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1. 发明授权

US07077533B2 Reflecting device for electromagnetic waves 失效
标题翻译：电磁波反射装置
公开(公告)号：US07077533B2
公开(公告)日：2006-07-18
申请号：US10477772
申请日：2002-05-28
申请人： Martin Weiser , Udo Dinger , Siegfried Stacklies , Markus Haidl
发明人： Martin Weiser , Udo Dinger , Siegfried Stacklies , Markus Haidl
IPC分类号： G02B5/08
CPC分类号： B82Y10/00 , B82Y40/00 , G03F1/24 , G03F7/2008 , G03F7/70958 , G21K1/06
摘要： A device serves for reflecting electromagnetic waves, in particular in a length range less than 200 nm. It has a mirror carrier made of a material with at least approximately vanishing thermal expansion and at least one reflective layer applied on said mirror carrier. An intermediate layer made of a material which is formed such that its surface roughness is not significantly increased after beam processing methods is fitted between the mirror carrier and the reflective layer.
摘要翻译：装置用于反射电磁波，特别是在小于200nm的长度范围内。它具有由至少近乎消失的热膨胀的材料制成的反射镜载体，并且至少一个反射层施加在所述反射镜载体上。由在反射镜载体和反射层之间装配光束处理方法之后形成为使得其表面粗糙度不显着增加的材料制成的中间层。

2. 发明授权

US07118449B1 Method of manufacturing an optical element 有权
标题翻译：制造光学元件的方法
公开(公告)号：US07118449B1
公开(公告)日：2006-10-10
申请号：US10943952
申请日：2004-09-20
申请人： Udo Dinger , Frank Eisert , Siegfried Stacklies , Martin Weiser , Guenther Seitz
发明人： Udo Dinger , Frank Eisert , Siegfried Stacklies , Martin Weiser , Guenther Seitz
IPC分类号： B24B49/00 , B24B51/00 , B24B1/00
CPC分类号： B24B13/06 , B24B51/00
摘要： A method of manufacturing an optical element having an optical surface extending close to a periphery of a substrate comprises: providing a substrate having a main surface extending beyond a periphery of the optical surface and also performing a polishing of the optical surface in regions of the main surface extending beyond the optical surface. Thereafter, material of the substrate carrying a portion of the surface extending beyond the optical surface is removed.
摘要翻译：一种制造具有靠近基板周边延伸的光学表面的光学元件的方法包括：提供具有延伸超过光学表面的周边的主表面的基板，并且还在主体的区域中执行光学表面的抛光表面延伸超出光学表面。此后，去除承载延伸超过光学表面的表面的一部分的基板的材料。

3. 发明授权

US07481543B1 Mirror for use in a projection exposure apparatus 有权
标题翻译：用于投影曝光装置的镜子
公开(公告)号：US07481543B1
公开(公告)日：2009-01-27
申请号：US11523396
申请日：2006-09-18
申请人： Udo Dinger , Frank Eisert , Siegfried Stacklies , Martin Weiser , Guenther Seitz
发明人： Udo Dinger , Frank Eisert , Siegfried Stacklies , Martin Weiser , Guenther Seitz
IPC分类号： G02B5/10
CPC分类号： B24B13/06 , B24B51/00
摘要： A mirror for use in a projection exposure apparatus is described. The mirror has a main surface extending beyond an outline of an optical surface of the main surface. The optical surface has a roughness of less than 1 nm rms, and the outline of the optical surface includes a portion where the main surface extends beyond the optical surface by less than 0.2 mm. Manufacturing the mirror may involve polishing the optical surface in regions of the main surface extending beyond the optical surface and removing material of the substrate carrying a portion of the surface extending beyond the optical surface.
摘要翻译：描述了用于投影曝光装置的反射镜。反射镜具有延伸超过主表面的光学表面轮廓的主表面。光学表面具有小于1nm的粗糙度，并且光学表面的轮廓包括主表面延伸超过光学表面小于0.2mm的部分。制造反射镜可以包括在主表面延伸超过光学表面的区域中抛光光学表面，并去除承载延伸超过光学表面的表面的一部分的基板的材料。

