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1. 发明授权

US5155263A Process for preparing .alpha.-ketobutyric acid 失效
标题翻译：制备α-酮丁酸的方法
公开(公告)号：US5155263A
公开(公告)日：1992-10-13
申请号：US767359
申请日：1991-09-30
申请人： Makoto Imanari , Hiroshi Iwane , Masashi Suzuki , Naoki Suzuki
发明人： Makoto Imanari , Hiroshi Iwane , Masashi Suzuki , Naoki Suzuki
IPC分类号： B01J23/60 , B01J23/42 , B01J23/62 , C07B61/00 , C07C51/235 , C07C59/185
CPC分类号： C07C51/235
摘要： A process for preparing .alpha.-ketobutyric acid comprising contacting 1,2-butanediol with molecular oxygen in the presence of a platinum catalyst is disclosed. The process produces .alpha.-ketobutyric acid in high yield at low cost.
摘要翻译：公开了一种制备α-酮丁酸的方法，包括在铂催化剂存在下使1,2-丁二醇与分子氧接触。该方法以低成本高产率生产α-酮丁酸。

2. 发明授权

US4937392A Process for preparing 4,4'-dihydroxydiphenylmethane 失效
标题翻译：制备4,4'-二羟基二苯基甲烷的方法
公开(公告)号：US4937392A
公开(公告)日：1990-06-26
申请号：US317956
申请日：1989-03-02
申请人： Makoto Imanari , Hiroshi Iwane , Takahiro Sugawara , Satoshi Ohtaka , Naoki Suzuki
发明人： Makoto Imanari , Hiroshi Iwane , Takahiro Sugawara , Satoshi Ohtaka , Naoki Suzuki
IPC分类号： C07C37/72 , C07C27/00 , C07C37/20 , C07C39/16 , C07C67/00
CPC分类号： C07C37/20 , C07C37/70 , C07C37/84
摘要： A process for preparing 4,4'-dihydroxydiphenylmethane, which comprises reacting phenol with formaldehyde in the presence of an acidic catalyst and separating the aimed 4,4'-dihydroxydiphenylmethane from the crude dihydroxydiphenylmethane thus obtained, is disclosed. According to this process, 4,4'-dihydroxydiphenylmethane can be separated from its isomers and oligomers at a high purity and at a high yield, compared with those achieved by known methods. Thus highly useful 4,4'-dihydroxydiphenylmethane can be advantageously prepared on an industrial scale.

3. 发明授权

US5442103A Process for producing 2,6-naphthalenedicarboxylic acid 失效
标题翻译： 2,6-萘二甲酸的制备方法
公开(公告)号：US5442103A
公开(公告)日：1995-08-15
申请号：US153424
申请日：1993-11-16
申请人： Hiroshi Iwane , Takahiro Sugawara , Katsufumi Kujira , Naoki Suzuki , Tomoya Sakata
发明人： Hiroshi Iwane , Takahiro Sugawara , Katsufumi Kujira , Naoki Suzuki , Tomoya Sakata
IPC分类号： C07B61/00 , C07C51/265 , C07C63/38 , C07C51/21
CPC分类号： C07C51/265
摘要： A process for producing 2,6-naphthalenedicarboxylic acid by oxidizing 2,6-dimethylnaphthalene by molecular oxygen in the presence of a catalyst including cobalt, manganese and bromine. The oxidation reaction is performed by using a 2,6-dialkylnaphthalene mixture of 2,6-dimethynaphthalene and a small amount of 2,6-diisopropylnaphthalene as a raw material. Thus, the desired 2,6-naphthalenedicarboxylic acid can be produced at a high yield.
摘要翻译：在包括钴，锰和溴的催化剂存在下，通过用分子氧氧化2,6-二甲基萘来生产2,6-萘二甲酸的方法。通过使用2,6-二甲基萘和少量2,6-二异丙基萘作为原料的2,6-二烷基萘混合物进行氧化反应。因此，可以高产率制备所需的2,6-萘二甲酸。

4. 发明授权

US5196598A Process for producing polyhydroperoxy aromatic compound 失效
标题翻译：生产聚羟基芳族化合物的方法
公开(公告)号：US5196598A
公开(公告)日：1993-03-23
申请号：US779053
申请日：1991-10-18
申请人： Hiroshi Iwane , Takahiro Sugawara , Naoki Suzuki , Kimiko Kaneko
发明人： Hiroshi Iwane , Takahiro Sugawara , Naoki Suzuki , Kimiko Kaneko
IPC分类号： B01J23/14 , B01J23/75 , B01J23/755 , B01J27/053 , B01J27/128 , B01J27/135 , B01J27/138 , B01J27/18 , B01J27/185 , B01J27/232 , B01J27/25 , B01J27/26 , B01J31/04 , B01J31/22 , C07B61/00 , C07C407/00 , C07C409/08
CPC分类号： C07C409/08 , C07C407/00
摘要： A process for producing a polyhydroperoxy aromatic compound by oxidation of an aromatic hydrocarbon, e.g., 4,4'-diisopropylbiphenyl and 4,4'-diisopropylnaphthalene, with molecular oxygen is disclosed, in which the oxidation is carried out in the presence of a metal ion selected from cobalt, nickel, zinc and lead ions. Even in using a reaction apparatus made of an iron-containing metal generally employed in industry, a high conversion of secondary alkyl groups can be reached, and the desired polyhydroperoxy aromatic compound can be obtained in a high yield.

