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1. 发明申请

US20050140326A1 Positioning system and positioning method 有权
标题翻译：定位系统及定位方法
公开(公告)号：US20050140326A1
公开(公告)日：2005-06-30
申请号：US10969235
申请日：2004-10-21
申请人： Martijn Houkes , Henrikus Cox , Ramidin Kamidin , Patricia Vreugdewater
发明人： Martijn Houkes , Henrikus Cox , Ramidin Kamidin , Patricia Vreugdewater
IPC分类号： G03F9/00 , G03F7/20 , G05D3/00 , H01L21/027 , H01L21/68 , G05D23/275
CPC分类号： G03F7/70758 , G05B2219/45031
摘要： A positioning system for moving an object to a target position is presented. In an embodiment, the system includes a first actuator configured to exert a force on the object in a first direction in response to a control current, the actuator having an actuator gain and the generated force being a function of the control current and the actuator gain, the actuator including a magnet configured to induce a magnetic field; and a coil arranged in the magnetic field, the magnet and the coil being movable relative to each other. The system also includes a power supply configured to supply the control current to the actuator in response to a control signal; and a control system configured to control the force generated by the actuator by supplying the control signal to the power supply, the control signal being adapted to the actuator gain, the gain being predetermined as a function of a parameter.
摘要翻译：提出了一种用于将物体移动到目标位置的定位系统。在一个实施例中，系统包括第一致动器，其构造成响应于控制电流在第一方向上对物体施加力，致动器具有致动器增益，并且所产生的力是控制电流和致动器增益的函数所述致动器包括被配置为引起磁场的磁体; 以及布置在所述磁场中的线圈，所述磁体和所述线圈可相对于彼此移动。该系统还包括被配置为响应于控制信号向致动器提供控制电流的电源; 以及控制系统，其被配置为通过将所述控制信号提供给所述电源来控制由所述致动器产生的力，所述控制信号适于所述致动器增益，所述增益作为参数的函数被预先确定。

2. 发明授权

US07005823B2 Positioning system and positioning method 有权
标题翻译：定位系统及定位方法
公开(公告)号：US07005823B2
公开(公告)日：2006-02-28
申请号：US10969235
申请日：2004-10-21
申请人： Martijn Houkes , Henrikus Herman Marie Cox , Ramidin Izair Kamidin , Patricia Vreugdewater
发明人： Martijn Houkes , Henrikus Herman Marie Cox , Ramidin Izair Kamidin , Patricia Vreugdewater
IPC分类号： G05D23/275
CPC分类号： G03F7/70758 , G05B2219/45031
摘要： A positioning system for moving an object to a target position is presented. In an embodiment, the system includes a first actuator configured to exert a force on the object in a first direction in response to a control current, the actuator having an actuator gain and the generated force being a function of the control current and the actuator gain, the actuator including a magnet configured to induce a magnetic field; and a coil arranged in the magnetic field, the magnet and the coil being movable relative to each other. The system also includes a power supply configured to supply the control current to the actuator in response to a control signal; and a control system configured to control the force generated by the actuator by supplying the control signal to the power supply, the control signal being adapted to the actuator gain, the gain being predetermined as a function of a parameter.
摘要翻译：提出了一种用于将物体移动到目标位置的定位系统。在一个实施例中，系统包括第一致动器，其构造成响应于控制电流在第一方向上对物体施加力，致动器具有致动器增益，并且所产生的力是控制电流和致动器增益的函数所述致动器包括被配置为引起磁场的磁体; 以及布置在所述磁场中的线圈，所述磁体和所述线圈可相对于彼此移动。该系统还包括被配置为响应于控制信号向致动器提供控制电流的电源; 以及控制系统，其被配置为通过将所述控制信号提供给所述电源来控制由所述致动器产生的力，所述控制信号适于所述致动器增益，所述增益作为参数的函数被预先确定。

