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1. 发明申请

US20070146660A1 Lithographic apparatus, system and device manufacturing method 有权
标题翻译：平版印刷设备，系统和器件制造方法
公开(公告)号：US20070146660A1
公开(公告)日：2007-06-28
申请号：US11319193
申请日：2005-12-28
申请人： Marc Lorenz Van Der Velden , Vadim Banine , Bastiaan Mertens , Johannes Josephina Moors , Markus Weiss , Bastiaan Wolschrijn , Michiel Nijkerk
发明人： Marc Lorenz Van Der Velden , Vadim Banine , Bastiaan Mertens , Johannes Josephina Moors , Markus Weiss , Bastiaan Wolschrijn , Michiel Nijkerk
IPC分类号： G03B27/52
CPC分类号： G03F7/70933 , G03F7/70916 , G03F7/7095
摘要： The invention relates to a lithographic apparatus that includes a system configured to condition a radiation beam or project a patterned radiation beam onto a target portion of a substrate. The system includes an optically active device configured to direct the radiation beam or the patterned radiation beam, respectively, and a support structure configured to support the optically active device. The apparatus further includes a gas supply for providing a background gas into the system. The radiation beam or patterned radiation beam react with the background gas to form a plasma that includes a plurality of ions. The support structure includes an element that includes a material that has a low sputtering yield, a high sputter threshold energy, or a high ion implantation yield, to reduce sputtering and the creation of sputtering products.
摘要翻译：本发明涉及一种光刻设备，其包括被配置为调节辐射束或将图案化的辐射束投影到基板的目标部分上的系统。该系统包括被配置为分别引导辐射束或图案化辐射束的光学有源器件，以及被配置为支持光学有源器件的支撑结构。该装置还包括用于将背景气体提供到系统中的气体供应。辐射束或图案化的辐射束与背景气体反应以形成包括多个离子的等离子体。支撑结构包括包括具有低溅射产率，高溅射阈值能量或高离子注入产量的材料的元件，以减少溅射和溅射产物的产生。

2. 发明申请

US20060219950A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20060219950A1
公开(公告)日：2006-10-05
申请号：US11094490
申请日：2005-03-31
申请人： Levinus Bakker , Vadim Banine , Vladimir Ivanov , Konstantin Koshelev , Bastiaan Mertens , Johannes Moors , Frank Schuurmans , Givi Zukavishvili , Bastiaan Wolschrijn , Marc Van Der Velden
发明人： Levinus Bakker , Vadim Banine , Vladimir Ivanov , Konstantin Koshelev , Bastiaan Mertens , Johannes Moors , Frank Schuurmans , Givi Zukavishvili , Bastiaan Wolschrijn , Marc Van Der Velden
IPC分类号： G03F7/20 , G21K5/00
CPC分类号： G03F7/70933 , B82Y10/00 , G03F7/70033 , G03F7/70916
摘要： A lithographic apparatus is arranged to project a beam from a radiation source onto a substrate. The apparatus includes an optical element in a path of the beam, a gas inlet for introducing a gas into the path of the beam so that the gas will be ionized by the beam to create electric fields toward the optical element, and a gas source coupled to the gas inlet for supplying the gas. The gas has a threshold of kinetic energy for sputtering the optical element that is greater than the kinetic energy developed by ions of the gas in the electric fields.
摘要翻译：光刻设备被布置成将来自辐射源的光束投影到基底上。该装置包括在光束的路径中的光学元件，用于将气体引入光束的路径中的气体入口，使得气体将被光束离子化以产生朝向光学元件的电场，并且气体源耦合到用于供应气体的气体入口。气体具有用于溅射光学元件的动能阈值，其大于由电场中的气体的离子产生的动能。

