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1. 发明授权

US07118449B1 Method of manufacturing an optical element 有权
标题翻译：制造光学元件的方法
公开(公告)号：US07118449B1
公开(公告)日：2006-10-10
申请号：US10943952
申请日：2004-09-20
申请人： Udo Dinger , Frank Eisert , Siegfried Stacklies , Martin Weiser , Guenther Seitz
发明人： Udo Dinger , Frank Eisert , Siegfried Stacklies , Martin Weiser , Guenther Seitz
IPC分类号： B24B49/00 , B24B51/00 , B24B1/00
CPC分类号： B24B13/06 , B24B51/00
摘要： A method of manufacturing an optical element having an optical surface extending close to a periphery of a substrate comprises: providing a substrate having a main surface extending beyond a periphery of the optical surface and also performing a polishing of the optical surface in regions of the main surface extending beyond the optical surface. Thereafter, material of the substrate carrying a portion of the surface extending beyond the optical surface is removed.
摘要翻译：一种制造具有靠近基板周边延伸的光学表面的光学元件的方法包括：提供具有延伸超过光学表面的周边的主表面的基板，并且还在主体的区域中执行光学表面的抛光表面延伸超出光学表面。此后，去除承载延伸超过光学表面的表面的一部分的基板的材料。

2. 发明授权

US07481543B1 Mirror for use in a projection exposure apparatus 有权
标题翻译：用于投影曝光装置的镜子
公开(公告)号：US07481543B1
公开(公告)日：2009-01-27
申请号：US11523396
申请日：2006-09-18
申请人： Udo Dinger , Frank Eisert , Siegfried Stacklies , Martin Weiser , Guenther Seitz
发明人： Udo Dinger , Frank Eisert , Siegfried Stacklies , Martin Weiser , Guenther Seitz
IPC分类号： G02B5/10
CPC分类号： B24B13/06 , B24B51/00
摘要： A mirror for use in a projection exposure apparatus is described. The mirror has a main surface extending beyond an outline of an optical surface of the main surface. The optical surface has a roughness of less than 1 nm rms, and the outline of the optical surface includes a portion where the main surface extends beyond the optical surface by less than 0.2 mm. Manufacturing the mirror may involve polishing the optical surface in regions of the main surface extending beyond the optical surface and removing material of the substrate carrying a portion of the surface extending beyond the optical surface.
摘要翻译：描述了用于投影曝光装置的反射镜。反射镜具有延伸超过主表面的光学表面轮廓的主表面。光学表面具有小于1nm的粗糙度，并且光学表面的轮廓包括主表面延伸超过光学表面小于0.2mm的部分。制造反射镜可以包括在主表面延伸超过光学表面的区域中抛光光学表面，并去除承载延伸超过光学表面的表面的一部分的基板的材料。

3. 发明授权

US07372624B2 8-mirror microlithography projection objective 失效
标题翻译： 8镜微光投影物镜
公开(公告)号：US07372624B2
公开(公告)日：2008-05-13
申请号：US11592065
申请日：2006-11-02
申请人： Hans-Juergen Mann , Wilhelm Ulrich , Guenther Seitz
发明人： Hans-Juergen Mann , Wilhelm Ulrich , Guenther Seitz
IPC分类号： G02B17/00 , G03B27/72 , G21K5/00
CPC分类号： G03F7/70233 , G02B17/0657 , G03F7/70275
摘要： A projection objective provides a light path for a light bundle from an object field in an object plane to an image field in an image plane. The projection objective includes eight mirrors. The light path is provided via the eight mirrors, and is free of obscuration.
摘要翻译：投影物镜提供从物体平面中的物场到像平面中的图像场的光束的光路。投影物镜包括八个镜子。光路通过八个镜子提供，并且没有遮蔽。

