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    • 5. 发明授权
    • Electric actuator
    • 电动执行器
    • US09096395B2
    • 2015-08-04
    • US14122774
    • 2012-06-18
    • Shinji Wakabayashi
    • Shinji Wakabayashi
    • B65G45/10B65G49/07H01L21/677B65G54/02
    • B65G54/02B65G45/10B65G49/07H01L21/67742Y10T74/18712
    • Provided is an electric actuator capable of preventing the release of particles from the body thereof. The electric actuator includes a body made of an elongated enclosure; a slider configured to move in a reciprocating manner along a lengthwise direction of the body; an opening formed in a side surface of the body to correspond to a moving path of the slider; a dust seal band provided to cover the opening; and a pair of electrodes protruding from the body at opposite sides of the opening toward the outside of the body and extending in the lengthwise direction of the body with the opening being interposed between the pair of electrodes. Positive potential is generated in the upper electrode of the pair of electrodes and negative potential is generated in the lower electrode of the pair of electrodes.
    • 提供一种能够防止颗粒从其本体释放的电致动器。 电致动器包括由细长壳体制成的主体; 滑块,其构造成沿着所述主体的长度方向以往复方式移动; 形成在所述主体的侧表面中以对应于所述滑块的移动路径的开口; 设置用于覆盖开口的防尘密封带; 以及一对电极,其从所述主体的相对侧朝向所述主体的外部突出并且在所述主体的长度方向上延伸,并且所述开口插入在所述一对电极之间。 在一对电极的上部电极中产生正电位,在一对电极的下部电极中产生负电位。
    • 6. 发明申请
    • Wafer transfer apparatus, wafer transfer method and storage medium
    • 晶圆转印装置,晶片转印方法和存储介质
    • US20090053023A1
    • 2009-02-26
    • US11892677
    • 2007-08-24
    • Shinji Wakabayashi
    • Shinji Wakabayashi
    • H01L21/677
    • H01L21/67748H01L21/681Y10S414/136
    • One sensor constituted of a light emission element and a light-receiving element is provided in a path through which a wafer is transferred. The sensor is positioned so that the wafer passes through an area between the light emission element and the light-receiving element. Coordinates of the center of the wafer are calculated based on encoder values obtained when the wafer starts passing through the sensor and when the wafer completes passing through the sensor, position data of wafer transfer means corresponding to the encoder value, and the diameter of the wafer; and thereby the amount of positional deviation of the center of the wafer from a reference position is calculated.
    • 在发送晶片的路径中设置由发光元件和受光元件构成的一个传感器。 传感器被定位成使得晶片通过发光元件和光接收元件之间的区域。 基于晶片开始通过传感器时获得的编码器值,当晶片完成通过传感器时,根据编码器值对应的晶片传送装置的位置数据和晶片的直径来计算晶片中心的坐标 ; 从而计算晶片的中心与基准位置的位置偏差量。
    • 7. 发明申请
    • Substrate carrying apparatus and substrate carrying method
    • 基板承载装置和基板承载方法
    • US20080050924A1
    • 2008-02-28
    • US11892430
    • 2007-08-22
    • Shinji Wakabayashi
    • Shinji Wakabayashi
    • H01L21/306H01L21/302
    • H01L21/67017H01L21/67778H01L21/68
    • Object A substrate processing apparatus is provided, which comprises a processing vessel adapted to provide a process to a substrate, an ambient atmospheric carrying chamber, and a functional module located on a carrying route of the substrate to be carried by a carrying means in the ambient atmospheric carrying chamber, wherein bad effect on the functional module due to particles and/or corrosive gases to be generated due to contact of the ambient air with the substrate after having been processed can be avoided. solution The substrate processing apparatus, adapted to provide a process, such as etching, to a wafer, comprises the processing vessel, the ambient atmospheric carrying chamber, and the functional module, such as an orienter 4. With the process to be provided, matters having potential to generate corrosive gases or the like due to contact with the ambient air are attached to the wafer. In the ambient atmospheric carrying chamber, a first air stream creating means 15a, 15b, 15c is provided. In the functional module, a second air stream creating means (FFU 60) is installed to create a stream of cleaned air directed toward the ambient atmospheric carrying chamber 14 from the functional module 4, by taking in the ambient air from a clean room.
    • 对象提供了一种基板处理装置,其包括处理容器,该处理容器适于向基板,环境大气输送室和位于基板的运送路径上的功能模块提供处理,所述功能模块将由环境中的承载装置承载 可以避免由于环境空气与处理后的基板接触而产生的颗粒和/或腐蚀性气体对功能模块的不良影响。 解决方案适用于向晶片提供诸如蚀刻的处理的衬底处理装置包括处理容器,环境大气承载室和诸如定向器4的功能模块。随着要提供的过程,事项 由于与环境空气的接触而产生腐蚀性气体等的潜力附着在晶片上。 在环境大气承载室中,设置有第一气流产生装置15a,15b,15c。 在功能模块中,安装第二气流产生装置(FFU60),以从功能模块4通过吸入来自洁净室的环境空气来产生朝向周围大气承载室14的清洁空气流。
    • 8. 发明授权
    • Oil deterioration detection apparatus
    • 油劣化检测装置
    • US07038459B2
    • 2006-05-02
    • US10695866
    • 2003-10-30
    • Shinji Wakabayashi
    • Shinji Wakabayashi
    • G01N27/416G01N27/02
    • G01N33/2888
    • An oil deterioration detection apparatus includes a sensor, an evaluation circuit, and a malfunction detecting circuit. The evaluation circuit has a determination circuit. The malfunction detecting circuit has a resistor and a switch. The evaluation circuit evaluates a condition of the oil based on a normal voltage. The normal voltage is measured when the switch is opened so that the resistor is not electrically conducted. The determination circuit determines whether the sensor malfunctions based on a relation between the normal voltage and a divided voltage. The divided voltage is measured when the switch is closed so that the resistor is electrically conducted in parallel with the sensor.
    • 油劣化检测装置包括传感器,评估电路和故障检测电路。 评估电路具有确定电路。 故障检测电路具有电阻和开关。 评估电路基于正常电压来评估油的状态。 当开关打开时测量正常电压,使电阻器不导电。 确定电路基于正常电压和分压之间的关系确定传感器是否发生故障。 当开关闭合时测量分压,使电阻器与传感器并联电气传导。