3. 发明申请

US20060215131A1 Lithographic apparatus, immersion projection apparatus and device manufacturing method 有权
标题翻译：平版印刷装置，浸没投影装置及装置的制造方法
公开(公告)号：US20060215131A1
公开(公告)日：2006-09-28
申请号：US11090699
申请日：2005-03-28
申请人： Jan-Gerard Van Der Toorn , Hans Butler , Henrikus Cox , Evert Draaijer , Nicolaas Ten Kate , Frits Van Der Meulen , Mark Johannes Frencken , Martijn Houkes , Antonius Arends , Minne Cuperus
发明人： Jan-Gerard Van Der Toorn , Hans Butler , Henrikus Cox , Evert Draaijer , Nicolaas Ten Kate , Frits Van Der Meulen , Mark Johannes Frencken , Martijn Houkes , Antonius Arends , Minne Cuperus
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： A lithographic apparatus comprises a substrate table to hold a substrate and a projection system to project a patterned radiation beam onto a target portion of the substrate. The lithographic apparatus further comprises a fluid supply system to supply a fluid between the substrate and a final lens element of the projection system as well as a position controller to control a position of the fluid supply system. The position controller is configured to, being provided with a position quantity of the substrate, determine a desired position of the liquid supply system by adding a position offset to the position quantity of the substrate, and position the liquid supply system according to the desired position. The position quantity may comprise a position and/or rotational position of the substrate table and/or a height function of a substrate height.
摘要翻译：光刻设备包括用于保持基板的基板台和将图案化的辐射束投影到基板的目标部分上的投影系统。光刻设备还包括一个流体供应系统，用于在基板和投影系统的最终透镜元件之间提供流体，以及位置控制器，用于控制流体供应系统的位置。位置控制器被配置为具有基板的位置量，通过向基板的位置量添加位置偏移来确定液体供应系统的期望位置，并且根据期望位置定位液体供应系统。位置量可以包括衬底台的位置和/或旋转位置和/或衬底高度的高度函数。

4. 发明申请

US20070002294A1 LITHOGRAPHIC APPARATUS IMMERSION DAMAGE CONTROL 有权
公开(公告)号：US20070002294A1
公开(公告)日：2007-01-04
申请号：US11169298
申请日：2005-06-29
申请人： Frits Van Der Meulen , Henrikus Cox , Martijn Houkes , Robertus Van Vliet , Stoyan Nihtianov , Petrus Wilhelmus Kemper , Roland Hanegraaf
发明人： Frits Van Der Meulen , Henrikus Cox , Martijn Houkes , Robertus Van Vliet , Stoyan Nihtianov , Petrus Wilhelmus Kemper , Roland Hanegraaf
IPC分类号： G03B27/42
CPC分类号： G03F7/70341
摘要： A lithographic apparatus includes a substrate table to hold a substrate; a substrate table position measurement system to measure a position quantity of the substrate table, a projection system to project a patterned radiation beam onto a target portion of the substrate, a fluid supply system to supply an immersion fluid in a space between a downstream lens of the projection system and the substrate, and a fluid supply system position measurement system to measure a position quantity of the fluid supply system. To prevent a collision between the fluid supply system and the substrate table, a damage control system of the lithographic apparatus may include a calculator to calculate a dimensional quantity of a gap between the fluid supply system and the substrate table from the positioned quantity of the substrate table and the position quantity of the fluid supply system. The damage control system may generate a warning signal when the dimensional quantity goes beyond a predetermined safety level.
摘要翻译：光刻设备包括用于保持衬底的衬底台; 用于测量衬底台的位置量的衬底台位置测量系统，将图案化的辐射束投影到衬底的目标部分上的投影系统，用于将浸没流体提供在下游透镜之间的空间中的流体供应系统投影系统和基板，以及用于测量流体供应系统的位置量的流体供应系统位置测量系统。为了防止流体供给系统和基板台之间的碰撞，光刻设备的损坏控制系统可以包括计算器，用于从基板的定位量计算流体供应系统和基板台之间的间隙的尺寸量表和流体供应系统的位置数量。当尺寸量超过预定的安全级别时，损坏控制系统可以产生警告信号。