4. 发明申请

US20050225774A1 Method for measuring and manufacturing an optical element and optical apparatus 审中-公开
标题翻译：光学元件和光学装置的测量和制造方法
公开(公告)号：US20050225774A1
公开(公告)日：2005-10-13
申请号：US11098546
申请日：2005-04-05
申请人： Rolf Freimann , Susanne Beder , Guenther Seitz , Frank Schillke , Bernd Doerband , Heinz Martin , Franz Krug
发明人： Rolf Freimann , Susanne Beder , Guenther Seitz , Frank Schillke , Bernd Doerband , Heinz Martin , Franz Krug
IPC分类号： G01B9/02 , G01M11/02 , G02B13/18 , G02B27/62
CPC分类号： G01M11/0214 , G01M11/025 , G01M11/0271 , G02B13/18 , G02B27/62
摘要： A method of processing an optical element comprises testing the optical surface of the optical element using an interferometer optics for generating a beam of measuring light; wherein the interferometer optics has a plurality of optical elements which are configured and arranged such that the measuring light is substantially orthogonally incident on a reflecting surface, at each location thereof; and wherein the method further comprises: measuring at least one property of the interferometer optics, disposing the optical surface of the optical element at a measuring position relative to the interferometer optics within the beam of measuring light, and performing at least one interferometric measurement; determining deviations of the optical surface of the first optical element from a target shape thereof, based on the interferometric measurement and the at least one measured property of the interferometer optics.
摘要翻译：一种处理光学元件的方法包括使用用于产生测量光束的干涉仪光学器件来测试光学元件的光学表面; 其中所述干涉仪光学元件具有多个光学元件，所述多个光学元件被配置和布置成使得所述测量光在其每个位置处基本正交入射在反射表面上; 并且其中所述方法还包括：测量所述干涉仪光学器件的至少一个属性，将所述光学元件的光学表面相对于所述测量光束内的所述干涉仪光学器件设置在测量位置处，并且执行至少一个干涉测量; 基于干涉测量和干涉仪光学器件的至少一个测量特性，确定第一光学元件的光学表面与其目标形状的偏差。

5. 发明授权

US07508580B2 8-mirror microlithography projection objective 失效
标题翻译： 8镜微光投影物镜
公开(公告)号：US07508580B2
公开(公告)日：2009-03-24
申请号：US12012825
申请日：2008-02-06
申请人： Hans-Juergen Mann , Wilhelm Ulrich , Guenther Seitz
发明人： Hans-Juergen Mann , Wilhelm Ulrich , Guenther Seitz
IPC分类号： G02B17/00 , G03B27/72 , G21K5/00
CPC分类号： G03F7/70233 , G02B17/0657 , G03F7/70275
摘要： A projection objective provides a light path for a light bundle from an object field in an object plane to an image field in an image plane. The projection objective includes a first mirror (S1), a second mirror (S2), a third mirror (S3), a fourth mirror (S4), a fifth mirror (S5), a sixth mirror (S6), a seventh mirror (S7), and an eighth mirror (S8). The light bundles includes light with a wavelength in a range of 10-30 nm. The light is provided via the eight mirrors, and in the light path exactly one intermediate image of the object field is provided.
摘要翻译：投影物镜提供从物体平面中的物场到像平面中的图像场的光束的光路。投影物镜包括第一镜（S1），第二镜（S2），第三镜（S3），第四镜（S4），第五镜（S5），第六镜（S6），第七镜 S7）和第八反射镜（S8）。光束包括波长在10-30nm范围内的光。光通过八个反射镜提供，并且在光路中提供了物场的一个中间图像。

