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1. 发明申请

US20070146660A1 Lithographic apparatus, system and device manufacturing method 有权
标题翻译：平版印刷设备，系统和器件制造方法
公开(公告)号：US20070146660A1
公开(公告)日：2007-06-28
申请号：US11319193
申请日：2005-12-28
申请人： Marc Lorenz Van Der Velden , Vadim Banine , Bastiaan Mertens , Johannes Josephina Moors , Markus Weiss , Bastiaan Wolschrijn , Michiel Nijkerk
发明人： Marc Lorenz Van Der Velden , Vadim Banine , Bastiaan Mertens , Johannes Josephina Moors , Markus Weiss , Bastiaan Wolschrijn , Michiel Nijkerk
IPC分类号： G03B27/52
CPC分类号： G03F7/70933 , G03F7/70916 , G03F7/7095
摘要： The invention relates to a lithographic apparatus that includes a system configured to condition a radiation beam or project a patterned radiation beam onto a target portion of a substrate. The system includes an optically active device configured to direct the radiation beam or the patterned radiation beam, respectively, and a support structure configured to support the optically active device. The apparatus further includes a gas supply for providing a background gas into the system. The radiation beam or patterned radiation beam react with the background gas to form a plasma that includes a plurality of ions. The support structure includes an element that includes a material that has a low sputtering yield, a high sputter threshold energy, or a high ion implantation yield, to reduce sputtering and the creation of sputtering products.
摘要翻译：本发明涉及一种光刻设备，其包括被配置为调节辐射束或将图案化的辐射束投影到基板的目标部分上的系统。该系统包括被配置为分别引导辐射束或图案化辐射束的光学有源器件，以及被配置为支持光学有源器件的支撑结构。该装置还包括用于将背景气体提供到系统中的气体供应。辐射束或图案化的辐射束与背景气体反应以形成包括多个离子的等离子体。支撑结构包括包括具有低溅射产率，高溅射阈值能量或高离子注入产量的材料的元件，以减少溅射和溅射产物的产生。

2. 发明申请

US20070145295A1 Radical cleaning arrangement for a lithographic apparatus 有权
标题翻译：用于光刻设备的自由清洁装置
公开(公告)号：US20070145295A1
公开(公告)日：2007-06-28
申请号：US11296702
申请日：2005-12-08
申请人： Vadim Banine , Vladimir Ivanov , Johannes Josephina Moors , Bastiaan Wolschrijn , Derk Jan Klunder , Maarten Johannes Wilhelmus Van Herpen
发明人： Vadim Banine , Vladimir Ivanov , Johannes Josephina Moors , Bastiaan Wolschrijn , Derk Jan Klunder , Maarten Johannes Wilhelmus Van Herpen
IPC分类号： A61N5/00
CPC分类号： G03F7/70933 , G03F7/70925
摘要： A cleaning arrangement is configured to clean an EUV optic of an EUV lithographic apparatus. The partial radical pressure ranges between 0.1-10 Pa. The cleaning arrangement can be configured inside a cleaning cocoon of the lithographic apparatus for offline cleaning. It can also be configured at particular positions inside the apparatus to clean nearby optics during production. In the pressure range of 0.1-10 Pa the penetration of atomic hydrogen into the optical devices is high, while the recombination to molecular hydrogen and hydrogen consumption is limited.
摘要翻译：清洁装置被配置为清洁EUV光刻设备的EUV光学元件。部分自由基压力范围在0.1-10Pa之间。清洁装置可以被配置在光刻设备的清洁茧内用于离线清洁。它也可以配置在设备内的特定位置，以便在生产过程中清洁附近的光学元件。在0.1-10Pa的压力范围内，原子氢进入光学器件的渗透率很高，而分子氢和氢消耗的复合受到限制。

3. 发明申请

US20050140945A1 Lithographic apparatus having a debris-mitigation system, a source for producing EUV radiation having a debris mitigation system and a method for mitigating debris 有权
标题翻译：具有碎片减轻系统的光刻设备，用于产生具有碎片减缓系统的EUV辐射的源和用于减轻碎片的方法
公开(公告)号：US20050140945A1
公开(公告)日：2005-06-30
申请号：US10748851
申请日：2003-12-31
申请人： Vadim Banine , Levinus Bakker , Vladimir Ivanov , Johannes Josephina Moors , Givi Zukavishvili , Abraham Veefkind
发明人： Vadim Banine , Levinus Bakker , Vladimir Ivanov , Johannes Josephina Moors , Givi Zukavishvili , Abraham Veefkind
IPC分类号： G03F7/20 , G03B27/52
CPC分类号： G03F7/70916 , G03F7/70983
摘要： A lithographic apparatus is disclosed. The apparatus includes an illumination system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate support that supports a substrate, a projection system that projects the patterned beam onto a target portion of the substrate, and a debris-mitigation system that mitigates debris particles which are formed during use of at least a part of the lithographic apparatus. The debris-mitigation system is arranged to apply a magnetic field so that at least charged debris particles are mitigated.
摘要翻译：公开了一种光刻设备。该装置包括提供辐射束的照明系统和支撑图形结构的支撑结构。图案形成结构被配置为在其横截面中赋予辐射束图案。该装置还包括支撑基板的基板支撑件，将图案化的光束投影到基板的目标部分上的投影系统，以及减轻碎片颗粒的碎片减轻系统，该碎片减小系统在使用期间形成的碎屑颗粒的至少一部分光刻设备碎片减轻系统被布置成施加磁场，使得至少带电的碎屑颗粒被减轻。

