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1. 发明授权

US06362084B1 Method of manufacturing a substrate for displays and a substrate for displays manufactured by same 失效
标题翻译：制造显示器用基板的方法和由其制造的显示器用基板
公开(公告)号：US06362084B1
公开(公告)日：2002-03-26
申请号：US09619329
申请日：2000-07-20
申请人： Maki Nakamura , Toshiaki Mizuno , Etsuo Ogino , Toshiaki Anzaki
发明人： Maki Nakamura , Toshiaki Mizuno , Etsuo Ogino , Toshiaki Anzaki
IPC分类号： H01L2120
CPC分类号： C03C17/3435 , C23C14/0676 , C23C14/3414
摘要： A method of manufacturing a substrate for displays is provided, which can easily control the surface electrical resistance of the anti-electrification film formed on a surface of the substrate, and a substrate for displays manufactured by the same method. The film is formed by preparing a target from a metal oxide, and forming a thin film of a metal oxynitride on a surface of the substrate by sputtering using the target in an atmosphere of a mixture gas of an inert gas and nitrogen, a mixing ratio of the inert gas and nitrogen in the atmosphere being adjusted such that the thin film has a desired surface electrical resistance.
摘要翻译：提供了一种制造用于显示器的基板的方法，其可以容易地控制形成在基板表面上的防电磁膜的表面电阻和通过相同方法制造的显示器基板。通过从金属氧化物制备靶材，并在惰性气体和氮气的混合气体的气氛中使用靶材溅射，在基板的表面上形成金属氮氧化物薄膜，混合比例的气氛中的惰性气体和氮气被调节，使得薄膜具有期望的表面电阻。

2. 发明授权

US06585871B1 Method of film deposition on substrate surface and substrate produced by the method 失效
公开(公告)号：US06585871B1
公开(公告)日：2003-07-01
申请号：US09553170
申请日：2000-04-20
申请人： Toshiaki Anzaki , Etsuo Ogino , Takayuki Toyoshima
发明人： Toshiaki Anzaki , Etsuo Ogino , Takayuki Toyoshima
IPC分类号： C25B1102
CPC分类号： H01J37/3429 , C23C14/027 , C23C14/352 , H01J37/3405
摘要： A method of film deposition is disclosed, which eliminates the conventional problem that a coating film having a component concentration gradient in the thickness direction and thus having a boundary with a compositional gradient or a coating film in which two or more components coexist as a mixture thereof cannot be stably obtained by sputtering. In the method, two planar cathodes are closely arranged as a pair, and a voltage is applied thereto while alternately inverting the polarities thereof so that when a target A bonded to one of the cathodes is used as a negative electrode, then a target B bonded to the other cathode and differing to the target A in component is used as a positive electrode. The targets A and B are simultaneously bombarded with positive ions while passing a substrate in front of the targets so as to cross the cathodes. Thus, a coating film having a boundary with a compositional gradient in the thickness direction or a coating film having a two-layer structure composed of a layer of ingredient A and a layer of ingredient B is deposited by sputtering through one-direction conveyance.

3. 发明授权

US06473235B2 Touch panel substrate having transparent conductive film 有权
标题翻译：具有透明导电膜的触摸屏基板
公开(公告)号：US06473235B2
公开(公告)日：2002-10-29
申请号：US09783331
申请日：2001-02-15
申请人： Takayuki Toyoshima , Daisuke Arai , Toshiaki Anzaki , Etsuo Ogino
发明人： Takayuki Toyoshima , Daisuke Arai , Toshiaki Anzaki , Etsuo Ogino
IPC分类号： G02B110
CPC分类号： G06F3/045 , B32B17/10018 , B32B17/10174
摘要： A transparent touch panel substrate comprising a transparent substrate and deposited thereon a transparent conductive metal oxide film which contains zinc, indium, and tin as metallic elements and is soluble in acids. The transparent conductive metal oxide film preferably contains zinc in an amount of from 40 to 65 atomic % based on all metals and contains indium in an amount of from 0.25 to 1.3 times the amount of tin on an atomic basis. The film preferably has a thickness of from 100 to 160 nm. Unlike the conventional substrate for resistive film type transparent touch panels which comprises a glass plate coated with a transparent conductive ITO film, the touch panel substrate of the invention combines three properties: high light transmittance; ease of processing in forming a transparent electrode by acid etching; and the transparent conductive film has a moderate sheet resistance of from 500 to 5,000&OHgr;. It therefore realizes a touch panel which combines the three functions of having satisfactory display quality, being of the power-saving type, and enabling touch switch operations to be conducted without fail.
摘要翻译：一种透明触摸面板基板，包括透明基板并且在其上沉积有透明导电金属氧化物膜，其包含锌，铟和锡作为金属元素并且可溶于酸。透明导电性金属氧化物膜优选含有相对于所有金属为40〜65原子％的量的锌，其含有锡原子量的0.25〜1.3倍的铟。该膜优选具有100至160nm的厚度。不同于传统的电阻膜型透明触摸屏基板，其包括涂有透明导电ITO膜的玻璃板，本发明的触摸面板基板结合了三种性能：高透光率; 通过酸蚀刻形成透明电极的易加工性; 并且透明导电膜具有500至5,000OMEGA的适度的薄层电阻。因此，实现了具有令人满意的显示质量，省电型的功能和能够不间断地进行触摸开关操作的三个功能的触摸面板。