6. 发明申请

US20050046867A1 Method for the interferometric measurement of non-rotationally symmetric wavefront errors 有权
标题翻译：用于干涉测量非旋转对称波前误差的方法
公开(公告)号：US20050046867A1
公开(公告)日：2005-03-03
申请号：US10931703
申请日：2004-09-01
申请人： Guenther Seitz , Wolfgang Otto
发明人： Guenther Seitz , Wolfgang Otto
IPC分类号： G01J9/02 , G01B9/02
CPC分类号： G01J9/02
摘要： The method serves for the interferometric measurement of non-rotationally symmetric wavefront errors on a specimen (1). The specimen (1) is brought in this case into a number of rotational positions, at least one measurement result being determined in each of the rotational positions. In conclusion, a mathematical evaluation of all measurement results is performed. The measurement is carried out in at least two measurement series (M, N). The measurement results (M1 . . . Mm; N1 . . . Nn) of each of the measurement series (M, N) are determined respectively in mutually equidistant rotational positions of the specimen (1). Each of the measurement series (M, N) comprises a specific number (m, n) of measurements. The individual numbers (m, n) are natural and mutually coprime numbers. The measurement results (M1 . . . Mm, N1 . . . Nn) of each of the at least two measurement series (M, N) are evaluated independently of one another for non-rotationally symmetric wavefront errors ( m, n) on the specimen, a difference of the at least two non-rotationally symmetric wavefront errors ( m, n) being formed. The difference ( m− n) that is formed is computationally rotated m or n times and the results are averaged out. At least one of the wavefront errors ( m, n) is corrected with the result ( m− n>m or m− n>n) averaged in this way.
摘要翻译：该方法用于对样品（1）上的非旋转对称波前误差进行干涉测量。在这种情况下，将样本（1）带入多个旋转位置，在每个旋转位置中确定至少一个测量结果。总之，对所有测量结果进行数学评估。测量在至少两个测量系列（M，N）中进行。测量系列（M，N）的测量结果（M1 ... Mm; N1 ... Nn）分别在样本（1）的相互等距的旋转位置中确定。每个测量系列（M，N）包括特定数量（m，n）的测量值。个别数字（m，n）是自然而且相互互相对称的数字。对于非旋转对称的波前误差（M，N，N）分别评估至少两个测量序列（M，N）中的每一个的测量结果（M1 ... Mm，N1 ... Nn） W> n），形成至少两个非旋转对称波阵面误差（W m，W n）的差。形成的差异（ m- n）计算旋转m或n次，结果被平均化。使用结果（“W”m -W> n> m或“W”m -n> n）校正波前差错（ m，W> n）中的至少一个，以这种方式平均。

7. 发明授权

US07581305B2 Method of manufacturing an optical component 有权
标题翻译：制造光学部件的方法
公开(公告)号：US07581305B2
公开(公告)日：2009-09-01
申请号：US10821959
申请日：2004-04-12
申请人： Bernhard Geuppert , Jens Kugler , Thomas Ittner , Bernd Geh , Rolf Freimann , Guenther Seitz , Bernhard Fellner , Bernd Doerband , Stefan Schulte
发明人： Bernhard Geuppert , Jens Kugler , Thomas Ittner , Bernd Geh , Rolf Freimann , Guenther Seitz , Bernhard Fellner , Bernd Doerband , Stefan Schulte
IPC分类号： G01R31/28
CPC分类号： G03F7/706 , B24B13/0055 , G03F7/70825 , Y10T29/49002 , Y10T29/49004 , Y10T29/4902 , Y10T29/49131 , Y10T29/49171
摘要： A method of manufacturing an optical component comprising a substrate and a mounting frame with plural contact portions disposed at predetermined distances from each other is provided. The method comprises providing a measuring frame separate from the mounting frame for mounting the substrate, which measuring frame comprises a number of contact portions equal to a number of the contact portions of the mounting frame, wherein respective distances between the contact portions of the measuring frame are substantially equal to the corresponding distances between those of the mounting frame, measuring a shape of the optical surface of the substrate, while the substrate is mounted on the measuring frame, and mounting the substrate on the mounting frame such that the contact portions of the mounting frame are attached to the substrate at regions which are substantially the same as contact regions at which the substrate was attached to the measuring frame.
摘要翻译：提供了一种制造光学部件的方法，该光学部件包括基板和安装框架，所述安装框架具有彼此以预定距离设置的多个接触部分。该方法包括提供与用于安装基板的安装框架分离的测量框架，该测量框架包括等于安装框架的多个接触部分的多个接触部分，其中测量框架的接触部分之间的相应距离基本上等于安装框架的相应距离，测量基板的光学表面的形状，同时将基板安装在测量框架上，以及将基板安装在安装框架上，使得接触部分安装框架在与基板附接到测量框架的接触区域基本相同的区域处附接到基板。

