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1. 发明授权

US06930834B2 Method of manufacturing diffractive optical element 失效
$Method of manufacturing diffractive optical element$
标题翻译：衍射光学元件的制造方法
公开(公告)号：US06930834B2
公开(公告)日：2005-08-16
申请号：US10023689
申请日：2001-12-21
申请人： Makoto Ogusu , Yuichi Iwasaki
发明人： Makoto Ogusu , Yuichi Iwasaki
IPC分类号： C23F1/02 , G02B5/18 , G03F1/52 , G03F1/70 , G03F7/00 , G03F7/20 , H01L21/027
CPC分类号： G02B5/1857 , C23F1/02 , G03F7/0005 , G03F7/0035
摘要： A method of manufacturing a diffractive optical element, including a process for forming a resist mask of blazed shape upon a substrate and for etching the substrate by use of the resist mask so that the blazed shape is transferred to the substrate. The method includes a process for forming, before the etching, an element being effective to prevent a taper shape, to be produced at an edge of the blazed shape of the resist mask, from being transformed to the substrate.
摘要翻译：一种制造衍射光学元件的方法，包括在衬底上形成闪耀形状的抗蚀剂掩模并通过使用抗蚀剂掩模蚀刻衬底的工艺，使得闪耀形状被转印到衬底。该方法包括在蚀刻之前形成有效防止在抗蚀剂掩模的闪耀形状的边缘处产生的锥形形状的元件被转变为基板的工艺。

2. 发明授权

US07679717B2 Exposure apparatus 失效
标题翻译：曝光装置
公开(公告)号：US07679717B2
公开(公告)日：2010-03-16
申请号：US11563885
申请日：2006-11-28
申请人： Yuichi Iwasaki
发明人： Yuichi Iwasaki
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F7/70341
摘要： An exposure apparatus for exposing a pattern of a reticle onto a substrate includes a projection optical system for projecting the pattern onto a substrate, the exposure apparatus exposing the substrate through a flammable liquid that is filled in a space between the substrate and a final lens of the projection optical system closest to the substrate, and an explosion-proof unit for shielding an ignition source that can ignite the liquid or vapor of the liquid, from the liquid and the vapor.
摘要翻译：用于将掩模版的图案曝光到基板上的曝光装置包括用于将图案投影到基板上的投影光学系统，曝光装置通过可燃液体曝光，该可燃液体填充在基板和最终透镜之间的空间中最靠近基板的投影光学系统，以及用于屏蔽可以从液体和蒸汽点燃液体的液体或蒸气的点火源的防爆单元。

3. 发明授权

US08035796B2 Immersion exposure apparatus and device manufacturing method 有权
标题翻译：浸渍曝光装置及装置的制造方法
公开(公告)号：US08035796B2
公开(公告)日：2011-10-11
申请号：US12133206
申请日：2008-06-04
申请人： Yuichi Iwasaki
发明人： Yuichi Iwasaki
IPC分类号： G03B27/52 , G03B27/42 , G03B27/58
CPC分类号： G03F7/7085 , G03F7/70341 , G03F7/70716
摘要： An immersion exposure apparatus which exposes a substrate through a liquid includes an illumination optical system, a projection optical system, a chuck, a liquid support plate, a stage, and a liquid repellency recovery unit. The illumination optical system illuminates an original with exposure light from exposure light sources. The projection optical system projects a pattern of the original onto the substrate. The chuck holds the substrate. The liquid support plate supports a liquid together with the substrate held by the chuck. A surface of the liquid support plate includes a surface of a metal oxide. The stage is provided with a chuck and the liquid support plate and is movable. The liquid repellency recovery unit is configured to recover the liquid repellency of the surface of the metal oxide with regard to the liquid.
摘要翻译：通过液体露出基板的浸渍曝光装置包括照明光学系统，投影光学系统，卡盘，液体支撑板，台架和拒液性回收单元。照明光学系统用来自曝光光源的曝光光照射原稿。投影光学系统将原稿的图案投影到基板上。卡盘夹持基板。液体支撑板与由卡盘保持的基板一起支撑液体。液体支撑板的表面包括金属氧化物的表面。该台设置有卡盘和液体支撑板并且是可移动的。液体排斥性回收单元被构造为回收关于液体的金属氧化物表面的拒水性。

4. 发明申请

US20090002649A1 IMMERSION EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译：倾斜曝光装置和装置制造方法
公开(公告)号：US20090002649A1
公开(公告)日：2009-01-01
申请号：US12133206
申请日：2008-06-04
申请人： Yuichi Iwasaki
发明人： Yuichi Iwasaki
IPC分类号： G03B27/52
CPC分类号： G03F7/7085 , G03F7/70341 , G03F7/70716
摘要： An immersion exposure apparatus which exposes a substrate through a liquid includes an illumination optical system, a projection optical system, a chuck, a liquid support plate, a stage, and a liquid repellency recovery unit. The illumination optical system illuminates an original with exposure light from exposure light sources. The projection optical system projects a pattern of the original onto the substrate. The chuck holds the substrate. The liquid support plate supports a liquid together with the substrate held by the chuck. A surface of the liquid support plate includes a surface of a metal oxide. The stage is provided with a chuck and the liquid support plate and is movable. The liquid repellency recovery unit is configured to recover the liquid repellency of the surface of the metal oxide with regard to the liquid.
摘要翻译：通过液体露出基板的浸渍曝光装置包括照明光学系统，投影光学系统，卡盘，液体支撑板，台架和拒液性回收单元。照明光学系统用来自曝光光源的曝光光照射原稿。投影光学系统将原稿的图案投影到基板上。卡盘夹持基板。液体支撑板与由卡盘保持的基板一起支撑液体。液体支撑板的表面包括金属氧化物的表面。该台设置有卡盘和液体支撑板并且是可移动的。液体排斥性回收单元被构造为回收关于液体的金属氧化物表面的拒水性。