4. 发明授权

US06579423B2 Light transmitting electromagnetic wave filter and process for producing the same 失效
公开(公告)号：US06579423B2
公开(公告)日：2003-06-17
申请号：US10011765
申请日：2001-12-11
申请人： Toshiaki Anzaki , Etsuo Ogino
发明人： Toshiaki Anzaki , Etsuo Ogino
IPC分类号： C23C1406
CPC分类号： H05K9/0096 , B32B17/10174 , C03C17/36 , C03C17/3613 , C03C17/3639 , C03C17/3644 , C03C17/3676 , C03C2217/78 , C23C14/08 , C23C14/3414 , G02B5/285 , G02B5/287 , H01J2211/446
摘要： A light transmitting electromagnetic wave filter comprising a transparent and a light transmitting electromagnetic wave shield film having a laminate structure composed of 2n+1 (n≧1) layers in which at least two dielectric layers and at least one silver layer are alternately laminated, with each other with the dielectric layer being the first to be provided on the transparent substrate, wherein at least one of the dielectric layers is an antistatic metal oxide layer having a refractive index of 1.6 to 2.7 at a wavelength of 550 nm, which is preferably formed by sputtering using a metal oxide, e.g., tin-containing indium oxide, as a target in an atmosphere having a reduced oxygen content. The electromagnetic wave filter has a high visible light transmission and a low near infrared transmission, is free from pin holes or contamination, and exhibits high durability against moist heat, etc.

5. 发明授权

US06316110B1 Electromagnetic wave filter for plasma display panel 失效
标题翻译：等离子显示面板用电磁波滤波器
公开(公告)号：US06316110B1
公开(公告)日：2001-11-13
申请号：US09265417
申请日：1999-03-10
申请人： Toshiaki Anzaki , Etsuo Ogino , Terufusa Kunisada
发明人： Toshiaki Anzaki , Etsuo Ogino , Terufusa Kunisada
IPC分类号： B32B1500
CPC分类号： H05K9/0096 , H01J11/10 , H01J11/44 , H01J29/868 , H01J2211/446 , Y10T428/24942 , Y10T428/24975 , Y10T428/265 , Y10T428/28 , Y10T428/2804
摘要： An electromagnetic wave filter for a plasma display panel which is effective in preventing incorrect actions of a remote control of appliances, comprising a transparent substrate, a light transmitting electromagnetic wave shield film, and a resin protective film, wherein the electromagnetic wave shield film is a 7-layered laminate in which a dielectric layer and a metal layer containing silver as the principal ingredient are laminated alternately with the dielectric layer being the first to be provided on the transparent substrate, the dielectric layer has a refractive index of 1.6 to 2.8 at 550 nm, and the metal layer containing silver as the principal ingredient contains 0.1 atomic % or more and less than 0.5 atomic % of palladium based on silver and has a thickness of 5 to 25 nm, whereby the electromagnetic wave shield film has a sheet resistance of 3 &OHgr;/□ or lower and a near infrared transmission of 20% or lower at 850 nm.
摘要翻译：一种用于等离子体显示面板的电磁波滤波器，其有效地防止了包括透明基板，透光电磁波屏蔽膜和树脂保护膜的电器遥控器的不正确动作，其中电磁波屏蔽膜是电介质层和含有银作为主要成分的金属层与首先被设置在透明基板上的电介质层交替叠层，其电介质层的折射率为1.6至2.8，550 nm，以银为主要成分的金属层含有0.1原子％以上且小于0.5原子％的基于银的钯，其厚度为5〜25nm，电磁波屏蔽膜的薄层电阻为 3欧米伽/平方或更低，在850nm处的近红外透射率为20％以下。