3. 发明申请

US20070085984A1 Lithographic projection apparatus, device manufacturing method and device manufactured thereby 审中-公开
标题翻译：平版印刷设备，装置制造方法和由此制造的装置
公开(公告)号：US20070085984A1
公开(公告)日：2007-04-19
申请号：US11252240
申请日：2005-10-18
申请人： Vadim Banine , Vladimir Ivanov , Bastiaan Mertens , Johannes Hubertus Moors , Bastiaan Wolschrijn
发明人： Vadim Banine , Vladimir Ivanov , Bastiaan Mertens , Johannes Hubertus Moors , Bastiaan Wolschrijn
IPC分类号： G03B27/52
CPC分类号： G03F7/70933 , G03F7/70841 , G03F7/70908
摘要： A lithographic projection apparatus includes a radiation system configured to supply a beam of radiation; a mask table provided with a mask holder for holding a mask; a substrate table provided with a substrate holder for holding a substrate; a projection system configured to image an irradiated portion of the mask onto a target portion of the substrate, wherein the projection system is separated from the substrate table by an intervening space that is at least partially evacuated and is delimited at the location of the projection system by a solid surface from which the employed radiation is directed toward the substrate table; the intervening space contains a hollow tube located between the solid surface and the substrate table and situated around the path of the beam of radiation, the tube being configured such that beam of radiation focused by the projection system onto the substrate table does not intercept a wall of the hollow tube; a flushing system is configure to continually flush the inside of the hollow tube with a flow of gas, wherein the gas is hydrogen, the flow of the gas is opposed to the flow of contaminants from the substrate and/or the hollow tube is in fluid communication with the intervening space.
摘要翻译：光刻投影设备包括被配置为提供辐射束的辐射系统; 设置有用于保持面罩的面罩座的面罩台; 设置有用于保持基板的基板保持器的基板台; 投影系统，被配置为将所述掩模的照射部分成像到所述基板的目标部分上，其中所述投影系统通过至少部分抽真空并且在所述投影系统的位置处界定的中间空间与所述基板台分离通过使用的辐射从该表面朝向衬底台的固体表面; 中间空间包含位于固体表面和基底台之间的中空管，并且位于辐射束的路径周围，该管被配置成使得由投影系统聚焦到衬底台上的辐射束不会拦截壁的中空管; 冲洗系统被配置为以气流连续冲洗中空管的内部，其中气体是氢气，气体的流动与来自基底和/或中空管的污染物的流动相对流体与中间空间的沟通。

4. 发明申请

US20060268246A1 Lithographic device, device manufacturing method and device manufactured thereby 有权
标题翻译：平版印刷装置，装置制造方法和由此制造的装置
公开(公告)号：US20060268246A1
公开(公告)日：2006-11-30
申请号：US11391731
申请日：2006-03-29
申请人： Johannes Jacobs , Vadim Banine , Barrie Brewster , Vladimir Ivanov , Bastiaan Mertens , Johannes Moors , Robert Livesey , Baastiaan Wolschrijn
发明人： Johannes Jacobs , Vadim Banine , Barrie Brewster , Vladimir Ivanov , Bastiaan Mertens , Johannes Moors , Robert Livesey , Baastiaan Wolschrijn
IPC分类号： G03B27/52
CPC分类号： G03F7/70933 , G03F7/70908
摘要： A lithographic apparatus is configured to project a pattern from a patterning device onto a substrate. The apparatus includes a gas purged sealing aperture extending between at least two different zones of the apparatus, and a gas supplier configured to supply the sealing aperture one or more gases selected from a group including hydrogen, deuterium, heavy hydrogen, deuterated hydrogen, and a mixture of argon and hydrogen.
摘要翻译：光刻设备被配置为将图案从图案形成装置投影到基板上。该装置包括在装置的至少两个不同区域之间延伸的气体净化密封孔，以及构造成为密封孔提供一种或多种选自包括氢，氘，重氢，氘代氢和氩和氢的混合物。

5. 发明申请

US20050112508A1 Lithographic projection apparatus, device manufacturing method and device manufactured thereby 有权
标题翻译：平版印刷设备，装置制造方法和由此制造的装置
公开(公告)号：US20050112508A1
公开(公告)日：2005-05-26
申请号：US10973250
申请日：2004-10-27
申请人： Willem Van Schaik , Bastiaan Mertens , Hans Meiling , Norbertus Koster
发明人： Willem Van Schaik , Bastiaan Mertens , Hans Meiling , Norbertus Koster
IPC分类号： G02B17/00 , G03F7/20 , H01L21/027
CPC分类号： G03F7/70925 , G03F7/70883 , G03F7/70933
摘要： In-situ cleaning of optical components for use in a lithographic projection apparatus can be carried out by irradiating a space within the apparatus containing the optical component with UV or EUV radiation having a wavelength of less than 250 nm, in the presence of molecular oxygen. Generally, the space will be purged with an ozoneless purge gas which contains a small amount of molecular oxygen in addition to the usual purge gas composition. The technique can also be used in an evacuated space by introducing a low pressure of molecular oxygen into the space.
摘要翻译：用于光刻投影装置的光学部件的原位清洁可以通过在分子氧的存在下用包含波长小于250nm的UV或EUV辐射在含有光学部件的装置内照射空间来进行。通常，除了通常的清洗气体组合物之外，空间将被除去含有少量分子氧的无臭吹扫气体吹扫。该技术也可以通过将低分子氧引入该空间而在真空空间中使用。