5. 发明授权

US07276707B2 Deflector, method of manufacturing deflector, and charged particle beam exposure apparatus 有权
标题翻译：偏转器，偏转器制造方法和带电粒子束曝光装置
公开(公告)号：US07276707B2
公开(公告)日：2007-10-02
申请号：US11196262
申请日：2005-08-04
申请人： Yuichi Iwasaki , Masato Muraki , Kenji Tamamori , Kouji Asano , Masayoshi Esashi , Yoshinori Nakayama , Shinichi Hashimoto , Yoshiaki Moro
发明人： Yuichi Iwasaki , Masato Muraki , Kenji Tamamori , Kouji Asano , Masayoshi Esashi , Yoshinori Nakayama , Shinichi Hashimoto , Yoshiaki Moro
IPC分类号： H01J37/30
CPC分类号： H01J37/045 , B82Y10/00 , B82Y40/00 , H01J37/1477 , H01J37/3174 , H01J2237/0437 , H01J2237/31774
摘要： A deflector which deflects a charged particle beam includes a substrate having an opening through which the charged particle beam should pass, and a deflection electrode which is arranged in the opening to deflect the charged particle beam and has a first conductive member and second conductive member which are formed by plating. The second conductive member is formed on a surface of the first conductive member and is essentially made of a material that is more difficult to oxidize than the first conductive member.
摘要翻译：偏转带电粒子束的偏转器包括具有带电粒子束应穿过的开口的基板和设置在开口中以偏转带电粒子束的偏转电极，并具有第一导电部件和第二导电部件，通过电镀形成。第二导电构件形成在第一导电构件的表面上，并且基本上由比第一导电构件更难氧化的材料制成。

6. 发明申请

US20050035300A1 Deflector, method of manufacturing deflector, and charged particle beam exposure apparatus 有权
公开(公告)号：US20050035300A1
公开(公告)日：2005-02-17
申请号：US10670328
申请日：2003-09-26
申请人： Yuichi Iwasaki , Masato Muraki , Kenji Tamamori , Kouji Asano , Masayoshi Esashi , Yoshinori Nakayama , Shinichi Hashimoto , Yoshiaki Moro
发明人： Yuichi Iwasaki , Masato Muraki , Kenji Tamamori , Kouji Asano , Masayoshi Esashi , Yoshinori Nakayama , Shinichi Hashimoto , Yoshiaki Moro
IPC分类号： H01J37/147
CPC分类号： H01J37/045 , B82Y10/00 , B82Y40/00 , H01J37/1477 , H01J37/3174 , H01J2237/0437 , H01J2237/31774
摘要： A deflector which deflects a charged particle beam includes a substrate having an opening through which the charged particle beam should pass, and a deflection electrode which is arranged in the opening to deflect the charged particle beam and has a first conductive member and second conductive member, which are formed by plating. The second conductive member is formed on the surface of the first conductive member and is made of a material that is more difficult to oxidize than the first conductive member. The first conductive member is made of a material having smaller residual stress than the second conductive member.

7. 发明授权

US06818911B2 Array structure and method of manufacturing the same, charged particle beam exposure apparatus, and device manufacturing method 有权
标题翻译：阵列结构及其制造方法，带电粒子束曝光装置及器件制造方法
公开(公告)号：US06818911B2
公开(公告)日：2004-11-16
申请号：US10406274
申请日：2003-04-04
申请人： Kenji Tamamori , Masato Muraki , Yuichi Iwasaki , Yoshinori Nakayama , Kouji Asano , Yoshiaki Moro , Masayoshi Esashi
发明人： Kenji Tamamori , Masato Muraki , Yuichi Iwasaki , Yoshinori Nakayama , Kouji Asano , Yoshiaki Moro , Masayoshi Esashi
IPC分类号： G21G500
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/045 , H01J37/3177 , H01J2237/0435
摘要： This invention provides a reliable blanking aperture array. An insulating layer and conductive layer are sequentially formed on the lower surface of a substrate. Then, a plurality of pairs of opposing trenches are formed in the substrate, and an insulating layer is formed on each of the side surfaces of the trenches by thermal oxidation. The conductive layer is exposed by etching the bottom of each trench. A conductive member is selectively grown in each trench using the conductive layer as a plating electrode to form a blanking electrode. An opening is formed between the opposing blanking electrodes.
摘要翻译：本发明提供了可靠的消隐孔径阵列。绝缘层和导电层依次形成在基板的下表面上。然后，在衬底中形成多对相对的沟槽，并且通过热氧化在沟槽的每个侧表面上形成绝缘层。通过蚀刻每个沟槽的底部来暴露导电层。使用导电层作为电镀电极，在每个沟槽中选择性地生长导电构件以形成消隐电极。在相对的消隐电极之间形成开口。

