专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20070002294A1 LITHOGRAPHIC APPARATUS IMMERSION DAMAGE CONTROL 有权
公开(公告)号：US20070002294A1
公开(公告)日：2007-01-04
申请号：US11169298
申请日：2005-06-29
申请人： Frits Van Der Meulen , Henrikus Cox , Martijn Houkes , Robertus Van Vliet , Stoyan Nihtianov , Petrus Wilhelmus Kemper , Roland Hanegraaf
发明人： Frits Van Der Meulen , Henrikus Cox , Martijn Houkes , Robertus Van Vliet , Stoyan Nihtianov , Petrus Wilhelmus Kemper , Roland Hanegraaf
IPC分类号： G03B27/42
CPC分类号： G03F7/70341
摘要： A lithographic apparatus includes a substrate table to hold a substrate; a substrate table position measurement system to measure a position quantity of the substrate table, a projection system to project a patterned radiation beam onto a target portion of the substrate, a fluid supply system to supply an immersion fluid in a space between a downstream lens of the projection system and the substrate, and a fluid supply system position measurement system to measure a position quantity of the fluid supply system. To prevent a collision between the fluid supply system and the substrate table, a damage control system of the lithographic apparatus may include a calculator to calculate a dimensional quantity of a gap between the fluid supply system and the substrate table from the positioned quantity of the substrate table and the position quantity of the fluid supply system. The damage control system may generate a warning signal when the dimensional quantity goes beyond a predetermined safety level.
摘要翻译：光刻设备包括用于保持衬底的衬底台; 用于测量衬底台的位置量的衬底台位置测量系统，将图案化的辐射束投影到衬底的目标部分上的投影系统，用于将浸没流体提供在下游透镜之间的空间中的流体供应系统投影系统和基板，以及用于测量流体供应系统的位置量的流体供应系统位置测量系统。为了防止流体供给系统和基板台之间的碰撞，光刻设备的损坏控制系统可以包括计算器，用于从基板的定位量计算流体供应系统和基板台之间的间隙的尺寸量表和流体供应系统的位置数量。当尺寸量超过预定的安全级别时，损坏控制系统可以产生警告信号。

2. 发明申请

US20060215131A1 Lithographic apparatus, immersion projection apparatus and device manufacturing method 有权
标题翻译：平版印刷装置，浸没投影装置及装置的制造方法
公开(公告)号：US20060215131A1
公开(公告)日：2006-09-28
申请号：US11090699
申请日：2005-03-28
申请人： Jan-Gerard Van Der Toorn , Hans Butler , Henrikus Cox , Evert Draaijer , Nicolaas Ten Kate , Frits Van Der Meulen , Mark Johannes Frencken , Martijn Houkes , Antonius Arends , Minne Cuperus
发明人： Jan-Gerard Van Der Toorn , Hans Butler , Henrikus Cox , Evert Draaijer , Nicolaas Ten Kate , Frits Van Der Meulen , Mark Johannes Frencken , Martijn Houkes , Antonius Arends , Minne Cuperus
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： A lithographic apparatus comprises a substrate table to hold a substrate and a projection system to project a patterned radiation beam onto a target portion of the substrate. The lithographic apparatus further comprises a fluid supply system to supply a fluid between the substrate and a final lens element of the projection system as well as a position controller to control a position of the fluid supply system. The position controller is configured to, being provided with a position quantity of the substrate, determine a desired position of the liquid supply system by adding a position offset to the position quantity of the substrate, and position the liquid supply system according to the desired position. The position quantity may comprise a position and/or rotational position of the substrate table and/or a height function of a substrate height.
摘要翻译：光刻设备包括用于保持基板的基板台和将图案化的辐射束投影到基板的目标部分上的投影系统。光刻设备还包括一个流体供应系统，用于在基板和投影系统的最终透镜元件之间提供流体，以及位置控制器，用于控制流体供应系统的位置。位置控制器被配置为具有基板的位置量，通过向基板的位置量添加位置偏移来确定液体供应系统的期望位置，并且根据期望位置定位液体供应系统。位置量可以包括衬底台的位置和/或旋转位置和/或衬底高度的高度函数。