6. 发明申请

US20050286041A1 Lithographic apparatus and patterning device transport 有权
标题翻译：平版印刷设备和图案形成装置运输
公开(公告)号：US20050286041A1
公开(公告)日：2005-12-29
申请号：US10874690
申请日：2004-06-24
申请人： Erik Ham , Robert Gabriel Lansbergen , Ellart Meijer , Hendricus Johannes Meijer , Hans Meiling , Bastiaan Mertens , Johannes Hubertus Moors , Gert-Jan Heerens
发明人： Erik Ham , Robert Gabriel Lansbergen , Ellart Meijer , Hendricus Johannes Meijer , Hans Meiling , Bastiaan Mertens , Johannes Hubertus Moors , Gert-Jan Heerens
IPC分类号： G03B27/52 , G03B27/62
CPC分类号： G03B27/52 , G03F7/70741
摘要： The invention relates to a box for transporting lithographic patterning device, the box being arranged to cooperate with a lithographic apparatus. The transport box is provided with a container part having an inner space with a storing position for storing the patterning device and an opening for the transfer of the patterning device. The box also comprises a closure part for closing the opening, and a channel system for evacuating and/or feeding gasses from/to the inner space the box. The invention also relates to a lithographic apparatus configured to cooperate with the transport box.
摘要翻译：本发明涉及一种用于输送平版印刷图案形成装置的盒子，该盒子被布置为与光刻设备配合。输送箱设置有具有用于存储图案形成装置的存储位置的内部空间和用于传送图案形成装置的开口的容器部分。该箱还包括用于封闭开口的封闭部分，以及用于将气体从盒子内部空间排出和/或送入箱体的内部空间的通道系统。本发明还涉及一种被配置为与传送箱配合的光刻设备。

7. 发明申请

US20050286029A1 Lithographic apparatus and patterning device transport 有权
标题翻译：平版印刷设备和图案形成装置运输
公开(公告)号：US20050286029A1
公开(公告)日：2005-12-29
申请号：US10972755
申请日：2004-10-26
申请人： Erik Ham , Gert-Jan Heerens , Robert Lansbergen , Ellard Meijer , Hendricus Meijer , Hans Meiling , Bastiaan Mertens , Johannes Moors
发明人： Erik Ham , Gert-Jan Heerens , Robert Lansbergen , Ellard Meijer , Hendricus Meijer , Hans Meiling , Bastiaan Mertens , Johannes Moors
IPC分类号： G03B27/52 , G03B27/62
CPC分类号： G03B27/52 , G03F7/70741
摘要： According to an embodiment, a box for transporting a lithographic patterning device is arranged to cooperate with a lithographic apparatus. The transport box may be provided with a container part having an inner space with a storing position for storing the patterning device and an opening for the transfer of the patterning device. Prior to transfer of the patterning device from the inner space to the apparatus, the inner space is pressurized. The box may also comprise a closure part for closing the opening, and/or a channel system for evacuating and/or feeding gasses from/to the inner space of the box. Other embodiments include a lithographic apparatus comprising and/or configured to cooperate with such a box.
摘要翻译：根据实施例，用于传送平版印刷图案形成装置的盒被布置成与光刻设备配合。运输箱可以设置有具有内部空间的容器部分，该内部空间具有用于存储图案形成装置的存储位置和用于图案形成装置的传送的开口。在将图案形成装置从内部空间传送到装置之前，内部空间被加压。箱子还可以包括用于关闭开口的封闭部分和/或用于将气体从箱体的内部空间排出和/或进气的通道系统。其他实施例包括包括和/或配置为与这种盒配合的光刻设备。

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