5. 发明申请

US20060139613A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20060139613A1
公开(公告)日：2006-06-29
申请号：US11022950
申请日：2004-12-28
申请人： Martijn Houkes , Hans Butler , Henrikus Cox
发明人： Martijn Houkes , Hans Butler , Henrikus Cox
IPC分类号： G03B27/58
CPC分类号： G03F7/70341 , G03F7/70725
摘要： A lithographic apparatus includes a first movable element (such as an immersion liquid supply system), which is in operation in contact with a surface of a second movable element (such as a substrate table). Further, the lithographic apparatus includes a second element controller (such as a substrate table controller) to control a position quantity of the second movable element. Disturbance forces caused by, e.g., movements of the first and second movable elements with respect to each other, due to capillary forces disturb a position of the first and second movable elements. To at least partly correct a position of the second movable element due to such disturbance forces, the lithographic apparatus includes a feedforward control path to provide a disturbance force feedforward signal to the second element controller, the feedforward control path including a disturbance force estimator to estimate a disturbance force from a position quantity of the first movable element.
摘要翻译：光刻设备包括与第二可移动元件（例如基板台）的表面接触的第一可移动元件（例如浸没液体供应系统）。此外，光刻设备包括用于控制第二可移动元件的位置量的第二元件控制器（诸如基板台控制器）。由于毛细作用力引起的第一和第二可移动元件相对于彼此的运动引起的干扰力会扰乱第一和第二可移动元件的位置。为了由于这种干扰力至少部分地校正第二可移动元件的位置，光刻设备包括前馈控制路径以向第二元件控制器提供干扰力前馈信号，前馈控制路径包括扰动力估计器以估计来自第一可移动元件的位置量的扰动力。

6. 发明授权

US08724084B2 Lithographic apparatus and device manufacturing method 有权
公开(公告)号：US08724084B2
公开(公告)日：2014-05-13
申请号：US13189255
申请日：2011-07-22
申请人： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Henrikus Herman Marie Cox , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Joeri Lof , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Johannes Catharinus Hubertus Mulkens , Gerardus Petrus Mattijs Van Nunen , Klaus Simon , Bernardus Antonius Slaghekke , Alexander Straaijer , Jan-Gerard Cornelis Van Der Toorn , Martijn Houkes
发明人： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Henrikus Herman Marie Cox , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Joeri Lof , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Johannes Catharinus Hubertus Mulkens , Gerardus Petrus Mattijs Van Nunen , Klaus Simon , Bernardus Antonius Slaghekke , Alexander Straaijer , Jan-Gerard Cornelis Van Der Toorn , Martijn Houkes
IPC分类号： G03B27/42 , G03B27/52 , G03F7/20
CPC分类号： G03F7/70341 , G03F7/70425 , G03F7/70525 , G03F7/709
摘要： In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.

7. 发明申请

US20100238424A1 Lithographic Apparatus and Device Manufacturing Method 有权
标题翻译：光刻设备和器件制造方法
公开(公告)号：US20100238424A1
公开(公告)日：2010-09-23
申请号：US12710752
申请日：2010-02-23
申请人： Tjarko Adriaan Rudolf VAN EMPEL , Martijn Houkes , Norbert Erwin Therenzo Jansen
发明人： Tjarko Adriaan Rudolf VAN EMPEL , Martijn Houkes , Norbert Erwin Therenzo Jansen
IPC分类号： G03B27/58 , B29C59/00
CPC分类号： G03F7/709 , G03F7/70725
摘要： A positioning apparatus includes a first object and a second object; a positioning system configured to position the first and the second objects with respect to each other; and a flexible transportation line that is connected to the first and the second objects, the flexible transportation line having a stiffness that varies along the flexible transportation line such that the flexible transportation line can be represented by a dynamic transfer function, the dynamic transfer function being adapted to a closed-loop transfer function of the positioning system.
摘要翻译：定位装置包括第一物体和第二物体; 定位系统，被配置为相对于彼此定位所述第一和第二对象; 以及柔性输送线，其与第一和第二物体连接，柔性输送线具有沿着柔性输送线变化的刚度，使得柔性输送线可以由动态传递函数表示，动态传递函数为适用于定位系统的闭环传递功能。