4. 发明申请

US20060127811A1 Lithographic apparatus and device manufacturing method 失效
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20060127811A1
公开(公告)日：2006-06-15
申请号：US11007579
申请日：2004-12-09
申请人： Johannes Josephina Moors , Robertus Jacobus Van Ballegoij , Vadim Banine , Gert-Jan Heerens , Frederik Elisabeth Heuts , Johannes Wilhelmus Jacobs , Paulus Liebregts , Hendrik Johannes Neerhof
发明人： Johannes Josephina Moors , Robertus Jacobus Van Ballegoij , Vadim Banine , Gert-Jan Heerens , Frederik Elisabeth Heuts , Johannes Wilhelmus Jacobs , Paulus Liebregts , Hendrik Johannes Neerhof
IPC分类号： G03F7/00
CPC分类号： G03F7/70916 , G03F7/70883 , G03F7/70908
摘要： A device manufacturing method includes projecting a patterned beam of radiation through an optics compartment and a channel that provides an open connection between the optics compartment and a substrate compartment onto a substrate, maintaining an ionized flush gas at a higher pressure in the channel than in the substrate compartment and in the optics compartment during the projecting, intercepting particles that emanate from the substrate with the ionized flush gas, pumping the flush gas carrying the intercepted particles from the substrate compartment using a pump coupled to a gas outlet coupled to at least one of the compartments, and establishing an electrical potential difference between a wall of the channel and the outlet and/or a rotor of the pump so that the outlet and/or the rotor of the pump attracts positively charged ions that stem from the flush gas in the channel.
摘要翻译：一种器件制造方法包括将图案化的辐射束投射通过光学隔室和通道，其在光学隔室和衬底隔室之间提供开放的连接到衬底上，保持电离冲洗气体在通道中的压力高于在衬底隔室和在光电隔室中，在用电离冲洗气体从衬底发射的颗粒中突出，截留颗粒时，使用耦合到与至少一个隔室，并且在通道的壁与出口和/或泵的转子之间建立电势差，使得泵的出口和/或转子吸引来自于冲洗气体的带正电荷的离子渠道。

5. 发明申请

US20060175558A1 Method for removal of deposition on an optical element, lithographic apparatus, device manufacturing method, and device manufactured thereby 有权
标题翻译：用于去除光学元件上的沉积的方法，光刻设备，器件制造方法以及由此制造的器件
公开(公告)号：US20060175558A1
公开(公告)日：2006-08-10
申请号：US11051477
申请日：2005-02-07
申请人： Levinus Bakker , Vadim Banine , Johannes Josephina Moors , Carolus Ida Maria Spee , Johannes Leonardus Franken , Arnoud Wassink , Paul Antonius Brom
发明人： Levinus Bakker , Vadim Banine , Johannes Josephina Moors , Carolus Ida Maria Spee , Johannes Leonardus Franken , Arnoud Wassink , Paul Antonius Brom
IPC分类号： G03B7/20
CPC分类号： G03F7/70175 , G03F7/70916
摘要： A method for removal of deposition on a radiation collector of a lithographic apparatus includes providing a gas barrier to an end of a radiation collector, thereby providing a radiation collector enclosure volume; providing a gas to the enclosure volume, the gas selected from a halogen containing gas and a hydrogen containing gas; and removing at least part of the deposition from the radiation collector. A lithographic apparatus includes a radiation collector; a circumferential hull enclosing the radiation collector; a gas barrier at an end of the radiation collector, thereby providing a radiation collector enclosure volume. The radiation collector is enclosed by the circumferential hull and the gas barrier. An inlet provides a gas to the radiation collector enclosure volume and an outlet removes a gas from the radiation collector enclosure volume.
摘要翻译：用于去除光刻设备的辐射收集器上的沉积的方法包括向辐射收集器的端部提供气体阻挡层，从而提供辐射收集器外壳体积; 向封闭体积提供气体，所述气体选自含卤素气体和含氢气体; 以及从所述辐射收集器去除所述沉积物的至少一部分。光刻设备包括辐射收集器; 围绕辐射收集器的周向船体; 在辐射收集器的端部处的气体屏障，从而提供辐射收集器外壳体积。辐射收集器被周向壳体和气体屏障包围。入口为辐射收集器外壳体积提供气体，出口从辐射收集器外壳体积中除去气体。