6. 发明授权

US06328857B1 Method for forming coating on substrate and sputtering apparatus used for the method 失效
标题翻译：在基板上形成涂层的方法和用于该方法的溅射装置
公开(公告)号：US06328857B1
公开(公告)日：2001-12-11
申请号：US09632617
申请日：2000-08-04
申请人： Toshiaki Anzaki , Etsuo Ogino
发明人： Toshiaki Anzaki , Etsuo Ogino
IPC分类号： C23C1434
CPC分类号： C23C14/3464 , H01J37/34
摘要： Sputtering method and apparatus for forming a coating on both sides of a flat substrate or on the entire surface of a bulky substrate without involving rotation of the substrate. At least one pair of sputtering cathodes each having a target attached thereto are arranged in a film-forming chamber capable of controlling a vacuum atmosphere with their target sides facing each other, and a substrate is disposed in front of the targets. A voltage is applied to the sputtering cathodes in such a manner that the polarity alternates between the sputtering cathodes making the pair to induce a glow discharge between the sputtering cathodes. The target on each sputtering cathode is thereby sputtered and deposited on the substrate.
摘要翻译：溅射方法和装置，用于在平坦基板的两侧或在庞大的基板的整个表面上形成涂层，而不涉及基板的旋转。每个具有附着靶的至少一对溅射阴极布置在能够控制其目标侧面对的真空气氛的成膜室中，并且将基板设置在靶的前方。以这样的方式将溅射阴极施加电压，使得溅射阴极之间的极性交替地使得该溅射阴极在溅射阴极之间引起辉光放电。因此，溅射阴极上的靶被溅射并沉积在衬底上。

7. 发明授权

US06277507B1 Method for coating insulating film and glass substrate for image display using the same 失效
标题翻译：用于涂覆绝缘膜的方法和使用其的图像显示用玻璃基板
公开(公告)号：US06277507B1
公开(公告)日：2001-08-21
申请号：US09336784
申请日：1999-06-21
申请人： Toshiaki Anzaki , Etsuo Ogino
发明人： Toshiaki Anzaki , Etsuo Ogino
IPC分类号： B32B900
CPC分类号： C03C17/3417 , C03C17/3435 , C23C14/0036 , C23C14/0652 , C23C14/0676 , C23C14/10 , G02F1/133345 , Y10T428/12014 , Y10T428/24967 , Y10T428/24975
摘要： A process for inexpensively producing an insulating substrate suitable for use in image displays fabricated through a high-temperature production step, such as plasma displays and field emission displays (FED). A multilayered insulating film of one member selected from SiO2, a silicon oxynitride, and a silicon nitride is coated on a surface of a glass plate by reactive sputtering using one or more silicon targets in oxygen or/and nitrogen. The interface between layers in the multilayered insulating film functions to trap sodium ions thermally diffusing from the glass, whereby the amount of sodium ions which dissolve in the insulating film and reach the surface thereof is considerably reduced.
摘要翻译：廉价地制造适合于通过高温生产步骤（诸如等离子体显示器和场发射显示器（FED））制造的图像显示器中的绝缘衬底的方法。通过使用氧或/和氮中的一种或多种硅靶通过反应溅射将选自SiO 2，氮氧化硅和氮化硅中的一种的多层绝缘膜涂覆在玻璃板的表面上。多层绝缘膜中的层之间的界面用于捕获从玻璃热扩散的钠离子，从而大大降低了溶解在绝缘膜中并到达其表面的钠离子的量。

8. 发明授权

US6040056A Transparent electrically conductive film-attached substrate and display element using it 失效
标题翻译：透明导电膜附着基板和使用它的显示元件
公开(公告)号：US6040056A
公开(公告)日：2000-03-21
申请号：US864985
申请日：1997-05-29
申请人： Toshiaki Anzaki , Etsuo Ogino
发明人： Toshiaki Anzaki , Etsuo Ogino
IPC分类号： G02F1/1343 , B32B7/02 , B32B9/00 , B32B15/04 , C01G15/00 , C03C17/36 , H01B5/14
CPC分类号： C03C17/3613 , C03C17/36 , C03C17/3639 , C03C17/3644 , C03C17/3655 , C03C17/3671 , H01L51/5215 , C03C2217/78 , C03C2217/948
摘要： A transparent electrically conductive film-attached substrate comprising a transparent glass substrate having formed on the surface thereof a transparent electrically conductive film, wherein the transparent electrically conductive film is formed by successively laminating a reflection preventing layer, a silver layer or a metal layer comprising silver as the main component, and a reflection preventing layer, and the reflection preventing layer comprises a composite oxide of zinc and indium. Atomic ratio of zinc and indium of the reflection preventing layer represented by Ad zinc/(zinc+indium) is from 0.03 to 0.9.The substrate has both the moisture and heat resistance and the alkali resistance and is suitable for a display element such as a liquid crystal cell.
摘要翻译：一种透明导电膜附着基板，其具有透明玻璃基板，该透明玻璃基板的表面形成有透明导电膜，其中，所述透明导电膜通过依次层叠防反射层，银层或包含银的金属层而形成作为主要成分和反射防止层，防反射层包含锌和铟的复合氧化物。由Ad锌/（锌+铟）表示的防反射层的锌和铟的原子比为0.03〜0.9。基板具有耐湿热性和耐碱性，并且适用于诸如液晶单元的显示元件。

