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1. 发明专利

MY135469A SINGLE PHASE FLUID IMPRINT LITHOGRAPHY METHOD 未知
公开(公告)号：MY135469A
公开(公告)日：2008-04-30
申请号：MYPI20043967
申请日：2004-09-28
申请人： MOLECULAR IMPRINTS INC , UNIV TEXAS
发明人： MCMACKIN IAN M , BABBS DANIEL A , VOTH DUANE J , WATTS MICHAEL P C , TRUSKETT X H VAN , XU FRANK Y , VOISIN RONALD D , LAD PANKAJ B , STACEY NICHOLAS A
IPC分类号： B01D19/00 , B29C59/02 , C23F1/00 , G03F20060101 , G03F7/00
摘要： THE PRESENT INVENTION IS DIRECTED TOWARD A METHOD FOR REDUCING PATTERN DISTORTIONS IN IMPRINTING LAYERS BY REDUCING GAS POCKETS PRESENT IN A LAYER OF VISCOUS LIQUID DEPOSITED ON A SUBSTRATE (30). TO THAT END, THE METHOD INCLUDES VARYING THE TRANSPORT OF GASES DISPOSED PROXIMATE TO THE VISCOUS LIQUID. SPECIFICALLY, THE ATMOSPHERE (78) PROXIMATE TO THE SUBSTRATE (30) WHEREIN A PATTERN IS TO BE RECORDED IS SATURATED WITH GASES THAT ARE EITHER HIGHLY SLUBLE, HIGHLY DIFFUSIVE, OR BOTH WITH RESPECT TO THE VISCOUS LIQUID BEING DEPOSITED. ADDITIONALLY, OR IN LIEU OF SATURATING THE ATMOSPHERE (78), THE PRESSURE OF THE ATMOSPHERE (78) MAY BE REDUCED.(FIG 2)

2. 发明专利

MY141006A MATERIALS FOR IMPRINT LITHOGRAPHY. 未知
公开(公告)号：MY141006A
公开(公告)日：2010-02-12
申请号：MYPI20050662
申请日：2005-02-22
申请人： MOLECULAR IMPRINTS INC , UNIV TEXAS
发明人： XU FRANK Y , WATTS MICHAEL P C , STACEY NICHOLAS A
IPC分类号： C08K5/54 , C08J7/16 , C08J7/18 , C08K3/00 , C08K5/541 , C09D11/10
摘要： (0051] THE PRESENT INVENTION IS DIRECTED TO A MATERIAL FOR USE IN IMPRINT LITHOGRAPHY THAT FEATURES A COMPOSITION HAVING A VISCOSITY ASSOCIATED THEREWITH AND INCLUDING A SURFACTANT, A POLYMERIZABLE COMPONENT, AND AN INITIATOR RESPONSIVE TO A STIMULI TO VARY THE VISCOSITY IN RESPONSE THERETO, WITH THE COMPOSITION, IN A LIQUID STATE, HAVING THE VISCOSITY BEING LOWER THAN ABOUT 100 CENTIPOISES, A VAPOR PRESSURE OF LESS THAN ABOUT 20 TORR, AND IN A SOLID CURED STATE A TENSILE MODULUS OF GREATER THAN ABOUT 100 MPa, A BREAK STRESS OF GREATER THAN ABOUT 3 MPa AND AN ELONGATION AT BREAK OF GREATER THAN ABOUT 2%.

