确定缺陷检测到的可释放区域的数量是否超过预设的允许数量。当检测到的缺陷位于可解除区域之外时，或者当缺陷检测到的可释放区域的数量超过允许数量时，输出模板检查失败的通知。

7. 发明授权

US07914958B2 Semiconductor device manufacturing method 有权
标题翻译：半导体器件制造方法
公开(公告)号：US07914958B2
公开(公告)日：2011-03-29
申请号：US12478408
申请日：2009-06-04
申请人： Ryoichi Inanami , Shinji Mikami , Hirofumi Inoue
发明人： Ryoichi Inanami , Shinji Mikami , Hirofumi Inoue
IPC分类号： G03C5/00 , G03F9/00 , B29C35/08
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F9/7076
摘要： A semiconductor device manufacturing method has forming a first resist pattern on the semiconductor substrate, and then, forming a first pattern on the semiconductor substrate by the use of the first resist pattern, and forming a second resist pattern on the semiconductor substrate by using an imprinter, and then, forming a second pattern on the semiconductor substrate by the use of the second resist pattern. The forming the first pattern, the first pattern smaller than a design pattern corresponding to the design data for forming a plurality of patterns on a semiconductor substrate being formed.
摘要翻译：半导体器件制造方法在半导体衬底上形成第一抗蚀剂图案，然后通过使用第一抗蚀剂图案在半导体衬底上形成第一图案，并通过使用打印机在半导体衬底上形成第二抗蚀剂图案，然后通过使用第二抗蚀剂图案在半导体衬底上形成第二图案。形成第一图案，第一图案小于与形成在半导体衬底上形成多个图案的设计数据相对应的设计图案。

8. 发明申请

US20100308513A1 TEMPLATE AND PATTERN FORMING METHOD 审中-公开
标题翻译：模式和图案形成方法
公开(公告)号：US20100308513A1
公开(公告)日：2010-12-09
申请号：US12796343
申请日：2010-06-08
申请人： Hiroyuki Kashiwagi , Kazuya Fukuhara , Ryoichi Inanami , Takuya Kono
发明人： Hiroyuki Kashiwagi , Kazuya Fukuhara , Ryoichi Inanami , Takuya Kono
IPC分类号： B29C35/08
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： According to one embodiment, a template for imprint lithography includes a transparent substrate having a pattern with a recess portion and a protruding portion, and a light-shielding portion formed on a bottom surface of the recess portion and on a top surface of the protruding portion. A side wall of the protruding portion is inclined.
摘要翻译：根据一个实施例，用于压印光刻的模板包括具有凹陷部分和突出部分的图案的透明基板，以及形成在凹部的底表面上并且在突出部分的顶表面上的遮光部分。突出部的侧壁倾斜。

9. 发明授权

US07368737B2 Electron beam writing method, electron beam writing apparatus and semiconductor device manufacturing method 失效
标题翻译：电子束写入方法，电子束写入装置和半导体器件的制造方法
公开(公告)号：US07368737B2
公开(公告)日：2008-05-06
申请号：US11409987
申请日：2006-04-25
申请人： Ryoichi Inanami , Tetsuro Nakasugi
发明人： Ryoichi Inanami , Tetsuro Nakasugi
IPC分类号： H01J37/08
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00
摘要： An electron beam writing method is disclosed, which includes preparing electron beam writing data structured from writing pattern data expressed by both data of VSB shots which are units of shaping beams at the time of carrying out writing a pattern and data of CP shots serving as bases of a repeating pattern, and CP aperture data into which identification numbers IDs and opening positions of respective openings of a CP aperture having openings for VSB shots and openings for CP shots are described, inputting the electron beam writing data to an electron beam writing apparatus, and expanding the electron beam writing data into data of the respective shots defined in the electron beam writing data, determining irradiation times of the respective expanded shots while correcting shot positions, and outputting control signals corresponding to shot data to repeat a shot of a desired pattern, by the electron beam writing apparatus.
摘要翻译：公开了一种电子束写入方法，其中包括准备电子束写入数据，该电子束写入数据由写入模式数据构成，该模式数据由作为执行写入模式时的整形波束的单元的VSB镜头的数据和用作基础的CP镜头的数据表示描述了CP电子束写入数据到电子束写入装置的CP孔径数据，CP孔径数据ID和具有用于VSB镜头的开口的CP孔的各个开口的打开位置和CP镜头的开口位置，并且将电子束写入数据扩展为在电子束写入数据中定义的各个镜头的数据，同时在校正镜头位置的同时确定各个扩展镜头的照射时间，并且输出对应于镜头数据的控制信号以重复所需图案的镜头，由电子束写入装置。

10. 发明授权

US06543044B2 Method of extracting characters and computer-readable recording medium 有权
标题翻译：提取字符和计算机可读记录介质的方法
公开(公告)号：US06543044B2
公开(公告)日：2003-04-01
申请号：US09814996
申请日：2001-03-23
申请人： Ryoichi Inanami , Shunko Magoshi
发明人： Ryoichi Inanami , Shunko Magoshi
IPC分类号： G21K510
CPC分类号： H01J37/3026 , H01J2237/30416 , H01J2237/3175
摘要： Using the hierarchy cell5, cell51, cell52, cell4 of the figure cells in the design pattern data, it is not necessary to take the actual forms of patterns and the arrangement information of data (relation between patterns, period of arrangement) into consideration, and therefore, characters for CP exposure can be extracted effectively.
摘要翻译：使用设计图案数据中的图形单元的层次结构单元5，单元格51，单元格52，单元格4，不需要考虑图形的实际形式和数据的排列信息（图案，排列周期之间的关系），以及因此，可以有效地提取CP曝光的字符。

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