3. 发明申请

US20050140326A1 Positioning system and positioning method 有权
标题翻译：定位系统及定位方法
公开(公告)号：US20050140326A1
公开(公告)日：2005-06-30
申请号：US10969235
申请日：2004-10-21
申请人： Martijn Houkes , Henrikus Cox , Ramidin Kamidin , Patricia Vreugdewater
发明人： Martijn Houkes , Henrikus Cox , Ramidin Kamidin , Patricia Vreugdewater
IPC分类号： G03F9/00 , G03F7/20 , G05D3/00 , H01L21/027 , H01L21/68 , G05D23/275
CPC分类号： G03F7/70758 , G05B2219/45031
摘要： A positioning system for moving an object to a target position is presented. In an embodiment, the system includes a first actuator configured to exert a force on the object in a first direction in response to a control current, the actuator having an actuator gain and the generated force being a function of the control current and the actuator gain, the actuator including a magnet configured to induce a magnetic field; and a coil arranged in the magnetic field, the magnet and the coil being movable relative to each other. The system also includes a power supply configured to supply the control current to the actuator in response to a control signal; and a control system configured to control the force generated by the actuator by supplying the control signal to the power supply, the control signal being adapted to the actuator gain, the gain being predetermined as a function of a parameter.
摘要翻译：提出了一种用于将物体移动到目标位置的定位系统。在一个实施例中，系统包括第一致动器，其构造成响应于控制电流在第一方向上对物体施加力，致动器具有致动器增益，并且所产生的力是控制电流和致动器增益的函数所述致动器包括被配置为引起磁场的磁体; 以及布置在所述磁场中的线圈，所述磁体和所述线圈可相对于彼此移动。该系统还包括被配置为响应于控制信号向致动器提供控制电流的电源; 以及控制系统，其被配置为通过将所述控制信号提供给所述电源来控制由所述致动器产生的力，所述控制信号适于所述致动器增益，所述增益作为参数的函数被预先确定。

4. 发明申请

US20060139613A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20060139613A1
公开(公告)日：2006-06-29
申请号：US11022950
申请日：2004-12-28
申请人： Martijn Houkes , Hans Butler , Henrikus Cox
发明人： Martijn Houkes , Hans Butler , Henrikus Cox
IPC分类号： G03B27/58
CPC分类号： G03F7/70341 , G03F7/70725
摘要： A lithographic apparatus includes a first movable element (such as an immersion liquid supply system), which is in operation in contact with a surface of a second movable element (such as a substrate table). Further, the lithographic apparatus includes a second element controller (such as a substrate table controller) to control a position quantity of the second movable element. Disturbance forces caused by, e.g., movements of the first and second movable elements with respect to each other, due to capillary forces disturb a position of the first and second movable elements. To at least partly correct a position of the second movable element due to such disturbance forces, the lithographic apparatus includes a feedforward control path to provide a disturbance force feedforward signal to the second element controller, the feedforward control path including a disturbance force estimator to estimate a disturbance force from a position quantity of the first movable element.
摘要翻译：光刻设备包括与第二可移动元件（例如基板台）的表面接触的第一可移动元件（例如浸没液体供应系统）。此外，光刻设备包括用于控制第二可移动元件的位置量的第二元件控制器（诸如基板台控制器）。由于毛细作用力引起的第一和第二可移动元件相对于彼此的运动引起的干扰力会扰乱第一和第二可移动元件的位置。为了由于这种干扰力至少部分地校正第二可移动元件的位置，光刻设备包括前馈控制路径以向第二元件控制器提供干扰力前馈信号，前馈控制路径包括扰动力估计器以估计来自第一可移动元件的位置量的扰动力。

5. 发明申请

US20060049698A1 Lithographic apparatus and device manufacturing method 有权
公开(公告)号：US20060049698A1
公开(公告)日：2006-03-09
申请号：US10936712
申请日：2004-09-09
申请人： Koen Maria Zaal , Edwin Buis , Henrikus Cox , Noud Gilissen , Harmen Schoot
发明人： Koen Maria Zaal , Edwin Buis , Henrikus Cox , Noud Gilissen , Harmen Schoot
IPC分类号： H02K41/00 , H02N1/00
CPC分类号： G03F7/70716 , G03F7/709
摘要： A substrate or a patterning device used in a lithographic apparatus and a lithographic device manufacturing method are presented. The substrate and patterning device are aligned with respect to a patterning beam and are movably supported by a support. Resonances in said support, however, may render the manufactured device unusable and/ or may render the control system complex. Therefore an actuator assembly frame with flexible coupling devices coupled to the support is provided with a number of actuators configured to move the support in a number of degrees of freedom. Thus, the resonances are damped by the flexible coupling devices resulting in a larger bandwidth for the control system and thus enabling a better position accuracy of the support.