4. 发明授权

US07031428B2 Substrate material for X-ray optical components 失效
标题翻译： X射线光学部件用基板材料
公开(公告)号：US07031428B2
公开(公告)日：2006-04-18
申请号：US10779516
申请日：2004-02-13
申请人： Udo Dinger , Frank Eisert , Martin Weiser , Konrad Knapp , Ina Mitra , Hans Morian
发明人： Udo Dinger , Frank Eisert , Martin Weiser , Konrad Knapp , Ina Mitra , Hans Morian
IPC分类号： G21K5/04 , G21K1/06 , C03C10/00
CPC分类号： G21K1/06 , C03C10/0009 , C03C19/00 , C03C23/0055 , C03C2204/08
摘要： There is provided a substrate material for an optical component for X-rays of wavelength λR. The substrate includes (a) a glass phase made of amorphous material having a positive coefficient of thermal expansion, and (b) a crystal phase including microcrystallites having a negative coefficient of thermal expansion and a mean size of less than about 4 λR. The substrate material has a stoichiometric ratio of the crystal phase to the glass phase such that a coefficient of thermal expansion of the substrate material is less than about 5×10−6 K−1 in a temperature range of about 20 °C. to 100°C. The substrate material, following a surface treatment, has a high spatial frequency roughness (HSFR) of less than about λR/30 rms.
摘要翻译：提供了用于波长λλX的X射线的光学部件的基板材料。该基板包括（a）由具有正的热膨胀系数的非晶材料制成的玻璃相，和（b）包含具有负的热膨胀系数和平均尺寸小于约4λλ的微晶的结晶相， R 。衬底材料具有晶相与玻璃相的化学计量比，使得衬底材料的热膨胀系数小于约5×10 -6 K -1 在约20℃的温度范围内。至100℃。在表面处理之后，衬底材料具有小于约λ/ 30 / 30rms的高空间频率粗糙度（HSFR）。

5. 发明申请

US20070138442A1 Modified and doped solder alloys for electrical interconnects, methods of production and uses thereof 审中-公开
标题翻译：用于电互连的改性和掺杂的焊料合金，其生产方法及其用途
公开(公告)号：US20070138442A1
公开(公告)日：2007-06-21
申请号：US11641367
申请日：2006-12-18
申请人： Martin Weiser
发明人： Martin Weiser
IPC分类号： H01B1/12
CPC分类号： C22C12/00 , H01B1/02 , H01L24/29 , H01L2224/29 , H01L2224/29101 , H01L2224/29109 , H01L2224/29111 , H01L2224/2919 , H01L2224/29298 , H01L2224/83439 , H01L2224/83805 , H01L2924/00013 , H01L2924/01005 , H01L2924/01006 , H01L2924/01013 , H01L2924/01019 , H01L2924/0102 , H01L2924/01023 , H01L2924/01024 , H01L2924/01029 , H01L2924/0103 , H01L2924/01032 , H01L2924/01033 , H01L2924/01038 , H01L2924/01047 , H01L2924/01049 , H01L2924/0105 , H01L2924/01051 , H01L2924/01056 , H01L2924/01057 , H01L2924/01058 , H01L2924/01067 , H01L2924/01074 , H01L2924/01078 , H01L2924/01079 , H01L2924/01082 , H01L2924/0132 , H01L2924/01322 , H01L2924/01327 , H01L2924/0133 , H01L2924/014 , H01L2924/0665 , H01L2924/1301 , H01L2924/1305 , H01L2924/14 , H01L2924/15747 , H01L2924/00 , H01L2924/01014 , H01L2924/01083 , H01L2924/00015 , H01L2224/29099 , H01L2224/29199 , H01L2224/29299 , H01L2224/2929
摘要： Solder compositions are described that include at least about 2% of silver, at least about 60% of bismuth, and at least one coupling element, wherein the at least one coupling element forms a complex with bismuth. Layered materials are also described that include a surface or substrate; an electrical interconnect; the solder composition described herein; and a semiconductor die or package. Methods of producing a solder composition are also described that include: a) providing at least about 2% of silver, b) providing at least about 60% of bismuth, c) providing at least one coupling element, wherein the at least one coupling element forms a complex with bismuth, and d) blending the silver, bismuth and at least one coupling element to form the solder composition.
摘要翻译：描述了包含至少约2％的银，至少约60％的铋和至少一种偶联元素的焊料组合物，其中所述至少一种偶联元素与铋形成络合物。还描述了包括表面或基底的分层材料; 电互连; 本文所述的焊料组合物; 和半导体管芯或封装。还描述了生产焊料组合物的方法，其包括：a）提供至少约2％的银，b）提供至少约60％的铋，c）提供至少一个耦合元件，其中所述至少一个耦合元件与铋形成络合物，和d）将银，铋和至少一种偶合元素混合以形成焊料组合物。