5. 发明授权

US5019656A Process for preparing p-hydroxybenzyl alcohol 失效
标题翻译：制备对羟基苄醇的方法
公开(公告)号：US5019656A
公开(公告)日：1991-05-28
申请号：US485482
申请日：1990-02-27
申请人： Hiroshi Iwane , Takahiro Sugawara , Naoki Suzuki
发明人： Hiroshi Iwane , Takahiro Sugawara , Naoki Suzuki
IPC分类号： C07C37/20
CPC分类号： C07C37/20 , C07C37/115
摘要： A process for preparing p-hydroxybenzyl alcohol or a derivative thereof comprising reacting a phenol and a formaldehyde source under a basic condition is disclosed, wherein the reaction is carried out in an alcoholic organic solvent in the presence of a crown ether. The process achieves high selectivity toward the para position without involving high cost.

6. 发明授权

US5220079A Process for para-methylolating phenol compounds 失效
标题翻译：对甲酚甲酚化合物的方法
公开(公告)号：US5220079A
公开(公告)日：1993-06-15
申请号：US807823
申请日：1992-04-24
申请人： Hiroshi Iwane , Takahiro Sugawara , Naoki Suzuki , Kimiko Kaneko
发明人： Hiroshi Iwane , Takahiro Sugawara , Naoki Suzuki , Kimiko Kaneko
IPC分类号： C07C37/20 , C07C39/11
CPC分类号： C07C37/115 , C07C37/20
摘要： A process for preparing phenols with high selectivities, comprising reacting a phenol compound and a formaldehyde source with a quaternary ammonium as a counter cation of a phenol anion in the presence of an alcoholic organic solvent.
摘要翻译： PCT No.PCT / JP91 / 00017 Sec。 371日期：1992年4月24日 102（e）日期1992年4月24日PCT 1991年1月11日PCT PCT。 WO91 / 18858 PCT公开号日本1991年12月12日。一种制备具有高选择性的酚的方法，包括在醇有机溶剂的存在下，使酚化合物和甲醛源与作为酚阴离子的抗衡阳离子的季铵反应。

7. 发明授权

US08896615B2 Image processing device, projector, and image processing method 有权
标题翻译：图像处理装置，投影机和图像处理方法
公开(公告)号：US08896615B2
公开(公告)日：2014-11-25
申请号：US13032927
申请日：2011-02-23
申请人： Naoki Suzuki
发明人： Naoki Suzuki
IPC分类号： G09G5/36 , H04N13/00 , H04N13/04 , H04N9/31
CPC分类号： H04N9/3197 , H04N9/3188 , H04N13/139 , H04N13/341 , H04N13/363
摘要： An image processing device includes: a horizontal resolution converting unit that converts a horizontal resolution of input image data to output horizontal resolution-converted image data; a line memory for the left eye and a line memory for the right eye that store the horizontal resolution-converted image data; a line memory specifying unit that specifies the line memory to store the horizontal resolution-converted image data; a line memory reading unit that reads the horizontal resolution-converted image data from either of the line memory for the left eye and the line memory for the right eye; and a vertical resolution converting unit that converts a vertical resolution of the horizontal resolution-converted image data read by the line memory reading unit to generate output image data.
摘要翻译：一种图像处理装置包括：水平分辨率转换单元，其将输入图像数据的水平分辨率转换为输出水平分辨率转换图像数据; 用于左眼的行存储器和用于存储水平分辨率转换的图像数据的用于右眼的行存储器; 行存储器指定单元，其指定用于存储水平分辨率转换图像数据的行存储器; 行存储器读取单元，用于从用于左眼的行存储器和用于右眼的行存储器中的任一个读取水平分辨率转换图像数据; 以及垂直分辨率转换单元，其转换由行存储器读取单元读取的水平分辨率转换图像数据的垂直分辨率，以生成输出图像数据。