6. 发明申请

US20050139790A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20050139790A1
公开(公告)日：2005-06-30
申请号：US10747617
申请日：2003-12-30
申请人： Martinus Boogaarts , Hans Butler , Henrikus Cox , Martinus Cuijpers , Jan Kuit
发明人： Martinus Boogaarts , Hans Butler , Henrikus Cox , Martinus Cuijpers , Jan Kuit
IPC分类号： G03F9/00 , G01N21/88 , G03F7/20 , H01L21/027 , G01N21/86
CPC分类号： G03F7/70808 , G01N21/8851 , G03F7/709
摘要： The present invention relates to a lithographic projection apparatus comprising a housing, which comprises therein a first exposure system that has at least one movable part, e.g. a movable first substrate holder, or a movable second substrate holder in a twin stage apparatus. The system is further provided with position disturbance correction system for correcting a position of the first substrate holder with respect to the patterned projection beam due to the influence of gas pressure differences or gas movements, caused by movements of the movable part. The invention also generally relates to a device manufacturing method comprising providing a lithographic projection apparatus according to the invention with a first substrate, and exposing said first substrate, wherein during said exposing of the first substrate a position thereof is corrected by means of position disturbance correction system.
摘要翻译：本发明涉及一种包括壳体的光刻投影设备，其中包括第一曝光系统，该曝光系统具有至少一个可移动部分，例如，可移动的第一衬底保持器或可移动的第二衬底保持器。该系统还设置有位置扰动校正系统，用于由于可移动部件的运动引起的气体压力差或气体运动的影响，校正第一衬底保持器相对于图案化的投影梁的位置。本发明还通常涉及一种器件制造方法，其包括：提供具有第一衬底的根据本发明的光刻投影设备，并且暴露所述第一衬底，其中在所述第一衬底的暴露期间，其位置通过位置干扰校正被校正系统。

7. 发明申请

US20060119829A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20060119829A1
公开(公告)日：2006-06-08
申请号：US11005480
申请日：2004-12-07
申请人： Henrikus Cox , Koen Johannes Maria Zaal
发明人： Henrikus Cox , Koen Johannes Maria Zaal
IPC分类号： G03B27/58
CPC分类号： G03F7/70725 , G05B2219/45028
摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam, a patterning device support constructed to support a patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate support constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto a target portion of the substrate. An actuator assembly is configured to move one of the supports with six degrees of freedom comprising x, y, z, rx, ry and rz directions. A controller controls the actuator assembly, and includes at least one compensator which is designed to dynamically decouple a dynamics of the actuator assembly in the degrees of freedom.
摘要翻译：光刻设备包括被配置为调节辐射束的照明系统，构造成支撑图案形成装置的图案形成装置支撑件，其能够在其横截面中赋予辐射束图案以形成图案化的辐射束，构造的衬底支架以保持基板和配置成将图案化的辐射束投影到基板的目标部分上的投影系统。致动器组件被配置为使包括x，y，z，rx，ry和rz方向的六个自由度中的一个支撑件移动。控制器控制致动器组件，并且包括至少一个补偿器，其被设计成以自由度动态地解耦致动器组件的动力学。