3. 发明专利

MY136832A METHOD TO REDUCE ADHESION BETWEEN A CONFORMABLE REGION AND A PATTERN OF A MOLD 未知
公开(公告)号：MY136832A
公开(公告)日：2008-11-28
申请号：MYPI20042293
申请日：2004-06-15
申请人： MOLECULAR IMPRINTS INC , UNIV TEXAS
发明人： CHOI BYUNG-JIN , XU FRANK Y , STACEY NICHOLAS A , TRUSKETT N VAN , WATTS MICHAEL P C
IPC分类号： B29C20060101 , B29C59/00 , G03F7/00
摘要： THE PRESENT INVENTION PROVIDES A METHOD TO REEDUCE ADHESION BETWEEN A CONFORMABLE REGION ON A SUBSTRATE AND A PATTERN OF A MOLD, WHICH SELECTIVELY COMES INTO CONTACT WITH THE CONFORMABLE REGION. THE METHOD FEATURES FORMING A CONFORMABLE MATERIAL ON THE SUBSTRATE AND CONTACTING THE CONFORMABLE MATERIAL WITH THE SURFACE. A CONDITIONED LAYER IS FORMED FROM THE CONFORMABLE MATERIAL. THE CONDITIONED LAYER HAS FIRST AND SECOND SUB-PORTIONS,WITH THE FIRST SUB-PORTION BEING SOLIDIFIED AND THE SECOND SUB-PORTION HAVING A FIRST AFFINITY FOR THE SURFACE AND A SECOND AFFINITY FOR THE FIRST SUB-PORTION.THE FIRST AFFINITY IS GREATER THAN THE SECOND AFFINITY. IN THIS FASHION, UPON SEPARATION OF THE MOLD FROM THE CONDITIONED LAYER, A SUBSET OF THE SECOND SUB-PORTION MAINTAINS CONTACT WITH THE MOLD,THEREBY REDUCING THE PROBABILITY THAT A PATTERN FORMED IN THE CONDITIONED LAYER BECOMES COMPROMISED.

4. 发明专利

SG128681A1 Single phase fluid imprint lithography method 未知
公开(公告)号：SG128681A1
公开(公告)日：2007-01-30
申请号：SG200608694
申请日：2004-09-24
申请人： MOLECULAR IMPRINTS INC , UNIV TEXAS
发明人： MCMACKIN IAN M , BABBS DANIEL A , VOTH DUANE J , WATTS MICHAEL P C , TRUSKETT VAN N , XU FRANK Y , VOISIN RONALD F , LAD PANKAJ B , STACEY NICHOLAS A
IPC分类号： B01D19/00 , B29C59/02 , C23F1/00 , G03F20060101 , G03F7/00
摘要： The present invention is directed toward a method of controlling a turbulent flow of a fluid between a substrate and a template, and more specifically, controlling a turbulent flow of a fluid between droplets disposed on a substrate and a template. To that end, the method further comprises the ingression and egression of the fluid through a first and second aperture, and in a further embodiment, a plurality of apertures, to create such a turbulent flow of the fluid.

5. 发明申请

WO2005000552A2 METHOD TO REDUCE ADHESION BETWEEN A CONFORMABLE REGION AND A PATTERN OF A MOLD 审中-公开
标题翻译：减少一个合格区域和一个模具图案之间的粘合力的方法
公开(公告)号：WO2005000552A2
公开(公告)日：2005-01-06
申请号：PCT/US2004018857
申请日：2004-06-10
申请人： MOLECULAR IMPRINTS INC , UNIV TEXAS
发明人： CHOI BYUNG-JIN , XU FRANK Y , STACEY NICHOLAS A , TRUSKETT VAN N , WATTS MICHAEL P C
IPC分类号： B29C20060101 , B29C59/00 , G03F7/00 , B29C
CPC分类号： B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： The present invention provides a method to reduce adhesion between a conformable region on a substrate and a pattern of a mold, which selectively comes into contact with the conformable region. The method features forming a conformable material on the substrate and contacting the conformable material with the surface. A conditioned layer is formed from the conformable material. The conditioned layer has first and second sub-portions, with the first sub-portion being solidified and the second sub-portion having a first affinity for the surface and a second affinity for the first sub-portion. The first affinity is greater than the second affinity. In this fashion, upon separation of the mold from the conditioned layer, a subset of the second sub-portion maintains contact with the mold, thereby reducing the probability that a pattern formed in the conditioned layer becomes compromised.
摘要翻译：本发明提供一种降低基材上的适形区域和选择性地与适形区域接触的模具图案之间的粘附性的方法。该方法的特征在于在基底上形成适形材料并使适形材料与表面接触。由适形材料形成调理层。调理层具有第一和第二子部分，其中第一子部分被固化，第二子部分对于表面具有第一亲和力，对第一子部分具有第二亲和力。第一亲和力大于第二亲和力。以这种方式，在模具与调理层分离时，第二子部分的子集保持与模具的接触，从而降低在调理层中形成的图案变得损害的可能性。

