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    • 1. 发明授权
    • Surface nanofabrication methods using self-assembled polymer nanomasks
    • 使用自组装聚合物纳米掩模的表面纳米加工方法
    • US09050621B2
    • 2015-06-09
    • US13748840
    • 2013-01-24
    • Mark Alejandro QuesadaJianguo WangYing Zhang
    • Mark Alejandro QuesadaJianguo WangYing Zhang
    • C25F3/00H01B13/00B44C1/22H01L21/302H01L21/461B05D5/00B82Y40/00G03F7/00B82Y10/00
    • B05D5/00B82Y10/00B82Y40/00G03F7/0002Y10S977/888
    • Methods for fabricating a nanopillared substrate surface include applying a polymer solution containing an amphiphilic block copolymer and a hydrophilic homopolymer to a substrate surface. The amphiphilic block copolymer and the hydrophilic homopolymer in the polymer solution self-assemble on the substrate surface to form a self-assembled polymer layer having hydrophobic domains adjacent to the substrate surface and hydrophilic domains extending into the self-assembled polymer layer. At least a portion of the hydrophilic domains may be removed to form a plurality of pores in the exposed surface of the self-assembled polymer layer. A protective layer may be deposited on the exposed surface as a mask for etching through the plurality of pores to form through-holes. A nanopillar-forming material may be deposited onto the substrate surface via the through-holes. Then, the remaining portion of the self-assembled polymer layer may be removed to expose a nanopillared substrate surface.
    • 制造纳米圆柱形基底表面的方法包括将含有两亲嵌段共聚物和亲水均聚物的聚合物溶液施加到基底表面。 聚合物溶液中的两亲性嵌段共聚物和亲水均聚物自组装在基材表面上以形成具有与基材表面相邻的疏水区域和延伸到自组装聚合物层中的亲水区域的自组装聚合物层。 亲水区域的至少一部分可以被去除以在自组装聚合物层的暴露表面中形成多个孔。 可以在暴露的表面上沉积保护层作为用于通过多个孔蚀刻的掩模以形成通孔。 可以通过通孔将纳米柱形成材料沉积到衬底表面上。 然后,可以除去自组装聚合物层的剩余部分以暴露出纳米圆柱形的衬底表面。
    • 2. 发明申请
    • SURFACE NANOFABRICATION METHODS USING SELF-ASSEMBLED POLYMER NANOMASKS
    • 使用自组装聚合物纳米颗粒的表面纳米化方法
    • US20140202984A1
    • 2014-07-24
    • US13748840
    • 2013-01-24
    • Mark Alejandro QuesadaJianguo WangYing Zhang
    • Mark Alejandro QuesadaJianguo WangYing Zhang
    • B05D5/00
    • B05D5/00B82Y10/00B82Y40/00G03F7/0002Y10S977/888
    • Methods for fabricating a nanopillared substrate surface include applying a polymer solution containing an amphiphilic block copolymer and a hydrophilic homopolymer to a substrate surface. The amphiphilic block copolymer and the hydrophilic homopolymer in the polymer solution self-assemble on the substrate surface to form a self-assembled polymer layer having hydrophobic domains adjacent to the substrate surface and hydrophilic domains extending into the self-assembled polymer layer. At least a portion of the hydrophilic domains may be removed to form a plurality of pores in the exposed surface of the self-assembled polymer layer. A protective layer may be deposited on the exposed surface as a mask for etching through the plurality of pores to form through-holes. A nanopillar-forming material may be deposited onto the substrate surface via the through-holes. Then, the remaining portion of the self-assembled polymer layer may be removed to expose a nanopillared substrate surface.
    • 制造纳米圆柱形基底表面的方法包括将含有两亲嵌段共聚物和亲水均聚物的聚合物溶液施加到基底表面。 聚合物溶液中的两亲性嵌段共聚物和亲水均聚物自组装在基材表面上以形成具有与基材表面相邻的疏水区域和延伸到自组装聚合物层中的亲水区域的自组装聚合物层。 亲水区域的至少一部分可以被去除以在自组装聚合物层的暴露表面中形成多个孔。 可以在暴露的表面上沉积保护层作为用于通过多个孔蚀刻的掩模以形成通孔。 可以通过通孔将纳米柱形成材料沉积到衬底表面上。 然后,可以除去自组装聚合物层的剩余部分以暴露出纳米圆柱形的衬底表面。
    • 7. 发明授权
    • Tin phosphate barrier film, method, and apparatus
    • 磷酸铁阻隔膜,方法和装置
    • US07749811B2
    • 2010-07-06
    • US12553469
    • 2009-09-03
    • Bruce Gardiner AitkenChong Pyung AnBenjamin Zain HansonMark Alejandro Quesada
    • Bruce Gardiner AitkenChong Pyung AnBenjamin Zain HansonMark Alejandro Quesada
    • H01L21/00
    • H01L51/5253C23C14/06H01L31/048Y02E10/50
    • A method is disclosed for inhibiting oxygen and moisture penetration of a device comprising the steps of depositing a tin phosphate low liquidus temperature (LLT) inorganic material on at least a portion of the device to create a deposited tin phosphate LLT material, and heat treating the deposited LLT material in a substantially oxygen and moisture free environment to form a hermetic seal; wherein the step of depositing the LLT material comprises the use of a resistive heating element comprising tungsten. An organic electronic device is also disclosed comprising a substrate plate, at least one electronic or optoelectronic layer, and a tin phosphate LLT barrier layer, wherein the electronic or optoelectronic layer is hermetically sealed between the tin phosphate LLT barrier layer and the substrate plate. An apparatus is also disclosed having at least a portion thereof sealed with a tin phosphate LLT barrier layer.
    • 公开了一种用于抑制装置的氧气和水分渗透的方法,包括以下步骤:在所述装置的至少一部分上沉积磷酸铁低液相线温度(LLT)无机材料以产生沉积的磷酸锡LLT材料,并热处理 沉积的LLT材料在基本上无氧和无水的环境中以形成气密密封; 其中沉积LLT材料的步骤包括使用包含钨的电阻加热元件。 还公开了一种有机电子器件,其包括基板,至少一个电子或光电子层和磷酸锡LLT阻挡层,其中电子或光电子层气密地密封在磷酸铁LLT阻挡层和基板之间。 还公开了一种装置,其至少一部分用磷酸铁LLT阻挡层密封。