8. 发明授权

US07277186B2 Method for the interferometric measurement of non-rotationally symmetric wavefront errors 有权
标题翻译：用于干涉测量非旋转对称波前误差的方法
公开(公告)号：US07277186B2
公开(公告)日：2007-10-02
申请号：US10931703
申请日：2004-09-01
申请人： Guenther Seitz , Wolfgang Otto
发明人： Guenther Seitz , Wolfgang Otto
IPC分类号： G01B9/02
CPC分类号： G01J9/02
摘要： The method serves for the interferometric measurement of non-rotationally symmetric wavefront errors on a specimen . The specimen is brought into a number of rotational positions, at least one measurement result being determined in each of the rotational positions and a mathematical evaluation of all measurement results is performed. The measurement results (M1 . . . Mm; N1 . . . Nn) of each of the measurement series (M, N) are determined respectively in mutually equidistant rotational positions of the specimen . The measurement results (M1 . . . Mm, N1 . . . Nn) of each of the at least two measurement series (M, N) are evaluated independently of one another for non-rotationally symmetric wavefront errors ( m, n) on the specimen, and a difference is computationally rotated m or n times and the results averaged out. At least one of the wavefront errors ( m, n) is corrected with the result ( m- n>m or m- n>n) averaged in this way.
摘要翻译：该方法用于干涉测量样品上的非旋转对称波前误差。将样本带入多个旋转位置，在每个旋转位置中确定至少一个测量结果，并且执行所有测量结果的数学评估。每个的测量结果（M 1 M 1 ... M N N N N 1 N N N N N N）分别在样本的相互等距的旋转位置确定测量系列（M，N）。每个的测量结果（M 1 M 1 ... M N N N N 1 N N N N N N N N N 对于非旋转对称的波前误差（ N，N> N），彼此独立地评估至少两个测量系列（M，N）在样本上，差异计算旋转m或n次，结果平均。波前错误（，）中的至少一个用结果（<< W> n 或以这种方式平均。

9. 发明申请

US20050223539A1 Method of manufacturing an optical component and optical system using the same 有权
标题翻译：制造使用其的光学部件和光学系统的方法
公开(公告)号：US20050223539A1
公开(公告)日：2005-10-13
申请号：US10821959
申请日：2004-04-12
申请人： Bernhard Geuppert , Jens Kugler , Thomas Ittner , Bernd Geh , Rolf Freimann , Guenther Seitz , Bernhard Fellner , Bernd Doerband , Stefan Schulte
发明人： Bernhard Geuppert , Jens Kugler , Thomas Ittner , Bernd Geh , Rolf Freimann , Guenther Seitz , Bernhard Fellner , Bernd Doerband , Stefan Schulte
IPC分类号： B24B13/005 , G02B7/00 , G03F7/20 , G11B7/24
CPC分类号： G03F7/706 , B24B13/0055 , G03F7/70825 , Y10T29/49002 , Y10T29/49004 , Y10T29/4902 , Y10T29/49131 , Y10T29/49171
摘要： A method of manufacturing an optical component comprising a substrate and a mounting frame with plural contact portions disposed at predetermined distances from each other is provided. The method comprises providing a measuring frame separate from the mounting frame for mounting the substrate, which measuring frame comprises a number of contact portions equal to a number of the contact portions of the mounting frame, wherein respective distances between the contact portions of the measuring frame are substantially equal to the corresponding distances between those of the mounting frame, measuring a shape of the optical surface of the substrate, while the substrate is mounted on the measuring frame, and mounting the substrate on the mounting frame such that the contact portions of the mounting frame are attached to the substrate at regions which are substantially the same as contact regions at which the substrate was attached to the measuring frame.
摘要翻译：提供了一种制造光学部件的方法，该光学部件包括基板和安装框架，所述安装框架具有彼此以预定距离设置的多个接触部分。该方法包括提供与用于安装基板的安装框架分离的测量框架，该测量框架包括等于安装框架的多个接触部分的多个接触部分，其中测量框架的接触部分之间的相应距离基本上等于安装框架的相应距离，测量基板的光学表面的形状，同时将基板安装在测量框架上，以及将基板安装在安装框架上，使得接触部分安装框架在与基板附接到测量框架的接触区域基本相同的区域处附接到基板。

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