6. 发明公开

EP1633545A4 METHOD TO REDUCE ADHESION BETWEEN A CONFORMABLE REGION AND A PATTERN OF A MOLD 有权转让
标题翻译：程序责任之间的柔软的面积和形状的一种形式减少
公开(公告)号：EP1633545A4
公开(公告)日：2009-05-06
申请号：EP04776543
申请日：2004-06-10
申请人： MOLECULAR IMPRINTS INC , UNIV TEXAS
发明人： CHOI BYUNG-JIN , XU FRANK Y , STACEY NICHOLAS A , TRUSKETT VAN N , WATTS MICHAEL P C
IPC分类号： B29C59/00 , B29C20060101 , G03F7/00
CPC分类号： B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： The present invention provides a method to reduce adhesion between a conformable region on a substrate and a pattern of a mold, which selectively comes into contact with the conformable region. The method features forming a conformable material on the substrate and contacting the conformable material with the surface. A conditioned layer is formed from the conformable material. The conditioned layer has first and second sub-portions, with the first sub-portion being solidified and the second sub-portion having a first affinity for the surface and a second affinity for the first sub-portion. The first affinity is greater than the second affinity. In this fashion, upon separation of the mold from the conditioned layer, a subset of the second sub-portion maintains contact with the mold, thereby reducing the probability that a pattern formed in the conditioned layer becomes compromised.

7. 发明公开

EP1718697A4 MATERIALS FOR IMPRINT LITHOGRAPHY 审中-公开
标题翻译：材料压印光刻
公开(公告)号：EP1718697A4
公开(公告)日：2007-03-21
申请号：EP05722972
申请日：2005-02-14
申请人： MOLECULAR IMPRINTS INC , UNIV TEXAS
发明人： XU FRANK Y , WATTS MICHAEL P C , STACEY NICHOLAS A
IPC分类号： C08K5/54 , C08J7/16 , C08J7/18 , C08K3/00 , C08K5/541 , C09D11/10
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , C09D11/101
摘要： The present invention is directed to a material for use in imprint lithography that features a composition having a viscosity associated therewith and including a surfactant, a polymerizable component, and an initiator responsive to a stimuli to vary the viscosity in response thereto, with the composition, in a liquid state, having the viscosity being lower than about 100 centipoises, a vapor pressure of less than about 20 Torr, and in a solid cured state a tensile modulus of greater than about 100 MPa, a break stress of greater than about 3 MPa and an elongation at break of greater than about 2%.

8. 发明专利

JP2012195610A Materials for imprint lithography 有权
标题翻译：材料缩图
公开(公告)号：JP2012195610A
公开(公告)日：2012-10-11
申请号：JP2012139488
申请日：2012-06-21
申请人： Molecular Imprints Inc , Board Of Regents The Univ Of Texas System , ボード・オブ・リージエンツ,ザ・ユニバーシテイ・オブ・テキサス・システム , モレキュラー・インプリンツ・インコーポレーテッド
发明人： XU FRANK Y , WATTS MICHAEL P C , STACEY NICHOLAS A
IPC分类号： H01L21/027 , C08F2/48 , C08F20/00 , C08J7/16 , C08J7/18 , C08K3/00 , C08K5/54 , C08K5/541 , C09D11/10
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , C09D11/101
摘要： PROBLEM TO BE SOLVED: To prevent a relief pattern recorded in a solidified polymeric material from being distorted during separation of an imprint template from a substrate, by resolving issues, so-called release characteristics, that first the solidified polymeric material ought to adhere well to a transfer layer on the substrate, and second, it ought to be easily released from a surface of the imprint template.SOLUTION: An imprinting material contains a fluorinated surfactant, a photoinitiator, and a monomer selected from a monomer group consisting of acrylates and methacrylates.
摘要翻译：要解决的问题：为了防止记录在固化的聚合物材料中的浮雕图案在将印模模板与基材分离期间变形，通过解决问题，所谓的剥离特性，首先固化的聚合材料应该很好地粘附到基板上的转印层，其次应该容易地从压印模板的表面释放。解决方案：压印材料包含氟化表面活性剂，光引发剂和选自由丙烯酸酯和甲基丙烯酸酯组成的单体组的单体。版权所有（C）2013，JPO＆INPIT