8. 发明授权

US06475704B1 Method for forming fine structure 失效
标题翻译：形成精细结构的方法
公开(公告)号：US06475704B1
公开(公告)日：2002-11-05
申请号：US09150837
申请日：1998-09-10
申请人： Yuichi Iwasaki , Ichiro Tanaka
发明人： Yuichi Iwasaki , Ichiro Tanaka
IPC分类号： G03C500
CPC分类号： C23F1/20 , C23F1/02 , C23F1/26 , G02B5/1857 , G03F7/0005
摘要： In order to form three or more steps on a substrate with high precision, a first mask is formed to an area on the substrate corresponding with every other step, and also etching is performed on the area of the substrate to which the first mask is not formed, a second mask is formed to an area on the substrate to which the first mask has not been formed, and also etching is performed on the area on the substrate to which the first and the second masks are not formed.
摘要翻译：为了在基板上高精度地形成三个以上的台阶，对于与其他工序相对应的基板上的区域形成第一掩模，并且对基板的不是第一掩模的区域进行蚀刻形成的第二掩模形成在未形成第一掩模的基板上的区域上，并且对未形成第一和第二掩模的基板上的区域进行蚀刻。

9. 发明授权

US06953938B2 Deflector, method of manufacturing deflector, and charged particle beam exposure apparatus 有权
标题翻译：偏转器，偏转器制造方法和带电粒子束曝光装置
公开(公告)号：US06953938B2
公开(公告)日：2005-10-11
申请号：US10670328
申请日：2003-09-26
申请人： Yuichi Iwasaki , Masato Muraki , Kenji Tamamori , Kouji Asano , Masayoshi Esashi , Yoshinori Nakayama , Shinichi Hashimoto , Yoshiaki Moro
发明人： Yuichi Iwasaki , Masato Muraki , Kenji Tamamori , Kouji Asano , Masayoshi Esashi , Yoshinori Nakayama , Shinichi Hashimoto , Yoshiaki Moro
IPC分类号： H01J37/147 , H01J37/304
CPC分类号： H01J37/045 , B82Y10/00 , B82Y40/00 , H01J37/1477 , H01J37/3174 , H01J2237/0437 , H01J2237/31774
摘要： A deflector which deflects a charged particle beam includes a substrate having an opening through which the charged particle beam should pass, and a deflection electrode which is arranged in the opening to deflect the charged particle beam and has a first conductive member and second conductive member, which are formed by plating. The second conductive member is formed on the surface of the first conductive member and is made of a material that is more difficult to oxidize than the first conductive member. The first conductive member is made of a material having smaller residual stress than the second conductive member.
摘要翻译：使带电粒子束偏转的偏转器包括具有带电粒子束应通过的开口的基板和布置在开口中以偏转带电粒子束并具有第一导电构件和第二导电构件的偏转电极，它们通过电镀形成。第二导电构件形成在第一导电构件的表面上，并且由比第一导电构件更难氧化的材料制成。第一导电部件由残留应力小于第二导电部件的材料制成。

10. 发明授权

US06514674B1 Method of forming an optical element 失效
标题翻译：形成光学元件的方法
公开(公告)号：US06514674B1
公开(公告)日：2003-02-04
申请号：US09521380
申请日：2000-03-08
申请人： Yuichi Iwasaki
发明人： Yuichi Iwasaki
IPC分类号： G02B518
CPC分类号： G02B1/11 , G02B5/1857
摘要： The back surface of a BOE (binary optical element) having a binary optical structure formed thereon is coated with a resist film. Chromium is then deposited on the BOE by means of electron beam evaporation so as to form an island structure with an island size of about 50 nm and an island-to-island distance of about 80 nm. The BOE is then etched with an etchant to a depth of 55 nm using the island structure as a mask thereby forming a pillar-shaped microstructure. The island structure used as the mask is removed by means of wet etching using an etchant, and the resist film on the back surface of the BOE is removed using a resist remover. Thus, a microstructure is obtained which has antireflection capability allowing suppression of reflection to a level of 1% or less for a wavelength of 248 nm.
摘要翻译：在其上形成有二元光学结构的BOE（二进制光学元件）的背面涂覆有抗蚀剂膜。然后通过电子束蒸发将铬沉积在BOE上，以便形成岛尺寸为约50nm，岛至岛距离为约80nm的岛状结构。然后使用岛结构作为掩模，用蚀刻剂蚀刻BOE至55nm的深度，从而形成柱状微结构。通过使用蚀刻剂的湿蚀刻除去用作掩模的岛结构，并使用抗蚀剂去除剂去除BOE背面上的抗蚀剂膜。因此，获得了具有抗反射能力的微结构，其允许在248nm的波长下抑制反射至1％或更低的水平。

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