6. 发明申请

US20060115771A1 Method for the removal of deposition on an optical element, method for the protection of an optical element, device manufacturing method, apparatus including an optical element, and lithographic apparatus 有权
公开(公告)号：US20060115771A1
公开(公告)日：2006-06-01
申请号：US11239479
申请日：2005-09-30
申请人： Maarten Marinus Wilhelmus Van Herpen , Vadim Banine , Johannes Josephina Moors , Carolus Ida Maria Spee , Derk Jan Klunder
发明人： Maarten Marinus Wilhelmus Van Herpen , Vadim Banine , Johannes Josephina Moors , Carolus Ida Maria Spee , Derk Jan Klunder
IPC分类号： G03C5/00
CPC分类号： B82Y10/00 , B08B7/0035 , B08B17/04 , G03F7/70925 , G03F7/70983 , G21K1/062
摘要： A method for the removal of a deposition on an optical element of an apparatus including the optical element includes providing an H2 containing gas in at least part of the apparatus includes producing hydrogen radicals from H2 from the H2 containing gas; and bringing the optical element with deposition into contact with at least part of the hydrogen radicals and removing at least part of the deposition. Further, a method for the protection of an optical element of an apparatus including the optical element includes providing a cap layer to the optical element by a deposition process; and during or after use of the apparatus, removing at least part of the cap layer from the optical element in a removal process as described above. The methods can be applied in a lithographic apparatus.

7. 发明申请

US20050254029A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20050254029A1
公开(公告)日：2005-11-17
申请号：US10842637
申请日：2004-05-11
申请人： Vadim Banine , Johannes Josephina Moors
发明人： Vadim Banine , Johannes Josephina Moors
IPC分类号： G03F7/20 , G03B27/42
CPC分类号： G03F7/70191 , G03F7/70575
摘要： A lithographic apparatus includes an illumination system configured to transmit a beam of radiation, the beam of radiation comprising desired radiation having a predetermined wavelength or a predetermined wavelength range, and undesired radiation having another wavelength or another wavelength range; a support structure configured to support a patterning structure, the patterning structure being configured to impart the beam of radiation with a pattern in its cross-section; a substrate table configured to hold a substrate; and a projection system configured to project the patterned beam of radiation onto a target portion of the substrate; wherein at least part of the lithographic apparatus, in use, includes a gas substantially transmissive for at least part of the desired radiation and substantially less transmissive for at least part of the undesired radiation.
摘要翻译：光刻设备包括被配置为透射辐射束的照明系统，所述辐射束包括具有预定波长或预定波长范围的期望辐射，以及具有另一波长或另一波长范围的不需要的辐射; 支撑结构，其构造成支撑图案形成结构，所述图案化结构被配置为在其横截面中赋予所述辐射束的图案; 被配置为保持基板的基板台; 以及投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上; 其中在使用中至少部分光刻设备包括至少部分所需辐射基本上透射的气体，对于至少部分不需要的辐射基本上较少透射。

8. 发明申请

US20050057734A1 Lithographic apparatus, device manufacturing method and device manufactured thereby 有权
标题翻译：平版印刷设备，器件制造方法和由此制造的器件
公开(公告)号：US20050057734A1
公开(公告)日：2005-03-17
申请号：US10738981
申请日：2003-12-19
申请人： Lucas Johannes Stevens , Martinus Antonius Leenders , Hans Meiling , Johannes Josephina Moors
发明人： Lucas Johannes Stevens , Martinus Antonius Leenders , Hans Meiling , Johannes Josephina Moors
IPC分类号： B08B7/00 , G03F7/20 , H01L21/027 , G03B27/52
CPC分类号： G03F7/70925 , B08B7/0035
摘要： A lithographic projection apparatus is disclosed. The apparatus includes a radiation system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to pattern the beam of radiation according to a desired pattern. The apparatus also includes a substrate support that supports a substrate, a projection system that projects the patterned beam onto a target portion of the substrate, a plurality of optical elements that form part of at least one of the radiation system, the patterning structure, and the projection system; and a cleaning device. The cleaning device includes at least one cleaning beam of radiation, and a gas. The cleaning device is configured to clean an individual optical element or a subset of the plurality of optical elements.
摘要翻译：公开了一种光刻投影装置。该装置包括提供辐射束的辐射系统和支撑图形结构的支撑结构。图形结构被配置为根据期望的图案对辐射束进行图案化。该装置还包括支撑基板的基板支撑件，将图案化的光束投影到基板的目标部分上的投影系统，形成辐射系统，图案形成结构和至少一个的一部分的多个光学元件投影系统; 和清洁装置。清洁装置包括至少一个清洁的辐射束和气体。清洁装置被配置为清洁单个光学元件或多个光学元件的子集。

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