8. 发明申请

US20060087630A1 Lithographic apparatus and device manufacturing method 有权
公开(公告)号：US20060087630A1
公开(公告)日：2006-04-27
申请号：US11212921
申请日：2005-08-29
申请人： Nicolaas Kemper , Henrikus Cox , Sjoerd Donders , Roelof Graaf , Christiaan Hoogendam , Nicolaas Kate , Martinus Hendrikus Leenders , Jeroen Mertens , Frits Meulen , Joost Ottens , Franciscus Maria Teunissen , Jan-Gerard Toorn , Martinus Verhagen , Marco Polizzi , Edwin Augustinus Van Gompel , Johannes Smeulers , Stefan Belfroid
发明人： Nicolaas Kemper , Henrikus Cox , Sjoerd Donders , Roelof Graaf , Christiaan Hoogendam , Nicolaas Kate , Martinus Hendrikus Leenders , Jeroen Mertens , Frits Meulen , Joost Ottens , Franciscus Maria Teunissen , Jan-Gerard Toorn , Martinus Verhagen , Marco Polizzi , Edwin Augustinus Van Gompel , Johannes Smeulers , Stefan Belfroid
IPC分类号： G03B27/52
CPC分类号： G03F7/70883 , G03F7/70341 , G03F7/70858 , G03F7/70866 , G03F7/7095
摘要： A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.

9. 发明申请

US20060082753A1 Actuator assembly and lithographic apparatus comprising such an actuator assembly 有权
标题翻译：包括这种致动器组件的致动器组件和光刻设备
公开(公告)号：US20060082753A1
公开(公告)日：2006-04-20
申请号：US10967306
申请日：2004-10-19
申请人： Henrikus Cox , Sven Hol , Hernes Jacobs
发明人： Henrikus Cox , Sven Hol , Hernes Jacobs
IPC分类号： G03B27/58
CPC分类号： G03F7/70758
摘要： An actuator assembly includes a coil moveably positionable in a magnetic field generated by a magnet assembly, each of the coil and the magnet having substantially only one side facing the other. A magnetized field-shaping element is provided for shaping the magnetic field such that the magnetic field is substantially perpendicular to the direction of the electrical current for generating a force in a first degree of freedom. Thus, the coil may easily be mounted, since it does not need to be enclosed by magnet poles.
摘要翻译：致动器组件包括能够由磁体组件产生的磁场中的可移动地定位的线圈，线圈和磁体中的每一个基本上只有一个面朝向另一侧。提供磁化场成形元件用于使磁场成形，使得磁场基本上垂直于用于产生第一自由度的电流的方向。因此，线圈可以容易地安装，因为它不需要被磁极包围。

10. 发明申请

US20050128460A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20050128460A1
公开(公告)日：2005-06-16
申请号：US10735846
申请日：2003-12-16
申请人： Petrus Marinus Van Den Biggelaar , Henrikus Cox , Yin Tso , Sjoerd Donders , Theodorus Knoops
发明人： Petrus Marinus Van Den Biggelaar , Henrikus Cox , Yin Tso , Sjoerd Donders , Theodorus Knoops
IPC分类号： G03F7/20 , H01L21/027 , G03B27/58
CPC分类号： G03F7/70508 , G03F7/70725
摘要： In a lithographic projection apparatus and a device manufacturing method, a movable part is controlled to produce a motion, an absolute value of at least one of a fourth and a higher derivative to time of the position of the motion being limited to less than a maximal value. Specifying at least one of a fourth and a higher derivative to time of the position may help to improve settling behavior to obtain more accurate positioning. Further, a movable part may be controlled to produce an acceleration of the movable part having a high at least one of a third and a higher derivative to time of the position of the motion at a start portion of the acceleration and a corresponding low at least one of a third and a higher derivative to time of the position of the motion at an end portion of the acceleration, the absolute value of the high at least one of the third and the higher derivative to time of the position of the motion being larger than the absolute value of the corresponding low at least one of the third and the higher derivative to time of the position of the motion.
摘要翻译：在光刻投影装置和装置制造方法中，可动部被控制以产生运动，将运动位置的第四和更高的导数与时间中的至少一个的绝对值限制为小于最大值值。指定位置的时间的第四和更高的派生中的至少一个有助于改善沉降行为以获得更准确的定位。此外，可以控制可移动部分，以产生具有高于加速度起始部分处的运动位置的第三和更高导数的至少一个的可移动部分的加速度，并且至少一个对应的低对加速度的端部处的运动位置的时间的三分之一或更高的导数之一，运动位置的第三和更高的导数与时间的高度的绝对值较大比相应的低的运动的位置的时间的第三和更高的导数中的至少一个的绝对值。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式