9. 发明专利

JP2010192911A Single phase fluid imprint lithography method 有权
标题翻译：单相流体印迹光刻法
公开(公告)号：JP2010192911A
公开(公告)日：2010-09-02
申请号：JP2010077189
申请日：2010-03-30
申请人： Board Of Regents The Univ Of Texas System , Molecular Imprints Inc , ボード・オブ・リージエンツ,ザ・ユニバーシテイ・オブ・テキサス・システム , モレキュラー・インプリンツ・インコーポレーテッド
发明人： MCMACKIN IAN M , BABBS DANIEL A , VOTH DUANE J , WATTS MICHAEL P C , TRUSKETT VAN N , XU FRANK Y , VOISIN RONALD D , LAD PANKAJ B , STACEY NICHOLAS A
IPC分类号： H01L21/027 , B01D19/00 , B29C59/02 , C23F1/00 , G03F20060101 , G03F7/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , Y10S425/06 , Y10S425/815 , Y10S438/909
摘要： PROBLEM TO BE SOLVED: To provide a method for reducing pattern distortions in imprinting layers by greatly reducing gas pockets present in the layer of viscous liquid deposited on a substrate. SOLUTION: The method includes a step of varying transport of gases disposed proximate to the viscous liquid. Specifically, the atmosphere proximate to the substrate wherein a pattern is to be recorded is saturated with gases that are either highly soluble, highly diffusive, or both with respect to the viscous liquid being deposited. Additionally, or in lieu of saturating the atmosphere, the pressure of the atmosphere can be reduced. COPYRIGHT: (C)2010,JPO&INPIT

10. 发明专利

JP2010192912A Single phase fluid imprint lithography method 有权
公开(公告)号：JP2010192912A
公开(公告)日：2010-09-02
申请号：JP2010077193
申请日：2010-03-30
申请人： Board Of Regents The Univ Of Texas System , Molecular Imprints Inc , ボード・オブ・リージエンツ,ザ・ユニバーシテイ・オブ・テキサス・システム , モレキュラー・インプリンツ・インコーポレーテッド
发明人： MCMACKIN IAN M , BABBS DANIEL A , VOTH DUANE J , WATTS MICHAEL P C , TRUSKETT VAN N , XU FRANK Y , VOISIN RONALD D , LAD PANKAJ B , STACEY NICHOLAS A
IPC分类号： H01L21/027 , B01D19/00 , B29C59/02 , C23F1/00 , G03F20060101 , G03F7/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , Y10S425/06 , Y10S425/815 , Y10S438/909
摘要： PROBLEM TO BE SOLVED: To provide a method for reducing pattern distortions in imprinting layers by greatly reducing gas pockets present in the layer of viscous liquid deposited on a substrate. SOLUTION: The method includes a step of varying transport of gases disposed proximate to the viscous liquid. Specifically, the atmosphere proximate to the substrate wherein a pattern is to be recorded is saturated with gases that are either highly soluble, highly diffusive, or both with respect to the viscous liquid being deposited. Additionally, or in lieu of saturating the atmosphere, the pressure of the atmosphere can be reduced. COPYRIGHT: (C)2010,JPO&INPIT

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