6. 发明授权

US4501516A Anchoring of tension members 失效
标题翻译：锚定紧张的成员
公开(公告)号：US4501516A
公开(公告)日：1985-02-26
申请号：US548741
申请日：1983-11-04
申请人： Bernhard Kotulla , Martin Weiser , Jurgen Faltin , Lothar Preis , Rudolf Schmidt , Eberhard Born
发明人： Bernhard Kotulla , Martin Weiser , Jurgen Faltin , Lothar Preis , Rudolf Schmidt , Eberhard Born
IPC分类号： E21D20/00 , E02D5/76 , E21D20/02 , E21D21/00
CPC分类号： E21D21/0093 , E02D5/76 , E21D20/025
摘要： By using a packer which is pushed as far over an anchor as the intended length of the moulding, the cavity in a borehole in the region of the bond can be completely filled with a reactive resin. Overhead work is possible even with slowly reacting resins. By using a catalyst on the packer, the reactive resin injected into the borehole behind the packer can be made to harden very rapidly.
摘要翻译：通过使用被推压在锚定件上远远超过模制件的预期长度的封隔器，在接合区域中的钻孔中的空腔可以被完全填充反应性树脂。即使使用缓慢反应的树脂也可以进行间接工作。通过在封隔器上使用催化剂，可以使注入封隔器后面的钻孔中的反应性树脂非常快速地硬化。

7. 发明授权

US4443132A Anchoring of tension members 失效
标题翻译：锚定紧张的成员
公开(公告)号：US4443132A
公开(公告)日：1984-04-17
申请号：US340417
申请日：1982-01-18
申请人： Bernhard Kotulla , Martin Weiser , Jurgen Faltin , Lothar Preis , Rudolf Schmidt , Eberhard Born
发明人： Bernhard Kotulla , Martin Weiser , Jurgen Faltin , Lothar Preis , Rudolf Schmidt , Eberhard Born
IPC分类号： E21D20/00 , E02D5/76 , E21D20/02 , E21D21/00
CPC分类号： E21D21/0093 , E02D5/76 , E21D20/025
摘要： By using a packer which is pushed as far over an anchor as the intended length of the moulding, the cavity in a borehole in the region of the bond can be completely filled with a reactive resin. Overhead work is possible even with slowly reacting resins. By using a catalyst on the packer, the reactive resin injected into the borehole behind the packer can be made to harden very rapidly.
摘要翻译：通过使用被推压在锚定件上远远超过模制件的预期长度的封隔器，在接合区域中的钻孔中的空腔可以被完全填充反应性树脂。即使使用缓慢反应的树脂也可以进行间接工作。通过在封隔器上使用催化剂，可以使注入封隔器后面的钻孔中的反应性树脂非常快速地硬化。

8. 发明授权

US09179176B2 Method for operating a data receiver and data receiver, in particular in a vehicle 有权
标题翻译：用于操作数据接收器和数据接收器的方法，特别是在车辆中
公开(公告)号：US09179176B2
公开(公告)日：2015-11-03
申请号：US14343070
申请日：2012-06-26
申请人： Thorsten Hehn , Jens Krause , Urs Thürmann , Martin Weiser
发明人： Thorsten Hehn , Jens Krause , Urs Thürmann , Martin Weiser
IPC分类号： H04N7/18 , H04N21/433 , H04N21/414 , H04N21/442 , H04N21/475 , H04N21/2668 , H04N21/432 , H04N21/462 , H04N21/61 , H04N21/658 , H04N21/235 , H04N21/258
CPC分类号： H04N21/4334 , H04N21/2353 , H04N21/25891 , H04N21/2668 , H04N21/41422 , H04N21/4325 , H04N21/4331 , H04N21/44222 , H04N21/4622 , H04N21/4755 , H04N21/6131 , H04N21/6582
摘要： A method for operating a data receiver for audio and/or video data, wherein a planned and variable program title sequence having program titles is recorded, audio and/or video data relating to at least one program title are received via a data link and are buffered, and audio and/or video data of at least one program title are reproduced. The transmission resources of the data link for audio and/or video data to be transmitted and to be buffered are distributed over at least two program titles that have not yet been reproduced by the data receiver. Also disclosed are a data receiver associated with the method and a media reproduction system connected thereto, in particular in a vehicle.
摘要翻译：一种用于操作用于音频和/或视频数据的数据接收机的方法，其中记录具有节目标题的预定和可变节目标题序列，经由数据链路接收与至少一个节目标题相关的音频和/或视频数据，并且缓冲的，以及至少一个节目标题的音频和/或视频数据被再现。要发送和要缓冲的音频和/或视频数据的数据链路的传输资源分布在数据接收机尚未被再现的至少两个节目标题上。还公开了与该方法相关联的数据接收器和与其连接的媒体再现系统，特别是在车辆中。