8. 发明申请

US20050012912A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20050012912A1
公开(公告)日：2005-01-20
申请号：US10880605
申请日：2004-07-01
申请人： Evert Draaijer , Martinus Cuijpers , Menno Fien , Marcus Joseph Breukers , Martijn Houkes , Edwin Van Donkelaar
发明人： Evert Draaijer , Martinus Cuijpers , Menno Fien , Marcus Joseph Breukers , Martijn Houkes , Edwin Van Donkelaar
IPC分类号： H01L21/027 , G03F7/20 , G03B27/68
CPC分类号： G03F7/70733
摘要： A lithographic apparatus that includes an exposure system and a measurement system, is presented. The exposure system projects a patterned beam onto a target portion of a first substrate, while the measurement system projects a measurement beam on a target portion of a second substrate. Movement of a movable part of the apparatus generates a disturbance in a position of another movable part of the apparatus, e.g. due to displacement of air. This error can be compensated by calculating a compensation signal which is a function of states of one or both of the movable parts.
摘要翻译：提出了一种包括曝光系统和测量系统的光刻设备。曝光系统将图案化的光束投影到第一基板的目标部分上，而测量系统将测量光束投射到第二基板的目标部分上。装置的可移动部分的运动在装置的另一可移动部分的位置产生干扰，例如，由于空气的位移。可以通过计算作为一个或两个可移动部件的状态的函数的补偿信号来补偿该误差。

9. 发明申请

US20110181859A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
公开(公告)号：US20110181859A1
公开(公告)日：2011-07-28
申请号：US13082038
申请日：2011-04-07
申请人： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Henrikus Herman Marie Cox , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Joeri Lof , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Johannes Catharinus Hubertus Mulkens , Gerardus Petrus Matthijs Van Nunen , Klaus Simon , Bernardus Antonius Slaghekke , Alexander Straaijer , Jan-Gerard Cornelis Van Der Toorn , Martijn Houkes
发明人： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Henrikus Herman Marie Cox , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Joeri Lof , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Johannes Catharinus Hubertus Mulkens , Gerardus Petrus Matthijs Van Nunen , Klaus Simon , Bernardus Antonius Slaghekke , Alexander Straaijer , Jan-Gerard Cornelis Van Der Toorn , Martijn Houkes
IPC分类号： G03B27/54
CPC分类号： G03F7/70341 , G03F7/70425 , G03F7/70525 , G03F7/709
摘要： In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.

10. 发明授权

US07936444B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：光刻设备和器件制造方法
公开(公告)号：US07936444B2
公开(公告)日：2011-05-03
申请号：US12068546
申请日：2008-02-07
申请人： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Henrikus Herman Marie Cox , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Joeri Lof , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Johannes Catharinus Hubertus Mulkens , Gerardus Petrus Matthijs Van Nunen , Klaus Simon , Bernardus Antonius Slaghekke , Alexander Straaijer , Jan-Gerard Cornelis Van Der Toorn , Martijn Houkes
发明人： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Henrikus Herman Marie Cox , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Joeri Lof , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Johannes Catharinus Hubertus Mulkens , Gerardus Petrus Matthijs Van Nunen , Klaus Simon , Bernardus Antonius Slaghekke , Alexander Straaijer , Jan-Gerard Cornelis Van Der Toorn , Martijn Houkes
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F7/70341 , G03F7/70425 , G03F7/70525 , G03F7/709
摘要： In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.
摘要翻译：在光刻设备中，将投影系统下的基板表面的局部区域浸入液体中。可以使用致动器来改变衬底表面上方的液体供应系统的高度。控制系统使用前馈或反馈控制输入基板的表面高度，以将液体供应系统保持在基板表面上方的预定高度。

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