9. 发明授权

US06761984B2 Article coated with photocatalyst film, method for preparing the article and sputtering target for use in coating with the film 失效
标题翻译：涂有光催化膜的制品，用于制备该制品的方法和用于涂覆该膜的溅射靶
公开(公告)号：US06761984B2
公开(公告)日：2004-07-13
申请号：US10168253
申请日：2002-09-23
申请人： Toshiaki Anzaki , Daisuke Arai , Yoshifumi Kijima
发明人： Toshiaki Anzaki , Daisuke Arai , Yoshifumi Kijima
IPC分类号： B32B900
CPC分类号： C23C14/083 , B01J35/002 , B01J35/004 , B01J37/34 , C23C14/06 , C23C14/08 , C23C14/3414 , C23C14/3464
摘要： This invention relates to an article having a substrate with a photocatalyst coating film formed thereon by ae sputtering method, characterized in that the photocatalyst coating film comprises titanium oxide as a main component and at least one kind of metal having a sputtering rate for Ar being 0.9 to 2.7 times that of Ti, preferably at least one kind of metal selected from the group consisting of Fe, V, Mo, Nb, Al and Cr, in an amount of 0.01 to 10 wt % in terms of the sum of such metals. The coating film is formed by a method using a Ti metal sputtering target or a Ti sub-oxide sputtering target containing the metal in an amount of 0.01 to 10 wt % in terms of the sum of such metals, or a method using two kinds of targets for two sputtering cathodes and applying reversing potential so as to have a cathode and an anode alternately.
摘要翻译：本发明涉及具有通过溅射法在其上形成的光催化剂涂膜的基板的制品，其特征在于，所述光催化剂涂膜包含氧化钛作为主要成分，并且至少一种具有Ar的溅射速率的金属为0.9 至Ti，优选选自Fe，V，Mo，Nb，Al和Cr中的至少一种金属的2.7倍，相对于这些金属的总量为0.01〜10重量％。通过使用含有该金属的0.01〜10重量％的金属的Ti金属溅射靶或Ti亚氧化物溅射靶的方法形成涂膜，或者使用两种用于两个溅射阴极并且施加反向电位以交替地具有阴极和阳极。

10. 发明申请

US20070082205A1 Photocatalytic member 审中-公开
标题翻译：光触媒成员
公开(公告)号：US20070082205A1
公开(公告)日：2007-04-12
申请号：US10560053
申请日：2004-06-09
申请人： Toshiaki Anzaki , Yoshitumi Kijima
发明人： Toshiaki Anzaki , Yoshitumi Kijima
IPC分类号： B32B17/06 , B32B15/04 , B32B9/00
CPC分类号： B01J21/066 , B01J21/063 , B01J35/004 , B01J37/0228 , B01J37/0238 , B01J37/0244 , B01J37/347 , C03C17/3417 , C03C17/36 , C03C2217/425 , C03C2217/71 , C03C2217/75 , C03C2217/948 , C03C2218/154 , C03C2218/365 , C23C28/042 , C23C28/322 , C23C28/345 , C23C28/3455 , C23C28/42
摘要： A photocatalytic member which does not undergo heat treatment is provided. A photocatalyst layer is formed on the surface of a substrate through the intermediary of an undercoat layer. The main component of the undercoat layer is a crystalline zirconium compound, the photocatalyst layer is constituted of a crystalline phase, and the substrate has a low heat resistant element.
摘要翻译：提供了不进行热处理的光催化剂。在底涂层的表面上通过底涂层形成光催化剂层。底涂层的主要成分是结晶锆化合物，光催化剂层由结晶相构成，基材具有低耐热性元素。

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