9. 发明授权

US07919004B2 Removing reflective layers from EUV mirrors 有权
标题翻译：从EUV镜子中去除反射层
公开(公告)号：US07919004B2
公开(公告)日：2011-04-05
申请号：US12534659
申请日：2009-08-03
申请人： Martin Weiser , Olaf Bork , Ulrich Andiel
发明人： Martin Weiser , Olaf Bork , Ulrich Andiel
IPC分类号： B29D11/00
CPC分类号： G02B5/0825 , C23F4/00 , G02B5/0891 , G03F1/24 , G03F1/72
摘要： A method for removing at least one reflective layer (4a, 4b) from an optical element (1) for EUV lithography, wherein the optical element (1) has a substrate (2) and an interlayer (6) between the substrate (2) and the at least one reflective layer (4a, 4b). The method includes etching away the at least one reflective layer (4a, 4b) as far as the interlayer (6) with an etching gas (7), wherein the material of the interlayer (6) does not react with the etching gas (7), and wherein, after the etching away, the interlayer (6) has a surface roughness of less than 0.5 nm rms, preferably of less than 0.2 nm rms, and more preferably of less than 0.1 nm rms. Also, an optical element (1) for reflecting radiation in the EUV wavelength range includes a substrate (2), at least one reflective layer (4a, 4b), and an interlayer (6) arranged between the substrate (2) and the at least one reflective layer (4a, 4b). The interlayer (6) is composed at least partly of a material which does not react with a halogen or a halogen compound as etching gas (7) and which is selected, in particular, from one or more of the following: alkali metal halides, alkaline earth metal halides and aluminum oxide (Al2O3). The interlayer (6) has a surface roughness of less than 0.5 nm rms, preferably of less than 0.2 nm rms, and more preferably of less than 0.1 nm rms.
摘要翻译：一种用于从用于EUV光刻的光学元件（1）去除至少一个反射层（4a，4b）的方法，其中所述光学元件（1）在所述基板（2）之间具有基板（2）和中间层（6）和所述至少一个反射层（4a，4b）。该方法包括使用蚀刻气体（7）将至少一个反射层（4a，4b）蚀刻掉至中间层（6），其中中间层（6）的材料不与蚀刻气体（7）反应），并且其中在蚀刻之后，中间层（6）具有小于0.5nm rms，优选小于0.2nm rms，更优选小于0.1nm rms的表面粗糙度。此外，用于反射EUV波长范围的辐射的光学元件（1）包括基板（2），至少一个反射层（4a，4b）和布置在基板（2）和基板至少一个反射层（4a，4b）。中间层（6）至少部分由不与卤素或卤素化合物作为蚀刻气体（7）反应的材料组成，特别是选自以下的一种或多种：碱金属卤化物，碱土金属卤化物和氧化铝（Al2O3）。中间层（6）具有小于0.5nm rms，优选小于0.2nm rms，更优选小于0.1nm rms的表面粗糙度。

10. 发明申请

US20070045838A1 Lead-containing anodes 审中-公开
标题翻译：含铅阳极
公开(公告)号：US20070045838A1
公开(公告)日：2007-03-01
申请号：US11592396
申请日：2006-11-02
申请人： Martin Weiser , Nancy Dean , Brett Clark , Michael Bossio , Ronald Fleming , James Flint
发明人： Martin Weiser , Nancy Dean , Brett Clark , Michael Bossio , Ronald Fleming , James Flint
IPC分类号： H01L23/48
CPC分类号： H01L24/10 , B23K35/025 , B23K35/26 , B23K35/268 , C22B13/06 , C25C1/18 , H01L23/3128 , H01L23/49816 , H01L24/13 , H01L2224/05568 , H01L2224/05573 , H01L2224/13 , H01L2224/13099 , H01L2224/16225 , H01L2924/00014 , H01L2924/01005 , H01L2924/01006 , H01L2924/01012 , H01L2924/01015 , H01L2924/01029 , H01L2924/01033 , H01L2924/01047 , H01L2924/01049 , H01L2924/01079 , H01L2924/01082 , H01L2924/01084 , H01L2924/01088 , H01L2924/01092 , H01L2924/014 , H01L2924/12042 , H01L2924/14 , H05K3/3463 , H05K3/3484 , H01L2924/00 , H01L2224/05599
摘要： The invention includes solder materials having low concentrations of alpha particle emitters, and includes methods of purification of materials to reduce a concentration of alpha particle emitters within the materials. The invention includes methods of reducing alpha particle flux in various lead-containing and lead-free materials through purification of the materials. The invention also includes methods of estimating the fractionation of a low concentration of one or more alpha particle emitters during purification of a material.
摘要翻译：本发明包括具有低浓度α粒子发射体的焊料材料，并且包括纯化材料以降低材料内的α粒子发射体浓度的方法。本发明包括通过纯化材料来减少各种含铅和无铅材料中的α粒子通量的方法。本发明还包括在纯化材料期间估计低浓度的一种或多种α粒子发射体的分馏的方法。

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