8. 发明授权

US07946636B2 Vehicle front shock absorbing structure 有权
标题翻译：车前减震结构
公开(公告)号：US07946636B2
公开(公告)日：2011-05-24
申请号：US12445051
申请日：2007-10-02
申请人： Naoki Goda , Naoki Suzuki
发明人： Naoki Goda , Naoki Suzuki
IPC分类号： B60R19/22
CPC分类号： B60R19/18 , B60R2019/186
摘要： A front shock absorbing structure of a vehicle includes a bumper reinforcement member that is disposed in a vehicle width direction in a front portion of a vehicle body and is formed as a rigid elongated member, and a shock absorbing member that is positioned on a front surface of the bumper reinforcement member. The shock absorbing member is vertically divided into a first shock absorbing portion and a second shock absorbing portion. The first and second shock absorbing portions are integrally coupled to each other at a forward side, so as to define a space therebetween at a rearward side. The coupling can be broken when an impact is applied by an impactor from ahead. The second shock absorbing portion has a protruding portion that is projected toward the space.
摘要翻译：车辆的前部减震结构包括保险杠加强构件，该保险杠加强构件设置在车体前部的车辆宽度方向上，并且形成为刚性细长构件，以及位于前表面上的减震构件的保险杠加强件。冲击吸收构件被垂直地分成第一冲击吸收部分和第二冲击吸收部分。第一和第二冲击吸收部分在前侧彼此一体地联接，从而在后侧确定其间的空间。当冲击器从前方施加冲击时，联轴器可能会损坏。第二减震部具有向该空间突出的突出部。

9. 发明授权

US07635016B2 Board cleaning method, board cleaning apparatus, and component mounting method 失效
标题翻译：电路板清洁方法，电路板清洁装置和部件安装方法
公开(公告)号：US07635016B2
公开(公告)日：2009-12-22
申请号：US10265381
申请日：2002-10-07
申请人： Naoki Suzuki , Youichi Nakamura , Kazuyuki Tomita
发明人： Naoki Suzuki , Youichi Nakamura , Kazuyuki Tomita
IPC分类号： B29C65/00
CPC分类号： H05K3/26 , B08B7/0035 , H05K2203/095 , Y10S438/906 , Y10T156/14 , Y10T156/17
摘要： In a board cleaning method for dry cleaning of connection sites on resin-based boards, one or more gases selected from a group consisting of gas that contains a hydrogen element and gas that contains a fluorine element are supplied at least to the connection sites, plasma is generated from the supplied gas, and the boards are cleaned by radicals and ions that are produced by the generated plasma.
摘要翻译：在树脂基板上的连接部位的干式清洗用电路板清洗方法中，至少选择从包含氢元素的气体和含有氟元素的气体中选择的一种或多种气体到等离子体由所供应的气体产生，并且通过由所产生的等离子体产生的自由基和离子来清洁板。

10. 发明申请

US20090166839A1 SEMICONDUCTOR STACK DEVICE AND MOUNTING METHOD 审中-公开
标题翻译：半导体堆叠器件和安装方法
公开(公告)号：US20090166839A1
公开(公告)日：2009-07-02
申请号：US12342603
申请日：2008-12-23
申请人： Naoki Suzuki , Akihisa Nakahashi , Haneo Iwamoto , Manabu Gokan , Satoru Yuhaku
发明人： Naoki Suzuki , Akihisa Nakahashi , Haneo Iwamoto , Manabu Gokan , Satoru Yuhaku
IPC分类号： H01L23/48 , H01L21/02
CPC分类号： H01L25/0657 , H01L24/48 , H01L24/49 , H01L24/50 , H01L24/73 , H01L24/86 , H01L24/91 , H01L2224/32145 , H01L2224/32225 , H01L2224/48095 , H01L2224/48227 , H01L2224/49 , H01L2224/73219 , H01L2224/73265 , H01L2224/92247 , H01L2225/0651 , H01L2225/06562 , H01L2225/06572 , H01L2225/06579 , H01L2924/00014 , H01L2924/01004 , H01L2924/01005 , H01L2924/01006 , H01L2924/01033 , H01L2924/01074 , H01L2924/01079 , H01L2924/01082 , H01L2924/014 , H01L2924/07811 , H01L2924/15787 , H01L2924/19041 , H01L2924/19043 , H01L2924/30105 , H01L2924/00 , H01L2924/00012 , H01L2224/45099 , H01L2224/05599
摘要： A semiconductor stack device having semiconductor chips stacked therein, wherein pads 4d of an uppermost semiconductor chip 2d are disposed on the side of a base substrate 1, and the pads 4d of the semiconductor chip 2d and electrodes 8d of the base substrate 1 are connected to each other via a flexible substrate 5 having circuit components 7 mounted thereon.
摘要翻译：具有堆叠在其中的半导体芯片的半导体堆叠器件，其中最上半导体芯片2d的焊盘4d设置在基底衬底1的一侧，半导体芯片2d的焊盘4d和基底衬底1的电极8d连接到彼此通过安装在其上的电路元件7的柔性基板5。

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